Atmospheric Pressure Deposition of SiO~x Thin Films by Oxidation of Liquid HMDSO in Remote Plasma (English)
- New search for: Huet, S.
- New search for: Belmonte, T.
- New search for: Czerwiec, T.
- New search for: Thiebaut, J. M.
- New search for: Bockel, S.
- New search for: Electrochemical Society
- New search for: Huet, S.
- New search for: Belmonte, T.
- New search for: Czerwiec, T.
- New search for: Thiebaut, J. M.
- New search for: Bockel, S.
- New search for: Allendorf, M. D.
- New search for: Maury, F.
- New search for: Teyssandier, F.
- New search for: Electrochemical Society
In:
Chemical vapor deposition
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676-680
;
2003
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ISBN:
- Conference paper / Print
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Title:Atmospheric Pressure Deposition of SiO~x Thin Films by Oxidation of Liquid HMDSO in Remote Plasma
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Contributors:Huet, S. ( author ) / Belmonte, T. ( author ) / Czerwiec, T. ( author ) / Thiebaut, J. M. ( author ) / Bockel, S. ( author ) / Allendorf, M. D. / Maury, F. / Teyssandier, F. / Electrochemical Society
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Conference:International conference; 16th, Chemical vapor deposition ; 2003 ; Paris
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Published in:Chemical vapor deposition ; 676-680PROCEEDINGS- ELECTROCHEMICAL SOCIETY PV ; 1 ; 676-680
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Publisher:
- New search for: Electrochemical Society
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Publication date:2003-01-01
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Size:5 pages
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Remarks:Held jointly with EUROCVD 14. Held as part of the 203rd meeting of the Electrochemical Society
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ISBN:
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Type of media:Conference paper
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Type of material:Print
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Language:English
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Keywords:
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Source:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Table of contents conference proceedings
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1
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Quantum Chemical Study of ZrO~2 Atomic Layer Deposition on the SiO~2 SurfaceGao, G. / Han, J. / Widjaja, Y. / Garfunkel, E. / Musgrave, C. / Electrochemical Society et al. | 2003
- 15
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Surface and Gas Phase Chemistry of the MOCVD of ZnSeMoscatelli, D. / Cavallotti, C. / Masi, M. / Carra, S. / Electrochemical Society et al. | 2003
- 22
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Effects of Heat Treatment of Silica and Precursor on the Surface Density of Aminosilanes Deposited Onto Silica by ALDEk, S. / Iiskola, E. I. / Niinisto, L. / Electrochemical Society et al. | 2003
- 30
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Non-Equilibrium Effects During Disilane DecompositionTsang, W. / Electrochemical Society et al. | 2003
- 39
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Investigation of Gas Phase Decomposition Mechanisms in GaN-CVD by Theoretical Methods: The "Entropic Challenge"Schmid, R. / Wolbank, B. / Basting, D. / Electrochemical Society et al. | 2003
- 47
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Gas-Phase Kinetic Modeling in the AlCl~3-CO~2-H~2-HCl System in View of the Chemical Vapor Deposition of Al~2O~3Tan, P. / Muller, J. / Neuschutz, D. / Electrochemical Society et al. | 2003
- 55
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Thermodynamics and Reaction Pathways in the Decomposition, Oxidation, and Hydrolysis of MonobutyltintrichlorideAllendorf, M. D. / Nielsen, I. M. B. / Melius, C. F. / van Mol, A. M. B. / Electrochemical Society et al. | 2003
- 65
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Decomposition, Oxidation, and Hydrolysis Kinetics of Monobutyltintrichloridevan Mol, A. M. B. / Allendorf, M. / Electrochemical Society et al. | 2003
- 74
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Thermal Decomposition of Ti Precursors in Gas PhaseHeo, J. S. / Cho, Y. S. / Kim, J. C. / Moon, S. H. / Electrochemical Society et al. | 2003
- 81
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Heat and Mass Transfer of Chemical Deposition of Zinc-Selenide LayersMinkina, V. G. / Electrochemical Society et al. | 2003
- 85
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A Method to Extract Physical Properties from Raman Scattering Data in a CVD ReactorHwang, J. / Huang, M. / Anderson, T. / Park, C. / Electrochemical Society et al. | 2003
- 92
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Identification of Black Deposits Produced During the Hydride-OMVPE Growth of GaNPark, C. / Han, S. / Doh, C. / Yeo, S. / Yoon, D. / Hwang, S.-K. / Lee, K.-H. / Anderson, T. / Electrochemical Society et al. | 2003
- 98
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Quantifying Superconformal Filling of Submicrometer Features Through Surfactant Catalyzed Chemical Vapor DepositionJosell, D. / Kim, S. / Wheeler, D. / Moffat, T. / Pyo, S. / Electrochemical Society et al. | 2003
- 104
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NMR, X-Ray, and Mass Spectrometry Characterization of Some Heteroleptic Aluminum Alkoxide ComplexesBau, D. / Carta, G. / Benetollo, F. / Rossetto, G. / Tamburini, S. / Turgambaeva, A. / Zanella, P. / Electrochemical Society et al. | 2003
- 112
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Mechanisms of Thermal and Photo Assisted MOCVD Processes From M(hfac)~2Tetraglyme (M=Sr, Ba) PrecursorsCondorelli, G. G. / Anastasi, G. / Giuffrida, S. / Fragala, I. L. / Electrochemical Society et al. | 2003
- 120
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Thermal Properties of Ir(I) Precursors: Acetylacetonato (1,5-Cyclooctadiene) Iridium(I) and (Methylcyclopentadienyl) (1,5-Cyclooctadiene) Iridium(I)Morozova, N. B. / Gelfond, N. V. / Semyannikov, P. P. / Trubin, S. V. / Igumenov, I. K. / Gimeno-Fabra, L. / Electrochemical Society et al. | 2003
- 128
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The Problem of the Storage Alkaline Earth Precursors Containing 2,2,6,6- Tetramethylheptanedione-3,5Vertlib, V. / Drozdov, A. / Timokhin, I. / Troyanov, S. / Pettinari, C. / Marchetti, F. / Min, Y. / Kim, D. / Electrochemical Society et al. | 2003
- 136
