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Surface characterization of ion-enhanced implanted photoresist removal
American Institute of Physics | 2006| -
Effects of UV cure on glass structure and fracture properties of nanoporous carbon-doped oxide thin films
National licenceAmerican Institute of Physics | 2008| -
Composition and structure of the native Si oxide by high depth resolution medium energy ion scattering
National licenceElsevier | 1991| -
Shallow junction formation by decaborane molecular ion implantation
American Institute of Physics | 2000| -
Angled implants for controlling gate#8211source-drain extension: A TCAD modeling study
Online Contents | 2005|Contributors: Al-Bayati, Amir -
Apparatus and method for substrate clamping in a plasma chamber
Free accessEuropean Patent Office | 2016| -
Evidence for competing growth phases in ion-beam-deposited epitaxial silicon films
National licenceTaylor & Francis Verlag | 1990| -
Surface characterization of ion-enhanced implanted photoresist removal
Online Contents | 2006|Contributors: Al-Bayati, Amir -
Characterization and reduction of a new particle defect mode in sub-0.25#956m semiconductor process flows
Online Contents | 2005|Contributors: Al-Bayati, Amir -
Effects of UV cure on glass structure and fracture properties of nanoporous carbon-doped oxide thin films
Online Contents | 2008|Contributors: Al-Bayati, Amir
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