Formation of neon induced cavities in silicon by plasma based ion implantation (English)
- New search for: Peripolli, S.
- New search for: Amaral, L.
- New search for: Oliviero, E.
- New search for: David, M. L.
- New search for: Beaufort, M. F.
- New search for: Barbot, J. F.
- New search for: Pichon, L.
- New search for: Drouet, M.
- New search for: Fichtner, P. F.
- New search for: Donnelly, S. E.
- New search for: Peripolli, S.
- New search for: Amaral, L.
- New search for: Oliviero, E.
- New search for: David, M. L.
- New search for: Beaufort, M. F.
- New search for: Barbot, J. F.
- New search for: Pichon, L.
- New search for: Drouet, M.
- New search for: Fichtner, P. F.
- New search for: Donnelly, S. E.
- New search for: Boerma, Dirk O.
- New search for: Climent-Font, Aurelio
- New search for: Respaldiza, Miguel Angel
In:
Ion beam analysis; IBA2005
1/2
;
193-195
;
2006
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ISSN:
- Conference paper / Print
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Title:Formation of neon induced cavities in silicon by plasma based ion implantation
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Contributors:Peripolli, S. ( author ) / Amaral, L. ( author ) / Oliviero, E. ( author ) / David, M. L. ( author ) / Beaufort, M. F. ( author ) / Barbot, J. F. ( author ) / Pichon, L. ( author ) / Drouet, M. ( author ) / Fichtner, P. F. ( author ) / Donnelly, S. E. ( author )
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Conference:International conference; 17th, Ion beam analysis; IBA2005 ; 2005 ; Sevilla, Spain
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Published in:Ion beam analysis; IBA2005 , 1/2 ; 193-195NUCLEAR INSTRUMENTS AND METHODS IN PHYSICS RESEARCH SECTION B ; 249, 1/2 ; 193-195
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Publisher:
- New search for: Elsevier
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Publication date:2006-01-01
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Size:3 pages
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ISSN:
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Type of media:Conference paper
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Type of material:Print
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Language:English
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Keywords:
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Source:
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