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A Correlation Between Volatility, and Molecular Structure: Spectroscopic Estimation of the Temperature for Onset of Sublimation in Metal beta-DiketonatesDas, M. / Shivashankar, S. A. / Electrochemical Society et al. | 2003
- 144
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From pyrocarbon CVD to pyrocarbon CVIVignoles, G. L. / Langlais, F. / Reuge, N. / Le Poche, H. / Descamps, C. / Mouchon, A. / Electrochemical Society et al. | 2003
- 155
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An Open-Source, Extensible Software Suite for CVD Process SimulationGoodwin, D. / Electrochemical Society et al. | 2003
- 163
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Procedure and Related Tools Proposed for the Modeling of Gas-Phase Mechanisms Involved in Chemical Vapor Deposition: Application to CVD of SiCde Persis, S. / Dollet, A. / Teyssandier, F. / Electrochemical Society et al. | 2003
- 171
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Heat Transfer in Very Low Pressure Stagnation Flow CVD ReactorsDorsman, R. / Kleijn, C. R. / Electrochemical Society et al. | 2003
- 179
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Uniform Molecular Flux in a Vertical Reactor with Pulsed Transition Regime Gas FlowKrumdieck, S. / Lee, J.-Y. / Raatz, H. / Electrochemical Society et al. | 2003
- 186
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Local Deposition Rates of alpha-Al~2O~3 from AlCl~3-CO~2-H~2-HCl derived with PHOENICS-CVD from Thermogravimetric Measurements in a Hot-Wall Reactor with Long Isothermal ZoneMuller, J. / Neuschutz, D. / Electrochemical Society et al. | 2003
- 194
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Predictive Model Extraction from Commercial Scale Poly-Silicon LPCVD ReactorShimizu, R. / Ogino, M. / Sugiyama, M. / Shimogaki, Y. / Electrochemical Society et al. | 2003
- 202
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Tin Oxide Deposition in a Cold-Wall CVD Reactor: Computations and ExperimentsXenidou, T. C. / Diamantis, A. G. / Boudouvis, A. G. / Tsamakis, D. M. / Markatos, N. C. / Electrochemical Society et al. | 2003
- 210
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Modeling Analysis of SiC CVD in the Horizontal Hot Wall ReactorsSemennikov, A. K. / Talalaev, R. A. / Vorob ev, A. N. / Makarov, Y. N. / Electrochemical Society et al. | 2003
- 218
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Modeling of Transport and Kinetic Processes in an Atomic Layer Deposition ReactorDevulapalli, B. / McInerney, J. / Dharan, M. / Electrochemical Society et al. | 2003
- 226
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Simulation of Epitaxial Silicon Deposition and Dopant Incorporation in an Industrial Barrel ReactorDi Stanislao, M. / Valente, G. / Fascella, S. / Masi, M. / Carra, S. / Fei, J. Y. / Yarlagadda, S. / Electrochemical Society et al. | 2003
- 235
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Aerosol Dynamics Modeling and Computational Fluid Dynamics of a Laser-Driven Nanoparticle Synthesis ReactorTalukdar, S. / Ng, C. / Swihart, M. / Electrochemical Society et al. | 2003
- 243
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Thermodynamic Optimization of OMCVD Deposition of SrTiO~3Salinas, E. R. / Pisch, A. / Chatillon, C. / Bernard, C. / Electrochemical Society et al. | 2003
- 249
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Design of MOCVD Film Growth in a Hot Wall Tubular ReactorBattiston, G. A. / Gerbasi, R. / Raic, K. T. / Electrochemical Society et al. | 2003
- 258
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Critical Issues in Group-III Nitride MOVPE ModelingYakovlev, E. / Talalaev, R. / Vorob ev, A. / Makarov, Y. / Electrochemical Society et al. | 2003
- 266
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Simulation of Silicon Thermal Oxidation and Stress Analysis in Flash Memory TechnologyVeneroni, A. / Beretta, A. / Masi, M. / Electrochemical Society et al. | 2003
- 272
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Study of the Automatic Modeling of Reaction Systems for Chemical Vapor Deposition Processes Using Genetic AlgorithmsTakahashi, T. / Funatsu, K. / Ema, Y. / Electrochemical Society et al. | 2003
- 279
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Modeling of Thermo- and Mass-Transfer Processes at Sublimation of Molecular Crystals of CVD PrecursorsGelfond, N. V. / Cherepanov, A. N. / Mikheev, A. N. / Cherepanova, V. K. / Popov, V. N. / Morozova, N. B. / Igumenov, I. K. / Electrochemical Society et al. | 2003
- 287
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Use of Surfactants in Organometallic Vapor Phase EpitaxyStringfellow, G. B. / Chapman, D. C. / Kim, B. J. / Seong, T. Y. / Electrochemical Society et al. | 2003
- 299
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Arrangement of Silicon and Oxygen Atoms in Low Pressure Chemically Vapor Deposited SiO~2 Films by SiH~4-O~2 and TEOS Chemistries: Comparison With Thermally Grown SiO~2 FilmsVamvakas, V. / Pappa, A. / Davazoglou, D. / Electrochemical Society et al. | 2003
- 307
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Formation Mechanism of Local Thickness Profile of Silicon Epitaxial FilmHabuka, H. / Fukaya, S. / Sawada, A. / Takeuchi, T. / Aihara, M. / Electrochemical Society et al. | 2003
- 316
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Synthesis and Structural Characterizations of Vanadium Oxide Thin Films Prepared by MOCVD and ALDMantoux, A. / Groult, H. / Doppelt, P. / Badot, J. C. / Balnois, E. / Baffier, N. / Lincot, D. / Electrochemical Society et al. | 2003
- 325
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Direct Injection Chemical Vapor Deposition of Textured Zirconium Oxide FilmsRapenne, L. / Bernard, O. / Huntz, A. M. / Andrieux, M. / Poulin, J. C. / Haut, C. / Seiler, W. / Electrochemical Society et al. | 2003
- 333
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Morphological Studies of Focused Ion Beam Induced Tungsten DepositionLangfischer, H. / Harasek, S. / Wanzenboeck, H. / Lugstein, A. / Basnar, B. / Bertagnolli, E. / Electrochemical Society et al. | 2003
- 340
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Mechanical Characterisation of Zirconium Oxide Thin Films Deposited by Chemical Vapor DepositionBernard, O. / Rapenne, L. / Huntz, A. M. / Rieux, M. / Poissonnet, S. / Electrochemical Society et al. | 2003
- 351
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CVD Coating of Sapphire Fibers With hBN to Improve Mechanical Properties of Reinforced NiAl CompositesReichert, K. / Cremer, R. / Neuschutz, D. / Electrochemical Society et al. | 2003
- 359
-
