The Effect of Plasma-Initiated Graft Copolymerization on Surface of PTMSP Membrane to its Gas Permselectivity [PB.1.12] (English)
- New search for: Hou, X.
- New search for: Zhang, J.
- New search for: Li, G.
- New search for: Sun, Q.
- New search for: International Union of Pure and Applied Chemistry
- New search for: American Physical Society
- New search for: Hou, X.
- New search for: Zhang, J.
- New search for: Li, G.
- New search for: Sun, Q.
- New search for: Heberlein, J. V.
- New search for: Ernie, D. W.
- New search for: Roberts, J. T.
- New search for: International Union of Pure and Applied Chemistry
- New search for: American Physical Society
In:
Plasma chemistry
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161-166
;
1996
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ISBN:
- Conference paper / Print
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Title:The Effect of Plasma-Initiated Graft Copolymerization on Surface of PTMSP Membrane to its Gas Permselectivity [PB.1.12]
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Contributors:Hou, X. ( author ) / Zhang, J. ( author ) / Li, G. ( author ) / Sun, Q. ( author ) / Heberlein, J. V. / Ernie, D. W. / Roberts, J. T. / International Union of Pure and Applied Chemistry / American Physical Society
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Conference:International symposium; 12th, Plasma chemistry ; 1995 ; Minneapolis; MN
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Published in:Plasma chemistry ; 161-166INTERNATIONAL SYMPOSIUM ON PLASMA CHEMISTRY ; 1 ; 161-166
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Publisher:
- New search for: Blackwell Science
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Publication date:1996-01-01
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Size:6 pages
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Remarks:See also 7161.300 vol 68 no 5 1996 for selected papers; Also known as ISPC 12
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ISBN:
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Type of media:Conference paper
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Type of material:Print
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Language:English
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Keywords:
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Source:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Table of contents conference proceedings
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- 3
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Present and Future Modelling Approaches for Non-Equilibrium Plasmas at Low and High Pressures - (invited) [A.1.01]Kushner, M. J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 4
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Advanced Diagnostic Techniques for Thermal Plasmas - (invited) [A.1.02]Fincke, J. R. / Snyder, S. C. / Swank, W. D. / Haggard, D. C. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 5
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New Frontiers in Thermal Plasma Processing - (invited) [E.1.01]Boulos, M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 6
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Future Prospects for Dry Etching - (invited) [E.1.02]Suzuki, K. / Itabashi, N. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 7
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From Molecules to Particles in Silane Plasmas - (invited) [H.1.1]Howling, A. A. / Hollenstein, C. / Courteille, C. / Sansonnens, L. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 8
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Design of Novel Nanocrystalline Composite Materials by Means of Plasma CVD - (invited) [J.1.01]Veprek, S. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 9
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Characterization of Low Pressure Plasmas Using Advanced Diagnostic Methods - (invited) [J.1.02]Wiesemann, K. H. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 10
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High Temperature Treatment of Waste: From Laboratories to the Industrial Stage - (invited) [M.1.01]Poiroux, R. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 13
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Self-Consistent Analysis of Low-Temperature Oxygen Plasma and Processes of its Interaction with Some Polymer Materials - (invited) [B.1.01]Rybkin, V. / Bessarab, A. / Kuvaldina, E. / Maximov, A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 14
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Plasmas and Polymers: From Laboratory to Large Scale Commercialization - (invited) [I.1.01]Wertheimer, M. R. / Thomas, H. R. / Perri, M. J. / Klemberg-Sapieha, J. E. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 15
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Chemical Reactions on Plasma Functionalized Polymer Surfaces [B.1.02]Behnisch, J. / Hollaender, A. / Mehdorn, F. / Zimmermann, H. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 21
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Nitrogen Plasma Treatment of Isotactic Polypropylene: Chemical Surface and Bulk Crystalline Structure Modifications [B.1.03]Poncin-Epaillard, F. / Falher, T. / Brosse, J. C. / Buzare, J. Y. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 27
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Plasma-Treatment of Polymers by Means of NH3-H2 RF Glow Discharges [B.1.04]D'Agostino, R. / Stendardo, M. / Favia, P. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 33
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Introduction of Functional Groups on Polyethylene Surfaces in a Low Pressure Carbon-Dioxide Glow Discharge; a Mechanistic Study [B.1.05]Takens, G. A. / Terlingen, J. G. / Engbers, G. H. M. / Feijen, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 39
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Spectrochemistry of Plasma-Induced Free Radicals in Glucose-Based Polycarbohydrates [B.1.06]Kuzuya, M. / Yamauchi, Y. / Niwa, J. / Kondo, S. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 45
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Study of the Helium Plasma-Polypropylene Interactions. Effect on the Stability of the Wettability, Adhesion and Mechanical Properties of the Polymer [B.1.07]Tatoulian, M. / Arefi-Khonsari, F. / Rouger-Mabille, I. / Amouroux, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 51
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Adhesion of Copper to Plasma-Treated Fluoropolymers [B.1.08]Shi, M. K. / Klemberg-Sapieha, J. E. / Czeremuszkin, G. / Martinu, L. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 57
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Plasma Polymerization of Acetylene in RF Box-Type Gas Discharge Reactor under Plug Flow Condition [I.1.02]Senda, K. / Uchida, T. / Vinogradov, G. K. / Morita, S. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 63
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Fixed Site Facilitated Transport in Cobalt Chelate Containing Plasma Polymers [I.1.03]Morosoff, N. C. / Choe, Y. / Barr, N. E. / Stannett, V. T. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 69
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Mechanisms of Polymerization of Esters and Carboxylic Acids in a Radio Frequency-Induced Plasma [I.1.04]Ameen, A. P. / Beck, A. J. / Jones, F. R. / O'Toole, L. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 75
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In Situ FTIR Investigation of Methyl Methacrylate Plasma, Plasma Polymerized Film and Reaction Mechanisms [I.1.05]Pan, Y. V. / Denton, D. D. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 81
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Plasma Synthesis of Polymeric Thin-Layer-Networks from High Molecular Weight Polysiloxanes [I.1.06]Denes, F. / Sarmadi, A. M. / Young, R. A. / Shohet, J. L. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 87
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Preparation of Thin Films of Poly-Thiophen by Atmospheric Pressure Glow (APG) Plasma [PB.1.29]Tanaka, K. / Okazaki, S. / Inomata, T. / Kogoma, M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 93
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Energy Transfer from an Argon Plasma to Polystyrene Surface [I.1.08]France, R. M. / Short, R. D. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 99
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Hydrophobic Fluorocarbon and Organo-Silicon Condenser Tube Coatings Deposited by Plasma Enhanced CVD [PB.1.01]Bonnar, M. P. / Burnside, B. M. / Reuben, R. L. / Wilson, J. I. B. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 105
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Structural Analysis of Thin Film Prepared by Cold Remote Nitrogen Plasma Assisted Polymerization [PB.1.02]Callebert, F. / Stephan, R. / Dessaux, O. / Goudmand, P. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 111
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Study of the Decomposition Mechanisms of (SF6-N2) Mixtures and Their Interactions with a High Density Polyethylene Target [PB.1.03]Courtot, A. / Arefi-Khonsari, F. / Amouroux, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 117
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Study of the Plasma-Polyethylene Interactions in the Case of SF6 and SF6 - CF4 Non-Equilibrium Discharges [PB.1.04]Khairallah-Abdelnour, Y. / Arefi-Khonsari, F. / Amouroux, J. / Leonard, D. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 123
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Study of the Effect of an Ammonia or Oxygen Plasmas on the Physicochemical Modifications of PP Surface [PB.1.05]Shahidzadeh-Ahmadi, N. / Arefi-Khonsari, F. / Chehimi, M. M. / Amouroux, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 129
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Improved Dyeing Properties of SiCl4-Plasma Treated Polyester Fabrics [PB.1.06]Sarmadi, A. M. / Denes, F. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 135
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A Comparative Study of Plasma-State and Plasma-Induced Polymerization of Acrylonitrile for Modification of Cellophane Surfaces [PB.1.07]Nielsen, L. D. / Denes, F. / Young, R. A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 141
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Surface Amination of Polypropylene Fabrics under Melamine-RF-Cold-Plasma Conditions [PB.1.08]Sarmadi, A. M. / Wang, X. F. / Denes, F. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 147
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Beryllium Containing Plasma Polymers; Their Preparation and Characterization [PB.1.09]Morosoff, N. C. / Barr, N. E. / James, W. J. / Stephens, R. B. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 149
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Plasma Induced Grafting of Styrene and (2-Chloroethyl)Vinyl Ether onto Polyethylene I. Investigation of Surface Changes [PB.1.10]Janke, A. / Grundke, K. / Bartella, J. / Gruenwald, H. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 155
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Plasma Induced Grafting of Styrene and (2-Chloroethyl) Vinyl Ether onto Polyethylene II. Assessment of Biocompatability by Hepatocytes [PB.1.11]Gebhardt, R. / Geckeler, K. E. / Gruenwald, H. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 161
