Bombardment angle dependence of reactive ion-beam etching of GaAs with CH~4/H~2 (English)
- New search for: Villalvilla, J. M.
- New search for: Santos, C.
- New search for: Valles-Abarca, J. A.
- New search for: Spanish Vacuum Society
- New search for: Portugese Vacuum Society
- New search for: Villalvilla, J. M.
- New search for: Santos, C.
- New search for: Valles-Abarca, J. A.
- New search for: De Segovia, J. L.
- New search for: Laranjeira, M. F.
- New search for: Spanish Vacuum Society
- New search for: Portugese Vacuum Society
In:
Hard coatings
10/11
;
1113-1114
;
1994
-
ISSN:
- Conference paper / Print
-
Title:Bombardment angle dependence of reactive ion-beam etching of GaAs with CH~4/H~2
-
Contributors:Villalvilla, J. M. ( author ) / Santos, C. ( author ) / Valles-Abarca, J. A. ( author ) / De Segovia, J. L. / Laranjeira, M. F. / Spanish Vacuum Society / Portugese Vacuum Society
-
Conference:1st European topical conference, Hard coatings ; 1993 ; Alicante; Spain
-
Published in:Hard coatings , 10/11 ; 1113-1114VACUUM -LONDON THEN OXFORD- PERGAMON- ; 45, 10/11 ; 1113-1114
-
Publisher:
- New search for: Pergamon
-
Publication date:1994-01-01
-
Size:2 pages
-
Remarks:Also known as ETCHC 1. Held in conjunction with the 2nd Iberian vacuum conference, also known as II RIVA
-
ISSN:
-
Type of media:Conference paper
-
Type of material:Print
-
Language:English
-
Keywords:
-
Source:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.