Microwave PACVD of Low Friction a-SiC Coatings: From Plasma Characterization to Material Mechanical PropertyThomas, L. / Teyssandier, F. / Ducarroir, M. / Boher, C. / Autrique, L. / Badie, J. M. / Berjoan, R. / Electrochemical Society et al. | 2003
- 364
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Optical Characterization of Solid Phase Crystallization of Silicon Thin Films Obtained by LPCVDModreanu, M. / Gartner, M. / Cobianu, C. / Hurley, P. / Electrochemical Society et al. | 2003
- 373
-
Electrical Properties of TiN Films Prepared by Plasma Assisted Atomic Layer Deposition Using Tetrakis(Dimethylamido)-TitaniumKim, D.-H. / Kim, Y. J. / Song, Y. S. / Electrochemical Society et al. | 2003
- 378
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Interrelation of Bond Configuration and Optical Properties of muc-SiC Thin Films by Spectroscopic EllipsometryLosurdo, M. / Iannuzzi, G. / Capezzuto, P. / Bruno, G. / Electrochemical Society et al. | 2003
- 386
-
Optical Properties of Low Pressure Chemically Vapor Deposited Silicon Oxynitride Films From SiCl~2H~2-NH~3-N~2O MixturesDavazoglou, D. / Electrochemical Society et al. | 2003
- 394
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Electrochromic Characterization of Mo-W Mixed Oxides and MoO~3 Thin FilmsGesheva, K. / Ivanova, T. / Kovalchuk, A. / Gurtovoi, B. / Trofimov, O. / Electrochemical Society et al. | 2003
- 401
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Electrochromism in WO~3 and WO~3-Pt Doped Nanophasic Thin Films Deposited by MOCVD on Gold SubstratesCarta, G. / Cavallotti, P. L. / Filippin, M. / Magagnin, L. / Rossetto, G. / Zanella, P. / Electrochemical Society et al. | 2003
- 408
-
Comparison of Photovoltaic Performance of SnO~2:F Coated Substrates Made Using APCVD With Different Sn Precursorsvan Mol, A. M. B. / Grob, F. / Spee, K. / van der Werf, K. / Schropp, R. / Electrochemical Society et al. | 2003
- 417
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The Influence of Film Thickness on Photoactivity for TiO~2 Films Grown on Glass by CVDNolan, M. / Sheel, D. W. / Pemble, M. / Electrochemical Society et al. | 2003
- 424
-
MOCVD of Tungsten Nitride Thin Films from the Imido Complex Cl~4(CH~3CN)W(NiPr): Effect of NH~3 on Film PropertiesBchir, O. / Anderson, T. / Brooks, B. / McElwee-White, L. / Electrochemical Society et al. | 2003
- 432
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Mass-Transfer and Doping Processes of the Inside Surfaces of Cast Iron Sleeves Using the Electrolyte-Plasma TreatmentPogrebnjak, A. D. / Kul ment eva, O. P. / Tyurin, Y. N. / Kobzev, A. P. / Boyko, A. G. / Golovenko, S. I. / Electrochemical Society et al. | 2003
- 439
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Optical Probes of Atmospheric Pressure CVD SystemsPemble, M. / Electrochemical Society et al. | 2003
- 455
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MOCVD Materials for Electronic and Optoelectronic ApplicationsChristiansen, K. / Luenenbuerger, M. / Dikme, Y. / Schineller, B. / Heuken, M. / Juergensen, H. / Electrochemical Society et al. | 2003
- 463
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In Situ Monitoring of Thin Film Oxygen Diffusion by Macroscopic CurvatureTripathi, A. B. / Boyd, D. A. / Goodwin, D. G. / Electrochemical Society et al. | 2003
- 471
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Investigation of Gas-Phase Reaction Effective on Deposition Behavior in MOCVD-Pb(Zr,Ti)O~3 Film Using In-Situ-Monitored by Fourier Transform Infrared SpectroscopyAsano, G. / Satake, T. / Ohtsuki, K. / Funakubo, H. / Electrochemical Society et al. | 2003
- 479
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Atomic Layer Deposition of Thin Films for MicroelectronicsRitala, M. / Leskela, M. / Electrochemical Society et al. | 2003
- 491
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Characteristics of Tungsten Carbide Films Prepared by Plasma Assisted Atomic Layer Deposition using Bis (TerT-Butylimido) Bis (Dimethylamido)TungstenKim, D. / Kim, Y. / Song, Y. / Lee, B. / Kim, J. / Suh, S. / Gordon, R. / Electrochemical Society et al. | 2003
- 503
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Atomic Layer Deposition of Alumina from Trimethylaluminum and OzoneHo, P. / Chou, C.-P. / Mokhtari, S. / Bailey, J. / Senzaki, Y. / Electrochemical Society et al. | 2003
- 511
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Growth of SnO~2 Thin Films by ALD and CVD: A Comparative StudySundqvist, J. / Harsta, A. / Electrochemical Society et al. | 2003
- 516
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Alkaline Earth Cyclopentadienyl Compounds as Precursors for Atomic Layer DepositionHatanpaa, T. / Hanninen, T. / Ihanus, J. / Kansikas, J. / Mutikainen, I. / Vehkamaki, M. / Ritala, M. / Leskela, M. / Electrochemical Society et al. | 2003
- 523
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Inside-Outside Densification of Carbon Fiber Preforms by Isothermal, Isobaric CVIZhang, W. G. / Huttinger, K. J. / Electrochemical Society et al. | 2003
- 530
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Fluidized Bed Chemical Vapor Deposition: State of the Art and Main ChallengesCaussat, B. / Serp, P. / Vahlas, C. / Electrochemical Society et al. | 2003
- 538
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Chemical Vapor Deposition in Spouted Bed ReactorsJuarez L, F. / Lafont, M. C. / Senocq, F. / Vahlas, C. / Electrochemical Society et al. | 2003
- 549
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Pyrolysis of Mixed Aerosols: A Versatile CVD-Based Process to Produce Clean and Long Aligned Multi-Walled Carbon NanotubesHemite, M. / Armand, X. / Porterat, D. / Reyhaud, C. / Electrochemical Society et al. | 2003
- 557
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Deposition of Thin Film Transition Metal Oxides (TMO) on Glass by Combustion Chemical Vapour Deposition (C-CVD)Benito, G. / Davis, M. J. / Hurst, S. J. / Sheel, D. W. / Pemble, M. E. / Electrochemical Society et al. | 2003
- 565
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Grafting Metalorganic Species into Mesoporous Silica from the Vapour PhaseGleizes, A. N. / Electrochemical Society et al. | 2003
- 573
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Kinetic Analysis of the Low Temperature CVD of Silicon/Silicon Carbide from Methyltrichlorosilane/Hydrogen for the Ceramization of Biomorphic Carbon PreformsPopovska, N. / Streitwieser, D. / Gerhard, H. / Emig, G. / Electrochemical Society et al. | 2003
- 581
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Laser-Induced Carbon CVD Using an Open-Air ReactorKwok, K. H. / Chiu, W. K. S. / Electrochemical Society et al. | 2003
- 588
-