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The Effect of Plasma-Initiated Graft Copolymerization on Surface of PTMSP Membrane to its Gas Permselectivity [PB.1.12]Hou, X. / Zhang, J. / Li, G. / Sun, Q. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 167
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Design of Large Volume Remote Plasma Reactor. Relation Between the Functionalization and the Adhesion Quality of Polypropylene Surfaces Treated by a Remote Nitrogen Plasma [PB.1.13]Mutel, B. / Hoyez, C. / Dessaux, O. / Goudmand, P. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 173
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Plasma Surface Modification of Polymers Characterized by Ellipsometry [PB.1.14]Rochotzki, R. / Meichsner, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 179
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Low Pressure Plasma Polymer Modification from the FTIR Point of View [PB.1.15]Nitschke, M. / Zeuner, M. / Meichsner, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 185
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In Situ XPS and Ex Situ XPS and TOF-SIMS Studies of Nylon 6 and PMMA Treated in Remote O2 and O2-N2 Plasmas [PB.1.16]Scheuer, A. / Prat, R. / Deville, J. P. / Leonard, D. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 191
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A Study of Gas Phase Processes in RF Plasma in the Mixture of Ar and Methylmethacrylate [PB.1.17]Shcheglov, A. N. / Kovalchiuk, A. V. / Yuranova, T. I. / Vasilets, V. N. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 197
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Preparation and Properties of Hydrophilic Plasma Polymer Films [PB.1.18]Biederman, H. / Hlidek, P. / Jezek, J. / Slavinska, D. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 203
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Plasma and Vacuum Ultraviolet Initiated Polymerization of Mesogenic Monomers on the Surface of Fluorocarbon Polymers [PB.1.19]Vasilets, V. N. / Yuranova, T. I. / Kovalchiuk, A. V. / Ponomarev, A. N. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 209
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Optical Emission Spectroscopy of Tetrafluoromethane Plasma as a Diagnostic of Surface Modification of Polymer [PB.1.20]Wang, W. / Poncin-Epaillard, F. / Brosse, J. C. / Ausserre, D. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 215
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Functionalization of UHMW Poly(Ethylene) Membranes by a Carbon Dioxide Plasma Treatment [PB.1.21]Terlingen, J. G. A. / Ter Beek, M. / Feijen, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 221
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On the Dynamics of the Top Layer of Polysulfone Membranes During Plasma Treatment [PB.1.22]Aldea, E. / Dinescu, G. / Musa, G. / Catana, G. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 227
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Surface Modification of Cellophane Films by Plasma Treatment for Membrane Applications [PB.1.28]Bhat, N. V. / Joshi, A. H. / Pawde, S. M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 233
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Reactive Ion Etching of Poly(Tetrafluoroethylene) in CF4/O2 Plasmas for Improvement of Copper Adhesion [PB.1.23]Lu, K. P. / Clark, R. A. / Hirsh, M. / Egitto, F. D. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 239
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Silent Discharge Treatment of Biaxially Oriented Polypropylene [PB.1.24]Boyd, R. D. / Greenwood, O. D. / Hopkins, J. / Badyal, J. P. S. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 245
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Laser-Induced Fluorescence of CF and CF2 Radicals: An In-Situ Diagnostic for Polymer Treatment in CF4 Discharges [PB.1.25]Tserepi, A. / Glasson, T. / Booth, J. P. / Derouard, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 251
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Reactions of Low Pressure Oxygen Plasmas with Liquid Aromatic Compounds [PB.1.26]Pati�o, P. / Ropero, M. / Iacocca, D. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 257
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Mechanisms of Gas Phase Convertion and Polymerization in Nonequilibrium Plasma [PB.1.27]Slovetsky, D. I. / Zimenok, A. I. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 265
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RF Inductive Discharge Source Design for Large Area Processing - (invited) [B.2.01]Wendt, A. / Breun, R. A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 267
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Plasmachemical Activity of the Contact Region of Low Pressure Microwave Plasma Source Arrays [B.2.02]Ohl, A. / Schleinitz, W. / Roepcke, J. / Kaening, M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 273
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A 30-cm-class Plasma Source Using Microwave Slot Antennas on a Rectangular Waveguide for Large Area Plasma Processing [B.2.03]Yasui, T. / Tahara, H. / Yoshikawa, T. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 279
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Microwave Plasma Source Using Planar Ring-Cusp Magnetic Field and Reentrant Coaxial Cavity for Large Area Processing [B.2.04]Yasui, T. / Tahara, H. / Yoshikawa, T. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 285
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A Large Volume Radio Frequency Plasma Source with a Magnetic Line-Cusp Field [B.2.05]Yabe, E. / Yajima, T. / Takahashi, K. / Nanri, K. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 291
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Application of a Large Area Inductive Ion Source to Diamond-Like Film Deposition [B.2.06]Bletzinger, P. / Garscadden, A. / Wu, R. L. C. / Lanter, W. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 297
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Generation of a Large Area Thermal Plasma by Induction Heating with 50-kHz Frequency High Power Source [B.2.07]Sakuta, T. / Sakashita, N. / Takashima, T. / Miyamoto, W. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 303
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Large Diameter Micro-Wave Plasma for Surface Treatment [PB.2.01]Bechu, S. / Laporte, C. B. / Leprince, P. / Marec, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 309
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Modelling of Profile Effects for the LLNL Large Area Inductive Coupled Plasma Source [PB.2.02]Vitello, P. / Parker, G. J. / Tishchenko, N. / DiPeso, G. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 315
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LLNL Large-Area Inductively Coupled Plasma (ICP) Source: Experiments [PB.2.03]Richardson, R. A. / Egan, P. O. / Benjamin, R. D. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 323
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Measurements of CFx and SiHx Radicals in ECR and RF Plasmas Used for Material Processing - (invited) [C.2.01]Goto, T. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 324
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Non-Local Behaviour of the Electron Component in Non-Equilibrium Plasmas - (invited) [C.2.O2]Winkler, R. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 325
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Emission and Absorption Spectroscopy Measurements of Atomic Hydrogen Level Populations in Expanding Magnetised Plasma [C.2.03]Qing, Z. / Otorbaev, D. K. / Eerden, M. J. J. / Brussaard, G. J. H. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 331
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Spectroscopic Temperature Measurements in a H2 Microwave Discharge [C.2.04]Tomasini, L. / Rousseau, A. / Gousset, G. / Leprince, P. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 337
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Fourier Transform Infrared Diagnostics of Reaction Products during Electron Cyclotron Resonance Plasma Etching of Si in Cl2 [C.2.05]Ono, K. / Nishikawa, K. / Tuda, M. / Oomori, T. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 343
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Atomic and Molecular Beams from Electrical Discharges: Their Characterization and Applications Useful for Plasma Diagnostic and Chemical Modelling [C.2.06]Brunetti, B. / Cappelletti, D. / Falcinelli, S. / Liuti, G. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 349
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Vacuum Ultraviolet to Visible Emission of Some Pure Gases Used for Plasma Processing [C.2.08]Kruse, A. / Fozza, A. / Wertheimer, M. R. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 355
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An Efficient Two-Zone Model of Capacitively Driven Low-Pressure Gas Discharges [C.2.09]Brinkmann, R. P. / Fuerst, R. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 361
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Ion Kinetic Energy Distributions in a Compact ECR [C.2.10]Wu, H. M. / Graves, D. B. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 367
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Laser Produced Carbon Plasma in an Ambient Gas [PC.2.01]Abdelli, S. / Kerdja, T. / Ghobrini, D. / Malek, S. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 373
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Measurements of N atom and N2(A) molecule densities in the flowing afterglow of a dinitrogen microwave plasma [PC.2.02]Andari, J. A. / Diamy, A. M. / Hochard, L. / Legrand, J.-C. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 379
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In Situ Monitoring of Plasma Etching and Deposition by Using the Gas Pressure Difference [PC.2.03]Trnovec, J. / Martisovits, V. / Kosinar, I. / Zahoran, M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 385
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Fast Self-Consistent Kinetic Modelling of Low-Pressure RF Discharges [PC.2.04]Berezhnoi, S. V. / Kaganovich, I. D. / Kortshagen, U. / Tsendin, L. D. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 391
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Fractional Dissociation Measurements of H2 and D2 in Molecular Gas Mixtures in RF Discharges [PC.2.05]Ganguly, B. N. / Bletzinger, P. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 397
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The Effect of Excitation Frequency (f=10 kHz - 100 MHz) on the Formation of Excited Atoms and Radicals [PC.2.06]Uyama, H. / Harada, T. / Tomikawa, N. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 403
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NO (X,v) Distributions in rf Discharges: Conditions for a Very High Vibrational Pumping [PC.2.07]De Benedictis, S. / Dilecce, G. / Cacciatore, M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 409
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Diagnostics of Magnetically-Enhanced RF Discharge Plasmas in Methane: Absolute Density of Hydrogen Atoms [C.2.07]Avtaeva, S. V. / Mamytbekov, M. Z. / Otorbaev, D. K. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 415
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Relaxing Kinetics of N~2(B^3cap pie~g,v) in Pulsed RF Discharges: Experimental Results and Mechanisms [PC.2.08]De Benedictis, S. / Dilecce, G. / Simek, M. / Cacciatore, M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 421
