Absorption and Secondary Radiation in Tetrahedral Carbon Films (English)
- New search for: Mashchenko, V. E.
- New search for: Puzikov, V. M.
- New search for: Semenov, A. V.
- New search for: Societe Francaise du Vide
- New search for: Deutsche Vakuumgesellschaft
- New search for: Mashchenko, V. E.
- New search for: Puzikov, V. M.
- New search for: Semenov, A. V.
- New search for: Hecht, G.
- New search for: Richter, F.
- New search for: Hahn, J.
- New search for: Societe Francaise du Vide
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In:
Thin films
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494-497
;
1994
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ISBN:
- Conference paper / Print
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Title:Absorption and Secondary Radiation in Tetrahedral Carbon Films
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Contributors:Mashchenko, V. E. ( author ) / Puzikov, V. M. ( author ) / Semenov, A. V. ( author ) / Hecht, G. / Richter, F. / Hahn, J. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft
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Conference:Joint conference, Thin films ; 1994 ; Dresden; Germany
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Published in:Thin films ; 494-497
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Publisher:
- New search for: DGM Informationsgesellschaft Verlag
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Publication date:1994-01-01
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Size:4 pages
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Remarks:Joint conference incorporating the 4th International symposium on trends and new applications in thin films, TATF'94 and the 11th Conference on high vacuum, interfaces and thin films, HVITF'94
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ISBN:
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Type of media:Conference paper
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Type of material:Print
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Language:English
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Keywords:
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Source:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Table of contents conference proceedings
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 3
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Plasma and Deposition Interactions With an Enhanced ArcColl, B. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 18
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Theoretical and Experimental Studies of Transport Phenomena in PVD ProcessesMachet, J. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 24
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MOCVD of Cr-Based Coatings: Suitable Organochromium Compounds for Low Temperature Deposition ProcessesMaury, F. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 30
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Diamond CVD - a Status ReportKlages, C.-P. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 36
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Tungsten and Copper for ULSI Multilevel MetallizationGessner, T. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 42
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High-Current Arc - A New Source for High Rate DepositionSiemroth, P. / Schuelke, T. / Schultrich, B. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 46
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The Development of Cr-Al-N Coatings by the Multi Source Arc ProcessKnotck, O. / Scholl, H. J. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 52
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Design and Performance of Linear Magnetron Sputtering SystemsMiernik, K. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 56
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Hollow-Cathode Plasma Sources and its Use in Coating TechnologiesBuecken, B. / Grimm, W. / Wolfframm, J. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 60
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CAE Multicomponent Coatings: Technology and Industrial ApplitionsEizner, B. A. / Markov, G. V. / Minevich, A. A. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 65
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Low Temperature Epitaxial Growth by MBE on Hydrogen Plasma Cleaned Silicon WafersRamm, J. / Beck, E. / Deller, H. R. / Dommann, A. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 69
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Study and Elaboration of Boron Nitride Films by Reactive Ion PlatingGrenier, I. / Malhouitre, S. / Bessaudou, A. / Machet, J. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 73
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Multi-component Hard Thin Films Deposited by Hollow Cathode Arc (HCA) Discharge EvaporatorSchulze, D. / Wilberg, R. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 77
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Spectroscopic Investigation of Plasma Processes in PVD and ArcWitke, T. / Lenk, A. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 81
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Short-Time Investigation of Laser and Arc Assisted Deposition ProcessesSiemroth, P. / Schuelke, T. / Witke, T. / Schultrich, B. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 85
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Laser Assisted Electron Beam Evaporation (LEBE) for Optical ApplicationsThomsen-Schmidt, P. / Schuefer, D. / Johansen, H. / Martini, T. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 89
