Rare-Earth Based Oxide and Nitride Thin Films Employing Volatile Homoleptic Guanidinate Precursors (English)
- New search for: Milanov, A.P.
- New search for: Thiede, T.
- New search for: Hellwig, M.
- New search for: Parala, H.
- New search for: Bock, C.
- New search for: Becker, H.
- New search for: Ngwashi, D.
- New search for: Cross, R.
- New search for: Paul, S.
- New search for: Kunze, U.
- New search for: Milanov, A.P.
- New search for: Thiede, T.
- New search for: Hellwig, M.
- New search for: Parala, H.
- New search for: Bock, C.
- New search for: Becker, H.
- New search for: Ngwashi, D.
- New search for: Cross, R.
- New search for: Paul, S.
- New search for: Kunze, U.
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In:
International chemical vapor deposition symposium; EuroCVD 17 / CVD 17 /
8
;
143-150
;
2009
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ISBN:
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ISSN:
- Conference paper / Print
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Title:Rare-Earth Based Oxide and Nitride Thin Films Employing Volatile Homoleptic Guanidinate Precursors
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Contributors:Milanov, A.P. ( author ) / Thiede, T. ( author ) / Hellwig, M. ( author ) / Parala, H. ( author ) / Bock, C. ( author ) / Becker, H. ( author ) / Ngwashi, D. ( author ) / Cross, R. ( author ) / Paul, S. ( author ) / Kunze, U. ( author )
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Conference:17th, International chemical vapor deposition symposium; EuroCVD 17 / CVD 17 / ; 2009 ; Vienna
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Published in:ECS TRANSACTIONS ; 25, 8 ; 143-150
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Publisher:
- New search for: Electrochemical Society
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Publication date:2009-01-01
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Size:8 pages
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Remarks:Also held on CD-ROM
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ISBN:
-
ISSN:
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Type of media:Conference paper
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Type of material:Print
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Language:English
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Keywords:
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Source:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Table of contents conference proceedings
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 3
-
Hot Wire Chemical Vapor Deposition: Recent Progress, Present State of the Art and Competitive OpportunitiesSchropp, R.E. et al. | 2009
- 15
-
Gas Phase Deposition and Characterization of (Si)-B-C CeramicsChollon, G. / Langlais, F. / Berjonneau, J. et al. | 2009
- 23
-
Electrical Properties of Plasma-Deposited Silicon Oxide Clarified by Chemical ModelingKovalgin, A. / Boogaard, A. / Brunets, I. / Aarnink, T. / Wolters, R. et al. | 2009
- 33
-
A Density Functional Theory Study of Chlorosilanes Polymerization in Silicon EpitaxyMoscatelli, D. / Dossi, M. / Fiorucci, A. / Masi, M. et al. | 2009
- 41
-
