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Experimental Observations of the Redistribution of Implanted Nitrogen at the Si-SiO~2 Interface During RTA Processing
British Library Conference Proceedings | 1999| -
Photolithography Yield Enhancement Due to Within Wafer Depth Focus Improvement
British Library Conference Proceedings | 1999| -
Cost and Initial Performance Observations of CMP vs. Spin-Etch Processing for Removal of Copper Metalization from Patterned Low-k Materials
British Library Conference Proceedings | 2000| -
Characterization of UV6 photoresist stabiliztion and implant masking for exclusive implementation in 180-nm device processing [3999-84]
British Library Conference Proceedings | 2000| -
Clean solutions to the incoming wafer quality impact on lithography process yield limits in a dynamic copper/low-k research and development environment [3998-33]
British Library Conference Proceedings | 2000| -
Experimental observations of the thermal stability of high-k gate dielectric materials on silicon
British Library Online Contents | 2002| -
Physical Characterization of High-K Gate Dielectric Film Systems Processed by RTA and Spike Anneal
British Library Conference Proceedings | 2002| -
Experimental observations of the thermal stability of high-k gate dielectric materials on silicon
British Library Conference Proceedings | 2002| -
Novel technique for contamination analysis around the edge, the bevel, and the edge exclusion area of 200- and 300-mm silicon wafers [5041-14]
British Library Conference Proceedings | 2003| -
Investigations of the Structure and Stability of Alternative Gate Dielectrics
British Library Conference Proceedings | 2003| -
Phase Separation in Hafnium Silicates for Alternative Gate Dielectrics Influence on the Unoccupied States
British Library Online Contents | 2003| -
Grazing-incidence small angle x-ray scattering studies of phase separation in hafnium silicate films
British Library Online Contents | 2003| -
Physicochemical properties of HfO~2 in response to rapid thermal anneal
British Library Online Contents | 2003| -
Physical and Electrical Characterization of Hafnium Silicate Thin Films
British Library Conference Proceedings | 2003| -
Application of Metastable Phase Diagrams to Silicate Thin Films for Alternative Gate Dielectrics
British Library Online Contents | 2003| -
Physical and Electrical Characterization of Hafnium Silicate Thin Films
British Library Conference Proceedings | 2003| -
Physical and electrical characterization of polysilicon vs. TiN gate electrodes for HfO2 transistors
British Library Online Contents | 2004| -
Physical and electrical characterization of polysilicon vs. TiN gate electrodes for HfO~2 transistors
British Library Conference Proceedings | 2004| -
Characterization of advanced gate stacks for Si CMOS by electron energy-loss spectroscopy in scanning transmission electron microscopy
British Library Online Contents | 2005|
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