Titanium Dioxide Thin Film Deposition on Polymer Substrates by Light Induced Chemical Vapor DepositionHalary-Wagner, E. / Wagner, F. / Hoffmann, P. / Electrochemical Society et al. | 2003
- 596
-
Atmospheric Pressure Deposition of Silica Thin Films by Photo-CVD Using Vacuum Ultraviolet Excimer LampMaezono, Y. / Nishi, K. / Yokotani, A. / Kurosawa, K. / Electrochemical Society et al. | 2003
- 603
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Characterization of SiO~2 Films by Photo-CVD using a Xe~2 Excimer LampMiyano, J. / Maezono, Y. / Toshikawa, K. / Yokotani, A. / Kurosawa, K. / Electrochemical Society et al. | 2003
- 609
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Physical Properties of SiO~2 Layers Deposited at Room Temperature by a Combination of ECR Plasma and High-Speed Jet of SilaneIsai, G. / Holleman, J. / Woerlee, P. / Wallinga, H. / Modreanu, M. / Cobianu, C. / Electrochemical Society et al. | 2003
- 617
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Composite Nitrided + Ti(N,C,O) Type Layers Produced by PAMOCVD ProcessesWierzchon, T. / Sobiecki, J. R. / Mankowski, P. / Rozniatowski, K. / Electrochemical Society et al. | 2003
- 624
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Influence of the Microwave Power in an ECR-PECVD Reactor on Dielectric-Cap Induced Blue Shift in 1.55 mum Laser StructuresWojcik, J. / Robinson, B. / Thompson, D. A. / Mascher, P. / Electrochemical Society et al. | 2003
- 624
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Influence of the microwave power in an ECR-PECVD reactor on dielectric-cap induced blue-shift in 1.55 micron laser structuresWojcik, J. / Robinson, B.J. / Thompson, D.A. / Mascher, P. et al. | 2003
- 630
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Study of Precursors for Atmospheric Pressure Plasma Enhanced CVD (AP-PECVD) of Silicon Dioxide FilmsAlexandrov, S. E. / Hitchman, M. L. / McSporran, N. / Electrochemical Society et al. | 2003
- 638
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Low Temperature Processing of SiO~2 Thin Films by PECVD Technique Using an Inductively-Coupled High-Density RF Plasma SourceJoshi, P. / Droes, S. / Flores, J. / Voutsas, T. / Hartzel, J. / Electrochemical Society et al. | 2003
- 646
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Plasma CVD of Si/C/N: Experimental and Theoretical ResultsBerger, C. / Broszeit, E. / Falk, F. / Hoche, H. / Kroke, E. / Kroll, P. / Probst, D. / Riedel, R. / Stafast, H. / Uhlitzsh, V. et al. | 2003
- 653
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Bias Power Effect on Property of PECVD Low-k SiOCH FilmShioya, Y. / Ohdaira, T. / Suzuki, R. / Maeda, K. / Electrochemical Society et al. | 2003
- 661
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Low Temperature Deposition of Microcrystalline Silicon Films by Plasma Assisted CVDGrimaldi, A. / Sacchetti, A. / Losurdo, M. / Ambrico, M. / Capezzuto, P. / Bruno, G. / Electrochemical Society et al. | 2003
- 668
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Atmospheric-Pressure Plasma-Enhanced Chemical Vapour Deposition (AP-PE-CVD) for Growth of Thin Films at Low TemperatureDavis, M. J. / Tsanos, M. / Lewis, J. / Sheel, D. W. / Pemble, M. E. / Electrochemical Society et al. | 2003
- 676
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Atmospheric Pressure Deposition of SiO~x Thin Films by Oxidation of Liquid HMDSO in Remote PlasmaHuet, S. / Belmonte, T. / Czerwiec, T. / Thiebaut, J. M. / Bockel, S. / Electrochemical Society et al. | 2003
- 681
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Optimizing Net Deposition Rates for a High Density Plasma CVD ProcessNiazi, K. / Chen, Z. / Karpenko, O. / Electrochemical Society et al. | 2003
- 689
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High-Density Plasma CVD Films of Aluminium, Gallium, and Indium Nitrides From Coordination Compounds of MetalsMazurenko, Y. A. / Gerasimchuk, A. I. / Electrochemical Society et al. | 2003
- 693
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Low-Temperature Solution for Silicon Nitride LPCVD Using Cl-Free Inorganic TrisilylamineTamaoki, N. / Sato, Y. / Dussarrat, C. / Girard, J.-M. / Kimura, T. / Electrochemical Society et al. | 2003
- 701
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Mechanism of Oxygen Contamination in PECVD a-Si:H FilmsHiramatsu, M. / Kimura, Y. / Jyumonji, M. / Nishitani, M. / Matsumura, M. / Electrochemical Society et al. | 2003
- 708
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Growth of Homogeneous and Gradient BC~xN~y Films by PECVD Using Trimethylaminoborane ComplexKosinova, M. L. / Fainer, N. I. / Rumyantsev, Y. M. / Maximovski, E. A. / Kuznetsov, F. A. / Terauchi, M. / Shibata, K. / Satoh, F. / Electrochemical Society et al. | 2003
- 716
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Plasma Enhanced Chemical Vapor Deposition of Er-Doped Amorphous Silicon Thin FilmsGiangregorio, M. M. / Losurdo, M. / Capezzuto, P. / Bruno, G. / Electrochemical Society et al. | 2003
- 722
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Interaction Between Active Plasma and Growing Co-C-O - Layer During PACVDNurnberg, A. / Stolle, R. / Wahl, G. / Raic, K. T. / Electrochemical Society et al. | 2003
- 730
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Niobium Nitride Film Growth by Plasma CVDYu, A. / Grigori, G. / Vajenine, V. / Electrochemical Society et al. | 2003
- 733
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Chromium and Zirconium Type Layers Produced from Metalorganic Compounds Using the Glow Discharge ConditionsSobiecki, J. / Wierzchon, T. / Electrochemical Society et al. | 2003
- 741
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Epitaxial Stabilization in MOCVD of Oxide Thin FilmsKaul, A. / Gorbenko, O. / Graboy, I. / Novozhilov, M. / Bosak, A. / Kamenev, A. / Antonov, S. / Nikulin, I. / Mikhailov, A. / Kartavtzeva, M. et al. | 2003
- 749
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MOCVD of Oxides on Textured Ni for High Temperature Superconducting TapesStadel, O. / Liekefett, M. / Schmidt, J. / Wahl, G. / Gorbenko, O. / Kaul, A. / Electrochemical Society et al. | 2003
- 755
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Magnesium Acetylacetonate-Dipivaloylmethanate as a New Precursor for MOCVD of MgO Thin FilmsKotova, O. / Botev, A. / Gorbenko, O. / Kuzmina, N. / Kaul, A. / Malkerova, I. / Alikhanyan, A. / Electrochemical Society et al. | 2003
- 763
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Aluminium Oxide Thin Film Grown by Low Pressure MOCVD Using Aluminium Acetylacetone and Nitrous OxideSingh, M. P. / Shripathi, T. / Shivashankar, S. A. / Electrochemical Society et al. | 2003
- 771