Investigation of the Thermal Decomposition of Triethylgallium Using in situ Raman Spectroscopy and DFT CalculationsLee, J. / Kim, Y. / Anderson, T.J. et al. | 2009
- 53
-
Cat-CVD (Catalytic-CVD); Its Fundamentals and ApplicationMatsumura, H. / Ohdaira, K. et al. | 2009
- 65
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N-doped Titania Thin Films, Prepared by Atmospheric Pressure Chemical Vapour Deposition: Enhanced Visible Light Photocatalytic Activity and Antimicrobial EffectsDunnill, C.W. / Aikin, Z. / Pratten, J. / Wilson, M. / Parkin, I. et al. | 2009
- 73
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A Comparative Study of the Photoinduced Properties of TiO~2/SiO~2 and TiO~2/ZnO/SiO~2 Layers Prepared by Chemical RoutesVernardou, D. / Spanakis, E. / Vlachou, K. / Kalogerakis, G. / Costello, J. / Koudoumas, E. / Katsarakis, N. / Pemble, M. et al. | 2009
- 81
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Selective Growth of B- and C-doped SiGe Layers in Unprocessed and Recessed Si Openings for pMOSFET ApplicationKolahdouz, M. / Adibi, P.T.Z. / Farniya, A.A. / Trybom, E. / Di Benedetto, L. / Shayestehaminzadeh, M. / Radamson, H. et al. | 2009
- 91
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Major Precursors of Pyrocarbon Deposition from Propane PyrolysisLacroix, R. / Fournet, R. / Ziegler-Devin, I. / Marquaire, P. et al. | 2009
- 99
-
A Comprehensive Insight in the MOCVD of Aluminum through Interaction between Reactive Transport Modeling and Targeted Growth ExperimentsXenidou, T.C. / Prud Homme, N. / Vahlas, C. / Markatos, N.C. / Boudouvis, A.G. et al. | 2009
- 107
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An Investigation of the Gas Phase and Surface Chemistry Active During the PECVD of nc-Silicon: A Detailed Model of the Gas Phase and Surface ChemistryCavallotti, C. / Rondanini, M. / Moiseev, T. / Chrastina, D. / Isella, G. et al. | 2009
- 115
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Multiscale Simulation and Optimization of an Atomic Layer Deposition Process in a Nanoporous MaterialDwivedi, V. / Adomaitis, R.A. et al. | 2009
- 125
-
MOCVD of Complex Oxide Systems: From Precursor Chemistry to ApplicationsMalandrino, G. / Toro, R.G. / Nigro, R.L. / Fragala, I.L. et al. | 2009
- 135
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CaCu~3Ti~4O~1~2 Thin Films for Capacitive Applications: MOCVD Synthesis and Nanoscopic/microscopic CharacterizationNigro, R.L. / Toro, R.G. / Catalano, M. / Malandrino, G. / Fragala, I.L. / Fiorenza, P. / Raineri, V. et al. | 2009
- 143
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Rare-Earth Based Oxide and Nitride Thin Films Employing Volatile Homoleptic Guanidinate PrecursorsMilanov, A.P. / Thiede, T. / Hellwig, M. / Parala, H. / Bock, C. / Becker, H. / Ngwashi, D. / Cross, R. / Paul, S. / Kunze, U. et al. | 2009
- 151
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Remarkable Influence of Molecular Structure of N,N'-unsymmetrically substituted 1,3-amidinate and -guanidinate on the Volatility and the Thermal Stability of Precursors for HfO~2 films via Liquid Injection-MOCVDEleter, M. / Daniele, S. / Brize, V. / Dubourdieu, C. / Lachaud, C. / Blasco, N. / Pinchart, A. et al. | 2009
- 161
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Mechanism-Based Design of Precursors for MOCVDMcElwee-White, L. / Koller, J. / Kim, D. / Anderson, T.J. et al. | 2009