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Microstructural Properties of Laser Deposited Oxide FilmsReisse, G. / Keiper, B. / Weissmantel, S. / Johansen, H. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 93
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The Thickness Dependence of the Resistivity of Thin Pd Films Deposited on Si(111)Hloch, H. / Wissmann, P. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 97
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The PVD Metallization of Plastic Material: Influence of Interface Structure on Film PropertiesKupfer, H. / Hecht, G. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 97
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The PVD metallization of plastic materials: influence of the interface structure on the film propertiesKupfer, H. / Hecht, G. et al. | 1994
- 102
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Preparation of Si Wafer Surface with VUV Light AssistanceDushenkov, S. D. / Valiev, K. A. / Velikov, L. V. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 105
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Resistance to Corrosion of Composite Layers Produced by Ionic TreatmentsMichalski, A. / Wierzchon, T. / Krupa, D. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 109
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Growth of ZnSe on GaAs(110) an (100) monitored in situ by Raman spectroscopyDrews, D. / Langer, M. / Richter, W. / Zahn, D.R.T. et al. | 1994
- 109
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Growth of ZnSe on GaAs(110) and (100) Monitored in situ by Raman SpectroscopyDrews, D. / Langer, M. / Richter, W. / Zahn, D. R. T. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 113
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A Mobile Transfer System for Surface Analytical ApplicationsAbels, J.-M. / Hecht, D. / Strehblow, H.-H. / Kuenzelmann, U. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 117
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High Resolution Transmission Electron Microscopy of Strained InAs Layers Grown on (100) GaAs Substrate by "Virtual Surfactant" Molecular Beam EpitaxyTrampert, A. / Tournie, E. / Ploog, K. H. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 121
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Ion Assisted Deposition of Low Stress Hard Coatings Using Unbalanced Magnetron Sputtering TechniqueMuensterer, S. / Kohlhof, K. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 127
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Plasma Processing by Use of Electrons Generated by Vacuum ArcsVetter, J. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 131
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Reactive DC Magnetron Sputtering of Elemental Targets in Ar/O~2-Mixtures: Relation Between the Discharge Characteristics and the Heat of Formation of the Corresponding OxidesEllmer, K. / Mientus, R. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 135
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Behaviour of Random Cathodic Arcs on Ti-Targets in Dependence on Electrical Power ParametersMecke, H. / Ellrodt, M. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 139
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Preparation of Diamond-Like Films by Laser-Controlled Arc Deposition (LASER-ARC)Scheibe, H.-J. / Drescher, D. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 143
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Elektrochemical and Mechanical Behaviour of Carbon Materials Prepared by Ion Assisted EvaporationUllmann, J. / Stopka, H. / Wolf, G. K. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 148
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Influence of Wafer Preclean before Selective Tungsten CVD on Surface Properties of Interconnect and Intermetal Dielectric MaterialsSchulz, S. E. / Hintze, B. / Gruenewald, W. / Hofmann, A. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 153
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PACVD of TiN in an Industrial PlantHeim, D. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 157
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Detection of Concentration Profiles During PACVD in an Industrial ReactorMorlok, O. / Kampschulte, G. / Markschlaeger, P. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 162
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Formation of Composite Layers on Tool Steel by PACVD MethodsMichalski, J. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 167
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Cold Remote Nitrogen Plasma: A New Trend for Thin Film DepositionCallebert, F. / Jama, C. / Goudmand, P. / Dessaux, O. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 171
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Synthesis and Characterization of Zinc Thin Films Obtained by a Cold Remote PlasmaMutel, B. / Taleb, A. B. / Dessaux, O. / Goudmand, P. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 175
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Nickel Films Deposition by Cold Remote Nitrogen Plasma on Acrylonitrile-Butadiene-Styrene (ABS)Brocherieux, A. / Dessaux, O. / Goudmand, P. / Gengembre, L. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 179
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Growth of Cu Thin Films by Photo-Assisted Metal Organic Chemical Vapor Deposition: Influence of HydrogenMoes, R. / Karsi, M. / Morancho, R. / Maury, F. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 183