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The Combined Thermal and RF-Plasma Activation of Chemical Reactions in the Model-System H2/I2/HI [PC.2.09]Dernier, A. / Gundermann, S. / Miethke, F. / Rutscher, A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 427
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Experimental Design Study by Optical Emission of a Magnetron Sputtering Discharge [PC.2.10]Dony, M. F. / Ricard, A. / Dauchot, J. P. / Wautelet, M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 433
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Plasma Kinetic Model of DC Magnetron Reactive Sputtering in Ar-O2 Gas Mixtures [PC.2.11]Ershov, A. / Pekker, L. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 439
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In Situ Measurement of the Electric Conductivity of Plasma Deposited Films Using Langmuir Probes [PC.2.12]Flender, U. / Rudakowski, S. / Wiesemann, K. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 445
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Surface and Volume Kinetics in a N2/O2 Low Pressure Glow Discharge [PC.2.13]Gordiets, B. / Ferreira, C. M. / Nahorny, J. / Pagnon, D. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 451
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Self-Consistent Kinetic Model for a N2-O2 DC Glow Discharge [PC.2.14]Guerra, V. / Loureiro, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 457
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H Atom Density Measurements in H2 Microwave Discharge [PC.2.15]Tomasini, L. / Rousseau, A. / Gousset, G. / Leprince, P. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 463
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The Application of Cooled Probes for the Investigation of the Change of Chlorinated and Unsubstituted Hydrocarbons in Plasma Jets [PC.2.16]Lachmann, J. / Boerger, I. / Schulz, G. / Trusov, G. B. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 469
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Similarity Principles of Non-Isothermal Plasma Chemical Reactors [PC.2.17]Jacobs, H. / Miethke, F. / Rutscher, A. / Wagner, H. E. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 475
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Low Energy Electron Collisions in SiF4 [PC.2.18]Nagpal, R. / Garscadden, A. / Liptak, D. / Clark, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 481
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Modelling of the Reactivity of Vibrationally Excited Molecules in a Corona Plasma for Catalytic Reactions [PC.2.19]Tas, M. A. / Van Hardeveld, R. / Van Veldhuizen, E. M. / Van Santen, R. A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 487
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Langmuir Probe Measurements of Plasma Parameters in a Planar Magnetron with Additional Plasma Confinement [PC.2.20]Spatenka, P. / Leipner, I. / Vlcek, J. / Musil, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 493
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Electrons and Ions in a Radio-Frequency Oxygen Plasma [PC.2.21]Stoffels, W. W. / Stoffels, E. / Vender, D. / Kroesen, G. M. W. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 499
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Ion Energy Distribution Functions in Microwave and Radio Frequency Plasmas [PC.2.22Reinke, P. / Zabeida, O. / Andreani, B. / Bureau, S. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 505
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Loss Process of Negative Charges in He+SF6 After-Glow Plasma in Pulse Modulated RF Discharge [PC.2.23]Tochitani, G. / Ohtsu, Y. / Nagata, H. / Fujita, H. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 511
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RF Plasma Monitoring Using Self Excited Electron Resonance Spectroscopy [PC.2.24]Klick, M. / Rehak, W. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 519
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Surface Chemistry During Plasma Etching of Silicon -(invited) [F.1.01]Donnelly, V. M. / Herman, I. P. / Cheng, C.-C. / Guinn, K. V. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 521
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Measurements of Mass Dependent Ion Flux, Radical Concentrations and Polymer Film Growth During the Etching of SiO2 and Si with High Density Fluorocarbon Plasmas [F.1.02]Abraham, I. / Breun, R. / Hershkowitz, N. / Kirmse, K. H. R. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 527
-
Electron-Beam Injected Inductively Coupled Plasma Etching and Probe Measurements [F.1.03]Inanami, R. / Vinogradov, G. K. / Morita, S. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 533
-
Does it Matter What Type of Source is Used for Plasma Etching of Semiconductors? [F.1.04]Hershkowitz, N. / Breun, R. / Ding, J. / Kirmse, K. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 539
-
2-D Imaging of CF2 Density by Laser-Induced Fluorescence of CF4 Etching Plasmas in the GEC rf Reference Cell [F.1.05]McMillin, B. K. / Zachariah, M. R. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 545
-
The Chemistry of Halocarbon RF Plasmas Studied by Infrared Absorption Spectroscopy [F.1.06]Stoffels, E. / Stoffels, W. W. / Haverlag, M. / Kroesen, G. M. W. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 551
-
Dry Etching of Si/SiGe Multiple Stacks: Process Control by Optical Emission Spectroscopy and Surface Analysis of Etched Films [F.1.07]Richter, H. H. / Wolff, A. / Tillack, B. / Szczypior, M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 557
-
Plasma Etching of High-Aspect-Ratio Interchip Vias for Vertical Integration of Chips [F.1.08]Engelhardt, M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 563
-
Patterning of Metal Oxide Transparent Electrodes for Flat Panel Displays using an Ar/Cl2 Based Reactive Ion Etch Process [PF.1.01]Molloy, J. / Maguire, P. / Laverty, S. / McLaughlin, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 569
-
Bird's Head Planarization for Bipolar Devices [PF.1.02]Jehoul, C. / Roussel, M. / Durand, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 575
-
Investigation of Ozone Generation on Dielectric Surfaces [B.3.01]Richter, R. / Pietsch, G. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 581
-
Direct Conversion from Methane to Methanol by a Pulsed Silent Discharge Plasma [B.3.02]Okazaki, K. / Nozaki, T. / Uemitsu, Y. / Hijikata, K. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 587
-
Study of a Desulfurization Process under Plasma Conditions with Ar/H2 Mixture [B.3.03]Mohammedi, M. / Leuenberger, J. L. / Amouroux, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 595
-
Cracking of Hydrocarbons in a Plasma Reactor with High Concentration of Activated Hydrogen: Interactions H/CH3 Radicals and Effects on Hydrocarbons Conversion [B.3.04]Leuenberger, J. L. / Mohammedi, M. / Francke, E. / Amouroux, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 601
-
Kinetics of Chemical Reactions of Methane in the Flowing Afterglow of a Dinitrogen Microwave Plasma [PB.3.07]Legrand, J. C. / Diamy, A. M. / Hrach, R. / Hrachova, V. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 607
-
Reactive Plasma Upgrade of Squalane - A Heavy Oil Simulant [B.3.06]Kong, P. C. / Watkins, A. D. / Detering, B. A. / Thomas, C. P. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 613
-
Production of Calcium Carbide in a Plasma-Jet Fluid Bed Reactor [B.3.07]El-Naas, M. H. / Munz, R. J. / Ajersch, F. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 619
-
Combined Plasma-Sorption Process for Producing Monosilane from Fluoride Raw Material [B.3.08]Tumanov, I. N. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 625
-
Ozone Generation by Superimposing Silent Discharge and Ultraviolet Irradiation [PB.3.01]Ehara, Y. / Ishizaka, M. / Kishida, H. / Ito, T. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 631
-
Control of Silicon Particles Velocities in RF Thermal Plasma by L.D.A. for Purification Process [PB.3.02]Francke, E. / Cazard-Juvernat, I. / Arnold, M. / Morvan, D. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 637
-
The Use of Gas Mixtures in a DC Plasma Torch to Increase the Operating Voltage, while Maintaining Stability, and Application to an Inflight Reactor [PB.3.03]Harry, J. E. / Yuan, Q. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 643
-
Processing of Uranium Hexafluoride in a Rotary Plasma Reactor [PB.3.04]Huczko, A. / Li, R. / Boulos, M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 651
-
Temperature Measurement Based on C2 Swan Spectrum in a Transferred Arc in CH4 + CO2 Mixture [PB.3.05]Nassar, H. / Meguernes, K. / Czernichowski, A. / Chapelle, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 657
-
Plasma Quench Technology for Natural Gas Conversion Applications [PB.3.06]Detering, B. A. / Kong, P. C. / Thomas, C. P. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 663
-
Electron Beam and Pulsed Corona Processing of Volatile Organic Compounds in Gas Streams - (invited) [C.1.01]Penetrante, B. M. / Hsiao, M. C. / Bardsley, J. N. / Merritt, B. T. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 665
-
Processing of Pollutants in Dielectric-Barrier in Plasma Reactors [C.1.02]Rosocha, L. A. / Coogan, J. J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 671
-
NOx-Reduction in Synthetic Air by Dielectric Barrier Discharges [C.1.03]Klein, M. / Lins, G. / Roemheld, M. / Seeboeck, R. J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 677
-
Modelling of the Removal of Nitric Monoxide from Exhausts by Dielectric Barrier Discharges [C.1.04]Niessen, W. / Neiger, M. / Schruft, R. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 683
-
Plasma Assisted N20 Oxidation and Reduction [C.1.05]Fridman, A. / Potapkin, B. / Strelkova, M. / Czernichowski, A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 685
-
Purification Processes in Heterogeneous Non-Equilibrium Plasma [C.1.06]Potapkin, B. V. / Deminski, M. A. / Fridman, A. A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 691
-
The Conversion of NO by a Corona Discharge Through a Catalyst Bed [C.1.07]Tas, M. A. / Van Hardeveld, R. / Van Veldhuizen, E. M. / Van Santen, R. A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 697
-
Decomposition of Trichloroethylene by a Large Scale, High Flow Packed-Bed Gas Phase Corona Reactor [C.1.08]Lerner, B. / Birmingham, J. / Tonkyn, R. / Barlow, S. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 705
-
Plasma Assisted Spectroscopic Monitoring of Alkali Metals in Pressurized Combustion and Gasification [C.1.09]Haeyrinen, V. T. / Hernberg, R. G. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 711
-
The Use of Inductively Coupled Plasma Atomic Emission Spectrometry in Environmental Surveying and Geochemical Prospecting [C.1.10]Oedegaard, M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 717
-
Chemical Kinetic Modelling of Ar-CO2 Thermal Plasmas Under Reduced Gas Pressure Conditions [PC.1.01]Beuthe, T. G. / Chang, J. S. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 723
-
Investigation on the Departures from Thermodynamic Equilibrium in a DC Plasma Jet [PC.1.02]Cao, M. / Gravelle, D. V. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 729
-
Electrically Assisted Water Shift Reaction [PC.1.03]Czernichowski, A. / Meguernes, K. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 735
-
Generation of Non-Thermal Transient Gas Discharges at Atmospheric Pressure for Pollution Control [PC.1.04]Kutzner, R. / Salge, J. G. H. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 741