- 173
-
Optimization of Calcium Precursor Transport for High Vacuum Chemical Vapor Deposition (HVCVD)Luo, L. / Kuzminykh, Y. / Catalano, M. / Malandrino, G. / Hoffmann, P. et al. | 2009
- 181
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Iron Amidinates as Precursors for the MOCVD of Iron Containing Thin FilmsGleizes, A.N. / Krisyuk, V. / Aloui, L. / Turgambaeva, A.E. / Sarapata, B. / Prud Homme, N. / Senocq, F. / Samelor, D. / Zielinska-Lipiec, A. / Dumestre, F. et al. | 2009
- 191
-
Atomospheric Pressure SiC Film Deposition at Low Temperatures Using SiH~3CH~3 and HCl GasesHabuka, H. / Ohmori, H. et al. | 2009
- 199
-
Photoluminescence Properties of Polar and Non-polar ZnO Films Grown by Atmospheric-pressure CVD Using Zn and H~2O as Source MaterialsTerasako, T. / Taniguchi, K. / Taira, K. / Yagi, M. / Shirakata, S. et al. | 2009
- 207
-
Influence of N~2 and H~2 Gas Flow Rates on Properties of N-type Nanocrystalline 3C-SiC:H Thin Films Prepared by Hot-wire Chemical Vapor DepositionTabata, A. / Hoshide, Y. / Kondo, A. et al. | 2009
- 213
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Atmospheric Pressure Chemical Vapour Deposition of Electrochromic Mo-W Oxide Films: Structure and Optoelectronic PropertiesIvanova, T. / Gesheva, K. / Lebedev, O. / Kalitzova, M. / Bojadjiev, S. et al. | 2009
- 221
-
Morphological and Structural Study of CVD MoO~3-Cr~2O~3 FilmsIvanova, T. / Gesheva, K. / Hamelmann, F. et al. | 2009
- 229
-
PECVD Deposition of nc-Si, μc-Si, and a-Si of Different Isotopic Composition in Form of Films and Bulk Material from SiF~4 PrecursorSennikov, P. / Golubev, S. / Shashkin, V. / Pryakhin, D. / Andreev, B. / Drozdov, M. / Pohl, H. et al. | 2009
- 229
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PECVD deposition of nc-Si, mc-Si, and a-Si of different isotopic composition in form of films and bulk material from SiF4 precursorSennikov, P.G. / Golubev, S.V. / Shashkin, V.I. / Pryakhin, D.A. / Andreev, B.A. / Drozdov, M.N. / Pohl, H.J. et al. | 2009
- 235
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PEALD ZrO~2 Films Deposition on TiN and Si SubstratesMonnier, D. / Gros-Jean, M. / Deloffre, E. / Doisneau, B. / Coindeau, S. / Crisci, A. / Roy, J. / Mi, Y. / Detlefs, B. / Zegenhagen, J. et al. | 2009
- 243
-
AFM Study of PECVD DLC Films for Solar Selective AbsorberTinchev, S. / Gusterov, A. / Sharlandzhiev, P. / Nikolova, P. / Dyulgerska, Y. et al. | 2009
- 249
-
Effect of H~2 on the Microstructure and Properties of TiO~2 Films Grown by Atmospheric Pressure MOCVD on Steel SubstratesDuminica, D. / Maury, F. / Hausbrand, R. et al. | 2009
- 257
-
Correlation between Plasma OES and Properties of B-doped Diamond Films Grown by MW PE CVDBelousov, M. / Krivchenko, V. / Minakov, P. / Pal, A. / Rakhimov, A. / Suetin, N. / Sen, V. et al. | 2009
- 265
-
Pulsed Spray Evaporation CVD of Functional Complex Oxides: Interplay between the Structure, Electrical Properties and Surface ReactivityBahlawane, N. / Ngamou, P.T. / Kohse-Hoinghaus, K. et al. | 2009
- 273
-
Online Control by IR Pyrometry of Nanostructured Multilayer CrCx/CrN Coatings Grown by MOCVDDouard, A. / Samelor, D. / Delclos, S. / Tendero, C. / Maury, F. et al. | 2009
