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Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
Online Contents | 2013|Contributors: Lee, Sanghun -
What is the source of pressure pain during abdominal examination in Korean medicine?
Free accessDOAJ | 2020| -
Molecular detection based on the electrical conductance of gold nanoparticle arrays
Tema Archive | 2011| -
Oxygen plasma effects on the electrical conductance of single-walled carbon nanotube bundles
National licenceIOP Institute of Physics | 2010| -
Flexible resistive random access memory using solution-processed TiOx with Al top electrode on Ag layer-inserted indium-zinc-tin-oxide-coated polyethersulfone substrate
Online Contents | 2011|Contributors: Jeon, Sanghun -
Impact of oxygen incorporation at the Si3N4/Al2O3 interface on retention characteristics for nonvolatile memory applications
National licenceAmerican Institute of Physics | 2008| -
Plasmon resonance changes of gold nanoparticle arrays upon modification
National licenceIOP Institute of Physics | 2009| -
High-Performance Implantable Bioelectrodes with Immunocompatible Topography for Modulation of Macrophage Responses
American Chemical Society | 2022| -
Case study of fault detection and diagnosis of a household air conditioner with a dynamic refrigeration cycle simulator
Online Contents | 2016|Contributors: Seo, Jung Ah, Kim, Sanghun -
Transient charge trapping and detrapping properties of a thick SiO2-Al2O3 stack studied by short single pulse Id-Vg
Online Contents | 2009|Contributors: Jung, Seungjae, Jeon, Sanghun -
Plasmon resonance changes of gold nanoparticle arrays upon modification
Online Contents | 2009|Contributors: Kim, Sanghun, Song, Jung-Hoon -
Impact of oxygen incorporation at the Si3N4-Al2O3 interface on retention characteristics for nonvolatile memory applications
Online Contents | 2008|Contributors: Jung, Seungjae, Jeon, Sanghun -
Semiconductors - Electrical Characteristics of ZrO2 Gate Dielectric Deposited on Ultrathin Silicon Capping Layer for SiGe Metal-Oxide-Semiconductor Device Applications (Short Note)
Online Contents | 2002|Contributors: Jeon, Sanghun, Lim, Jung-Wook
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