-
Modelling the Plasma Chemistry of a Pulsed Corona Discharge in Dry and Humid Air [PC.1.05]Morgan, W. L. / Jacob, M. / Fisher, E. R. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 747
-
Thermodynamic Aspects of Processes Taking Place in a Discharge Gap on an Ozonizer [PC.1.06]Ozonek, J. / Fijalkowski, S. / Pollo, I. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 753
-
Ionizational Nonequilibrium in Thermal Air Plasmas [PC.1.07]Laux, C. O. / Gessman, R. J. / Kruger, C. H. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 759
-
The Distribution of Atomic Hydrogen in an Atmospheric-Pressure Free-Burning Arc Discharge [PC.1.08]Snyder, S. C. / Murphy, A. B. / Hofeldt, D. L. / Reynolds, L. D. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 765
-
Generation of Microwave Cold Plasma at Atmospheric Pressure [PC.1.09]Sugiyama, K. / Tsutsumi, K. / Itoh, A. / Matsuda, T. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 771
-
Thermal and Chemical Non-Equilibrium Flowfields in an Arcjet Expansion Nozzle for Low Pressure Plasma Processing [PC.1.10]Tahara, H. / Komiko, K. / Yasui, T. / Yoshikawa, T. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 777
-
Diagnostic Study of DC Gliding Arc Discharge [PC.1.11]Simek, M. / Clupek, M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 783
-
Formation of a DC Glow Discharge at Atmospheric Pressure Using Solid Electrolyte [PC.1.12]Torimoto, Y. / Yao, S. / Harano, A. / Sadakata, M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 789
-
Study of Ar/CF4/H2 Inductively Coupled Plasma: Effect of Hydrogenated and/or Oxygenated Atmosphere. Comparison to Ar/CH4 System [PC.1.13]Al Ayoubi, S. / Gonnord, M. F. / Cavvadias, S. / Ricard, A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 795
-
Kinetical Modelling of Chemical Processes During Conversion of Chlorinated Hydrocarbons in a Thermal Plasma [PC.1.14]Boerger, I. / Lachmann, J. / Trusov, B. G. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 801
-
Gliding Arc Treatment of Aqueous Solutions Near Atmospheric Pressure [PC.1.15]Chabchoub, M. / Brisset, J. L. / Czernichowski, A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 807
-
Radical Oxidation Automotive De-NOx [PC.1.16]Chang, B. / Garcia, M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 813
-
OH Generation in Steam-air Pulsed Corona [PC.1.17]Garcia, M. / Chang, B. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 819
-
The Effect of Superimposed Discharge on the Decomposition of NOx in Exhaust Gas [PC.1.18]Ito, T. / Nomura, T. / Miyamoto, H. / Ehara, Y. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 825
-
Industrial Trials of the GlidArc Plasma Reactor [PC.1.19]Janowski, T. / Stryczewska, H. D. / Ranaivosoloarimanana, A. / Czernichowski, A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 831
-
Spectroscopic Temperature Measurement in Dielectric Barrier Discharges [PC.1.20]Klein, M. / Roemheld, M. / Seeboeck, R. J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 837
-
Oxidation of Aromatic Hydrocarbon in a Low-Pressure Plasma Catalytic Fluidized-Bed Reactor [PC.1.21]Langleron, M. / Havet, J.-L. / Cavvadias, S. / Amouroux, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 843
-
UV Emission and Chemical Kinetics of Positive Coronas as Envisaged for Flue Gas Treatment [PC.1.22]Jacob, M. / Teich, T. H. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 849
-
Experimental Equipment for Toxic Substances Destruction Using Plasma Processing [PC.1.23]Coufal, O. / Gregor, J. / Hrabovsky, M. / Senk, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 855
-
A Prevented Spark Reactor for Pollutant Control. Investigation of NO~x Removal [PC.1.24]Hafez, R. / Samson, S. / Marode, E. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 863
-
Coating Generation: Vapor Cloud Surrounding a Particle Prior to Impact and Splat Formation - (invited) [C.3.01]Vardelle, M. / Vardelle, A. / Fauchais, P. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 864
-
Application of Plasma Spraying to Solid Oxide Fuel Cell Production - (invited) [C.3.02]Notomi, A. / Hisatome, N. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 865
-
Suspension Plasma Spraying of Hydroxyapatite [C.3.03]Bouyer, E. / Gitzhofer, F. / Boulos, M. I. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 871
-
Particle Temperature and Residence Time Control for Reactive Spraying [C.3.04]Fincke, J. R. / Swank, W. D. / Haggard, D. C. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 877
-
Plasma Water Interactions in Underwater Plasma Spraying [C.3.05]Waldie, B. / Harris, W. K. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 883
-
Analysis of Thermally Induced Defects in DC Plasma Sprayed Thermal Barriers by the Use of an Acoustic Emission Technique [C.3.06]Voyer, J. / Gitzhofer, F. / Boulos, M. I. / Durham, S. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 889
-
Fume Generation Mechanism in Wire Arc Spraying [C.3.07]Watanabe, T. / Wang, X. / Heberlein, J. / Pfender, E. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 895
-
Plasma Spraying of Porous Ni/ZRO2-Cermet Anodes for the Solid Oxide Fuel Cells [C.3.08]Fendler, E. / Henne, R. / Lang, M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 901
-
Study of Deposition Offset in Plasma Spray of Zirconia [C.3.09]Zhuang, W. H. / Gray, D. / Etemadi, K. / Benenson, D. M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 907
-
Enhancement of Coating Uniformity with Secondary Gas Atomization in Wire Arc Spray [C.3.10]Wang, X. / Heberlein, J. / Pfender, E. / Gerberich, W. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 915
-
Thermal Cycling, Oxidation Behavior and Mechanical Properties of Graded and Duplex PSZ TBC Coatings [PC.3.01]Musil, J. / Alaya, M. / Oberacker, R. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 921
-
Comparative Analysis and Testing of a Different Theories Characterizing a Diameter and Thickness of Plasma Sprayed Splats [PC.3.02]Solonenko, O. P. / Smirnov, A. V. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 927
-
Ceramic Coatings Using Quasi-Steady Magneto-Plasma-Dynamic Arcjet Generators [PC.3.03]Tahara, H. / Mitsuo, K. / Yasui, T. / Kagaya, Y. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 933
-
Augmentation of Thermal Barrier Coatings by Small Particle Plasma Spray [PC.3.04]Bernecki, T. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 937
-
Control of Substrate Temperature During Diamond Deposition [D.1.01]Bieberich, M. T. / Girshick, S. L. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 938
-
Nozzle Optimization for Dissociated Species Transport in Low Pressure Plasma Chemical Vapor Deposition [D.1.02]George, C. / Candler, G. / Young, R. / Pfender, E. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 939
-
DC-Plasma Torches with Diverging Nozzles for Advanced Plasma Spraying [D.1.03]Henne, R. H. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 940
-
Parameters Controlling the Generation and Properties of Plasma Sprayed Zirconia Coatings [D.1.04]Fauchais, P. / Vardelle, M. / Vardelle, A. / Bianchi, M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 941
-
On the Spreading and Solidification of Molten Particles in a Plasma Spray Process: Effect of Thermal Contact Resistance [D.1.05]Pasandideh-Fard, M. / Mostaghimi, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 942
-
Modelling of Nonequilibrium Effects in a High-Velocity Nitrogen-Hydrogen Plasma Jet [D.1.06]Chang, C. H. / Ramshaw, J. D. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 943
-
Development of a Sensing & Control Technique for an Innovative Atmospheric Plasma CVD Process [D.1.07]Watkins, A. D. / Snyder, S. C. / Kong, P. C. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 944
-
Heat Transfer in Plasma Spraying [D.1.08]Nutsch, G. / Rother, W. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 945
-
Isotope Separation by DC Arc Discharge [D.1.09]Suzuki, M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 946
-
Fuzzy Logic Modelling for Process Optimization and Control [D.1.10]Schaible, B. / Lee, Y. C. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 947
-
Co-Processing Conception of a Quenching Plasma Reactor Associated to a Fluidized Bed Designed to Hydrogen Radical Production at Low Temperature [F.2.01]Mohammedi, M. N. / Cavvadias, S. / Leunberger, J. L. / Francke, E. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 948
-
Diffusion Phenomena of a Cold Gas in a Thermal Plasma Stream [F.2.02]Rahmane, M. / Soucy, G. / Boulos, M. I. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 949
-
The Role of Radical and Cluster in Thermal Plasma Flash Evaporation Process [F.2.03]Takamura, Y. / Hayasaki, K. / Terashima, K. / Yoshida, T. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 951
-
An Improved Method for the Calculation of Thermal Conductivities in the Low Temperature Region of Thermal Plasma Processes [F.2.04]Wilhelmi, H. / Bollmann, H. / Caesar, T. / Aretz, W. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 957
-
High-Definition Plasma Spraying with Wire Feedstock [F.2.05]Fincke, J. R. / Swank, W. D. / Haggard, D. C. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 958
-
Studies on Plasma Heat Transfer [F.2.06]Kanzawa, A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 959
-
Plasma-Particle Momentum Transfer under Conditions of Great Knudsen Numbers and Thin Plasma Sheath [F.2.07]Chen, X. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 960
-
Characterization of D.C. Plasma Torch Voltage Fluctuations [F.2.08]Coudert, J. F. / Planche, M. P. / Fauchais, P. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 963
-
Chemistry of the Electron Beam Process and its Application to Emission Control - (invited) [G.1.01]Maetzing, H. / Baumann, W. / Paur, H.-R. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 965
-
Characterization of Chemical Processes in Non-thermal Plasmas for the Destruction of Volatile Organic Compounds [G.1.02]Green, D. S. / Sieck, L. / Herron, J. T. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 971
-
Elimination of Organic Solvent in Air by Means of Plasma Technique [G.1.03]Ge, Y. J. / Chen, S. G. / Qiao, Z. S. / Wang, D. B. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 977
-
Spectroscopic Measurement of Radical in Non-Equilibrium Plasma [G.1.04]Habu, K. / Harano, A. / Sadakata, M. / Hosokawa, S. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 983
-
Stabilization of Trichlorotrifluoroethane(CFC-113) by Plasma Copolymerization with a Hydrocarbon Monomer [G.1.05]Tsuji, O. / Sawai, M. / Nakamo, H. / Minaguchi, T. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 989
-
The Corona Discharge in Humid Air as an Oxidizing Tool for the Destruction of Aromatic Solutes [G.1.06]Peulon, V. / Brisset, J.-L. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 995
-
Modelling of Capillary Tube Plasma Reactor Corona Discharge Parameters in Dry Air with Trace Volatile Organic Compounds [G.1.07]Chang, J. S. / Urashima, K. / Thompson, H. / Myint, T. A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1001
-
Calcite Fluidized Bed Reactor Heated by Argon-Hydrogen Plasma Jets for the Destruction of Carbofluorine Wastes [G.1.08]Pateyron, B. / Elchinger, M.-F. / Delluc, G. / Erin, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1009
-
3-D Computer Simulation of Electron Beam Cleaning Processes [G.1.09]Petrusev, A. S. / Potapkin, B. V. / Shulakova, E. V. / Fridman, A. A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1015
-