- 281
-
Preparation and Physical Characterization of SnO~2:SbHaireche, S. / Boumeddiene, A. / Guittoum, A. / El Hdiy, A. / Boufelfel, A. et al. | 2009
- 291
-
Microstructural Control of Zirconium Carbide Coating Prepared by Chemical Vapor DepositionSun, W. / Xiong, X. / Huang, B. / Li, G. / Zhang, H. / Xiao, P. / Chen, Z. / Zheng, X. et al. | 2009
- 301
-
Variation in Properties CVD-ZnS~xSe~1~-~x with CompositionGavrishchuk, E. / Savin, D.V. / Ikonnikov, V. et al. | 2009
- 309
-
In Situ Doped Si Selective Epitaxial Growth at Low Temperatures by Atmospheric Pressure Plasma CVDOhnishi, T. / Kirihata, Y. / Ohmi, H. / Kakiuchi, H. / Yasutake, K. et al. | 2009
- 317
-
Comparison of Diamond Deposition With Boron or Sulfur AdditionHaubner, R. et al. | 2009
- 323
-
High-speed Growth and Characterization of Polycrystalline AlN Layers by High Temperature Chemical Vapor Deposition (HTCVD)Claudel, A. / Blanquet, E. / Chaussende, D. / Martin, R. / Pique, D. / Pons, M. et al. | 2009
- 323
-
High-speed growth and characterization of polycrystalline AIN layers by high temperature chemical vapor deposition (HTCVD)Claudel, A. / Blanquet, E. / Chaussende, D. / Martin, R. / Pique, D. / Pons, M. et al. | 2009
- 327
-
Barium Titanate Thin Film Growth by Low-pressure Metalorganic Chemical Vapor DepositionSekine, T. / Okumura, Y. / Satou, A. / Akiyama, Y. et al. | 2009
- 333
-
Preparation of Strontium Titanate Film by Low Pressure Chemical Vapor DepositionKon, D. / Hashiba, K. / Kawashima, T. / Akiyama, Y. et al. | 2009
- 339
-
Formation of Silicon Nitride Layer on Microcrystalline Silicon Thin Films by Hot-wire Chemical Vapor Method using Nitrogen and Hydrogen GasesTabata, A. / Mazaki, K. / Kondo, A. et al. | 2009
- 343
-
PECVD BC~xN~y Films from Mixtures of N-trimethylborazine with Hydrogen and Ammonia: Modelling, Synthesis and CharacterizationSulyaeva, V. / Kosinova, M. / Golubenko, A. / Rumyantsev, Y. / Fainer, N.I. / Kuznetsov, F.A. et al. | 2009
- 349
-
In-Situ Infrared Spectroscopy of Hydrocarbons in a Pyrocarbon CVD ReactorKawase, M. / Ito, T. / Miura, K. et al. | 2009
- 357
-
Modeling of the Gas Dynamic Processes During the Ddeposition of Nanolayers on the Surface of Submicrometer Channels of Porous SolidsGolovnev, I.F. / Fomin, V. / Igumenov, I.K. / Kuchumov, B.M. et al. | 2009
- 365
-
Chemical Vapour Deposition of Metastable Ni~3NLindahl, E. / Ottosson, M. / Carlsson, J. et al. | 2009
- 373
-
Effect of Ozone on Deposition of Silicon Oxide Films from DecamethylcyclopentasiloxaneAlexandrov, S. / Filatov, L.A. / Speshilova, A. et al. | 2009
- 381
-
Effect of Ozone on Deposition of Titanium Oxide Films from TetraisopropoxideAlexandrov, S. / Filatov, L.A. / Protopopova, V. / Baryshnikova, M. et al. | 2009
- 389
-
CVD Flow Field Modeling Using the Quiet Direct Simulation (QDS) MethodCave, H. / Lim, C. / Jermy, M. / Wu, J.S. / Smith, M. / Krumdieck, S. et al. | 2009
- 397
-
In-Situ Investigation of the Processes of Precursor Adsorption by Means of Ellipsometry and Mass SpectrometryIgumenov, I.K. / Prozorov, P. / Semyannikov, P.P. / Zhukova, I.N. et al. | 2009
- 405
-
Characterization of High-Rate Deposited Microcrystalline Si Films Prepared using Atmospheric-Pressure Very High-Frequency PlasmaTabuchi, K. / Ouchi, K. / Ohmi, H. / Kakiuchi, H. / Yasutake, K. et al. | 2009
