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101–120 of 327 hits
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Aspect Relating to the Design of Chemically Amplified Resist Materials for sub-0.2 mu m Lithogrophy
British Library Conference Proceedings | 1997| -
Plasma Polymerized Methylsilane (PPMS): The Deposition of a Dry Deposited Photoresist for Use in 248 and 193 nm Lithographies
British Library Online Contents | 1997| -
Evaluation of cycloolefin-maleic anhydride alternating copolymers as single-layer photoresists for 193-nm photolithography [2724-33]
British Library Conference Proceedings | 1996| -
Advances in DUV Lithography for 0.25 m Technology Development
British Library Conference Proceedings | 1995| -
Electron-beam and x-ray lithographic characteristics of the optical resist ARCH [2437-06]
British Library Conference Proceedings | 1995| -
Lithographic Materials Technologies: 193 nm Imaging and Beyond
British Library Conference Proceedings | 2000| -
A unified approach to resist materials design for the advanced lithographic technologies
Tema Archive | 1994| -
A new variable transmission illumination technique optimized with design rule criteria
Tema Archive | 1998| -
Organic lasers based on lithographically defined photonic-bandgap resonators
British Library Online Contents | 1998| -
Award Address: Polymerization kinetics of a cycloolefin-based ArF binder resin
British Library Online Contents | 2001| -
Polymers for Microlithographic Applications: New Directions and Challenges
British Library Conference Proceedings | 2001| -
Impact of carbon nanotube exposure, dosage and aggregation on smooth muscle cells
British Library Online Contents | 2007| -
Environmental Stability of 193-nm Single Layer Chemically Amplified Resists
British Library Online Contents | 1999| -
Design of ultra low-dielectric constant organosilicates using block copolymers as templates
British Library Online Contents | 2001| -
Invited Paper: Extending Resolution Limits of IC Fabrication Technology: Demonstration by Device Fabrication and Circuit Performance
British Library Conference Proceedings | 2001| -
Effects of compressive strains on electrical conductivities of a macroscale carbon nanotube block (3 pages)
British Library Online Contents | 2007| -
Focus drilling and attenuated phase shift mask for subwavelength contact window printing using positive and negative resists
American Institute of Physics | 1999|
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