Zirconium dioxide thin films for high-k applications by MOCVD from novel mononuclear precursors (English)
- New search for: Thomas, R.
- New search for: Patil, U.
- New search for: Ehrhart, P.
- New search for: Devi, A.
- New search for: Waser, R.
- New search for: Thomas, R.
- New search for: Patil, U.
- New search for: Ehrhart, P.
- New search for: Devi, A.
- New search for: Waser, R.
- New search for: Devi, A.
In:
Chemical vapor deposition
9
;
944-951
;
2005
-
ISBN:
- Conference paper / Print
-
Title:Zirconium dioxide thin films for high-k applications by MOCVD from novel mononuclear precursors
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Contributors:Thomas, R. ( author ) / Patil, U. ( author ) / Ehrhart, P. ( author ) / Devi, A. ( author ) / Waser, R. ( author ) / Devi, A.
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Conference:15th:; European Conference, Chemical vapor deposition ; 2005 ; Bochum, Germany
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Published in:Chemical vapor deposition , 9 ; 944-951PROCEEDINGS- ELECTROCHEMICAL SOCIETY PV , 9 ; 944-951
-
Publisher:
- New search for: Electrochemical Society Inc,
-
Place of publication:Pennington, NJ:
-
Publication date:2005-01-01
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Size:8 pages
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ISBN:
-
Type of media:Conference paper
-
Type of material:Print
-
Language:English
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Keywords:
-
Source:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Table of contents conference proceedings
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1
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Numerical simulation of SiC processes: A characterization tool for the design of epitaxial structures in electronicsPons, M. / Nishizawa, S. / Wellmann, P. / Ucar, M. / Blanquet, E. / Dedulle, J. M. / Baillet, F. / Chaussende, D. / Bernard, C. / Madar, R. et al. | 2005
- 13
-
Substrate heater design investigation for uniform temperature in a cold-wall low pressure reactorKrumdieck, S. P. / Jung, H.-C. et al. | 2005
- 21
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Elaboration on the automatic modelling system for reaction mechanism using a novel calculation methodTakahashi, T. / Takahashi, K. / Ema, Y. et al. | 2005
- 29
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Toward a systematic methodology for modelling vapor deposition processesKajikawa, Y. / Mima, H. / Matsushima, K. / Noda, S. / Komiyama, H. et al. | 2005
- 36
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Expanding thermal plasma CVD: Experimental studies of the plasma-surface interactionVan de Sanden, M. C. M. / Creatore, M. / Blauw, M. A. / Hoefnagels, J. P. M. / Hoex, B. / van den Oever, P. J. / Smets, A. H. M. / Schram, D. C. / Kessels, W. M. M. et al. | 2005
- 49
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RTLPCVD modelling: Steady-state simulationsLogerais, P.-O. / Girtan, M. / Bouteville, A. et al. | 2005
- 57
-
The effect of ozone on the growth rate of tin oxide from monobutyltin trichlorideChae, Y. / Allendorf, M. D. et al. | 2005
- 65
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A critical evaluation of surface reaction models based on reactive sticking coefficientsDorsman, R. / Kleijn, C. R. et al. | 2005
- 73
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Multiple experimental investigation for understanding CVD mechanism: Example of laminar pyrocarbon depositionLanglais, F. / Le Poche, H. / Lavenac, J. / Feron, O. et al. | 2005
- 87
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Gas phase association reactions in 13-15 CVD: Annoying obstacle or rewarding advantage?Timoshkin, A. Y. et al. | 2005
