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Impact of alternating phase-shift mask quality on 100-nm gate lithography [4186-45]
British Library Conference Proceedings | 2001| -
Modeling defect-feature interactions in the presence of aberrations [4186-43]
British Library Conference Proceedings | 2001| -
Ion projection lithography: new insights and results of this NGL technology [4186-28]
British Library Conference Proceedings | 2001| -
Practical defect-sizing issues for UV inspection of 248-nm embedded attenuated PSM contact layer [4186-22]
British Library Conference Proceedings | 2001|
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