Plasma Treatment of Aluminum Dross [G.1.10]Takeuchi, A. / Hashimoto, H. / Tanaka, K. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1021
-
The First Step to Industrialize Decomposition Process of Ozone Depleting Substances by Steam Plasma [G.1.11]Takeuchi, S. / Takeda, K. / Uematsu, N. / Komaki, H. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1027
-
Thermochemistry and Kinetics of Plasma Waste Destruction [N.1.01]McAllister, T. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1033
-
The Destruction of Toxic Liquid Wastes in an Induction Plasma Reactor [N.1.02]Bergeron, E. / Soucy, G. / Boulos, M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1039
-
Investigation of the Pyrolysis of Chlorinated Hydrocarbons in an Argon Plasma Jet [N.1.03]Glocker, B. / Messerschmid, E. / Kanne, S. / Berger, R. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1045
-
Thermal Plasma Reduction of UF6 [N.1.04]Fincke, J. R. / Swank, W. D. / Haggard, D. C. / Detering, B. A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1051
-
Destruction of CH3Cl Using Plasma Fluidized CaO Bed [N.1.05]Sekiguchi, H. / Matsudera, N. / Kanzawa, A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1057
-
Induction-Coupled Plasma Energy Recycle and Conversion (PERC) of Military Waste Streams [N.1.06]Smith, R. W. / Mutharasan, R. / Knight, R. / Luu, D. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1063
-
Aluminum Can Recovery by Thermal Plasma [N.1.07]Szente, R. N. / Cruz, A. C. / Sousa, L. B. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1069
-
Application of Plasma Arcs for the Pyrolysis of Mixed Solid/Liquid Waste Material [N.1.08]Sartwell, B. D. / Giuliani, J. L. / Fleming, J. W. / Apruzese, J. P. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1071
-
Carbon Monoxide Production from CO2 Using DC Plasma Jets [N.1.09]Carabine, M. D. / Vasanthakumar, L. S. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1077
-
Incineration and Vitrification of Surrogate Nuclear Wastes by Thermal Plasma [N.1.10]Girold, C. / Cartier, R. / Taupiac, J. P. / Vandensteendam, C. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1083
-
Pulsed Positive Corona in Water [N.1.11]Van Veldhuizen, B. M. / Rutgers, W. R. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1089
-
Energy Consideration for Steam Plasma Gasification of Black Liquor and Chemical Recovery [PG.1.02]Grandy, I. D. / Kong, P. C. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1095
-
Parameters Study of Plasma Jet Behavior with a Numerical Simulator [PG.1.03]Matsuyama, K. / Yamamoto, R. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1101
-
Application of Hollow Anode Ion-Electron Sources in Plasma Chemistry [PG.1.04]Miljevic, V. I. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1107
-
Chemical Kinetics Model for NO Reduction from Flue Gas Excited by Pulsed Corona Discharge [PG.1.05]Yousfi, M. / Hart, J. / Hamani, A. / Hennad, A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1113
-
On the Use of the "Electrical Wind" to Improve the Removal Efficiency of Air Pollutants Treated by Corona Discharges [PG.1.06]Pinart, J. / Goldman, A. / Goldman, M. / Pinart, M.-E. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1119
-
Decomposition of 1,2-Dichloroethane in Hydrogen by Non-Equilibrium RF Plasma [PG.1.07]Schulz, G. / Birkhahn, G. / Boerger, I. / Lachmann, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1125
-
Experimental Investigations of the Removal of Toxic Exhaust Gas Components by Dielectric Barrier Discharges [PG.1.08]Wolf, O. / Weiser, F. / Neiger, M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1131
-
Ozone for NOx Elimination from Waste Gases [PG.1.09]Wolinska, J. / Pollo, I. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1137
-
Physical-Chemical Mechanisms of NOx Oxidation Stimulated by Electron Beam [PG.1.10]Shulakova, E. V. / Deminsky, M. A. / Fridman, A. A. / Potapkin, B. V. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1145
-
Analysis of Coulomb-Crystal Formation Process for Application to Tailored Particle Synthesis in RF Plasmas - (invited) [G.2.01]Tachibana, K. / Hayashi, Y. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1146
-
Induction Plasma Synthesis of Ultrafine SiC - (invited) [G.2.02]Gitzhofer, F. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1147
-
Nanocrystalline Ceramic SiC, TiC and SiC-TiC Powders Produced in an RF Induction Plasma [G.2.03]Klotz, H.-D. / Mach, R. / Oleszak, F. / Szulzewsky, K. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1153
-
Synthesis of Ultrafine Powders by MW Plasma at Atmosphere Pressure [G.2.04]Zheng, G. L. / Li, S. C. / Cheng, R. Y. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1159
-
Characterization of a 3-Phase AC Plasma Reactor for Carbon Black Synthesis from Natural Gas [G.2.05]Fulcheri, L. / Flamant, G. / Variot, B. / Ravary, B. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1165
-
Carbonization of Hexane and Toluene in an RF Thermal Plasma at Normal Pressure [G.2.06]Szepvoelgyi, J. / Beck, M. T. / Keki, S. / Mohai, I. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1171
-
Carbon Clusters and Fullerene Formation in Turbulent Radial Jet from Graphite Contact Arc [G.2.07]Sukhinin, G. I. / Nerushev, O. A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1177
-
The Plasma Production of Fullerenes [G.2.08]Alexakis, T. / Tsantrizos, Y. S. / Meunier, J. L. / Tsantrizos, P. G. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1183
-
Fullerene Formation in a Helium-Carbon Plasma [G.2.09]Huczko, A. / Lange, H. / Byszewski, P. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1189
-
Deposition of C60 in the Microwave Plasmas [G.2.10]Ikegami, T. / Matsumoto, O. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1195
-
Thermal Plasma Modification of Titanium Carbide Powder - Numerical Analysis of Powder Behavior in Plasmas [G.2.11]Watanabe, T. / Kanzawa, A. / Ishigaki, T. / Moriyoshi, Y. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1201
-
Analysis of the Synthesis of Ultrafine AlN Powders in an Induction Plasma Reactor [PG.2.01]Bilodeau, J.-F. / Proulx, P. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1207
-
Synthesis of Ultrafine Powders of Silica in a DC Transferred Plasma Arc Furnace [PG.2.02]Chang, K. / Ageorges, H. / Megy, S. / Vandensteendam, C. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1213
-
Preparation of Ultrafine Calcia Powder by Air Plasma [PG.2.03]Fan, Y. / Fu, L. / Zhang, M. / Xiao, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1219
-
Laserinduced Synthesis and Characterisation of Boron Doped Nanosized Silicon Carbide Powders [PG.2.04]Foerster, J. / Buchner, P. / Uhlenbusch, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1225
-
High Frequency Capacitor Plasmatorches for Synthesis of New Ceramic Powders at High Pressure [PG.2.05]Dresvin, S. / Goldfarb, V. / Amouroux, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1231
-
Ultrafine SiC Synthesis Using Induction Plasmas: A Parametric Study [PG.2.06]Guo, J. Y. / Gitzhofer, F. / Boulos, M. I. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1237
-
RF Induction Plasma Synthesis of Si3N4-SiC Composite Powders from Different Silanes and Silane Mixtures [PG.2.07]Mach, R. / Klotz, H.-D. / Drost, H. / Kosche, I. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1243
-
Properties of Plasma Silica Powders used to Sapo Molecular Sieve Synthesis [PG.2.08]Schulz, G. / Geissler, H. / Braun, M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1249
-
Synthesis of a New Y-Fe-O Ultrafine Particles Using Inductively Coupled Plasma [PG.2.09]Sugasawa, M. / Kikukawa, N. / Ishikawa, N. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1255
-
Synthesis of Silicon Nitride Nanopowders in an RF Thermal Plasma Torch: Comparative Study on Different Precursors [PG.2.10]Szepvoelgyi, J. / Mohai, I. / Baksa, G. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1261
-
Rapid Nitriding of Aluminum under Nitrogen Glow Plasma [PG.2.11]Ito, S. / Akashi, K. / Takahashi, H. / Yoshida, K. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1267
-
Plasma Arc Process for Producing Disperse Oxide Materials from Volatile Fluorides [PG.2.12]Tumanov, I. N. / Hohlov, V. A. / Sigailo, V. D. / Kuzminykh, S. A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1273
-
Arc Plasma Process for Producing High-Quality Ceramic Materials from Solutions and Melts [PG.2.13]Tumanov, I. N. / Hohlov, V. A. / Sigailo, V. D. / Khodalev, V. B. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1279
-
Cathodic Arc Carbon Plasma-Gas Interaction Effects at Low Pressures of He, Ar and N2 in Fullerene Synthesis [PG.2.14]Meunier, J.-L. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1287
-
Formation of Dense Submicronic Clouds in Low Pressure Ar-SiH4 RF Reactor: Diagnostics and Growth Processes from Monomers to Large Size Particulates - (invited) [I.3.01]Bouchoule, A. / Boufendi, L. / Hermann, J. / Plain, A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1288
-
Kinetic Models of Plasma-Particle Charge, Momentum and Energy Transfer under Rarefield Flow Conditions - (invited) [I.3.02]Gnedovets, A. G. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1289
-
On Morphology and Growth in Dust-Laden Plasmas [I.3.03]Haaland, P. / Garscadden, A. / Ganguly, B. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1295
-
Effects of Silicon Particles on DC and/or AC Discharge Characteristics in Magnetized Silane Plasmas [I.3.04]Fujiyama, H. / Yang, S.-C. / Nakajima, Y. / Maemura, Y. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1301
-
Thermal Plasma Expansion Process for the Controlled Synthesis of Silicon, Carbon, and Silicon Carbide Nanoparticles [I.3.05]Hansen, D. / Micheel, B. / Rao, N. / Girshick, S. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1307
-
Detection of Dust Particles by Laser Heating [I.3.06]Stoffels, E. / Stoffels, W. W. / Kroesen, G. M. W. / De Hoog, F. J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1313
-
Physical, Chemical and Microstructural Modification of Powders by Thermal Plasma Treatment [I.3.07]Ishigaki, T. / Moriyoshi, Y. / Jurewicz, J. / Gitzhofer, F. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1319
-
Particle Contaminant Formation and Transport in Microelectronics Fabrication Processes [PI.3.01]Yu, B. W. / Krishnan, A. / Kelkar, M. / Rao, N. P. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1325
-
Transport Phenomena During the Vaporization of Metallic Waste Particle in a Plasma Jet [PI.3.02]Bamrim, A. / Flamant, G. / Badie, J. M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1331
-
Nucleation Phenomena in D.C. High Pressure Electrical Discharges and Post-Production of Ultra-Fine Aerosol [PI.3.03]Borra, J. P. / Boulaud, D. / Goldman, A. / Goldman, M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1337
-
A Study of the Influence of Plasma Jet Confinement on Particle Parameters in Induction Plasma Processing [PI.3.04]Coulombe, S. / Boulos, M. I. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1343
-
Injection and Trajectories of Particles in DC Plasma Spray Processes [PI.3.05]Dussoubs, B. / Vardelle, A. / Li, K.-I. / Vardelle, M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1349
-
Forces Acting on a Spherical Particle in a Rarefied Plasma [PI.3.06]Gnedovets, A. G. / Gusarov, A. V. / Uglov, A. A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1355
-
Hydrodynamics and Stability of Plasma Spouted Beds [PI.3.07]Hamdi, H. / Jurewicz, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1361
-