- 95
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A Multiscale study of the MOCVD of GaNMoscatelli, D. / Caccioppoli, P. / Cavallotti, C. et al. | 2005
- 103
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The decomposition mechanism of a gallium azide single molecule precursor derived from accurate theoretical calculationsSchmid, R. / Tafipolsky, M. et al. | 2005
- 111
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Multiscale modelling of silicon-based materials LPCVD in deep submicronic trenches: A continuum feature scale modelJaouen, L. / Roqueta, F. / Scheid, E. / Vergnes, H. / Caussat, B. et al. | 2005
- 120
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Design investigation for three dimensional uniformity of the mass transport fieldKrumdieck, S. P. / Baluti, S. I. / Marcus, L. / Peled, A. et al. | 2005
- 128
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Molecular dynamic approach of SiC layers growth in CVD and PECVD reactorsSourd, B. / Aubreton, J. / Elchinger, M.-F. et al. | 2005
- 136
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The QM/MM design of precursors for CVD and ALD processesRogachev, A. Y. / Konyuhov, S. V. / Bochenkova, A. V. / Kuzmina, N. P. / Nemukhin, A. V. et al. | 2005
- 144
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An efficient methodology for integrated computer-aided design of CVD reactors: An application in tungsten/carbon codepositionXenidou, T. C. / Boudouvis, A. G. / Markatos, N. C. et al. | 2005
- 152
-
Numerical assessment of new precursor in MOVPE processMukinovic, M. / Brenner, G. / Mesic, E. / Schmid, R. et al. | 2005
- 160
-
Kinetic analysis of the chemical vapor deposition of Si from SiCl4-H2 for the production of Biomorphic Si~3N~4 ceramicsPopovska, N. / Streitwieser, D. A. / Ghanem, H. et al. | 2005
- 168
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Comparative theoretical study of beta-ketoiminates and beta-diketonates as precursors to aluminum oxide thin filmsBalashov, A. M. / Ermilov, A. Y. / Kuzmina, N. P. et al. | 2005
- 173
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Theoretical determination of accurate entropy contributions by a monte carlo calculation of the partition function: Application to the decomposition of a single molecule precursorTafipolsky, M. / Schmid, R. et al. | 2005
- 181
-
Study on the possibilities of modeling the physical processes involved in spray CVDGirtan, M. / Logerais, P.-O. / Bouteville, A. et al. | 2005
- 189
-
Deposition process of amorphous boron carbide from CH~4/BCl~3/H~2 precursorBerjonneau, J. / Chollon, G. / Langlais, F. et al. | 2005
- 198
-
Heat and Mass transfer during producing large-area layers of zinc selenideMinkina, V. G. et al. | 2005
- 203
-
Selective atomic layer deposition of titanium oxide on silicon and gold with patterned self-assembled monolayersSung, M. M. et al. | 2005
- 214
-
Structure control of thin films via droplet charge in aerosol assisted vapor deposition processHou, X. / Choy, K.-L. et al. | 2005
- 221
-
Fluidized bed as a solid precursor delivery system in a chemical vapor deposition reactorVahlas, C. / Caussat, B. / Senocq, F. / Gladfelter, W. L. / Sarantopoulos, C. / Toro, D. / Moersch, T. et al. | 2005
- 229
-
Cobalt diketonate complexes as CVD precursors: Issues of stability and vapor pressureAtakan, B. / Siddiqi, M. A. et al. | 2005
- 237
-
Vapor pressure measurement of technologically important precursorsRushworth, S. A. / Smith, L. M. / Kingsley, A. J. / Odedra, R. et al. | 2005
- 244
-
In-situ infrared spectroscopic study on a manganese precursor in metalorganic chemical vapor depositionNakamura, T. / Tai, R. / Nishimura, T. / Tachibana, K. et al. | 2005
