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Advances in Patterning Materials and Processes XXXIV : 27 February-2 March 2017, San Jose, California, United States
TIBKAT | 2017|Contributors: Hohle, Christoph K. -
Advances in Patterning Materials and Processes XXXIV : 27 February-2 March 2017, San Jose, California, United States
TIBKAT | 2017|Contributors: Hohle, Christoph K. -
Novel spin-on metal hardmask materials for filling applications [9051-87]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K. -
Numerical analysis for resist profile after thermal process in display manufacturing [9051-63]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K. -
Modeling acid transport in chemically amplified resist films [9051-60]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K. -
Removal of highly crosslinked resists and hybrid polymers for single micro parts fabrication and nanoimprint stamp rework [9051-56]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K. -
High-volume manufacturing equipment and processing for directed self-assembly applications (Invited Paper) [9051-22]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K. -
Directed self-assembly process integration: Fin patterning approaches and challenges [9051-21]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K. -
Novel surface treatment materials for aligning block-co-polymer in directed self-assembly processes [9051-20]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K. -
Investigation of interactions between metrology and lithography with a CD SEM simulator [9051-8]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K. -
SRAF window improvement with under-coating layer [9051-76]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K. -
Improved adhesion of novolac and epoxy based resists by cationic organic materials on critical substrates for high volume patterning applications [9051-59]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K. -
Inhomogeneity of PAGs in resist film studied by molecular-dynamics simulations for EUV lithography [9051-49]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K. -
Extending lithography with advanced materials (Invited Paper) [9051-40]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K. -
Robust complementary technique with multiple-patterning for sub-10 nm node device [9051-30]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K. -
Line width roughness reduction by rational design of photoacid generator for submillisecond laser post-exposure bake [9051-16]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K. -
Positive tone cross-linked resists based on photoacid inhibition of cross linking [9051-13]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K. -
Fluidity dependence of deprotonation kinetics of chemically amplified resist [9051-68]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K. -
EUV resists based on tin-oxo clusters [9051-48]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K. -
Development of novel protecting derivatives for chemically amplified extreme ultraviolet resist [9051-83]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K.
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