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Characterization of the Plasma Enhanced CVD Process Using Optical Emission SpectroscopyPintaske, R. / Peter, S. / Lang, J. / Hecht, G. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 187
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Determination of Ion Energy Distribution in Glow DischargesPeter, S. / Pintaske, R. / Reinhold, B. / Richter, F. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 191
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Deposition of Si-C-N Films by Metalorganic Plasma CVDPeter, S. / Pintaske, R. / Richter, F. / Hecht, G. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 195
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Properties of Surface Layers Produced from Organic Compounds under Glow-Discharge ConditionsWierzchon, T. / Sobiecki, J. R. / Kuzydlowski, K. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 199
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Formation of Surface Layers from Gaseous Phase with Participation of Chemical Reaction: The Role of Plasma in the Deposition ProcessMichalski, J. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 203
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Formation of Surface Layers from Gaseous Phase with Participation of Chemical Reaction: The Role of Substrate in the Deposition ProcessMichalski, J. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 208
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Laser CVD on Carbon Fibres: Structure of Layers and Tensile Strength of FibresHopfe, V. / Jaeckel, R. / Tehel, A. / Boehm, S. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 212
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Nucleation, Growth and Modification of Polycristalline Diamond Films Prepared by HCAP CVDLaufer, S. / Ullmann, J. / Weber, A. / Stiegler, J. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 217
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The New Technology for Fabrication of the Composition Targets, Used for Magnetron Sputtering of Coatings, Based on the Self-Propagating High-Temperature Syntesis (SHS). Structure and Properties of Thin FilmsLevashov, E. A. / Borovinskaya, I. P. / Kosyanin, V. I. / Bogatov, Y. V. / Societe Francaise du Vide; Deutsche Vakuumgesellschaft et al. | 1994
- 220
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Equipment for Ion Beam and UV-Light Assisted DepositionRoeckelein, M. / Rauschenbach, B. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 224
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High Energy Ion Beam Activated DepositionTamulevicius, S. / Galdikas, A. / Pranevicius, L. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 230
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Microstructure of Amorphous Sputtered SiN~x-Coatings. Comparison of Computer Simulation and ExperimentZoesch, A. / Wuttke, W. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 234
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Computer Simulation of Rarefied Gas FlowTaziukov, F. / Osipov, P. / Burmistrov, A. / Fomina, M. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 235
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Modification of Growth Modes in Lattice-Mismatched Epitaxial Systems: Si/GeOsten, H. J. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 238
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Ion-Assisted PVD Hard and Anti-Wear Composite Films of TiN and TiC with i-CYan, X. / Erler, J.-H. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 242
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TiN and TiC Coatings by Ion-Assisted Reactive SputteringYan, X. / Erler, J.-H. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 246
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Effect of Evaporation on the Morphology of Beaded Thin FilmsKaganovskii, Y. S. / Yurchenko, S. P. / Beke, D. L. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 247
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Stress Distribution in Layered Surfaces Subjected to Tribological ForcesArnell, R. D. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 250
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Preparation, Characterisation and Wear Behaviour of PECVD-TiN~x- and (Ti,Si)N~x-Coated CermetsEndler, I. / Wolf, E. / Leonhardt, A. / Beger, A. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 255
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Stresses and Dislocation Formation in Thin FilmsAleksandrov, L. N. / Mitlina, L. A. / Kostilov, V. N. / Yankovskaya, T. V. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 255
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Deposition of Aluminium or Boron Containing Films Using Organometallic PrecursorTaeschner, C. / Leonhardt, A. / Duemichen, U. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 259
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Diamond Films CVD in Methane/Air Induction Plasma JetTrukhanov, A. S. / Bykova, N. G. / Ruliev, Y. K. / Yakushin, M. I. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 263
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Auger Depth Profile Analysis of Deeply Buried InterfacesBarna, A. / Menyhard, M. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 263
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Microwave Plasma Enhanced Low Pressure Sputtering of Copper FilmsMusil, J. / Misina, M. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 267
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Effects of Multiaxial Substrate Rotation in Industrial PVD-ProcessesRother, B. / Jehn, H. A. / Ebersbach, G. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 273