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Growth of Al~2O~3 Films by Pulsed Injection MOCVD: Comparative Study of Precursor MaterialsAbrutis, A. / Bartasyte, A. / Kubilius, V. / Teiserskis, A. / Baumann, P. / Lindner, J. / Schumacher, M. / Dubourdieu, C. / Electrochemical Society et al. | 2003
- 777
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Tungsten Doped Vanadium Oxide Thin Films by Atmospheric Pressure Chemical Vapour DepositionManning, T. D. / Parkin, I. P. / Electrochemical Society et al. | 2003
- 783
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Parametric Study of the CVD of YSZ from Organometallic PrecursorsVaranasi, V. / Besmann, T. / Hyde, R. / Xu, W. / Starr, T. / Electrochemical Society et al. | 2003
- 790
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MOLPCVD of Ta~2O~5 Using TaC~1~2H~3~0O~5N as Precursor for Batch FabricationBriand, D. / Mondin, G. / Jenny, S. / Banakh, O. / van der Wal, P. D. / Jeanneret, S. / Keppner, H. / de Rooj, N. F. / Electrochemical Society et al. | 2003
- 798
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Single Source MOCVD Precursors for RNiO~3 (R = Rare Earth Metal) Thin Film DepositionAbdyushev, P. R. / Novojilov, M. A. / Ryazanov, M. V. / Bochkov, E. A. / Kuzmina, N. P. / Kaul, A. R. / Gleizes, A. N. / Electrochemical Society et al. | 2003
- 806
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Textured SrTiO~3 Thin Films on SiO~2/Si by Liquid Injection MOCVD Using a New Bimetallic PrecursorLhostis, S. / Audier, M. / Senateur, J.-P. / Dubourdieu, C. / Auvray, L. / Electrochemical Society et al. | 2003
- 814
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Infrared Spectroscopic Study on Metalorganic Chemical Vapor Deposition of (Ba, Sr)TiO~3 FilmsNakamura, T. / Nishimura, T. / Momose, S. / Tachibana, K. / Electrochemical Society et al. | 2003
- 821
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Strongly Oriented Thin Films of Er~2O~3 Grown on Fused Quartz by Low-Pressure MOCVDSingh, M. P. / Shalini, K. / Shivashankar, S. A. / Electrochemical Society et al. | 2003
- 829
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Balancing Reactor Fluid Dynamics and Deposition Kinetics to Achieve Compositional Variation in Combinatorial Chemical Vapor Depositions of ZrO, HfO~2, and SnO~2Gladfelter, W. / Xia, B. / Chen, F. / Campbell, S. / Roberts, J. / Electrochemical Society et al. | 2003
- 839
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Novel Precursor for High-k Dielectrics and Metal Electrodes Part I: SynthesisAtwood, J. / Hoth, D. / Moreno, D. / Hoover, C. / Peck, J. / Natwora, J. / Mosscrop, M. / Meiere, S. / Electrochemical Society et al. | 2003
- 847
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Novel Precursors for High-k Dielectrics and Metal Electrodes Part II: DepositionAtwood, J. / Hoth, D. / Moreno, D. / Hoover, C. / Meiere, S. / Thompson, D. / Piotrowski, G. / Litwin, M. / Peck, J. / Electrochemical Society et al. | 2003
- 855
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Chemical Vapor Deposition of Zirconium Tin Titanate: A Dielectric Material for Potential Microelectronic ApplicationsMays, E. / Hess, D. / Rees, W. / Electrochemical Society et al. | 2003
- 863
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Hafnium Titanium Silicate High-k Dielectric Films Deposited by MOCVD using Novel Single Source PrecursorsZuercher, S. / Morstein, M. / Lemberger, M. / Bauer, A. / Electrochemical Society et al. | 2003
- 871
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Development of Improved Precursors for the MOCVD of Bismuth TitanateJones, A. C. / Williams, P. A. / Tobin, N. L. / Chalker, P. R. / Marshall, P. / Wright, P. J. / Lane, P. A. / Donohue, P. / Smith, L. M. / Davies, H. O. et al. | 2003
- 879
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Effect of Solvent on Growth of Ru and RuO~2 Films by Liquid Injection MOCVDFrohlich, K. / Husekova, K. / Machajdik, D. / Soltys, J. / Patoprsty, V. / Baumann, P. / Lindner, J. / Schumacher, M. / Electrochemical Society et al. | 2003
- 886
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MOCVD of RuO~2 Thin Films Using (?^6-benzene)(?^4-1,3-cyclohexadiene)RuHwang, H.-N. / Han, K. C. / An, K.-S. / Chung, T.-M. / Kim, Y. / Electrochemical Society et al. | 2003
- 894
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Utilizing MOCVD for High-Quality Zirconium Dioxide Gate Dielectrics in MicroelectronicsHarasek, S. / Wanzenboeck, H. / Brezna, W. / Smoliner, J. / Gornik, E. / Bertagnolli, E. / Electrochemical Society et al. | 2003
- 900
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MOCVD of ZrO~2 Thin Films from Two Different beta-Diketonate Precursors: Dependence of Microstructure and Growth Kinetics on the PrecursorDharmaprakash, M. S. / Shivashankar, S. A. / Electrochemical Society et al. | 2003
- 907
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HfO~2 Films Obtained By Injection MOCVDRoussel, F. / Roussel, H. / Audier, M. / Dubourdieu, C. / Senateur, J. P. / Jimenez, C. / Leedham, T. J. / Davies, H. O. / Jones, A. C. / O Sullivan, B. J. et al. | 2003
- 915
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MOCVD Growth of Pr~2O~3 High-k Gate Dielectric for Silicon: Synthesis and Structural InvestigationNigro, R. L. / Toro, R. / Malandrino, G. / Raineri, V. / Fragala, I. L. / Electrochemical Society et al. | 2003
- 923
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Continuous and Granular Metal Films Produced by Chemical Vapor Deposition with Chelate Compound PrecursorsBakovets, V. V. / Electrochemical Society et al. | 2003
- 931
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CVD of Transition Metals from Metalorganic ComplexesPopovska, N. / Schneider, A. / Emig, G. / Zenneck, U. / Topf, C. / Electrochemical Society et al. | 2003
- 938
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Silver Thin Films Deposited by Injection MOCVDAbourida, M. / Guillon, H. / Jimenez, C. / Decams, J. M. / Valet, O. / Doppelt, P. / Electrochemical Society et al. | 2003
- 946
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Atomic Layer Deposition of Ruthenium from RuCp^2 and Oxygen: Film Growth and Reaction Mechanism StudiesAaltonen, T. / Rahtu, A. / Ritala, M. / Leskela, M. / Electrochemical Society et al. | 2003
- 954
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Thin Tungsten and Tungsten Oxide Films Produced by Tungsten Pentacarbonyle Pentaisonitrile in a Remote Plasma ReactorHamelmann, F. / Brechling, A. / Aschentrup, A. / Heinzmann, U. / Jutzi, P. / Sandrock, J. / Siemeling, U. / Electrochemical Society et al. | 2003
- 959