- 252
-
Towards chemical vapor infiltration of silica microfibers with TiO~2 anataseSarantopoulos, C. / Duminica, F.-D. / Gleizes, A. N. / Maury, F. et al. | 2005
- 260
-
Thermal properties of volatile organohafnium precursors for HfO~2 MOCVD processesCarta, G. / Rossetto, G. / Sitran, S. / Zanella, P. / Crociani, L. / Zherikova, K. V. / Morozova, N. B. / Gelfond, N. V. / Semyannikov, P. P. / Yakovkina, L. V. et al. | 2005
- 268
-
Phosphane and phosphite silver(I) complexes as CVD precursorsLang, Heinrich / Jakob, Alexander / Schmidt, Heike / Djiele, Patrice / Walfort, Bernhard / Haase, Thomas / Bahlawane, Naoufal / Kohse-Höinghaus, Katharina et al. | 2005
- 268
-
Phosphane and phosphate silver (I) complexes as CVD precursorsLang, H. / Jakob, A. / Schmidt, H. / Djiele, P. / Walfort, B. / Haase, T. / Bahlawane, N. / Kohse-Hoinghaus, K. et al. | 2005
- 276
-
Mass spectrometry as a basis for the selection of CVD precursorsHaase, T. / Bahlawane, N. / Strong, J. T. / Jakob, A. / Shen, Y. / Lang, H. / Kohse-Hoinghaus, K. et al. | 2005
- 284
-
Poly-Si films prepared by muPCVD techniqueBakardjieva, V. S. / Stoianchov, T. R. / Stanimirova, T. J. / Kazakov, R. H. et al. | 2005
- 284
-
Poly-Si films prepared by microPCVD techniqueBakardjieva, V.S. / Stoianchov, T.R. / Stanimirova, T.J. / Kazakov, R.H. et al. | 2005
- 291
-
Calculation of the infrared optical constants of LPCVD and thermally grown SiO~2 films by measurements of reflection in non normal incidenceZogopoulos, K. / Vamvakas, V. E. / Davazoglou, D. et al. | 2005
- 299
-
In-situ investigations of GaN chemical instability during MOCVDZavarin, E. E. / Sizov, D. S. / Lundin, W. V. / Tsatsulnikov, A. F. / Talalaev, R. A. / Kondratyev, A. V. / Bord, O. V. et al. | 2005
- 306
-
MOCVD application for thin film deposition of nonvolatile lanthanide carboxylatesKotova, O. / Eliseeva, S. / Muydinov, R. / Kuzmina, N. / Kaul, A. et al. | 2005
- 312
-
Gas phase decomposition studies on the MOCVD precursor [Ti(OC~3H~7)~4] using Matrix-isolation FTIR spectroscopyBhakta, R. / Gemel, E. / Muller, J. / Devi, A. et al. | 2005
- 320
-
MOCVD of TiO2 thin films on OTS modified Si(100) substrates by micro-contact printing (microCP): selective growth and new characterization technique with micro-Raman spectroscopyKang, B.C. / Lee, J.H. / Jung, D.Y. / Devi, A. / Bhakta, R. / Fischer, R.A. / Hong, S.H. / Boo, J.H. et al. | 2005
- 320
-
MOCVD of TiO~2 thin films on OTS modified Si(100) substrates by microcontact printing: Selective growth and new characterization technique with micro-raman spectroscopyKang, B.-C. / Lee, J.-H. / Jung, D.-Y. / Devi, A. / Bhakta, R. / Fischer, R. A. / Hong, S.-H. / Boo, J.-H. et al. | 2005
- 326
-
Selective growth of tantalum nitride and hafnium nitride thin films on OTS patterned Si(100) substrates by MOCVD methodKang, B.-C. / Baunemann, A. / Kim, Y. / Lee, J.-H. / Jung, D.-Y. / Devi, A. / Parala, H. / Fischer, R. A. / Boo, J.-H. et al. | 2005
- 333
-
Depth profiling of nm thin layers with SIMSEhrke, U. / Maul, J. L. et al. | 2005
- 340
-
Growth of Nanosized carbon structures with predefinite architecturesTerranova, M. L. / Sessa, V. / Orlanducci, S. / Fiori, A. / Tamburri, E. / Rossi, M. et al. | 2005
- 348
-
Detailed gas-phase chemistry in CVD of carbon from unsaturated light hydrocarbonsNorinaga, K. / Deutschmann, O. et al. | 2005
- 356
-
Coating of carbon short fibers with PyC, SiC, and TiN in a large scale CVD reactorPopovska, N. / Hackl, G. / Gerhard, H. et al. | 2005
- 364
-
High-yield catalytic synthesis of thin multiwalled carbon nanotubes and their field emission characteristicsJeong, H. J. / Lim, S. C. / Lee, J. Y. / Jung, K. T. / Choi, Y. / Lee, Y. H. et al. | 2005
