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Dopant enhanced in nickel silicide formation for high-k dielectric applications
Online Contents | 2009| -
Dopant enhanced in nickel silicide formation for high-k dielectric applications
Springer Verlag | 2009| -
Dopant enhanced in nickel silicide formation for high-k dielectric applications
Online Contents | 2009| -
Dopant enhanced in nickel silicide formation for high-k dielectric applications
British Library Online Contents | 2010| -
Control of Interface Traps in HfO2 Gate Dielectric on Silicon
British Library Online Contents | 2010| -
Investigation of the Interfaces in Ni-FUSI/Hf-Based/Si and Ni-FUSI/SiO2/Si Stacks by Physical and Electrical Characterization Techniques
British Library Online Contents | 2009| -
Crime victimization and the implications for individual health and wellbeing: A Sheffield case study
British Library Online Contents | 2016| -
The influence of temperature and precipitation climate regimes on vegetation dynamics in the US Great Plains: a satellite bioclimatology case study
British Library Online Contents | 2007| -
Challenges and performance limitations of high-k and oxynitride gate dielectrics for 90/65nm CMOS technology
British Library Online Contents | 2007| -
Singularity problem in the [non-Roman script word] model with nonminimal coupling (10 pages)
British Library Online Contents | 2012| -
Aberrant immunoarchitecture distinguishes hyperplastic germinal centres in pattern 1 angioimmunoblastic T-cell lymphoma from reactive follicles
British Library Online Contents | 2014|
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