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Amorphous and Nanodispersed Thin Films - Transport Properties and ApplicationsHeinrich, A. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 275
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Problems of Structure Evolution in Polycrystalline Films. Correlation between Grain Morphology and Texture Formation MechanismsAdamik, M. / Barna, P. B. / Tomov, I. / Biro, D. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 279
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Giant Magnetoresistance in Layered and Granular Thin FilmsKools, J. C. S. / Coehoorn, R. / Duchateau, J. P. W. B. / Rijks, T. G. S. M. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 283
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Rapid Thermal Annealing of Thin ZnO FilmsNennewitz, O. / Schmidt, H. / Pezoldt, J. / Stauden, T. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 285
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High Resolution Auger Depth Profile Analysis of Deeply Buried InterfacesBarna, A. / Menyhard, M. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 289
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Plasma Modification of Polymer Films Studied by Ellipsometry and Infrared SpectroscopyRochotzki, R. / Nitschke, M. / Arzt, M. / Meichsner, J. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 291
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Complex XRD Study of Inhomogeneous Microstructure in Hard CoatingsKuzel, R. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 297
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Texture and Stress Analysis of Sputtered Thin FilmsBacmann, J. J. / Gergaud, P. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 299
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Growth Conditions Affecting the Electrochemical and Mechanical Stability of Carbon Films Prepared by Ion Assisted EvaporationUllmann, J. / Stopka-Ebeler, H. / Wolf, G. K. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 303
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Layer Characterisation with Linear-Optical MethodsZettler, T. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 312
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Residual Stress in Ni an C Monolayers and Multilayers Produced by Pulsed Laser DepositionKallis, N. / Mai, H. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 316
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Superconductivity and Critical Fields in Amorphous Tungsten/Silicon MultilayersMajkova, E. / Luby, S. / Jergel, M. / Lohneysen, H. V. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 319
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Investigation of Initial Oxide Growth on NiAl by Scanning Tunneling MicroscopyWolf, B. / Warner, C. / Bonnell, D. / Bobeth, M. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 320
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Optical Properties of Laser Pulse Deposited Oxide FilmsReisse, G. / Weissmantel, S. / Keiper, B. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 324
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Photosensitivity of MIM-Type Devices Based on a-SiC:HVincenzoni, R. / Leo, G. / Galluzzi, F. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 329
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Muon Spin Research of Thin Films and SurfacesKottmann, F. / Maden, D. / Meyberg, M. / Morenzoni, E. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 333
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Hydrogen Films at Low TemperaturesLutsishin, P. P. / Panchenko, O. A. / Sologub, S. V. / Shpagin, V. F. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 333
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Thin Film Nanoprocessing by Laser/STM CombinationGorbunov, A. A. / Pompe, W. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 337
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STM Investigations of Diamond and DLC FilmsGorbunov, A. A. / Pimenov, S. M. / Smolin, A. A. / Scheibe, H.-J. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 339
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Interdiffusion in Multicomponent Solid Solutions. The Mathematical Model for Thin FilmsDanielewski, M. / Filipek, R. / Holly, K. / Szyszkiewicz, K. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 341
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An X-Ray Detector Based on a-Si:H/Transition Metal Bilayer SystemsPanckow, A. N. / Witte, H. / Oleynik, T. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 345
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Electrical in situ Characterisation of Cubic CdS Grown on InP(110)Schultz, C. / Von der Emde, M. / Zahn, D. R. T. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 349
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Laterally Resolved Ellipsometric Investigations of Oxide Layers Manufactured by Laser-Assisted Electron Beam EvaporationSchwiecker, H. / Wolf, R. / Schneider, U. / Zilian, J. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 351
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The Conservation of Momentum and Energy in Open Systems. Diffusional Approach to the Mass Transport in SolidsDanielewski, M. / Krzyzanski, W. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 353
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Modification of Laser-Arc DLC Layers by Ion BeamsKolitsch, A. / Scheibe, H. J. / Drescher, D. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 357
