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Interfacial structure analysis of polymer laminate using SPring-8 X-ray microbeam
Online Contents | 2007| -
A Monte Carlo simulation of primary and secondary electron trajectories in a specimen
National licenceAmerican Institute of Physics | 1989| -
Influence of Electron Scattering on Resist Pattern Edge Roughness in Low Dose Electron Beam Lithography
British Library Online Contents | 2006| -
Three-dimensional simulation of resist pattern deformation by surface tension at the drying process
Online Contents | 2005| -
Three-dimensional simulation of resist pattern deformation by surface tension at the drying process
Online Contents | 2005| -
Computational Assignment of the EC Numbers for Genomic-Scale Analysis of Enzymatic Reactions
Online Contents | 2004| -
Analysis of Resist Surface Deformation during Electron Beam Irradiation (5 pages)
British Library Conference Proceedings | 2010| -
Simulation of Fogging Electrons in Electron Beam Lithography (4 pages)
British Library Online Contents | 2009| -
Simulation of Fogging Electrons in Electron Beam Lithography (4 pages)
British Library Conference Proceedings | 2009| -
Analysis of Resist Surface Deformation during Electron Beam Irradiation (5 pages)
British Library Online Contents | 2010| -
Water and oil repellency of polysiloxanes with highly fluorinated alkyl side chains
Tema Archive | 2003| -
Influence of the scattered electrons at the mask in a projection lithography system
Online Contents | 2001| -
Simulation of time-dependent charging of resist on Si under electron-beam irradiation
British Library Online Contents | 2001|
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