Thermal Plasma Modification of Titanium Carbide Powder - Thermochemical Analysis and Experimental Study [PI.3.08]Ishigaki, T. / Moriyoshi, Y. / Watanabe, T. / Kanzawa, A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1367
-
Electrostatic Field Effects on the Transport of Macroparticles in Magnetized Plasma Ducts [PI.3.09]Keidar, M. / Beilis, I. / Boxman, R. L. / Goldsmith, S. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1373
-
On the Electrical Charging of Dust Particles in a Capacitively Coupled RF Plasma [PI.3.10]Kortshagen, U. / Muemken, G. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1379
-
A Model for Nanosize Silicon Particle Formation in a Thermal Plasma Expansion Reactor [PI.3.11]Micheel, B. / Hansen, D. / Rao, N. / Girshick, S. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1385
-
Adaptive Phase/Doppler Velocimeter and Its Applications to In-Situ Measurement of Fine Metallic Particles and Charged Particles [PI.3.12]Naqwi, A. A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1391
-
Program Complex for Automation of a Computer Experiment in Plasma Dynamics of a Jet Disperse Systems [PI.3.13]Solonenko, O. P. / Zinoviev, A. P. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1397
-
Numerical Analysis of Si Particles Injection Parameters Influence on Evaporation Process in Thermal Plasma Reactor [PI.3.14]Stefanovic, P. L. / Pavlovic, P. B. / Kostic, Z. G. / Cvetinovic, D. B. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1405
-
Dissociation and Vibrational Deactivation of H2 and D2 on Metallic Surfaces: A Theoretical Survey - (invited) [G.3.01]Cacciatore, M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1407
-
Fluorination of Silicon in Fluorocarbon RF Discharges Studied by In Situ High-Speed Infrared Ellipsometry [G.3.02]Haverlag, M. / Den Boer, J. H. W. G. / Swinkels, G. H. P. M. / Kroesen, G. M. W. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1413
-
In Situ Fourier Transform Infrared Ellipsometry for Monitoring c-Si Etching Process by CF4 Plasma [G.3.03]Shirafuji, T. / Tachibana, K. / Muraishi, S. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1419
-
Comprehensive Study of Reaction Kinetics of Simplest Unsaturated Fluorocarbons in Non-Equilibrium Plasma. Mechanism of Heterogeneous Stages of Plasma-Surface Interactions [G.3.04]Vinogradov, G. K. / Imanbaev, G. J. / Timokhov, A. G. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1425
-
Energy Transfer and Oxygen Atoms Recombination on Refractory Materials. Aging Mechanisms of the Material [G.3.05]Nguyen-Xuan, F. / Cavvadias, S. / Amouroux, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1431
-
Oxygen Elimination and New Electronic Properties of Silicon Due to a Treatment by a Thermal Plasma (Argon + 1% of H2 or Argon + 10.6% of He) [G.3.06]Cazard-Juvernat, I. / Pajot, B. / Morvan, D. / Amouroux, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1437
-
A Thermionic Cathode with Diffused Arc Root for Plasma Generators [G.3.07]Lin, L. / Sun, Z. / Wang, B. Y. / Wu, C. K. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1443
-
Numerical Investigations of the Cathode Region of Electric Arcs [G.3.08]Kaddani, A. / Simonin, O. / Delalondre, C. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1449
-
A Simplified Unified Theory of Arcs and Their Electrodes [G.3.09]Lowke, J. J. / Morrow, R. / Haidar, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1455
-
Anodic Arc Root Behavior of a Transferred Arc Moving Orthogonally to a Plane Surface [G.3.10]Sobrino, J. M. / Coudert, J. F. / Fauchais, P. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1461
-
Local Current Density and Cathodic Arc Root Shape in a Rotating Thermal Arc [G.3.11]Eubank, P. T. / Munz, R. J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1469
-
D.C. Plasma Jet Heating of a Rotating Cylinder: Modelling and Measuring [PG.3.01]Dublanche, D. / Coudert, J. F. / Fauchais, P. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1475
-
Evolution of the Plasma Flow Characteristics, During the First Hours, After Replacing the Set of Electrodes [PG.3.02]Planche, M. P. / Coudert, J. F. / Fauchais, P. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1481
-
Investigation of the Erosion Behaviour of Graphite and Silicon Carbide by Mass Spectrometry [PG.3.03]Dabala, P. / Auweter-Kurtz, M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1487
-
A Study of Excited Nitrogen Assist Chemical Reaction at PTFE Surface Treated by the Discharge in Smaller pd Region [PG.3.04]Hoshino, S. / Yumoto, M. / Sakai, T. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1493
-
Effects of Electrode Size on Electrode Erosion in AC Plasma Torches [PG.3.05]Iwata, M. / Yasui, S. / Shibuya, M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1499
-
The Chemical Interaction between Plasma-Excited Nitrogen and the Surface of Oxide Catalysts [PG.3.06]Kameoka, S. / Kuroda, M. / Kuriyama, T. / Ito, S. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1505
-
Vacuum Arc Movement on Various Graphite Cathode Ions Sources for Diamond-Like Arc Films Production [PG.3.07]Kandah, M. / Meunier, J.-L. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1511
-
Improvement of Steel Surfaces by a Combination of Magnetron Sputtering and Plasma Nitriding [PG.3.08]Musil, J. / Vicek, J. / Jezek, V. / Benda, M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1515
-
Mechanism of Surface Modification of Carbon Black in Plasma [PG.3.09]Ge, Y. J. / Chen, S. G. / Wang, D. B. / Zhang, G. Q. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1521
-
Hydrogen Effects in Interaction Between Thermal Ar-H2 Plasma and Metal [PG.3.10]Suzuki, M. / Hirayama, M. / Nishikubo, M. / Akatsuka, H. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1527
-
Properties of LaB6-W Electrode [PG.3.11]Tanaka, K. / Ushio, M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1533
-
Emission Spectroscopic Diagnostics and Result Comparison of Theoretical and Experimental Investigations in the Cathode Region [PG.3.12]Zhou, X. / Heberlein, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1535
-
Theory of a Cathodic Part of High-Pressure Arc Discharges [PG.3.13]Benilov, M. S. / Marotta, A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1541
-
Plasma Cleaning of Steel and Aluminum Studied by Optical Emission Spectroscopy and Langmuir Probe Measurements [PG.3.14]Barholm-Hansen, C. / Pedersen, H. C. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1547
-
Influence of RF-Cold Plasma Treatment on the Surface Properties of Security Paper [PG.3.15]Hua, Z. Q. / Barrios, E. / Evans, J. / Denes, F. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1553
-
Determination of N2 Atom Density in N2 and N2-CH4 H. F. Flowing Post-Discharges [PG.3.16]Bockel, S. / Diamy, A. M. / Ricard, A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1559
-
Low Temperature Cleaning of InP Substrates Using H-Atoms. In-Situ Optical Methods for H2 Plasma and Surface Characterization [PG.3.17]Bruno, G. / Losurdo, M. / Capezzuto, P. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1565
-
Dense Medium Plasma Reactions: A New Approach to Plasma Chemistry [PG.3.18]Denes, F. / Young, R. A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1571
-
Effects of Corona Discharge Treatment on Enhancement of Seed Germination [PG.3.19]Watanabe, T. / Kumano, E. / Kanzawa, A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1577
-
Energy Transfer to the Walls at Low Pressure Plasma Processing [PG.3.20]Kersten, H. / Deutsch, H. / Steffen, H. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1583
-
A Low-Pressure R.F. Oxygen Plasma as a Tool for Oxidation: The Treatment of Copper Foils [PG.3.21]Bellakhal, N. / Draou, K. / Cheron, B. / Lenglet, M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1589
-
Cold Plasma Treatment of Activated Carbon and Its Surface Properties [PG.3.22]Kurano, N. / Yamada, H. / Sugiyama, K. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1595
-
On the Thermophysical Model of Cold Electrodes Erosion [PG.3.23]Sharakhovsky, L. I. / Borisjuk, V. N. / Marotta, A. / Da Silva, L. O. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1601
-
Axial Scanning of Arc Roots in an Electric Arc Torch [PG.3.24]Borisyuk, V. N. / Esipchuk, A. M. / Marotta, A. / Olenovich, A. S. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1609
-
Influence of Metallic Vapors on Electric Arc Properties - (invited) [I.2.01]Vaquie, S. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1611
-
Influence of Copper and Iron Vapours on an Argon Transferred Arc [I.2.02]Gonzalez, J. J. / Bouaziz, M. / Razafinimanana, M. / Gudzy, P. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1617
-
Analytical Radiative Emission Results for Argon/Copper Thermal Plasmas [I.2.03]Menart, J. / Pfender, E. / Heberlein, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1619
-
Time Resolved Measurements of Arc Voltage, Temperature and Velocity in a.d.c. Plasma Torch [I.2.04]Coudert, J. F. / Planche, M. P. / Fauchais, P. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1627
-
Fluctuations of Light Intensity in Thermal Plasma Jet Generated by Water Stabilized DC Arc Torch [I.2.05]Hrabovsky, M. / Konrad, M. / Kopecky, V. / Hlina, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1633
-
Electron-Temperature and Electron-Density Profiles in an Atmospheric-Pressure Argon Plasma Jet [I.2.06]Snyder, S. C. / Reynolds, L. D. / Fincke, J. R. / Lassahn, G. D. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1639
-
Diagnostics and Modelling of a High-Power R.F. Plasma Flow [I.2.07]Cao, M. / Rahmane, M. / Gravelle, D. V. / Soucy, G. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1645
-
Interaction Between Subsonic Gas Flow and a Glydarc Electric Discharge [I.2.08]Harry, J. E. / Yuan, Q. / Dubus, M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1651
-
Time-iterative Solutions of Inviscid Supersonic d.c. Plasma Jet [I.2.09]Jodoin, B. / Proulx, P. / Mercadier, Y. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1657
-
Mathematical Model for the Calculation of the Impedance of R.F. Inductively Coupled Plasmas [I.2.10]Merkhouf, A. / Boulos, M. I. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1663
-
Water Entrainment into Underwater Thermal Plasmas [PI.2.01]Waldie, B. / Ryan, E. J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1669
-
New Approach to Application of Classic Methods of Physical and Chemical Kinetics to Analysis of Efficiency of Plasma Technology of Coal Gasification [PI.2.02]Carpenko, E. I. / Devaytov, B. N. / Zhukov, M. F. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1675
-
Computational Study of Enthalpy Probe Measurements in High-Speed Plasma Flow [PI.2.03]Chang, C. H. / Ramshaw, J. D. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1681
-
Experimental Study of Thermal Plasma Flow and Heat Transfer in a Tube [PI.2.04]Chen, X. / Yu, L. / Su, B. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1687
-
Mass and Energy Transfer Study of the Decomposition of NH3 in an Induction Plasma Reactor (PI.2.05]Davies, B. / Soucy, G. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1693
-
Multicomponent Mass Transfer in a Plasma Reactor: Comparison of Three Different Diffusion Flux Formulations [PI.2.06]Desilets, M. / Proulx, P. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1699
-
Dynamic and Static Behaviours of DC Vortex Torch Working With H2 and Ar-H2 [PI.2.07]Erin, J. / Pateyron, B. / Delluc, G. / Fauchais, P. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1707
-
