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The information industry, multinational corporations and urbanisation in the Pacific Asian countries: A research agenda
National licenceElsevier | 1986| -
Effect of Al Incorporation in the Thermal Stability of Atomic-Layer-Deposited HfO~2 for Gate Dielectric Applications
British Library Online Contents | 2007| -
A novel approach of using a MBE template for ALD growth of high-k dielectrics
British Library Conference Proceedings | 2007| -
A novel approach of using a MBE template for ALD growth of high-k dielectrics
British Library Online Contents | 2007| -
3.3 Invited: High K Gate Dielectrics for the Silicon Industry
British Library Conference Proceedings | 2001| -
A novel approach of using a MBE template for ALD growth of high-κ dielectrics
Online Contents | 2007|Contributors: Kwo, R. -
Dielectric Science and Materials - Effect of Al incorporation in the Thermal Stability of Atomic-Layer-Deposited HfO2 for Gate Dielectric Applications
Online Contents | 2007|Contributors: Kwo, R. -
A novel approach of using a MBE template for ALD growth of high-κ dielectrics
Online Contents | 2007|Contributors: Kwo, R.
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