Quantitative Determination of Light Elements in Semiconductor Matrices by Charged Particle Activation Analysis (English)
- New search for: Misaelides, P.
- New search for: Misaelides, P.
- New search for: Misaelides, P.
In:
Application of particle and laser beams in materials technology
;
387-398
;
1995
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ISBN:
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ISSN:
- Conference paper / Print
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Title:Quantitative Determination of Light Elements in Semiconductor Matrices by Charged Particle Activation Analysis
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Contributors:Misaelides, P. ( author ) / Misaelides, P.
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Conference:NATO advanced study, Application of particle and laser beams in materials technology ; 1994 ; Kallithea; Greece
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Published in:NATO ASI SERIES E APPLIED SCIENCES ; 283 ; 387-398
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Publisher:
- New search for: Kluwer Academic Publishers
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Publication date:1995-01-01
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Size:12 pages
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ISBN:
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ISSN:
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Type of media:Conference paper
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Type of material:Print
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Language:English
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Keywords:
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Source:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Table of contents conference proceedings
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1
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Fundamental Aspects of Ion Electron InteractionsGolser, R. et al. | 1995
- 21
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Fundamentals of Ion-Solid Interactions: Atomic CollisionsSteinbauer, E. et al. | 1995
- 37
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Excitation and Ionization In Fast Ion-Atom Collisions Due To Projectile-Electron - Target-Electron InteractionsZouros, T. J. M. et al. | 1995
- 53
-
Radiation Induced Point Defects and DiffusionRiviere, J.-P. et al. | 1995
- 77
-
High Temperature Oxidation and Corrosion of Metals and Alloys: Fundamentals and Influence of High Energy BeamsGalerie, A. et al. | 1995
- 95
-
Thin Films of High-Temperature Superconductors: Application-Oriented Studies of Growth and PropertiesGeerk, J. / Linker, G. / Meyer, O. et al. | 1995
- 115
-
An Overview of Surface Analysis. Application to the Adsorption of Li on Single Crystals of Layered CompoundsPapageorgopoulos, C. A. et al. | 1995
- 133
-
Depth Profiling in Combination with SputteringWittmaack, K. et al. | 1995
- 151
-
A SIMS Study of the Inter-Diffusion of Group III Atoms in a Distributed Bragg ReflectorBeyer, G. P. / McPhail, D. S. / Khan, A. / Ghisoni, M. et al. | 1995
- 159
-
Thermal He-Atom Scattering for the Study of Surface Systems: K on Si(001)Foulias, S. / Curson, N. / Cowen, M. / Allison, W. et al. | 1995
- 167
-
Experimental and Monte-Carlo Simulation Studies of the Surface Concentration Changes in ZrO~2 under Ion BombardmentMiteva, V. / Stanchev, A. / Stefanov, P. / Slavova, V. et al. | 1995
- 175
-
Ion-Induced Photon Emission of Materials and Possibilities of its Application for Surface DiagnosticsSuchanska, M. et al. | 1995
- 185
-
The Raman Approach to Materials ScienceAnastassakis, E. et al. | 1995
- 219
-
Laser-Material Interaction, Plasma Formation and ApplicationsBoulmer-Leborgne, C. et al. | 1995
- 237
-
Optical Spectrometry Coupled with Laser Ablation for Analytical Applications on SolidsGeertsen, C. / Mauchien, P. et al. | 1995
- 259
-
In Situ Laser Beam Probes for Semiconductor ProcessingGu, G. / Li, H. / Cook, J. / Ogryzlo, E. A. et al. | 1995
- 269
-
Laser Deposition and Patterning of Diamond FilmsObraztsov, A. N. et al. | 1995
- 281
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Laser-Raman Spectroscopy of Some Lanthanide/Hgl~2 Heterometallic Complexes (HL=5,7-Dimethyl-1,8-Naphthyridine-2-OL)Lalia-Kantouri, M. / Goodgame, D. M. L. et al. | 1995
- 287
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Accelerators in Materials ResearchBethge, K. et al. | 1995