Numerical Simulation of the Position and Rotary Velocity of Arc Spot in a Tubular Arc Plasma Generator with Double Steps [PI.2.08]Fan, Y. / Zhang, M. / Fu, L. / Xiao, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1713
-
Splitted Arc Discharge of High Pressure [PI.2.09]Golysh, V. I. / Simonov, Y. P. / Mukhazhanov, V. N. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1719
-
Interaction of Thermal Plasma Jet with the Stream of Injected Liquid [PI.2.10]Hrabovsky, M. / Konrad, M. / Kopecky, V. / Sember, V. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1725
-
Voltage Gradient-Current Characteristics of Ar Torch Plasma Normalized by its Experimental Photo-Radius [PI.2.11]Inaba, T. / Endo, M. / Watanabe, Y. / Shibuya, M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1731
-
Net Emission Coefficient for Thermal Plasmas in H2, O2, C, H2O, CF4 and CH4 [PI.2.12]Riad, H. / Gonzalez, J. J. / Gleizes, A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1737
-
Mechanism and Kinetics of H2S-CO2 Mixture Dissociation in Plasma of a Microwave Discharge [PI.2.13]Potapkin, B. V. / Strelkova, M. I. / Fridman, A. A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1743
-
RF Multiflux Plasmatron Study. Experimental Measurements and Modelling [PI.2.14]Morvan, D. / Erin, J. / Magnaval, S. / Amouroux, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1749
-
High Enthalpy Plasma Sources for Re-Entry Simulation [PI.2.15]Laure, S. / Auweter-Kurtz, M. / Kurtz, H. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1755
-
2-D Simulation for a Spherical Top Inductively Coupled Plasma Source [PI.2.16]Wu, H.-M. / Li, M. / Yang, Y. / Wu, C.-K. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1761
-
A Physical Modelling of a DC Plasma Torch [PI.2.17]Bauchire, J. M. / Gonzalez, J. J. / Gleizes, A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1767
-
Plasma Plume Dynamics Metamorphoses during the Plume Laminar-Turbulent Transition [PI.2.18]Krejcf, L. / Dolinek, V. / Ruzicka, B. / Sara, L. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1773
-
Numerical Simulation of a Non-Equilibrium Plasma Jet in an Applied Magnetic Field Using Three-Fluid Model [PI.2.19]Nishiyama, H. / Saito, T. / Kamiyama, S. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1779
-
Effect of a Magnetic Field on Turbulence of a Non-Equilibrium Plasma Jet [PI.2.20]Sato, T. / Nishiyama, H. / Kamiyama, S. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1785
-
Characterisation of Cascaded Arc Thermal Plasma Source in Argon and Hydrogen: Experiment and Modelling [PI.2.21]Qing, Z. / Otorbaev, D. K. / Kulumbaev, E. B. / Semenov, V. F. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1791
-
Mass Spectroscopic and Optical Diagnostics of the Arc Discharge with Evaporated Graphite Cathode [PI.2.22]Kurtynina, G. N. / Otorbaev, D. K. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1799
-
Modelling and Diagnostics of Plasma Chemical Processes in Mixed-Gas Arcs - (invited) [L.2.01]Murphy, A. B. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1801
-
The Transport Phenomena in Non-Isothermal Multispecie Plasma [L.2.02]Kaganovich, I. D. / Tsendin, L. D. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1807
-
The Argon-Hydrogen Expanding Thermal Arc Plasma [L.2.03]Meulenbroeks, R. F. G. / Engeln, R. A. H. / Van de Sanden, M. C. M. / Van der Mullen, J. A. M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1813
-
Theoretical Analysis of Removal of Oxides of Sulphur and Nitrogen in Pulsed Corona [L.2.04]Lowke, J. J. / Morrow, R. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1819
-
Development of the Localization Method: Application for the Diagnostic of a Plasma Having a Plane of Symmetry [L.2.05]Bousrih, S. / Megy, S. / Ershov-Pavlov, E. A. / Baronnet, J.-M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1825
-
Optical Emission Measurements of an Inductively Coupled Argon Plasma (ICP) [L.2.06]Jaffe, S. / Hernberg, R. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1831
-
Energy Balance in H2 - N2 Glow Discharges [L.2.07]Nagpal, R. / Garscadden, A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1837
-
Kinetic Analysis of Efficient H-Formation in Laser Irradiated H2 [L.2.08]Garscadden, A. / Nagpal, R. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1843
-
Property of RF Capacitive Discharge Containing Oxygen Negative Ions [L.2.09]Amemiya, H. / Yasuda, N. / Endo, M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1849
-
Mass Spectrometric Determination of Reaction Rates During Plasma Processing of Layers [PL.2.01]Trnovec, J. / Martisovits, V. / Cicala, G. / Capezzuto, P. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1855
-
Particle Analysis at the Electrode Surfaces of an rf Discharge [PL.2.02]Zeuner, M. / Meichsner, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1861
-
Non-Equilibrium Properties of Electric Arc Plasma and Combined Methods of Its Diagnostic [PL.2.03]Babich, I. L. / Cheredarchuk, A. I. / Veklich, A. N. / Zhovtyansky, V. A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1867
-
Comprehensive Study of Reaction Kinetics of Simplest Unsaturated Fluorocarbons in Non-Equilibrium Plasma. Mechanisms of Gas Phase Transformations [PL.2.04]Vinogradov, G. K. / Timokhov, A. G. / Zimenok, A. I. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1873
-
Magnesium as a Representative Analyte Metal in an Argon Inductively Coupled Plasma [PL.2.05]Vicek, J. / Forejt, L. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1879
-
Pressure Dependence of Discharge By-Products from Ar-CH4-H2 and Ar-CO2-H2 Mixture ICP Plasmas [PL.2.06]Chang, J. S. / Hayashi, H. / Daza, C. / Lee, D. C. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1885
-
Study of the Plasma Chemistry of Sealed-Off CO2 Lasers with Novel Mass-Spectrometric Technique. Part I. Experimental Technique. [PL.2.07]Wang, Y. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1891
-
On Generalization of Current-Voltage and Thermal Characteristics of Electric Arc [PL.2.08]Bublievski, A. F. / Esipchuk, A. M. / Marotta, A. / Yas'ko, O. I. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1897
-
On the Adequacy of Approximation Methods for the Current-Voltage Characteristics of Arc Plasma Torches [PL.2.09]Yas'ko, O. I. / Marotta, A. / Laktyushina, T. V. / Da Silva, L. O. M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1903
-
Effect of Gas Flow Rate and Electrodes Diameter Variation in the Similarity of Plasma Torches Characteristics for Different Methods of Experimental Data Approximation [PL.2.10]Yas'ko, O. I. / Marotta, A. / Laktyushina, T. V. / Da Silva, L. O. M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1909
-
Current-Voltage Characteristics Generalization for Plasma Torches Operating with Different Gases [PL.2.11]Yas'ko, O. I. / Marotta, A. / Laktyushina, T. V. / Da Silva, L. O. M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1917
-
Plasma Deposition of Amorphous Silicon Alloys from Fluorinated Gases - (invited) [K.1.01]Cicala, G. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1918
-
Synthesis of Carbon Clusters and Inorganic Thin Films by Low Temperature Plasma CVD under Atmospheric Pressure - (invited) [L.1.01]Koinuma, H. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1919
-
Diamond Crystallization from Gas Phase and Carbon Allotropy - (invited) [N.2.01]Varnin, V. P. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1920
-
Fast Deposition of Amorphous Layers - (invited) [N.2.02]Van de Sanden, M. C. M. / Schram, D. C. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1921
-
Plasma Chemical Vapor Deposition and Characterization of Hydrogenated Amorphous Silicon from Silane and Dichlorosilane Mixtures [K.1.02]Hata, N. / Osborne, I. S. / Matsuda, A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1927
-
Mass Spectrometry and Power Measurements for Kinetics and Mechanism Investigation of Silane Glow Discharges [K.1.03]Spiliopoulos, N. / Stamou, S. / Mataras, D. / Rapakoulias, D. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1933
-
Thin Layer Deposition Under High Energy Metal Ions Bombardment [K.1.04]Musa, G. / Ehrich, H. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1939
-
TEOS/02 MMP-DECR Plasma Deposition. Growth Processes and Analytical Modelling [PK.1.20]Delsol, R. / Segui, Y. / Raynaud, P. / Despax, B. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1945
-
Deposition of Silica Thin Film on the Surface of Powder by PCVD Under Atmospheric Pressure [K.1.06]Mori, T. / Okazaki, S. / Inomata, T. / Kogoma, M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1951
-
Reactor Modelling for RF Plasma Deposition of SixNy-H Comparison Between Two Flow Arrangements [K.1.07]Caquineau, H. / Dupont, G. / Despax, B. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1957
-
Interface Formation Controlled by an Electro-Magnetron [K.1.08]Olcaytug, F. / Schalko, H. / Ebel, M. F. / Ebel, H. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1963
-
Hard Material Layers on the Basis of the System Ti-Al-C-O-N Deposited by Pulsed DC-Plasma [L.1.02]Bartsch, K. / Zuelch, W. / Leonhardt, A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1969
-
Characterization of Oxygen/TEOS Plasmas in a Helicon Diffusion Reactor using Mass Spectrometry and Optical Emission Spectroscopy [L.1.03]Granier, A. / Perry, A. J. / Nicolazo, F. / Vallee, C. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1975
-
Plasma Deposition Chemistry of Fluorinated Silicon Oxide Films [L.1.04]Nguyen, S. V. / Shapiro, M. J. / Matsuda, T. / Dobuzinsky, D. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1981
-
Deposition of Transparent Conductive Tin Oxide Films by PACVD from a Mixture of TMT (Tetra methyl Tin) + O2 + Ar [L.1.05]Arefi-Khonsari, F. / Farber, Y. / Benghozi, E. / Mabille-Rouger, I. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1987
-
Plasma-Assisted Evaporation of Titanium Dioxide Films [L.1.06]Alam, Z. / Kano, H. / Uyama, H. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1993
-
The Preparation of YBa2Cu3O7-X-Films by Plasma Flash Evaporation [L.1.07]Michelt, B. / Lins, G. / Seeboeck, R. J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 1999
-
LaMnO3 Perovskite Thin Film Deposition, from Aqueous Nitrate Solutions of La and Mn, in a Low Pressure Plasma Expanded Through a Nozzle [L.1.08]Miralai, S. F. / Morvan, D. / Amouroux, J. / Naoumidis, A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2005
-
XPS Analyses of Zinc Containing Films Deposited by a Cold Remote Nitrogen Plasma [L.1.09]Mutel, B. / Taleb, A. B. / Dessaux, O. / Goudmand, P. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2011
-
Secondary Discharge Induced Nonequilibrium Chemistry in a CVD Diamond Arcjet Reactor [N.2.03]Baldwin, S. K. / Owano, T. G. / Kruger, C. H. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2017
-
Diagnostics of Boundary Layer Chemistry in Thermal Plasma CVD [N.2.04]Owano, T. G. / Wahl, E. H. / Kruger, C. H. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2023
-
Experimental Study of Diamond Film Morphology and Surface Chemistry in RF Induction Plasma CVD [N.2.05]Lindsay, J. W. / Han, H. / Girshick, S. L. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2029
-
Deposition Area, Growth Rate, and Arc Power Scaling Laws for Diamond Film Deposited by Arc-Heated Gas Flows [N.2.06]Young, R. M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2035
-
Chemistry in a Supersonic Vacuum Plasmajet [N.2.07]Pauser, H. / Laimer, J. / Stoeri, H. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2041
-