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Correlations Between Structural and Optical Properties of Amorphous Selenium FilmsWitte, H. / Freistedt, H. / Blaesing, J. / Giesler, H. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 361
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Magneto-optic Display Material with High Faraday-Rotation and Low Coercive ForceKessler, T. / Baumann, H. / Bethge, K. / Reinmann, J. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 363
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Correlation between Structural and Optical Properties of Amorphous Selenium FilmsWitte, H. / Freistedt, H. / Blaesing, J. / Giesler, H. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 365
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Optical Properties of Coated CaF~2Laux, S. / Richter, W. / Schroeter, B. / Glaschke, T. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 369
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Detection of Ultrathin SiC Layers by Infrared Spectroscopy. Simulation and ExperimentFriedrich, M. / Morley, S. / Mainz, B. / Deutschmann, S. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 369
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Condensation Model of Dislocations Origination in Epitaxial Ferrospinel Surface LayersAleksandrov, L. N. / Mitlina, L. A. / Dorodnov, E. I. / Kostilov, V. N. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 373
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Magnetic Field Dependence of Hall Coefficient in Short-Period PbTe/SnTe SuperlatticesLitvinov, V. / Oszwaldowski, M. / Berus, T. / Mironov, O. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 378
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Determination of Young's Modulus of Thin Films by Ultrasonic Surface WavesSchneider, D. / Scheibe, H.-J. / Schultrich, B. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 379
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The Elastic Indentation of Coating-Substrate Systems with Large Difference in the Young ModuliSchwarzer, N. / Schimmel, J. / Richter, F. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 382
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Electrical Characteristics of HMDS-LPCVD Thin FilmsAngelescu, A. / Kleps, I. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 385
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Elastic Modulus of Amorphous Carbon FilmsSchultrich, B. / Scheibe, H.-J. / Grandremy, G. / Schneider, D. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 386
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YSZ Buffer Layers for YBaCuO Deposition on SiliconBeddies, G. / Schneider, P. / Lange, C. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 391
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The Contact Problem of Elastic Indentation of Coating/Substrate SystemsSchwarzer, N. / Schimmel, J. / Richter, F. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 395
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Photoluminescence Studies of Porous SiliconLebedev, A. A. / Remenyuk, A. D. / Rud, Y. V. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 400
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Photoluminescence of Silicon-Hydrogen FilmsAstrova, E. V. / Belov, S. V. / Lebedev, A. A. / Remenyuk, A. D. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 401
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Optical and Photoelectrical Properties of c-Si Layers and the Influence of Subsequent HydrogenationKrankenhagen, R. / Schmidt, M. / Henrion, W. / Sieber, I. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 407
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The Photoluminescence of Light Emitting Films on Silicon in the Visible Region of SpectrumVitman, R. F. / Kapitamova, I. M. / Lebedev, A. A. / Razbirin, B. S. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 407
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Photoluminescence Studies of Porous Silicon and Silicon-Hydrogen FilmsAstrova, E. V. / Belov, S. V. / Lebedev, A. A. / Remenyuk, A. D. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 411
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Surface Contamination after LappingBarylski, A. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 415
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Polycrystalline -FeSi~2 Thin Films on Non-Silicon SubstratesHerz, K. / Powalla, M. / Eicke, A. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 419
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Quantitative Characterization of Thin Film StructuresKurzydlowski, K. J. / Wierzchon, T. / Bucki, J. J. / Rozniatowski, K. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 423
-
Influence of a Ti-Interlayer on the Adhesion of TiN-Hard CoatingsBuecken, B. / Cernohorsky, H. / Leonhardt, G. / Lunow, T. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 425
-
Quantitative Composition Analysis of Semiconducting Silicide FilmsReinsperger, G.-U. / Schoepke, A. / Selle, B. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 429
-
Polycrystalline Iridium Silicide Films. Phase Formation, Electrical and Optical PropertiesSchumann, J. / Elefant, D. / Gladun, C. / Heinrich, A. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 429
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Internal Stresses and Elastic Modulus of DLC Films and their Relation to Structure and Deposition ProcessSchultrich, B. / Scheibe, H.-J. / Grandremy, G. / Schneider, D. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 433