- 372
-
CVD of ferromagnetic filled carbon nanotubesLeonhardt, A. / Muller, C. / Hampel, S. / Selbmann, D. / Ritschel, M. / Gemming, T. / Biedermann, K. / Elefant, D. / Buchner, B. et al. | 2005
- 378
-
PECVD carbon as a new material for advanced DRAM productionVogt, M. / Stravrev, M. / Sperlich, H.-P. et al. | 2005
- 388
-
Formation of carbon textures in chemical vapor infiltration and deposition - A comparisonZhang, W. G. / Huttinger, K. J. et al. | 2005
- 396
-
Decorating of multi-walled carbon nanotubes by copper particles using MOCVDTaschner, C. / Biedermann, K. / Leonhardt, A. / Buchner, B. / Gemming, T. / Wetzig, K. et al. | 2005
- 403
-
Influence of the subsrate surface morphology on the CVD growth of carbon nanotubesLopez-Camacho, E. / Fernandez, M. / Gomez-Aleixandre, C. et al. | 2005
- 408
-
Transmission electron microscopy of pyrolytic carbon coatings deposited in a hot-wall reactor: Preferred orientation and stacking character of graphitic crystallitesReznik, B. / Popovska, N. / Hackl, H. et al. | 2005
- 415
-
Plasma chemistry in the CVD synthesis of nanodiamond filmsGordillo-Vazquez, F. J. / Gomez-Aleixandre, C. / Albella, J. M. et al. | 2005
- 427
-
Application of Plasma-enhanced CVD to nitride synthesisVajenine, G. V. / Ganin, A. Y. et al. | 2005
- 433
-
Plasma enhanced MOCVD of transition metal oxide thin films with a thickness between some hundred and less than one nanometer for optical applicationsHamelmann, F. / Hachmann, W. / Wonisch, A. / Heinzmann, U. / Ivanova, T. / Gesheva, K. et al. | 2005
- 441
-
Emission spectroscopy, mass spectrometry, and kinetics in CH~4-CO~2 plasmas used for diamond depositionMet, C. / de Persis, S. / Vandenbulcke, L. / Aubry, O. / Delfau, J. L. / Vovelle, C. / Lago, V. et al. | 2005
- 449
-
Synthesis of molybdenum nitrides by plasma enhanced chemical vapor depositionGanin, A. Y. / Kienle, L. / Vajenine, V. et al. | 2005
- 457
-
Deposition and characterization of PECVD phosphorus doped silicon oxynitride layers for integrated optics applicationsHussein, M. G. / Worhoff, K. / Sengo, G. / Driessen, A. et al. | 2005
- 465
-
Thin film transistors fabricated in laser crystallized chemically vapor deposited amorphous silicon films on quartz substratesKouvatsos, D. N. / Voutsas, A. T. / Papaioannou, G. J. et al. | 2005
- 473
-
Comparative study of muPCVD and PECVD phosphosilicate glass films after rapid thermal annealingBeshkov, G. D. / Alexieva, Z. I. / Bakardjieva, V. S. / Vitanov, P. K. / Lazarova, V. B. et al. | 2005
- 481
-
Generation and characterization of composite Pd/SiO~2 catalysts by CVS/CVD in a continuous Gas-Phase/Aerosol ProcessKasper, G. / Heel, A. et al. | 2005
- 491
-
Generation of titania nanoparticles by liquid flame spray for photocatalytic applicationsKeskinen, H. / Makela, J. M. / Hellsten, S. / Aromaa, M. / Levanen, E. / Mantyla, T. et al. | 2005
- 499
-
MOCVD challenge to the synthesis of oxide nanotube arraysMalandrino, G. / Finocchiaro, S. T. / Fragala, I. L. et al. | 2005
- 506
-
Advances in synthetic strategies for metal oxide nanosystems: A non-conventional hybrid CVD/Sol-gel approachArmelao, L. / Barreca, D. / Bottaro, G. / Gasparotto, A. / Maragno, C. / Tondello, E. et al. | 2005
- 518
-
Bi~2O~3 rods deposited under atmospheric pressure by means of halide CVD on C-sapphireTakeyama, T. / Takahashi, N. / Nakamura, T. / Itoh, S. et al. | 2005
- 523
-
LPCVD synthesis of silicon nanodots from silane and for flash memory devicesCocheteau, V. / Caussat, B. / Mur, P. / Scheid, E. / Donnadieu, P. / Billon, T. et al. | 2005
- 531
-
Growth of one-dimensional IrO~2 nanocrystals via metal-organic chemical vapour depositionKorotcov, A. V. / Chen, R. S. / Huang, Y. S. / Tsai, D. S. et al. | 2005