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MOCVD of Transparent, p-Type Conducting CuCrO~2 Thin Films Using Acetylacetonat PrecursorsMahapatra, S. / Mane, A. U. / Dharmaprakash, M. S. / Bera, P. S. / Hegde, M. S. / Shivashankar, S. A. / Electrochemical Society et al. | 2003
- 967
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Growth and Formation of Inverse GaP and InP OpalsYates, H. M. / Whitehead, D. E. / Nolan, M. G. / Pemble, M. E. / Palacios-Lidon, E. / Rubio, S. / Meseguer, F. J. / Lopez, C. / Electrochemical Society et al. | 2003
- 975
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Zinc Amide Compounds as Potential Precursors for the Synthesis of Zinc NitrideMaile, E. / Devi, A. / Fischer, R. / Electrochemical Society et al. | 2003
- 982
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InP/InGaAs Tunneling-Emitter Bipolar Transistor (TEBT) with a Step-Graded Collector Structure Prepared by MOCVDChen, C.-Y. / Lin, K.-W. / Chiou, W.-H. / Chuang, H.-M. / Chen, J.-Y. / Fu, S.-Y. / Kao, C.-I. / Liu, W.-C. / Electrochemical Society et al. | 2003
- 990
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MOCVD of Thin Mixed-Conducting Films on Porous Ceramic SubstratesStiens, D. / Wahl, G. / Garcia, G. / Van Veen, A. / Rebeilleau, M. / Electrochemical Society et al. | 2003
- 996
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Deposition of Mixed Conducting Oxide Thin Films on Porous Ceramic SubstratesFaucheux, V. / Deschanvres, J. L. / Pignard, S. / Audier, M. / Teiserskis, A. / Abrutis, A. / Rushworth, S. / Electrochemical Society et al. | 2003
- 1001
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CVD-Grown Thin Films of Tetracyanoethylene-Based Room-Temperature FerrimagnetsCasellas, H. / Valade, L. / De Caro, D. / Cassoux, P. / Villain, F. / Gatteschi, D. / Electrochemical Society et al. | 2003
- 1008
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Chemical Vapour Deposition of Cobalt for Magnetic ApplicationsDeo, N. / Montgomery, J. / Bain, M. / Gamble, H. / Electrochemical Society et al. | 2003
- 1016
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Chemical Vapor Deposition of Cobalt on Si(100)Greve, D. / Zhao, Q. / Barmak, K. / Singanamalla, R. / Electrochemical Society et al. | 2003
- 1024
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MOCVD Growth Characterization of Cobalt Phosphide Thin Films on InP SubstratesBarreca, D. / Camporese, R. / Casarin, M. / El Habra, N. / Gasparotto, R. / Natali, M. / Rossetto, G. / Tondello, E. / Zanella, P. / Electrochemical Society et al. | 2003
- 1032
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(Cu~xZn~1~-~x)Fe~2O~4 Ferrimagnetic Films Prepared by Atmospheric MOCVD at 360^o CChang, Y. / Huang, C. / Lin, J. / Yang, J. / Yiu, Z. / Electrochemical Society et al. | 2003
- 1040
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Niobium and Molybdenum-Based Molecular Magnets Grown as Thin Films by Chemical Vapor DepositionLamouroux, E. / Alric, E. / Casellas, H. / Valade, L. / De Caro, D. / Etienne, M. / Gatteschi, D. / Electrochemical Society et al. | 2003
- 1047
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CVD Growth of Carbon Nanotubes: Catalyst, Growth, and StructureDelzeit, L. / McAninch, I. / Matthews, K. / Ng, H. T. / Stevens, R. / Meyyappan, M. M. M. / Electrochemical Society et al. | 2003
- 1056
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Synthesis of Carbon Nanotubes on Metallic Substrates by PECVD Thermal CVDPark, D. / Kim, Y. H. / Lee, J. K. / Electrochemical Society et al. | 2003
- 1064
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Macroscopic and Microscopic Investigations on the LPCVD Fabrication of Silicon Nanodots on Oxidized Silicon WafersBlanquet, E. / Donnadieu, P. / Schouler, M.-C. / Simon, J.-P. / Maret, M. / Pons, M. / Cocheteau, V. / Caussat, B. / Scheid, E. / Mur, P. et al. | 2003
- 1072
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CVD-Based Preparation Routes of Single-Walled Carbon Nanotubes with Controlled ArchitecturesTerranova, M. L. / Orlanducci, S. / Sessa, V. / Botti, S. / Electrochemical Society et al. | 2003
- 1079
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Investigation of Nanocrystalline Diamond Films Prepared by Microwave Plasma Chemical Vapor DepositionKulisch, C. P. W. / Electrochemical Society et al. | 2003
- 1086
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Nanocrystalline SiC~xN~y films: RPECVD Synthesis and Transformation Under Thermal AnnealingFainer, N. I. / Kosinova, M. L. / Rumyantsev, Y. M. / Ayupov, B. M. / Kolesov, B. A. / Kuznetsov, F. A. / Boronin, A. I. / Koscheev, C. V. / Terauchi, M. / Shibata, K. et al. | 2003
- 1094
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Plasma Enhanced Chemical Vapour Deposition of AlN NanolayersBeshkov, G. / Grigorov, K. / Maciel, H. / Oliveira, I. C. / Georgiev, S. / Electrochemical Society et al. | 2003
- 1098
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Nano structures of Group-III Nitrides by MOCVD Using Molecular PrecursorsKhanderi, J. / Wohlfart, A. / Parala, H. / Devi, A. / Fischer, R. A. / Electrochemical Society et al. | 2003
- 1104
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Nanoscale ZnS and CdS Thin Films from Single-Source Molecular PrecursorsArmelao, L. / Barreca, D. / Bottaro, G. / Gasparotto, A. / Maragno, C. / Sada, C. / Spalding, T. R. / Tondello, E. / Electrochemical Society et al. | 2003
- 1112
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Nanostructured Cerium Dioxide Thin Films by MOCVD: Influence of the Substrate Nature and Processing ParametersMalandrino, G. / Nigro, R. L. / Toro, R. / Fragala, I. / Electrochemical Society et al. | 2003
- 1119
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Nanoscale CeO~2-ZrO~2 Thin Films: A Combined Approach by CVD and Sol-Gel RoutesArmelao, L. / Barreca, D. / Bigliani, L. / Bottaro, G. / Gasparotto, A. / Tondello, E. / Electrochemical Society et al. | 2003
- 1123
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Preparation of Thin Films and Nanoparticles of Zinc Oxide Using Alkylzinc AlkoxidesCho, W. / Sung, K. / An, K.-S. / Lee, S. S. / Kim, C. G. / Kim, Y. / Electrochemical Society et al. | 2003
- 1131
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Nanostructured TiO~2 Films Deposited by MOCVD on Si-SubstratesBackman, U. / Auvinen, A. / Jokiniemi, J. / Electrochemical Society et al. | 2003
- 1138
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SAXS/WAXD on Thermally Annealed Nanostructured CVD-Obtained TiO~2 FilmsLaveeviae, M. L. / Posedel, D. / Turkoviae, A. / Electrochemical Society et al. | 2003
- 1146
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Ordered Nanostructure Observed in ZnO Films Grown by MOCVD at 320^oCChang, Y. / Lu, H. / Hung, Y. / Lee, C. / Qiu, J. / Li, X. / Electrochemical Society et al. | 2003