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Deposition of Low Energy Coatings with DLC-Like PropertiesGrischke, M. / Trojan, K. / Dimigen, H. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 441
-
Growth Conditions, Optical and Dielectric Properties of Yttrium Oxide Thin FilmsAndreeva, A. F. / Sisonyuk, A. G. / Himich, E. G. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 441
-
SiC Interlayer Formation Studied by Infrared SpectroscopyFriedrich, M. / Morley, S. / Mainz, B. / Deutschmann, S. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 445
-
Studies of TiN Layers Using PAS and Other MethodsUhlmann, K. / Britton, D. T. / Haerting, M. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 447
-
A Study of the Compositional Structure and Electrical Behaviour of Thin Silicon Oxynitride Layers Prepared by Rapid Thermal ProcessingBeyer, R. / Burghardt, B. / Proesch, G. / Thomas, E. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 449
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Observation of Metastable Phases of Chromium Carbide Layers by X-Ray DiffractionEhrlich, A. / Hoyer, W. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 453
-
Characterization and Deposition of Oxide Films by Laser Assisted Electron Beam Evaporation (LEBE) for Optical ApplicationsThomsen-Schmidt, P. / Schaefer, D. / Johansen, H. / Martini, T. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 453
-
Ion Beam Analysis Investigations on Multilayer Devices for Visible OpticsWagner, W. / Rauch, F. / Jeschkowski, U. / Bange, K. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 457
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Investigations in the Roughness of the Interfaces of Multilayer FilmsSchuhrke, T. / Zweck, J. / Hoffmann, H. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 461
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Optical and Microstructural Properties of Laser Pulse Deposited Oxide FilmsReisse, G. / Keiper, B. / Weissmantel, S. / Johansen, H. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 465
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The Electromigration Kinetics in Precious Metal Overlayers on a Carbon Thin Film Surface Studied by Scanning Tunneling Microscopy (STM) and Scanning Tunneling Potentiometry (STP)Besold, J. / Matz, N. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 469
-
Characterization of AIN FilmsGraefe, V. / Schalch, D. / Scharmann, A. / Wiese, C. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 471
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Electronic States in Tetrahedral Carbon FilmsMashchenko, V. E. / Puzikov, V. M. / Semenov, A. V. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 473
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Characterization of AIN/Si InterfacesGraefe, V. / Schalch, D. / Scharmann, A. / Wiese, C. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 477
-
Preparation of Thin Co-Doped Irondisilicid Films, Electrical and Structural PropertiesTetchert, S. / Lange, C. / Kilper, R. / Franke, T. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 481
-
Influence of the Growth Mode on the Microstructure of Highly Mismatched InAs/GaAs HeterostructuresTrampert, A. / Tournie, E. / Ploog, K. H. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 482
-
Nucleation and Grain Growth of -FeSi~2 Thin FilmsHerz, K. / Powalla, M. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 486
-
The Peeling Test with Initialized Crack FormationSchwarzer, N. / Schimmel, J. / Schmidbauer, S. / Hahn, J. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 490
-
Influence of Surface Defects on Porous Silicon LuminescenceDittrich, T. / Flietner, H. / Timoshenko, V. Y. / Kashkarov, P. K. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 491
-
Monitoring Heteroepitaxial Growth of ZnSe on GaAs by Raman SpectroscopyDrews, D. / Langer, M. / Richter, W. / Zahn, D. R. T. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 494
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Absorption and Secondary Radiation in Tetrahedral Carbon FilmsMashchenko, V. E. / Puzikov, V. M. / Semenov, A. V. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 497
-
Electrical in situ Characterisation of c-CdS/InP(110) HeterostructuresSchultz, C. / Von der Emde, M. / Zahn, D. R. T. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 498
-
TiN/(Cr,Co)N Coatings Crystallized from Pulse PlasmaMichalski, A. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 501
-
Mechanical Properties of Amorphous Thin FilmsNemec, P. / Navratil, V. / Sladek, P. / Roca i Cabarrocas, P. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 505
-
The Influence of Interface Roughness on the Giant Magnetoresistance of Co/Cu Multilayer FilmsDorner, C. / Haidl, H. / Hoffmann, H. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 509
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Photo-Simulated Changes in Thin As-Ge-S Films Determined by Raman SpectroscopyPetkov, K. / Dinev, B. / Boychev, V. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 513
-
Optical and photoelectrical properties of micro-c Si layers in dependence on structural ordering and defect passivationKrankenhagen, R. / Schmidt, M. / Henson, W. / Sieber, I. / Selle, B. / Flietner, H. et al. | 1994
- 513
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Optical and Photoelectrical Properties of c-Si Layers in Dependence on Structural Ordering and Defect PassivationKrankenhagen, R. / Schmidt, H. / Henrion, W. / Sieber, I. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 518
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Interface Defects at Si/SiO~2-Inerfaces and Their Relation to Growth Processes and Dynamic EffectsAngermann, H. / Dittrich, T. / Kliefoth, K. / Flietner, H. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 521