- 537
-
Chemical vapour synthesis of zinc oxide nanoparticles using a volatile organometallic precursorRoy, A. / Polarz, S. / Merz, M. / Schneider, L. / Halm, S. / Bacher, G. / Kruis, F.E. / Driess, M. et al. | 2005
- 537
-
Chemical vapor synthesis of zinc oxide nanoparticles using a volatile organometallic precursorRoy, A. / Polarz, S. / Merz, M. / Schneider, L. / Halm, S. / Bacher, G. / Kruis, F. E. / Driess, M. et al. | 2005
- 545
-
Atomic layer deposition of metal thin filmsLeskela, M. / Aaltonen, T. / Hamalainen, J. / Niskanen, A. / Ritala, M. et al. | 2005
- 555
-
In-situ RHEED of atomic layer depositionBankras, R. G. / Holleman, J. / Schmitz, J. et al. | 2005
- 563
-
Atomic layer deposition of tungsten carbonitride thin films from a new metalorganic precursorDezelah, C. L. / El-Kadri, O. M. / Heeg, M. J. / Niinisto, L. / Winter, C. H. et al. | 2005
- 575
-
The effect of precursors to the structure and conductivity of atomic layer deposited TiO~2 filmsJogi, I. / Aarik, J. / Kukli, K. / Kaambre, H. / Laan, M. / Lu, J. / Sajavaara, T. / Uustare, T. et al. | 2005
- 583
-
ALD processes for the preparation of noble-metal-free monolithic catalystsBahlawane, N. / Kohse-Hoinghaus, K. / Park, J. S. / Gordon, R. G. et al. | 2005
- 583
-
ALD process for the preparation of noble-metal-free monolithic catalystsBahlawane, Naoufal / Kohse-Höinghaus, Katharina / Park, Jin-Seong / Gordon, Roy G. et al. | 2005
- 591
-
In-situ quartz crystal microbalance investigation of atomic layer deposition of Cu~3NOttosson, M. / Torndahl, T. / Carlsson, J.-O. et al. | 2005
- 598
-
Atomic layer deposition of dielectric Nb~2O~5 films using the NbI~5-O~2 precursor combinationRooth, M. / Kukli, K. / Harsta, A. et al. | 2005
- 605
-
Precursor combinations for ALD of rare earth oxides and silicates-A quantum chemical and x-ray studyElliott, S. D. / Scarel, G. / Wiemer, C. / Fanciulli, M. / Lebedinskii, Y. / Zenkevich, A. / Fedushkin, I. L. et al. | 2005
- 614
-
Aminoalkoxide groups as monovalent bidentate ligands for the precursors to various metals and metal oxides and the applications of the precursors in MOCVD and ALDKim, C. G. / Chung, T.-M. / Lee, Y. K. / An, K.-S. / Lee, S. S. / Yang, T. S. / Kim, Y. et al. | 2005
- 626
-
Precursor chemistries for electronics and opto-electronicsIrven, J. et al. | 2005
- 638
-
Thin films of iron from Fe(CO)~5 under atmospheric pressureDelsol, T. / Maury, F. / Senocq, F. et al. | 2005
- 644
-
Growth of iron thin films by AP-MOCVD starting from ferrocene and H~2ODuminica, F.-D. / Maury, F. / Vahlas, C. / Senocq, F. / Delsol, T. et al. | 2005
- 652
-
Deposition of undoped and in-situ doped amorphous and polycrystalline silicon with LPCVDSchaekers, M. / Shi, X. et al. | 2005
- 659
-
Chemical vapor deposition of nickel thin films on glass using nickel acetylacetonateGesthuizen, J. / Miguelanez, A. H. / Reilmann, F. / Ros, R. / Bahlawane, N. et al. | 2005
- 667
-
Synthesis and properties of volatile Cu(II) complexes with beta-diiminates derived from acetylacetone-New precursors for MOCVD processesMorozova, N. B. / Gelfond, N. V. / Liskovskaya, T. I. / Stabnikov, P. A. / Semyannikov, P. P. / Trubin, S. V. / Mischenko, A. V. / Igumenov, I. K. / Norman, J. A. et al. | 2005
- 675
-
Systematic investigations of new Pd(II) precursors for MOCVD processesIgumenov, I. K. / Zharkova, G. I. / Baidina, I. A. / Stabnikov, P. A. / Semyannikov, P. P. / Morozova, N. B. / Gelfond, N. V. et al. | 2005
- 683
-
Preparation of silver thin films from vinyltriethylsilane (hexafluoroacetylacetonato)silver(I) using liquid-delivery metalorganic chemical vapor depositionHuryeva, T. / Lisker, M. / Silinskas, M. / Burte, E. P. / Kalkofen, B. / Matichyn, S. et al. | 2005