Preparation of Cubic Boron Nitride Films by RF Bias Sputtering [N.2.08]Tsuda, O. / Yamada, Y. / Tatebayashi, Y. / Yoshida, T. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2047
-
Initial Stage of Cubic Boron Nitride Growth by Low Pressure ICP-CVD [N.2.09]Ichiki, T. / Amagi, S. / Yoshida, T. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2053
-
Deposition of Composite Metal/C:H Films and Their Basic Properties [N.2.10]Biederman, H. / Hlidek, P. / Pesicka, J. / Slavinska, D. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2059
-
Synthesis of Tantalum-Oxide Thin Film with Reactive DC-Magnetron Sputtering in Electron-Cyclotron-Resonance (ECR) Excited Ar + O2 Plasma [PK.1.01]Akitsu, T. / Miyashita, H. / Nakagawa, Y. / Matsuzawa, H. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2065
-
Determination of Energy Distribution Functions of Fluxes in a D.C. Magnetron Discharge [PK.1.02]Blachere, E. / Lefumeux, C. / Degout, D. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2071
-
Space Resolved Optical Emission Spectroscopy of Ni(CO)4 Interaction with a Cold Remote Nitrogen Plasma [PK.1.03]Brocherieux, A. / Supiot, P. / Dessaux, O. / Goudmand, P. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2077
-
Deposition of BaTiO3 Thin Films by Plasma MOCVD Method [PK.1.04]Chiba, T. / Matsumoto, O. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2083
-
Optical Emission Study of the Laser Plasma Plume Produced During Y-B-C-O Superconducting and Pb-Zr-Ti-O Ferroelectric Film Preparation [PK.1.05]Ebihara, K. / Kurogi, H. / Yamagata, Y. / Ikegami, T. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2089
-
Plasma Diagnostics and Film Characterization of TiN Films Deposited in a Hollow Cathode Arc Discharge [PK.1.06]Eggs, C. / Kersten, H. / Wagner, H.-E. / Wulff, H. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2095
-
Deposition of Polysiloxane Films Using CO2 Laser Evaporation Assisted by Remote O2 Plasma and Its Transformation to Silicon Oxide Films [PK.1.07]Hattori, S. / Fujii, T. / Yokoi, T. / Hiramatsu, M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2101
-
Selective Control of Particles by Eletron-Beam-Excited Plasma and Its Application [PK.1.08]Ikezawa, S. / Miyano, R. / Kitada, R. / Izumi, S. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2107
-
Properties of TiN, Ti(C,N), TiC Films Prepared by Arc Ion Plating [PK.1.09]Takeda, T. / Sato, T. / Ito, S. / Yumoto, H. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2113
-
Effect of Nitrogen on Cathode Spot Characteristics in Arc Ion-Plating of TiN [PK.1.10]Kim, G. / Meunier, J.-L. / Ajersch, F. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2119
-
Process Diagnostics during the Deposition of Cubic Boron Nitride [PK.1.11]Pintaske, R. / Schaller, M. / Kahl, N. / Hahn, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2125
-
Roles of H Radicals in the Low Temperature Growth of Poly-Si Films by Plasma CVD Using SiF4/SiH4/H2 [PK.1.12]Shirafuji, T. / Tachibana, K. / Morita, T. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2131
-
Hydrodynamic Investigation of a Low-Pressure Plasma Expanded Through a Nozzle (PETN) for Ceramic Oxides Depositions from Nitrate Precursors [PK.1.13]Miralai, S. F. / Francke, E. / Morvan, D. / Amouroux, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2137
-
In Situ Characterization of Plasma-MOCVD of Ti-C-N Thin Films [PK.1.14]Peter, S. / Richter, F. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2143
-
Improved Method for the Measurement and Control of the Actual Power Dissipated in RF Glow Discharges [PK.1.15]Spiliopoulos, N. / Mataras, D. / Rapakoulias, D. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2149
-
Supersonic Gas Jets Activated by an Electron Beam [PK.1.16]Sukhinin, G. I. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2155
-
Active Control of Nucleation Process in Plasma CVD by Ultra-Short High-Voltage Pulses [PK.1.17]Okazaki, K. / Yasuda, S. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2161
-
Surface Morphology Measurements and Particle Formation of SiOx Films Deposited Using Low Frequency Plasma CVD Method [PK.1.18]Yamaguchi, T. / Shimozuma, M. / Date, H. / Sakamoto, N. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2167
-
Deposition of Diamond-Like Films in Hydrocarbon Plasma of Vacuum Arc and Unbalanced DC Magnetron [PN.2.01]Anisimov, V. P. / Anisimova, I. A. / Otorbaev, D. K. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2173
-
Dynamics of KrF Excimer Laser Plasma Plume Produced During Diamondlike Carbon Thin Film Preparation [PN.2.02]Aoqui, S. / Ikegami, T. / Yamagata, Y. / Ebihara, K. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2179
-
Microwave Surfatron System for Diamond Film Depositions [PN.2.03]Bardos, L. / Barankova, H. / Berg, S. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2185
-
Plasma Diagnostics and Modelling in Plasma Enhanced BN-Layer Deposition [PN.2.04]Lunk, A. / Neuffer, A. / Barth, K.-L. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2191
-
A Surface-Wave Driven Plasma Reactor for Thin Diamond Film Deposition: Parametric Study of the Process Parameter Influence on Film Roughness [PN.2.05]Borges, C. F. M. / Moisan, M. / Guay, D. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2197
-
Formation of Carbon Nitrides CNx Films Assisted by a TEA CO2 Laser Ablation Graphite in a Remote Nitrogen Plasma [PN.2.06]Jama, C. / Dessaux, O. / Duez, N. / Dupret, C. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2203
-
Hard Amorphous Hydrogenated Carbon Films Deposited with an Expanding Thermal Plasma [PN.2.07]Gielen, J. W. A. M. / Kleuskens, P. R. M. / Van der Zande, M. J. / Kiers, A. G. M. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2209
-
Mass Spectrometric Analysis of a Thermal Plasma Used for CVD of Diamond Films [PN.2.08]Greuel, P. G. / Roberts, J. T. / Ernie, D. W. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2215
-
Diamond Deposition at Low Sustrate Temperatures in a Thermal Plasma Reactor [PN.2.09]Han, Q. Y. / Asmann, M. / Heberlein, J. V. R. / Pfender, E. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2221
-
ID Diffusion Model for Moderate Pressure H2 Plasmas Used for Diamond Films Deposition [PN.2.10]Hassouni, K. / Farhat, S. / Scott, C. D. / Gicquel, A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2227
-
Diamond Deposition from Ar-CO2-CH4 Plasmas [PN.2.11]Itoh, K. / Matsumoto, O. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2233
-
Preparation of Boron Nitride Thin Films by Sputtering Using R.F. Inductively Coupled Plasma [PN.2.12]Kasori, Y. / Ito, S. / Akashi, K. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2239
-
Langmuir Probe and Energy-Mass Spectroscopy Measurements in ECWR Plasmas for Diamond Deposition [PN.2.13]Kasper, W. / Awakowicz, P. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2245
-
Two-Dimensional Diamond Chemical Vapor Deposition Simulation [PN.2.14]Kolman, D. / Heberlein, J. / Pfender, E. / Young, R. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2247
-
Modelling of RF Plasma Discharges of Polyatomic Gases for Carbon Film Deposition [PN.2.15]Nagayama, K. / Farouk, B. / Lee, Y. H. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2255
-
Diamond Deposition on the Substrate Pretreated in N2-C2 H2 Plasma [PN.2.16]Narumi, S. / Sato, T. / Ito, S. / Akashi, K. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2261
-
Preparation of Diamond Films in a Low Pressure Inductively Coupled RF Plasma [PN.2.17]Okada, K. / Komatsu, S. / Ishigaki, T. / Matsumoto, S. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2267
-
Diamond Synthesis by RF Thermal Plasma CVD [PN.2.18]Park, D. W. / Park, H. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2273
-
Deposition of a-C:H/Diamond Thin Film on the Heated Fe/Si Substrate in CH4 rf Discharge [PN.2.19]Saitoh, K. / Mutsukura, N. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2279
-
Diamond Film Deposition in an Inductively Coupled Plasma Reactor [PN.2.20]Taylor, P. R. / Liang, W. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2285
-
Microwave CH4/H2 Plasma Composition Analysis for Diamondlike Carbon Film Synthesis [PN.2.21]Yasui, T. / Tahara, H. / Yoshikawa, T. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2291
-
Deposition of Hard Carbon Film in CH4 RF Discharges Mixed with Ar and Xe [PN.2.22]Yoshida, K. / Mutsukura, N. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2297
-
Diamond Film Synthesized by MW Plasma CVD and Computation Modelling of its Optical Parameters [PN.2.23]Zheng, C. Q. / Ran, J. G. / Yu, Z. G. / Jiang, S. W. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2303
-
Process Characterization of CVD Diamond from Liquid Precursors [PN.2.24]Zhuang, Q. D. / Schwendinger, P. / Hammerstand, C. / Heberlein, J. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2309
-
Mass Spectrometric Diagnostics and Modelling of Selected Species in CH4/H2 and C2H2/H2 Plasmas [PN.2.25]Schwaerzler, C. G. / Schnabl, O. / Laimer, J. / Stoeri, H. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2315
-
A New RF+DC Plasma CVD Method for Diamond Deposition [PN.2.26]Matsumoto, S. / Chattopadhyay, K. K. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2321
-
Characteristics of c-BN/Diamond Bi-Layered Coatings [PN.2.27]Tsai, C. / Ikeda, K. / Kamikubo, F. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2325
-
Plasma Processing of Dusts and Residues - (invited) [K.2.01]Neuschuetz, D. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2327
-
Numerical Modelling of Metallic Bath Heating with Transferred Arc [K.2.02]Trenty, L. / Bouvier, A. / Delalondre, C. / Simonin, O. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2333
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Effect of N2 and CO2 Additions on Arc Voltage and Steel Composition During Argon Plasma Heating of Steel Melts [K.2.03]Neuschuetz, D. / Stueber, A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2339
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Numerical Modelling of AC Electric Arcs [K.2.04]Larsen, H. L. / Hildal, A. / Sevastyanenko, V. G. / Bakken, J. A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2345
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Plasma Transferred Arc Reactor (PPetit, F. / Grimaud, A. / Fauchais, P. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2351
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Induction Plasma Synthesis of Al-Ni-Mo Intermetallic Powders as Precursors Alloys for Alkaline Water Electrolysis Cathodes [K.2.06]Berube, F. / Jurewicz, J. / Gitzhofer, F. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
- 2357
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Numerical Simulation of Si-O-C Arcs and Its Radiative and Transport Properties [K.2.07]Sevastyanenko, V. G. / Gu, L. / Bakken, J. A. / International Union of Pure and Applied Chemistry / American Physical Society et al. | 1996
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Oxide Etch Dusty Plasma Studies in the GEC Reference Cell Using Dynamic Laser Light Scattering TechniquesAnderson, H. M. / Radovanov, S. / IUPAC / American Physical Society et al. | 1996
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Plasma Transferred Arc Rotary Furnace for "Corium" MeltingKassabji, F. / Cognet, G. / Jegou, C. / Roubaud, A. / IUPAC / American Physical Society et al. | 1996
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OES Control of a Low Pressure DC Arc at TiN Layer DepositionAndreev, M. A. / Ershov-Pavlov, E. A. / Krat'ko, L. E. / Maksimenko, V. N. / IUPAC / American Physical Society et al. | 1996