- 1153
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Pure and Lu(III)-Doped Nanocrystalline ZnO Films by CVDBarreca, D. / Battiston, G. A. / Berto, D. / Convertino, A. / Gasparotto, A. / Gerbasi, R. / Tondello, E. / Viticoli, S. / Electrochemical Society et al. | 2003
- 1161
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Photothermal Aerosol Synthesis of and Photoluminescence from Silicon NanoparticlesLi, X. / He, Y. / Swihart, M. / Electrochemical Society et al. | 2003
- 1168
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MOCVD of Nanocrystalline Fe~2O~3-ZrO~2 and Fe~2O~3-Y~2O~3-ZrO~2 Thin FilmsBattiston, G. A. / Gerbasi, R. / Berto, D. / Barreca, D. / Tondello, E. / Electrochemical Society et al. | 2003
- 1174
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Lead Containing Perovskite Films and Superlattices Grown by MOCVD in Self-Tuning ModeBosak, A. / Gorbenko, O. / Kaul, A. / Mirin, I. G. N. / Gudenko, S. / Dubourdieu, C. / Senateur, J.-P. / Electrochemical Society et al. | 2003
- 1182
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Polycrystalline Copper Nanowires and Networks with 100-Nanometer Radius Observed in MOCVDChang, Y. / Chen, Y. / Wu, R. / Chen, K. / Lin, J. / Electrochemical Society et al. | 2003
- 1190
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Microcoiled Carbon Fibers Formed by Using Ni-Cu Catalysts in CVD ProcessChen, X. / Takeuchi, K. / Yang, S. / Hishikawa, Y. / Motojima, S. / Electrochemical Society et al. | 2003
- 1198
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Vapor Phase Preparation of Carbon Microcoils/Nanocoils Under Concerted Amplification of Magnetic Field Their PropertiesMotojima, S. / Kuzuya, K. / Yang, S. / Chen, X. / Hashishin, T. / Iwanaga, H. / Shimada, S. / Saito, H. / Yoshikawa, N. / Awaji, T. et al. | 2003
- 1206
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Carbon Micro/Nanocoils Produced by Using WS~2 Catalyst in CVD ProcessYang, S. / Chen, X. / Motojima, S. / Electrochemical Society et al. | 2003
- 1212
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Thermodynamic and Experimental Approaches of Barrier Materials Synthesis for Silicon IC TechnologyBlanquet, E. / Chenevier, B. / Ramberg, E. / Bernard, C. / Madar, R. / Electrochemical Society et al. | 2003
- 1224
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Deposition and Treatment of Titanium Based Barrier Layers by MOCVDEcke, R. / Schulz, S. E. / Gessner, T. / Riedel, S. / Lipp, E. / Eizenberg, M. / Electrochemical Society et al. | 2003
- 1231
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Nitrogen-Free Cu Barrier SiOCH Film with k = 4.3Nishimoto, Y. / Shioya, Y. / Shimoda, H. / Ohdaira, T. / Suzuki, R. / Maeda, K. / Electrochemical Society et al. | 2003
- 1239
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Cu Barrier Property of Low-K SiOCH Film with k = 3.5 Deposited by PE-CVD Using HMDSO and N~2O GasesShioya, Y. / Nishimoto, Y. / Ohdaira, T. / Suzuki, R. / Maeda, K. / Electrochemical Society et al. | 2003
- 1247
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MOCVD of CrSi~xC~y Thin Films: Study of Their Potentiality as Diffusion BarrierDuminica, F. D. / Maury, F. / Electrochemical Society et al. | 2003
- 1255
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Cr~3(C,N)~2 Thin Films Grown by MOCVD as Barrier Against Copper DiffusionGasqueres, C. / Maury, F. / Electrochemical Society et al. | 2003
- 1262
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Growth and Characterization of Ti-Al-N Films Prepared by Plasma-Enhanced Atomic Layer Deposition of TiN and AlNLee, Y. J. / Kang, S.-W. / Electrochemical Society et al. | 2003
- 1268
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Structural Comparison Between Cu(hfac)(VTMS) and Cu(hfac)(MHY): An Answer to Differences in Copper Film DepositionJoulaud, M. / Omnes, L. / Mourier, T. / Mayer, D. / Doppelt, P. / Electrochemical Society et al. | 2003
- 1275
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MOCVD of Copper Films From Bis(ethyl-3-oxo-butanoato)copper(II): Experiment and Thermodynamic AnalysisMukhopadhyay, S. / Shalini, K. / Devi, A. / Shivashankar, S. A. / Electrochemical Society et al. | 2003
- 1284
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Preparation of Cu Thin Films by MOCVD Using Novel Organometallic Cu(II) PrecursorsKim, C. G. / Park, J. W. / Chung, T.-M. / Lee, S. S. / Kim, Y. / Electrochemical Society et al. | 2003
- 1290
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Low Temperature Cu Thin Film Growth Using Cycles of Alternate Supply of (HFAC)Cu(I)(DMB) and Ar Purge GasYong, K. K. K. / Electrochemical Society et al. | 2003
- 1297
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Thin Copper Films Prepared by CVD from (HFA)Cu (1.5-COD)Panin, A. / Shugurov, A. / Liskovskaya, T. / Igumenov, I. / Ivonin, I. / Oskomov, K. / Electrochemical Society et al. | 2003
- 1305
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Copper Dots Deposition Using New Precuresors [Cu^1(hfac)]~2(DVTMSO) and [Cu^1(hfac)]~2(HD)Kang, S.-W. / Yun, J.-H. / Rhee, S.-W. / Krisyuk, V. / Turgambaeva, A. / Electrochemical Society et al. | 2003
- 1313
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Copper Film Deposition with Cu(dpm)~2 PrecursorBakovets, V. V. / Levashova, T. M. / Dolgovesova, I. P. / Maximovski, E. A. / Electrochemical Society et al. | 2003
- 1318
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Comparative Study of Cu-Precursors for 3D Focused Electron Beam Induced DepositionLuisier, A. / Utke, I. / Bret, T. / Cicoira, F. / Hauert, R. / Rhee, S.-W. / Doppelt, P. / Hoffmann, P. / Electrochemical Society et al. | 2003
- 1327
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MOCVD of Ir-Al~2O~3 Protective CoatingsIgumenov, I. K. / Gelfond, N. V. / Morozova, N. B. / Semyannikov, P. P. / Trubin, S. V. T. / Danilovich, V. S. / Gimeno-Fabra, L. / Electrochemical Society et al. | 2003
- 1335
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Investigation of Chemical Vapor Deposition Processes to Perform Dense alpha-Alumina Coating on SuperalloysBahlawane, N. / Blittersdorf, S. / Kohse-Hoinghaus, K. / Atakan, B. / Muller, J. / Electrochemical Society et al. | 2003
- 1343
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Diamond Nucleation on Silicon Using an Intermediate Temperature StepDumitrescu-Buforn, L. / Blank, E. / Electrochemical Society et al. | 2003
- 1351
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Growth of ECR-CVD Carbon Nitride Films With a High Nitrogen Content from CH~4/N~2/Ar MixturesCamero, M. / Gomez-Aleixandre, C. / Albella, J. M. / Electrochemical Society et al. | 2003
- 1357