- 413
-
Texture and Residual Stress Analysis by XRD on Metastable Tetragonal Zirconia Films Obtained by MOCVDJouili, M. / Andrieux, M. / Gallet, I. / Prud Homme, N. / Ji, V. et al. | 2009
- 421
-
Predictable Simple Reaction Model for Poly-Silicon LPCVD ProcessKaneko, K. / Ogino, M. / Shimizu, R. / Shimogaki, Y. / Koshi, M. et al. | 2009
- 429
-
Impact of Small Deviations in EEDF on Silane-based Plasma ChemistryKovalgin, A. / Boogaard, A. / Wolters, R. et al. | 2009
- 437
-
Growth of ZnO Nanowires by MOCVD: Fundamental Role of the SubstrateTernon, C. / Rey, G. / Labeau, M. / Thire, N. / Jimenez, C. / Rapenne, L. / Bellet, D. et al. | 2009
- 445
-
An Ab Initio RRKM/Master Equation Investigation of SiH~4 and GeH~4 Decomposition Kinetics Using a Kinetic Monte Carlo ApproachCavallotti, C. / Polino, D. / Barbato, A. et al. | 2009
- 453
-
MOCVD of Epitaxial Alkali-Earth Fluorides Thin FilmsBlednov, A.V. / Gorbenko, O. / Samoilenkov, S. / Muydinov, R. / Kaul, A. et al. | 2009
- 459
-
Rapid Thermal (RT) MOCVD of Undoped and Al Doped ZnO Thin FilmsNebatti, A.E. / Pflitsch, C. / Eckert, C. / Atakan, B. et al. | 2009
- 467
-
Synthesis of ZnO- CeO~2 thin films by APCVDTorres-Huerta, A.M. / Dominguez-Crespo, M. / Brachetti-Sibaja, S. / Ramirez-Meneses, E. / Hernandez-Perez, M. et al. | 2009
- 475
-
Synthesis of Transparent ZrO~2 Thin Films by MOCVDCarcamo-Leon, P. / Torres-Huerta, A.M. / Dominguez-Crespo, M. / Ramirez-Meneses, E. et al. | 2009
- 483
-
Development of an Automatic Modeling System for Reaction Mechanisms in CVD ProcessesTakahashi, T. / Ema, Y. et al. | 2009
- 491
-
The Application of Advanced Spectroscopic Diagnostics with Chemometric Modelling to Optimise Thin Film Properties Grown by Atmospheric Pressure PECVDSawtell, D. / Sheel, D.W. / Martin, P.A. et al. | 2009
- 501
-
2D Species Concentration Mapping of Thermal AP-CVD Reactors for Monitoring, Control and DesignSawtell, D. / Kasiutsich, V. / Holdsworth, R. / Sheel, D.W. / Martin, P.A. et al. | 2009
- 507
-
Reaction Kinetics of GaN Metal-Organic Vapor-Phase Epitaxy Analyzed by Multi-Scale Profiles of Growth RateSugiyama, M. / Yasukochi, S. / Shioda, T. / Shimogaki, Y. / Nakano, Y. et al. | 2009
- 513
-
Epitaxial Heterostructures of KNbO~3/LaNiO~3/SrTiO~3 and KNbO~3/La~1~-~xKxMnO~3/SrTiO~3 : MOCVD preparation and propertiesKorsakov, I. / Mankevich, A. / Tsymbarenko, D. / Makarevich, A.M. / Murzina, T. / Kaul, A. et al. | 2009
- 521
-
In Situ Monitoring of the Initial Nucleation for the Formation of Uniform InGaAs Micro-discs on SiDeura, M. / Kondo, Y. / Hoshii, T. / Takenaka, M. / Takagi, S. / Nakano, Y. / Sugiyama, M. et al. | 2009
- 525
-
Low-temperature MOCVD of Epitaxial CaF~2 and SrF~2 FilmsMakarevich, A.M. / Shchukin, A. / Markelov, A. / Samoilenkov, S. / Semyannikov, P.P. / Kuzmina, N.P. et al. | 2009
- 533
-
Crystallization Process of Amorphous Silicon Utilizing A Radio Frequency Thermal Plasma TorchOta, N. / Haruta, K. / Shimizu, H. / Kobayashi, T. / Shirai, H. et al. | 2009
- 541
-
Deposition of WN~xC~y from the Tungsten Piperidylhydrazido Complex Cl~4(CH~3CN)W(N-pip) as a Single-source PrecursorKim, D. / Kim, O. / Ajmera, H. / Anderson, T.J. / Koller, J. / McElwee-White, L. et al. | 2009
- 549
-