- 691
-
Growth and characterisation of free-standing hydride vapor phase epitaxy GaN on two-step epitaxial lateral overgrown GaN templateGogova, D. / Kanev, S. / Monemar, B. / Ivanov, I. G. / Yakimova, R. / Talik, E. et al. | 2005
- 699
-
Silicon carbide nanoheteropolytypic structures grown by UHV-CVD on Si (111)Morales, F. M. / Forster, C. / Ambacher, O. / Pezoldt, J. et al. | 2005
- 707
-
Stress Manipulation in CVD grown SiC on Si by Mono- and submonolayer Ge precoveragesPezoldt, J. / Zgheib, C. / Morales, F. M. / Forster, C. / Stauden, T. / Wang, C. / Masri, P. / Leycuras, A. / Ferro, G. / Ambacher, O. et al. | 2005
- 715
-
Nanocrystalline Pt films by MOCVD in the presence of water vapor electrode useBattiston, G. A. / Gerbasi, R. / Rodriguez, A. / Daniele, S. / Barreca, D. / Tondello, E. et al. | 2005
- 723
-
[(Arene)(diene) Ru(0)-complexes as precursors for ruthenium MOCVDSchneider, A. / Popovska, N. / Gerhard, H. / Jipa, I. / Zenneck, U. et al. | 2005
- 730
-
A single source approach for the deposition of GaSb filmsFahrenholz, S. / Kuczkowski, A. / Schulz, S. / Wandelt, K. / Seemayer, A. / Assenmacher, W. et al. | 2005
- 736
-
Synthesis of tailor-made single source precursors for the deposition of binary group-13 antimonide thin filmsSchulz, S. / Fahrenholz, S. / Kuczkowski, A. / Wandelt, K. / Seemayer, A. / Assenmacher, W. et al. | 2005
- 744
-
Evaluation of cyclic gallium amides as precursors for gallium nitride thin filmsKhanderi, J. / Winter, M. / Parala, H. / Becker, H.-W. / Fischer, R. A. et al. | 2005
- 754
-
Singularity in growth of Pt and Ir films obtained by metalorganic chemical vapour depositionNizard, Harry / Gelfond, Nikolay V. / Morozova, Natalia B. / Igumenov, Igor K. / Fietzek, Heiko / Gimeno-Fabra, Lluis / Redjaimia, Abdelkrim et al. | 2005
- 754
-
Singularity in growth of Pt and Ir films obtained by metalorganic chemical vapor depositionNizard, H. / Gelfond, N. V. / Morozova, N. B. / Igumenov, I. K. / Fietzek, H. / Gimeno-Fabra, L. / Redjaimia, A. et al. | 2005
- 762
-
MOCVD of conductive cubic HfN thin films from Hf(NR~2)~4 and N, N-DimethylhydrazineKim, Y. / Parala, H. / Bauer, A. / Lemberger, M. / Baunemann, A. / Fischer, R. A. et al. | 2005
- 768
-
New metastable phases in the aluminumoxide-hydrido-halogenido-systemVeith, M. / Kohler, N. et al. | 2005
- 775
-
Photocatalytic properties of TiO~2: (Fe, S) thin films prepared from complex precursors by CVDBessergenev, V. G. / Pereira, R. J. F. / Mateus, M. C. / Vasconcelos, D. A. / do Rego, A. M. B. et al. | 2005
- 783
-
Atmospheric pressure CVD growth of photocatalytic titanium dioxide thin films on tin oxideYates, H. M. / Nolan, M. G. / Sheel, D. W. / Pemble, M. E. et al. | 2005
- 791
-
Novel molecular precursors for the MOCVD of Ba~1~-~xSr~xTiO~3 thin filmsBattiston, B. A. / Garbasi, R. / Carta, G. / Marchetti, F. / Paoletti, M. / Pettinari, C. / Rodriguez, A. / Barereca, D. / Maragno, C. et al. | 2005
- 799
-
Technology and characterization of CVD-grown mixed Mo/W Oxide films and electrochromic devices made on their basisGesheva, K. A. / Ivanova, T. / Steinman, E. / Hamelmann, F. / Brechling, A. / Heinzmann, U. et al. | 2005
- 810
-
Chemical vapor deposition of Zn~xCo~3~-~xO~4 films and their characterizationFeldmann, J. / Bahlawane, N. / Kohse-Hoinghaus, K. et al. | 2005
- 818
-
Preparation of trivalent metal doped ZnO thin films by liquid-delivery MOCVDYoshizawa, S. / Kabeya, M. / Kanoko, T. / Tasaki, Y. et al. | 2005
- 826
-
Preparation of (RE)NiO~3 thin films as an electrode by liquid-delivery MOCVDTasaki, Y. / Kabeya, M. / Kanoka, T. / Yoshizawa, S. et al. | 2005
- 833
-