-
The Electrical Resistivity of Thin Pd Films Grown on Si(111)Hloch, H. / Wissmann, P. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 524
-
PVD and PECVD Coatings for Packaging ApplicationsBenmalek, M. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 527
-
Characterization of AlN Films on SiGraefe, V. / Niessner, W. / Schalch, D. / Scharmann, A. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 531
-
Cleaning and Interface Control in IC Process TechnologyMulder, J. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 537
-
Ultrathin SiO2- and Al2O3-ilms as selective component for gassensorsAlthainz, P. / Dahlke, A. / Frietsch-Klarhof, M. / Goschnick, J. / Ache, H.J. et al. | 1994
- 537
-
Ultrathin SiO~2-and Al~2O~3- Films as Selective Component for Gas SensorsGoschnick, J. / Althainz, P. / Dahlke, A. / Frietsch-Klarhof, M. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 539
-
Interface Stability and Silicide Formation in High Temperature Stable Mo~xSi~1~-~x/Si Multilayer Soft X-Ray Mirrors Studied by Means of X-Ray Diffraction and TEMKleineberg, U. / Stock, H.-J. / Kloidt, A. / Schmiedeskamp, B. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 541
-
Stability of Mo/Cu Interfaces Under Thermal ProcessingLuby, S. / Majkova, E. / Jergel, M. / Brunel, M. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 545
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Laser-Damage Resistant Multilayer Coatings on Polycarbonate SubstratesHubrach, G. / Becker, K.-J. / Hacker, E. / Bernitzki, H. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 550
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Preparation and Properties of Transparent Protective Layers Produced by Vacuum TechnologiesLeonhardt, G. / Ehrlich, U. / Falz, M. / Buecken, B. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 556
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Hollow Cathode Arc Plasma Pre-Treatment and Vaccum Arc Coating - A New Combination of ProcessesSchulze, D. / Wilberg, R. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 557
-
Thermal Ageing of Ni/C Multilayers Prepared by Pulsed Laser DepositionKrawietz, R. / Wehner, B. / Kallis, N. / Dietsch, R. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 560
-
Thin Films on ASIC (TFA)-Color Sensors - New Applications of Optical Thin Film DetectorGiehl, J. / Stiebig, H. / Rieve, P. / Boehm, M. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 560
-
Thin film on ASIC (TFA)-color-sensors - new applications of optical thin film detectorsGiehl, J. / Stiebig, H. / Rieve, P. / Böhm, M. et al. | 1994
- 564
-
Lift Off Patterning of Thin Film StructuresWenzel, C. / Urbansky, N. / Burmeister, D. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 565
-
Formal Order for Search of the Principle Structure of Multilayer Coatings at Their DesigningVoevodin, A. A. / Erokhin, A. L. / Lyubimov, V. V. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 568
-
Implantation Through Metal as Suitable Technique for Formation of Shallow p^+n JunctionsBesse, I. / Hrubcin, L. / Senderak, R. / Kobzev, A. P. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 572
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Assessement of the Technological Capacity of High Speed Steel (HSS) Cutting Tools Coated with Hard Materials Using the Complex Tools DiagnosisKunanz, K. / Langer, U. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 575
-
Network Modification of DLC Coatings to Adjust a Defined Surface EnergyTrojan, K. / Grischke, M. / Dimigen, H. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 576
-
Material Selection for Thin Film Thermocouples Operating at Extremely High TemperaturesBewilogua, K. / Huebsch, H. / Bethge, R. / Willich, P. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 580
-
Comparison of Implantation Techniques for Formation of Shallow p^+n JunctionsBesse, I. / Hrubcin, L. / Hlavka, J. / Babinsky, M. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 584
-
The Influence of Geometry on the Sensitivity of Semiconductors Thermal Vacuum SensorsDubravcova, V. / Csabay, O. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 587
-
Comparative Investigation of the Wear Behaviour of TiN Monolayer Coatings, Ti(C,N) Multicomponent Coatings and TiC/Ti(C,N)/TiN Multilayer Coatings Deposited by the Vacuum Are MethodWalkowicz, J. / Smolik, J. / Miernik, K. / Bujak, J. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 587
-
Effect of PACVD TiN on Pitting Corrosion of High Alloyed Tool SteelLunarska, E. / Al Ghanem, S. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 591
-
Anodic Arc Evaporation: Application to Web-CoatingSiefert, W. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 594
-
Electrophysical Properties and Device Applications of the SiC Thin FilmsLebedev, A. A. / Anikin, M. M. / Rastegaeva, M. G. / Savkina, N. S. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 595
-
Magneto-Optic Display Material with Large Faraday Rotation and Low CoercivityKessler, T. / Baumann, H. / Reinmann, J. / Friedrich, K. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 606
-
Controlling Polysilicon Sensor Characteristics by Current TrimmingGridtchin, V. A. / Sputai, S. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 611
-
Plasma and Surface Modeling for the Deposition of Hydrogenated Carbon FilmsMoeller, W. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 611
-
Organically Modified SiO~2 and Al~2O~3 Films as Selective Components for Gas SensorsAlthainz, P. / Dahlke, A. / Frietsch-Klarhof, M. / Goschnick, J. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 614