Innovative M(Hfa)2·TMEDA (M=Cu, Co) Precursors for the CVD of Copper-Cobalt Oxides: an Integrated Theoretical and Experimental ApproachGasparotto, A. / Barreca, D. / Devi, A. / Fischer, R. / Fois, E. / Gamba, A. / Maccato, C. / Seraglia, R. / Tabacchi, G. / Tondello, E. et al. | 2009
- 557
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Thermal Properties of Some Volatile Titanium (IV) PrecursorsFilatov, E.S. / Nizard, H. / Semyannikov, P.P. / Sysoev, S.V. / Trubin, S.V. / Morozova, N.B. / Zherikova, K. / Gelfond, N.V. et al. | 2009
- 561
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MOCVD of Zirconium Oxide from the Zirconium Guanidinate Complex [ZrCp'{ eta ^2-(^iPrN)~2CNMe~2}~2Cl]Blackman, C. / Carmalt, C. / Moniz, S. / Potts, S.E. / Davies, H. / Pugh, D. et al. | 2009
- 567
-
On gaseous phase of ALD precursors by means of thermodynamicsViolet, P. / Nuta, I. / Chatillon, C. / Blanquet, E. et al. | 2009
- 575
-
Novel N-Containing Precursors of Nickel(II) for Film Deposition by MOCVDZherikova, K. / Morozova, N.B. / Kil metiev, A.S. / Zelenina, L.N. / Semyannikov, P.P. / Gelfond, N.V. / Chusova, T.P. / Igumenov, I.K. et al. | 2009
- 581
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CVD of Pure Copper Films from a Novel Amidinate PrecursorKrisyuk, V. / Aloui, L. / Prud Homme, N. / Sarapata, B. / Senocq, F. / Samelor, D. / Vahlas, C. et al. | 2009
- 587
-
Dimethylgallium Isopropoxide as a New Volatile Source for ALD and MOCVD of Ga~2O~3Lee, H. / Kim, K. / Woo, J. / Jun, D. / Park, Y. / Kim, Y. / Cho, Y. / Cho, H. et al. | 2009
- 593
-
Novel Precursors for the MOCVD of Molybdenum NitrideThiede, T. / Gwildies, V. / Alsamann, L. / Rische, D. / Fischer, R. et al. | 2009
- 601
-
Zinc Malonate Based Precursors for MOCVD of ZnOBekermann, D. / Pilard, D. / Fischer, R. / Devi, A. et al. | 2009
- 609
-
Alkylsilyl Compounds of Selenium and Tellurium: New Precursors for ALDHatanpaa, T. / Pore, V. / Ritala, M. / Leskela, M. et al. | 2009
- 617
-
MOCVD Of Gallium Oxide Thin Films Using Homoleptic Gallium Complexes: Precursor Evaluation and Thin Film CharacterisationHellwig, M. / Xu, K. / Barreca, D. / Gasparotto, A. / Niermann, B. / Winter, J. / Becker, H. / Rogalla, D. / Fischer, R. / Devi, A. et al. | 2009
- 625
-
Tuning the Thermal Properties of Hafnium Precursors by Tailoring the LigandsXu, K. / Milanov, A.P. / Devi, A. et al. | 2009
- 633
-
New Complexes of Alkali-Metals as Precursors for MOCVD of Ferroelectric (K, Na)NbO~3 Thin FilmsTsymbarenko, D. / Korsakov, I. / Mankevich, A. / Girichev, G. / Pelevina, E. / Kaul, A. et al. | 2009
- 641
-
Industrial Applications of Atomic Layer DepositionRitala, M. / Niinisto, J. et al. | 2009
- 653
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Low Pressure Chemical Vapor Deposition as a Tool for Deposition of Thin Film Battery MaterialsOudenhoven, J. / van Dongen, T. / Niessen, R. / de Croon, M. / Notten, P. et al. | 2009
- 659
-
A Conformal Oxide Linear for Through Silicon Vias by Pulsed SA-CVD DepositionSleeckx, E. / Schaekers, M. / Durr, E. et al. | 2009
- 667
-
Novel CVD Strategies and Novel Chemical Precursors Enabling Low Temperature Epitaxy of Si and Si:C AlloysBauer, M. / Thomas, S. et al. | 2009
- 679
-
