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SiOxNy films deposited by remote plasma enhanced chemical vapor deposition using SiCl4
Tema Archive | 1996| -
Two step synthesis of TIBa~2Ca~2Cu~3O~x films on Ag substrates by spray pyrolysis of metal-acetylacetonates
British Library Online Contents | 2008| -
Structural Properties of Low Temperature Silicon Oxide Films Prepared by Remote Plasma-Enhanced Chemical Vapor Deposition
British Library Online Contents | 1993| -
Characterization of luminescent praseodymium-doped ZrO~2 coatings deposited by ultrasonic spray pyrolysis technique
British Library Online Contents | 2007| -
Determination of thermoluminescence kinetic parameters of terbium-doped zirconium oxide
British Library Online Contents | 2001| -
Microstructural characteristics and carbon content of Al2O3 films as a function of deposition parameters
British Library Online Contents | 2004| -
Polycrystalline zinc selenide films deposited by a low‐temperature close‐spaced‐vapor‐transport method
National licenceAmerican Institute of Physics | 1984| -
Modified Pechini's method to prepare LaAlO3:RE thermoluminescent materials
British Library Online Contents | 2017|
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