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Varying implant dose rate for defect reduction in laser thermal processing
British Library Online Contents | 2001| -
Understanding And Modeling Ramp Rate Effects On Shallow Junction Formation
British Library Conference Proceedings | 2001| -
Ultra-shallow junctions produced by plasma doping and flash lamp annealing
British Library Online Contents | 2004| -
Ultra-shallow junctions produced by plasma doping and flash lamp annealing
British Library Conference Proceedings | 2004| -
Ultra-Shallow Junction Formation Using Very Low Energy B and BF~2 Sources
British Library Conference Proceedings | 1996| -
Tuning for optimal performance in angle control, uniformity, and energy purity
British Library Conference Proceedings | 2005| -
Tuning for optimal performance in angle control, uniformity, and energy purity
British Library Online Contents | 2005| -
Trends in the sheet resistance and uniformity of medium dose n- and p-type implants as a function of time and wafer surface preparation
British Library Conference Proceedings | 1995| -
The Role Of Ge in Cluster Formation in B and BF~2 Implanted Si Wafers After Ge Pre-Amorphization
British Library Conference Proceedings | 2004| -
The Role of Extended Defects on the Formation of Ultra-shallow Junctions in Ion Implanted ^1^1B^+, ^4^9BF~2, ^7^5As^+ and ^3^1P^+
British Library Conference Proceedings | 1998| -
Thermal Stability and Substitutional Carbon Incorporation Far Above Solid-Solubility in Si~1~-~xC~x and Si~1~-~x~-~yGe~xC~y Layers Grown by Chemical Vapor Deposition Using Disilane
British Library Conference Proceedings | 2002|Contributors: Downey, D. F. -
Thermal Evolution of Extrinsic Defects in Ion Implanted Silicon: Current Understanding and Modeling
British Library Conference Proceedings | 2002|Contributors: Downey, D. F. -
The Local Structure of Antimony in High Dose Antimony Implants in Silicon by XAFS and SIMS
British Library Conference Proceedings | 2002|Contributors: Downey, D. F. -
The local structural characterization of the inactive clusters in B, BF2 and BF3 implanted Si wafers using X-ray techniques
British Library Online Contents | 2005| -
The local structural characterization of the inactive clusters in B, BF2 and BF3 implanted Si wafers using X-ray techniques
British Library Conference Proceedings | 2005| -
The local structural characterization of the inactive clusters in B, BF2 and BF3 implanted Si wafers using X-ray techniques
British Library Online Contents | 2005| -
The Influence of Low Temperature Pre-Annealing on the Defect Removal and the Reduction of Junction Depth in Excimer Laser Annealing
British Library Conference Proceedings | 2002|Contributors: Downey, D. F. -
The Effects of Small Concentrations of Oxygen in RTP Annealing of Low Energy Boron, BF~2 and Arsenic Ion Implants
British Library Conference Proceedings | 1998| -
The Effect Of Impurities On Diffusion And Activation Of Ion Implanted Boron In Silicon
British Library Conference Proceedings | 2001|
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