Hafnium (IV) beta-diketonates as precursors for MOCVD of HfO2 filmsZherikova, K. V. / Morozova, N. B. / Gelfond, N. V. / Sysoev, S. V. / Yakovkina, L. V. / Kaichev, V. V. / Kitchai, V. N. / Smirnova, T. P. / Semyannikov, P. P. / Igumenov, I. K. et al. | 2005
- 841
-
Reel-to-Reel MOCVD process of coated conductors on biaxially textured nickel alloy tapesSamoilenkov, S. V. / Stadel, O. / Schmidt, J. / Keune, H. / Wahl, G. / Gorbenko, O. Y. / Melnikov, O. V. / Kaul, A. R. et al. | 2005
- 849
-
Growth of thin iron oxide films on Si(100) by MOCVDPflitsch, C. / Viefhaus, D. / Bergmann, U. / Kravets, V. / Nienhaus, H. / Atakan, B. et al. | 2005
- 857
-
Investigation of the structural and electrical properties of ferroelectric PbZr~xTi~1~-~xO~3 (PZT) thin films grown using liquid delivery metalorganic chemical vapor depositionMatichyn, S. / Lisker, M. / Silinskas, M. / Burte, E. P. et al. | 2005
- 865
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Structural and electrical properties of zirconium oxide layers grown by liquid delivery MOCVDLisker, M. / Silinskas, M. / Matichyn, S. / Burte, E. P. et al. | 2005
- 873
-
High-k hafnium silicate films on silicon and germanium wafers by MOCVD using single-source precursorLemberger, M. / Schon, F. / Dirnecker, T. / Jank, M. P. M. / Pakaleva, A. / Bauer, A. J. / Frey, L. / Ryssel, H. et al. | 2005
- 873
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High-k hafnium silicate films on silicon and germanium wafers by MOCVD using a single-source precursorLemberger, Martin / Schön, Florian / Dirnecker, Tobias / Jank, Michael P.M. / Paskaleva, Albena / Bauer, Anton J. / Frey, Lothar / Ryssel, Heiner et al. | 2005
- 881
-
Liquid-delivery MOCVD of SBT thin films using novel bismuth precursorsSilinskas, M. / Lisker, M. / Matichyn, S. / Burte, E. P. / Hyeon, J. / Lorenz, V. / Edelmann, F. et al. | 2005
- 889
-
Atmospheric pressure glow discharge CVD of TiO~2 thin filmsHodgkinson, J. L. / Sheel, D. W. / Yates, H. M. / Davis, M. J. / Pemble, M. E. et al. | 2005
- 897
-
SrZrO~3 thin films grown by direct liquid injection MOCVDGasqueres, C. / Gallet, I. / Herbst-Ghysel, M. / Andrieux, M. / Condat, M. / Kessler, V. G. / Seisenbaeva, G. A. / Poissonnet, S. et al. | 2005
- 905
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Growth of La~1~-~xAg~yMnO~3~+~d~e~l~t~a epitaxial films for room temperature application of colossal magnetoresistanceGorbenko, O. Y. / Melnikov, O. V. / Kaul, A. R. / Babushkina, N. A. / Barranco, A. et al. | 2005
- 913
-
Volatile single source precursors for the MOCVD of metal silicate thin filmsPatil, U. / Becker, H.-W. / Winter, M. / Fischer, R. A. / Devi, A. et al. | 2005
- 921
-
Metal 2,7,7-trimethyl-3,5-octanedionates as new MOCVD precursors for oxide filmsPasko, S. / Huber-Pfalzgraf, L. G. / Abrutis, A. / Kiziene, A. et al. | 2005
- 928
-
Low temperature CVD process for growing of electrochromic chromium oxide thin filmsIvanova, T. / Gesheva, K. A. / Steinman, E. / Abrashev, M. et al. | 2005
- 936
-
MOCVD growth and properties of high-k dielectric praseodymium oxides layers on siliconAbrutis, A. / Lukosius, M. / Kiziene, A. / Baumann, P. K. / Schumacher, M. / Lindner, J. et al. | 2005
- 944
-
Zirconium dioxide thin films for high-k applications by MOCVD from novel mononuclear precursorsThomas, R. / Patil, U. / Ehrhart, P. / Devi, A. / Waser, R. et al. | 2005
- 952
-
Chemically vapor deposited SnO~2 films by oxidation of SnCl~2 vapors: Films characterization and application in gas sensorsFavre, C. / Vourdas, N. / Pimients, E. / Vamvakas, V. E. / Davazoglou, D. et al. | 2005
- 960
-
Homo and heterometallic precursors for hafnium oxide based filmsHubert-Pfalzgraf, L. G. / Pasko, S. / Abrutis, A. et al. | 2005
- 968
-