-
Diffusion of Nitrogen in the Ti-N System - Formation of Intermediate PhasesLengauer, W. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 620
-
Thermal Ageing of Ni/C Multilayers Produced by Pulsed Laser DepositionKrawietz, R. / Wehner, B. / Kallis, N. / Dietsch, R. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 624
-
Interface Stability and Silizide Formation in High Temperature Stable Mo~XSi~Y/Si Multilayer Soft X-Ray Mirrors Studied by Means of X-Ray Diffraction and TEMKleineberg, U. / Stock, H. J. / Kloidt, A. / Schmiedeskamp, B. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 628
-
Physical and Electronic Properties of Thin Siliconoxynitride Layers Prepared by Rapid Thermal ProcessingBeyer, R. / Burghardt, H. / Proesch, G. / Thomas, E. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 632
-
Ion Kinetics in RF-Plasmas for Surface Modification of PolymersZeuner, M. / Meichsner, J. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 636
-
Interdiffusion in r-Component (r2) Alloys; the Mathematical Model for Thin FilmsDanielewski, M. / Filipek, R. / Holly, K. / Krzyzanski, W. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 640
-
Deposition of Glass-Ceramic Layers from a Beam of Particles Accelerated by a High-Voltage Electric FieldOlszyna, A. / Zacharenko, I. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 645
-
Effect of Rapid Cooling and Heating on the Plasma-Enhanced Crystallization of Layers of High-Melting Materials from Gaseous PhaseOlszyna, A. / Michalski, A. / Zdunek, K. / Sokolowska, A. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 650
-
Characterization and Radiation Grafted PVDF and P(VDF/TrFE) FilmsPetersohn, E. / Betz, N. / Le Moel, A. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 658
-
Formation and Properties of Borided Layers on Steel Under Glow Discharge ConditionsWierzchon, T. / Bielinski, P. / Krupa, D. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 662
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Al~2O~3 Films Formed by Anodic Oxidation of Al-1wt%Si-0.5wt%Cu FilmsChiu, S. / Chang, P.-H. / Tung, C.-H. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 666
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X-Ray Diffraction Analysis of RTP-Annealed Thin ZnO FilmsNennewitz, O. / Schawohl, J. / Spiess, L. / Schmidt, H. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 670
-
Corrosion Resistance of Chromized Layers Produced by the Vacuum Technique on Low-Carbon SteelKasprzycka, E. / Pietrzak, K. / Tacikowski, J. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 674
-
Infrared Spectroscopy of Plasma Modification Effects in Thin Polymer FilmsNitschke, M. / Meichsner, J. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 678
-
Structure and Morphology of Chromium Diffusion Layers Made on Low-Carbon Steel in the Process of Vacuum ChromizingKasprzycka, E. / Tacikowski, J. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 682
-
Ellipsometric Study of Thin Polymer Films Modified in Low Pressure PlasmaRochotzki, R. / Arzt, M. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 686
-
Laser Induced Structural Modification of Excimer Laser Ablated Carbon FilmsKeiper, B. / Weissmantel, S. / Reisse, G. / Schulze, S. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 690
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Graphitisation of Amorphous Carbon C:H Films under Irradiation and Thermal TreatmentRubshtein, A. P. / Trakhtenberg, I. S. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 694
-
Single MeC or Composite MeC/Me(C,N)/MeN Coatings on High Speed Steels by Means of an Indirect MethodWendler, B. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 698
-
Buffer Layer for Growing -SiC on SiStoemenos, J. / Pecz, B. / Barna, P. B. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 702
-
The Conversation of Momentum and Energy in Open Systems, Diffusional Approach to the Mass Transport in SolidsDanielewski, M. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 706
-
The Al-Fe and Al-N Phase Formation on the -Fe Surface by the Ion-Beam Mixing and Subsequent N^+ Ion ImplantationMurzin, I. G. / Choupiatova, L. P. / Komarovsky, I. A. / Kolosova, E. I. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 710
-
Polycrystalline Iridium Silicide Film-Structure, Electrical and Optical PropertiesSchumann, J. / Elefant, D. / Gladun, C. / Heinrich, A. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 710
-
Polycrystalline iridium silicide films - structure, electrical and optical propertiesSchumann, J. / Elefant, D. / Gladun, C. / Heinrich, A. / Lange, H. / Henrion, W. et al. | 1994
- 714
-
High Temperature X-Ray Diffraction Studies of the Phase Formation Process in Thin Ir~xSi~1~-~x filmsPitschke, W. / Heinrich, A. / Schumann, J. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 722
-
Analysis of Diffusion-Limited Growth Al-Mn Quasicrystal Layers by High Temperature Sequential DepositionZsigmond, G. / Barna, P. B. / Raschewski, F. / Urban, K. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 726
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Correlation between Texture and Morphology of Polycrystalline FilmsAdamik, M. / Barna, P. B. / Tomov, I. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
- 730
-
Mechanisms of Low Temperature Silicid CreationKiv, A. E. / Kovalchuk, V. V. / Britavskaya, E. P. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994
-
The Identification of Amorphous Films by the Method of Coordination Spheres DiffractometrySozin, Y. I. / Societe Francaise du Vide / Deutsche Vakuumgesellschaft et al. | 1994