- 301
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Application of Elastic Recoil Detection in Materials AnalysisArnoldbik, W. M. / Habraken, F. H. P. M. et al. | 1995
- 323
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Applications of High Energy Ion Scattering in Materials ScienceVan Ijzendoorn, L. J. et al. | 1995
- 341
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High Energy Heavy Ion RBS, ERDA and ChannellingDavies, J. A. / Siegele, R. et al. | 1995
- 359
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Some New Detection Techniques for Light-Ion Scattering AnalysisDe Voigt, M. J. A. / Rijken, H. A. / Klein, S. S. et al. | 1995
- 375
-
Prompt Gamma-Ray Resonant Nuclear Reaction Analysis for Light Elements: H, Li, F and NaLanford, W. A. / Cummings, K. / Haberl, A. / Shepard, C. et al. | 1995
- 387
-
Quantitative Determination of Light Elements in Semiconductor Matrices by Charged Particle Activation AnalysisMisaelides, P. et al. | 1995
- 399
-
Thin Layer Activation in Materials TechnologyStroosnijder, M. F. et al. | 1995
- 415
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Optimum Industrial Application of the Thin Layer Activation TechniqueRacolta, P. M. / Popa-Simil, L. / Pascovici, G. / Ivanov, E. A. et al. | 1995
- 427
-
Ion Beam Analysis of Glasses - Industrial ApplicationsLaube, M. / Rauch, F. et al. | 1995
- 437
-
Nuclear Reaction Analysis of Corroded Glass SurfacesCummings, K. / Lanford, W. A. et al. | 1995
- 443
-
Ion-Beam Archacometry: Technological Assessment of Ancient and Medieval MaterialsJarjis, R. A. et al. | 1995
- 463
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Non-Destructive Analysis Of American Gold Jewellery Items By PIXE, RBS and PIGERuvalcaba, J. L. / Demortier, G. et al. | 1995
- 471
-
Recoil Spectrometry: A Suitable Method for Studying Interfacial Reactions in Metal-InP SystemsPersson, L. / Hult, M. / Whitlow, H. J. / El Bouanani, M. et al. | 1995
- 477
-
Bismuth-Implanted Silicon Reference Material Revisited: The Concept of Traceability and the Individual Characterisation of ChipsWaetjen, U. et al. | 1995
- 485
-
Energy Dispersive X-Ray Analysis of the Tin Distribution on Electrolytically Coloured Anodised AluminiumKallithrakas-Kontos, N. / Moshohoritou, R. / Tsangaraki-Kaplanoglou, I. et al. | 1995
- 493
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Determination of Sulphur and Copper Distribution on Chemically Modified HEU-Type Zeolite Crystals by Means of Nuclear Resonant Reaction Analysis Techniques, Scanning Electron Microscopy and X-Ray FluorescenceGodelitsas, A. / Misaelides, P. / Charistos, D. / Pavlidou, E. et al. | 1995
- 501
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Modern Technological Projects with High Power Electron BeamsKukulin, V. I. et al. | 1995
- 513
-
Computer-Aided Design of Technological Electron-Optical SystemsSabchevski, S. B. et al. | 1995
- 527
-
Ion Beam MixingRiviere, J. P. et al. | 1995
- 557
-
Materials Modification Using Electron BeamsMehnert, R. et al. | 1995
- 581
-
Deposition and Etching Mechanisms in Plasma Thin Film ProcessesKuo, Y. et al. | 1995
- 595
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Active Modification and Amorphisation of Materials by Low-Energy Ion IrradiationTereshko, I. V. / Khodyrev, V. I. / Tereshko, V. M. / Lipsky, E. A. et al. | 1995
- 603
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SIMOX Thin Films. Structural and Electrical Characterisation using FTIR SpectroscopyKatsidis, C. C. / Siapkas, D. I. et al. | 1995
- 613
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The Key Role of Electron Beams in IC TechnologyHatzakis, M. et al. | 1995
- 623
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Cadmium Sulphide Microcrystallite-Doped Silicon Dioxide Thin Films Prepared by RF-Sputtering: Growth and Physical CharacterisationRolo, A. G. / Gomes, M. J. M. / Belsley, M. / Ribeiro, J. L. et al. | 1995
- 633
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Synchrotron Radiation Sources for Materials TechnologyWeihreter, E. et al. | 1995
- 653
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Photoemission and EXAFS Study of Na on 2H-TaS~2Holub-Krappe, E. / Aminpirooz, S. / Becker, L. / Keil, M. et al. | 1995
- 661
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Characterisation of Nearly Stoichiometric Buried Si~xN~y Films with EXAFS and NEXAFSPaloura, E. C. / Mertens, A. / Grekos, P. / Frentrup, W. et al. | 1995