Corrosion Inhibitors for Copper in Hydroxylamine-Based Chemistries Used for CMP and Post-CMP Cleaning (English)
- New search for: Tamilmani, S.
- New search for: Huang, W.
- New search for: Raghavan, S.
- New search for: Small, R.
- New search for: Tamilmani, S.
- New search for: Huang, W.
- New search for: Raghavan, S.
- New search for: Small, R.
- New search for: Heyns, M.
- New search for: Meuris, M.
- New search for: Mertens, P.
In:
Ultra clean processing of silicon surfaces
;
271-274
;
2003
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ISSN:
- Conference paper / Print
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Title:Corrosion Inhibitors for Copper in Hydroxylamine-Based Chemistries Used for CMP and Post-CMP Cleaning
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Contributors:Tamilmani, S. ( author ) / Huang, W. ( author ) / Raghavan, S. ( author ) / Small, R. ( author ) / Heyns, M. / Meuris, M. / Mertens, P.
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Conference:International symposium; 6th, Ultra clean processing of silicon surfaces ; 2002 ; Ostend, Belgium
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Published in:DIFFUSION AND DEFECT DATA PART B SOLID STATE PHENOMENA ; 92 ; 271-274
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Publisher:
- New search for: Scitec Publications
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Publication date:2003-01-01
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Size:4 pages
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Remarks:Also known as UCPSS 2002
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ISSN:
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Type of media:Conference paper
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Type of material:Print
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Language:English
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Keywords:
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Source:
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