Zirconium pivalate as a new precursor for ZrO~2 thin film depositionKuzmina, N. P. / Altsybeev, A. E. / Korsakov, I. E. / Malkerova, I. P. / Alikhanyan, A. S. et al. | 2005
- 975
-
Thermal behavior and kinetic investigation of Bi, La, and Ti MOCVD precursors for application in nonvolatile ferroelectric memoriesBedoya, C. / Condorelli, G. G. / Finocchiaro, S. T. / Di Mauro, A. / Atanasio, D. / Fragala, I. L. / Cattaneo, L. / Carella, S. et al. | 2005
- 982
-
Ferroelectric (Pb, Ba)(Zr, Ti) O~3 thin films grown by MOCVDHoffmann-Eifert, S. / Puchalla, J. / Cattaneo, L. / Carella, S. / Waser, R. et al. | 2005
- 990
-
MOCVD synthesis of perovskite CaCu~3Ti~4O~1~2 filmsNigro, R. L. / Toro, R. G. / Malandrino, G. / Bettinelli, M. / Speghini, A. / Fragala, I. L. et al. | 2005
- 998
-
A Novel precursor for MOCVD of lead oxide films: [Pb(hfa)~2.diglyme]~2 complexMalandrino, G. / Nigro, R. L. / Rossi, P. / Dapport, P. / Fragala, I. L. et al. | 2005
- 1006
-
Chemical vapor deposition of tungsten carbide layer for cutting toolOsada, A. / Nakamura, E. / Tsuchiya, S. / Nishiyama, A. et al. | 2005
- 1014
-
Plasma-enhanced CVD of hard SiCN thin films using bistrimethyl silylcarbodiimide or hexamethyl disilazane as single source precursorsStelzner, T. / Falk, F. / Stafast, H. / Probst, D. / Hoche, H. et al. | 2005
- 1021
-
CVD of high precision optical coatingsHitchman, M. L. / Manookian, W. / Shamlian, S. H. / Gibson, D. R. et al. | 2005
- 1029
-
Structural features of RE MOCVD coatingsGelfond, N. V. / Morozova, N. B. / Igumenov, I. K. / Semyannikov, P. P. / Trubin, S. V. / Benien, H. / Nizard, H. / Gimeno-Fabra, L. / Vlcek, J. et al. | 2005
- 1037
-
De-hydration and phase transformations of MOCVD processed alumina coatings investigated by temperature induced deflection of dissymmetrical samplesHuntz, A. M. / Andrieux, M. / Herbst-Ghysel, M. / Haut, C. / Vahlas, C. / Samelor, D. / Sovar, M. M. / Gleizes, A. N. et al. | 2005
- 1045
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Growth of thin aluminum oxide films on stainless steel by MOCVD at ambient pressureMuhsin, A. / Pflitsch, C. / Bergmann, U. / Atakan, B. et al. | 2005
- 1045
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Growth of thin aluminium oxide films on stainless steel by MOCVD at ambient pressureMuhsin, Ali / Pflitsch, Christian / Bergmann, Ulf / Atakan, Burak et al. | 2005
- 1051
-
Low temperature CVD route for the preparation of alumina coatings with a high specific surface areaSamelor, D. / Sovar, M. M. / Stefanescu, A. / Gleizes, A. N. / Alphonse, P. / Vahlas, C. et al. | 2005
- 1059
-
Protective metal oxide coating obtained via MOCVD on steelCarta, G. / Natali, M. / Rossetto, G. / Zanella, P. / Crociani, L. / Guidi, F. / Moretti, G. et al. | 2005
- 1066
-
Al-Pt coating architectures by MOCVD for the protection of Ti6242 alloy against high temperature oxidationDelmas, M. / Kihn, Y. / Poquillon, D. / Vahlas, C. et al. | 2005
- 1074
-
Nanocrystalline films of silicon carbonitride: chemical composition and bonding and functional propertiesFainer, N. I. / Kosinova, M. L. / Rumyantsev, Y. M. / Maximovskii, E. A. / Ayupov, B. M. / Kolesov, B. A. / Kuznetsov, F. A. / Kesler, V. G. / Terauchi, M. / Shibata, K. et al. | 2005
- 1082
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Synthesis, nanoindentation and AFM studies of CVD boron carbon nitride filmsKosinova, M. L. / Fainer, N. I. / Sulyaeva, V. S. / Rumyantsev, Y. M. / Kuznetsov, F. A. / Maximovskii, E. A. / Cao, Z. / Terauchi, M. / Shibata, K. / Satoh, F. et al. | 2005
- 1088
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Chemical vapor deposition of p-type and n-type semiconducting boron carbide thin filmsHallbeck, M. S. / Caruso, A. N. / Boag, N. M. / Brand, J. I. et al. | 2005