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Growth of Si and Ge Quantum Dots on Insulators by LPCVDBaron, T. / Mazen, F. / Perniola, I. / Pelissier, B. / Hartmann, J. M. / Damlencourt, J. F. / Electrochemical Society et al. | 2003
- 1364
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Fabrication Characteristics of Midgap Metal Gates Compatible With Thin SiO~2 Films Using Low Pressure Chemically Vapor Deposited Tungsten FilmsKouvatsos, D. N. / Ioannou-Sougleridis, V. / Tsevas, S. / Davazoglou, D. / Christoforou, F. / Boukouras, C. / Electrochemical Society et al. | 2003
- 1372
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Low Pressure Chemical Vapor Deposition of Silicon Nitride Using Mono- and DisilylamineDussarrat, C. / Girard, J.-M. / Kimura, T. / Tamaoki, N. / Sato, Y. / Electrochemical Society et al. | 2003
- 1380
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Very Thin (<10nm) Silicon Oxynitride (SiO~xN~y) Layers Formed by PECVDBeck, R. B. / Cuch, M. / Wojtkiewicz, A. / Kudla, A. / Jakubowski, A. / Electrochemical Society et al. | 2003
- 1387
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Titanium Phosphide Coatings From the Atmospheric Pressure CVD Reaction of TiCl~4 with PR~xH~3~-~x (R = cy^h^e^x; or R = SiMe~3 where x = 3)Blackman, C. / Carmalt, C. / O Neill, S. / Parkin, I. / Molloy, K. / Apostolico, L. / Electrochemical Society et al. | 2003
- 1395
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An n^+-InGaAs/n-GaAs Dual-Doped-Channel Heterostructure Field-Effect Transistor (DDC-HFET) Grown by LP-MOCVDChuang, H.-M. / Lin, K.-W. / Yu, K.-H. / Chen, C.-Y. / Chen, J.-Y. / Lai, P.-H. / Kao, C.-I. / Liu, W.-C. / Electrochemical Society et al. | 2003
- 1403
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Study of Deposition Processes in PZT Films Grown by Liquid Delivery MOCVDKurasawa, M. / Nakabayashi, M. / Nakamura, K. / Maruyama, K. / Eshita, T. / Kurihara, K. / Electrochemical Society et al. | 2003
- 1411
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Effect of Solvent on the Deposition Behavior of MOCVD-Pb(Zr,Ti)O~3 Films Using Liquid-Deliver Source Supply SystemFunakubo, H. / Asano, G. / Ozeki, T. / Machida, H. / Yoneyama, T. / Takamatsu, Y. / Electrochemical Society et al. | 2003
- 1419
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Deposition of Yttrium or Lanthanum-Substituted Bismuth Titanate Films by Direct Liquid Injection-Metal Organic Chemical Vapor Deposition for Use in Non-Volatile MemoriesKang, S.-W. / Rhee, S.-W. / Electrochemical Society et al. | 2003
- 1426
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Tin Phosphide Coatings from the Atmospheric Pressure Chemical Vapour Deposition of SnCl~4 and Pcyc^h^e^x~xH~3~-~xBinions, R. / Carmalt, C. J. / Parkin, I. P. / Electrochemical Society et al. | 2003
- 1434
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Optical Thin Fillm Coatings of CVD Molybdenum Oxides and Investigations of Their Electrochromic PropertiesIvanova, T. / Gesheva, K. A. / Electrochemical Society et al. | 2003
- 1442
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Fabrication of Electrochromic Displays by Chemically Vapor Depositing Patterning WO~3 Films on SnO~2:F Covered Glass SubstratesVassilopoulou, M. / Pappas, D. / Raptis, I. / Kostis, D. D. I. / Electrochemical Society et al. | 2003
- 1448
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Characterization of Vanadium Oxide Films Prepared by Atmospheric Pressure Chemical Vapour DepositionVernardou, D. / Pemble, M. E. / Sheel, D. / Ivan, T. D. M. / Parkin, P. / Electrochemical Society et al. | 2003
- 1455
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Chemical Vapor Deposition of Co~3O~4 on Honeycomb Substrates for Catalytic ApplicationsRivera, E. F. / Atakan, B. / Kohse-Hoinghaus, K. / Electrochemical Society et al. | 2003
- 1463
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Preparation of Pd/Zn/ZnO Catalysts for Methanol Steam Reforming by MOCVDPopovska, N. / Kiesslich, F. / Emig, G. / Electrochemical Society et al. | 2003
- 1471
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Sub-Estioquiometric Titania Layers Prepared by MOCVD for Photocatalysis ApplicationsJusticia, I. / Garcia, G. / Battiston, G. A. / Gerbasi, R. / Figueras, A. / Dorignac, D. / Electrochemical Society et al. | 2003
- 1477
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MOCVD of TiO~2 Thin Films Using a New Class of Metalorganic PrecursorsBhakta, R. / Patil, U. / Devi, A. / Electrochemical Society et al. | 2003
- 1484
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Polycrystalline Spinel Chromite ZnCr~2O~4 Films Prepared by MOCVDChang, Y. / Pen, H. / Chung, C. / Electrochemical Society et al. | 2003
- 1492
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A Study on (311) CuCr~2O~4 Spinel Films Prepared by MOCVDChang, Y. / Lin, C. / Lee, B. / Electrochemical Society et al. | 2003
- 1500
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Comparative Study of MOCVD Platinum Thin films Obtained by the Use of Liquid Injection System or Conventional BubblerValet, O. / Doppelt, P. / Baumann, P. K. / Schumacher, M. / Beuran, F. C. / Guillon, H. / Electrochemical Society et al. | 2003
- 1508
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New Yttrium Precursors for YBCO Films Prepared by PI-MOCVDTerrematte, J. / Daniele, S. / Hubert-Pfalzgraf, L. G. / Decams, J. M. / Le Gall, S. / Guillon, H. / Beauquis, S. / Ng, P. H. / Jimenez, C. / Weiss, F. et al. | 2003
- 1514
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Novel Compounds for use as TiO~2 Precursors in Thin Film Deposition by Liquid Injection MOCVDClarke, C. L. / Boag, N. M. / Pemble, M. E. / Electrochemical Society et al. | 2003
- 1522
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Buffer Layers and YBCO Growth on Ni Rabit TapesDonet, S. / Weiss, F. / Chaudouet, P. / Electrochemical Society et al. | 2003
- 1528
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PI-MOCVD Original Buffer Layers for YBa~2Cu~3O~7~-~d~e~l~t~a Coated ConductorsBeauquis, S. / Donet, S. / Weiss, F. / Roussel, H. / Abrutis, A. / Electrochemical Society et al. | 2003
- 1540
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CVD Of Thin Oxygen Permeable Membrane FilmsMuydinov, R. / Novojilov, M. / Gorbenko, O. / Korsakov, I. / Kaul, A. / Stiens, D. / Samoilenkov, S. / Wahl, G. / Electrochemical Society et al. | 2003
- 1547
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Preparation Of Tl-1223 Superconducting Films With High Transport J~c by Spray PyrolysisPhok, S. / Galez, P. / Jorda, J. L. / De Barros, D. / Weiss, F. / Peroz, C. / Villard, C. / Electrochemical Society et al. | 2003