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Relationship between stochasticity and wavelength of exposure source in lithography
British Library Online Contents | 2014| -
Effect of photodecomposable quencher on latent image quality in extreme ultraviolet lithography
British Library Online Contents | 2014| -
Theoretical Study on Acid Diffusion Length in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography (5 pages)
British Library Online Contents | 2013| -
Theoretical Relationship between Quencher Diffusion Constant and Image Quality in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography (5 pages)
British Library Online Contents | 2013| -
Effect of Initial Dispersion of Protected Units on Line Edge Roughness of Chemically Amplified Extreme Ultraviolet Resists
British Library Online Contents | 2013| -
Effect of Molecular Weight and Protection Ratio on Latent Image Fluctuation of Chemically Amplified Extreme Ultraviolet Resists (4 pages)
British Library Online Contents | 2012| -
Stochastic Effect of Acid Catalytic Chain Reaction in Chemically Amplified Extreme Ultraviolet Resists (5 pages)
British Library Online Contents | 2012| -
Lower Limit of Line Edge Roughness in High-Dose Exposure of Chemically Amplified Extreme Ultraviolet Resists (5 pages)
British Library Online Contents | 2012| -
Lower Limit of Line Edge Roughness in High-Dose Exposure of Chemically Amplified Extreme Ultraviolet Resists (5 pages)
British Library Conference Proceedings | 2012| -
Relationship between Absorption Coefficient and Line Edge Roughness of Chemically Amplified Resists Used for Extreme Ultraviolet Lithography
British Library Online Contents | 2012| -
Bayesian optimization-based estimation of effective reaction radius of chemically amplified resist in acid catalyzed deprotection reaction
British Library Conference Proceedings | 2022| -
Review Accelerated Synthesis of Ceramics Powders by Solid-State Reaction in Water Vapor
British Library Online Contents | 2015| -
Two-Dimensional Assembly Based on Flow Supramolecular Chemistry: Kinetic Control of Molecular Interactions Under Solvent Diffusion
British Library Online Contents | 2014| -
Acid diffusion length in contact hole imaging of chemically amplified extreme ultraviolet resists
British Library Online Contents | 2014| -
Facile preparation of core@shell and concentration-gradient spinel particles for Li-ion battery cathode materials
British Library Online Contents | 2015| -
Supramolecular Polymerization in Microfluidic Channels: Spatial Control Over Multiple Intermolecular Interactions
British Library Online Contents | 2013| -
Stochastic Effect on Contact Hole Imaging of Chemically Amplified Extreme Ultraviolet Resists (5 pages)
British Library Online Contents | 2013| -
Chemical Gradient of Contact Hole Latent Image Created in Chemically Amplified Extreme Ultraviolet Resists (5 pages)
British Library Online Contents | 2013| -
Resist Materials and Processes for Extreme Ultraviolet Lithography (14 pages)
British Library Online Contents | 2013| -
Resist Properties Required for 6.67 nm Extreme Ultraviolet Lithography (6 pages)
British Library Online Contents | 2012| -
Theoretical Study of Exposure Latitude of Chemically Amplified Resists Used for Extreme Ultraviolet Lithography (5 pages)
British Library Online Contents | 2011| -
Effect of Acid Generator Decomposition during Exposure on Acid Image Quality of Chemically Amplified Extreme Ultraviolet Resists (6 pages)
British Library Online Contents | 2011| -
Thermalization Distance of Electrons Generated in Poly(4-hydroxystyrene) Film Containing Acid Generator upon Exposure to Extreme Ultraviolet Radiation (3 pages)
British Library Online Contents | 2011| -
Relationship of Electron Diffusion Length to Line Edge Roughness in Chemically Amplified Extreme Ultraviolet Resists (5 pages)
British Library Online Contents | 2011| -
Wavelength Dependence of Lithography Resolution in Extreme Ultraviolet Region
British Library Online Contents | 2011| -
Feasibility Study of Chemically Amplified Resists for Short Wavelength Extreme Ultraviolet Lithography
British Library Online Contents | 2011| -
Radiation Chemistry in Chemically Amplified Resists (19 pages)
British Library Online Contents | 2010| -
Relationship between Normalized Image Log Slope and Chemical Gradient in Chemically Amplified Extreme Ultraviolet Resists (5 pages)
British Library Online Contents | 2010| -
Relationship between Normalized Image Log Slope and Chemical Gradient in Chemically Amplified Extreme Ultraviolet Resists (5 pages)
British Library Conference Proceedings | 2010| -
Basic aspects of acid generation processes in chemically amplified electron beam resist
Tema Archive | 2005| -
Exposure Dose Dependence of Chemical Gradient in Chemically Amplified Extreme Ultraviolet Resists (5 pages)
British Library Online Contents | 2009| -
Effects of Flare on Latent Image Formation in Chemically Amplified Extreme Ultraviolet Resists (5 pages)
British Library Online Contents | 2009| -
Normalized Image Log Slope with Secondary Electron Migration Effect in Chemically Amplified Extreme Ultraviolet Resists
British Library Online Contents | 2009| -
Image Formation in Chemically Amplifired Resists upon Exposure to Extreme Ultraviolet Radiation
British Library Online Contents | 2009| -
Theoretical Study on Chemical Gradient Generated in Chemically Amplified Resists Based on Polymer Deprotection upon Exposure to Extreme Ultraviolet Radiation
British Library Online Contents | 2009| -
High-Absorption Resist Process for Extreme Ultraviolet Lithography [published November 14, 2008]
British Library Online Contents | 2008| -
Theoretical Study on Difference between Image Quality Formed in Low- and High-Activation-Energy Chemically Amplified Resists
British Library Online Contents | 2008| -
Effects of Polymer Interference during Acid Generation on Latent Image Quality of Extreme Ultraviolet Resists [published November 14, 2008]
British Library Online Contents | 2008| -
Study on resist performance of chemically amplified molecular resists based on cyclic oligomers
British Library Online Contents | 2015| -
Side Wall Degradation of Chemically Amplified Resists Based on Poly(4-hydroxystyrene) for Extreme Ultraviolet Lithography [published October 17, 2008]
British Library Online Contents | 2008| -
Redox-dependent DNA distortion in a SoxR protein-promoter complex studied using fluorescent probes
British Library Online Contents | 2015| -
Stochastic effects in 11 nm imaging of extreme ultraviolet lithography with chemically amplified resists
British Library Online Contents | 2014| -
Binding of Promoter DNA to SoxR Protein Decreases the Reduction Potential of the [2Fe-2S] Cluster
British Library Online Contents | 2015|
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