Normal Pressure CVD - an Easy and Sustainable Method for Technical Surface FunctionalisationHeft, A. / Pfuch, A. / Horn, K. / Schimanski, A. et al. | 2009
- 685
-
Tungsten Coatings as a Protective Layer on Surfaces in Contact with Molten MetalsCosemans, P. / Lauwerens, W. / Mampaey, F. et al. | 2009
- 693
-
Amorphous Carbon Film Deposition for Hydrogen Barrier in FeRAM Integration by Radio Frequency Plasma Chemical Vapor Deposition MethodSaito, T. / Izumi, K. / Hirota, Y. / Okamoro, N. / Kondo, K. / Yoshimura, T. / Fujimura, N. et al. | 2009
- 701
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Large Area PECVD TechnologyChoi, S. / White, J.M. et al. | 2009
- 711
-
Characterization of Phosphorous and Boron Doped Silicon Oxynitride Prepared by Plasma Enhanced Chemical Vapor DepositionSun, F. / Sengo, G. / Driessen, A. / Worhoff, K. et al. | 2009
- 719
-
Multi-scale Simulations for Plasma Processing of Thin FilmsBhoj, A. / Shah, K. / Megahed, M. / Kathnur, P. / Kinder, R. et al. | 2009
- 727
-
Investigation of Optical Properties and Photoluminescence of Amorphous Silicon Carbide in a-SiC/Si~3N~4 Quantum Well Structures Fabricated by PECVD TechniqueKamyab, L. / Rusli / Yu, M. / He, L. / Dua, M. et al. | 2009
- 737
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Controlled Synthesis of Carbon Nanotubes by Various CVD and PECVD MethodsIonescu, M.I. / Liu, H. / Zhong, Y. / Zhang, Y. / Li, R. / Sun, X. / Kpetsu, J. / Cote, C. / Jedrzejowsk, P. / Sarkissian, A. et al. | 2009
- 749
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Influencing Factors towards a Scalable Synthesis of Aligned Carbon Nanotubes by Chemical Vapour DepositionNitodas, S.F. / Karachalios, T.K. et al. | 2009
- 757
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Long and Aligned Multi-Walled Carbon Nanotubes Grown on Carbon and Metallic Substrates by Injection-CVD ProcessDelmas, M. / Pinault, M. / Porterat, D. / Reynaud, C. / Mayne-L Hermite, M. et al. | 2009
- 763
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Vapor Phase Synthesis of Pt Nanoparticles on Carbon Nanotube-Active Carbon Hierarchical CompositesJin, C. / Holz, M. / Xia, W. / Mei, B. / Kundu, S. / Muhler, M. et al. | 2009
- 773
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Hybrid Aerosol Assisted Atmospheric Pressure Chemical Vapour Deposition: A Facile Route Toward Nano-Composite Thin Films?Saeli, M. / Piccirillo, C. / Parkin, I. / Binions, R. et al. | 2009
- 781
-
Effects of APCVD Growth Conditions on the Photocatalytic Behaviour of Titania FilmsYates, H.M. / Evans, P. / Sheel, D.W. et al. | 2009
- 789
-
Optimization of Solar Cell Performance using Atmospheric Pressure Chemical Vapour Deposition deposited TCOsYates, H.M. / Evans, P. / Sheel, D.W. / Hodgkinson, J.L. / Sheel, P. / Dagkaldiran, U. / Gordijn, A. / Finger, F. / Remes, Z. / Vanecek, M. et al. | 2009
- 797
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Silicon Oxynitride Layers Fabricated by Plasma Enhanced Chemical Vapor Deposition (PECVD) for CMOS DevicesMroczynski, R. / Beck, R. et al. | 2009
- 805
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Stabilized Zirconia-Based Materials for Solid Oxide Fuel Cells (SOFC) obtained by MOCVD and Aerosol-CVDEl Habra, N. / Bolzan, M. / De Zorzi, C. / Favaro, M. / Casarin, M. / Sada, C. / Rossetto, G. et al. | 2009
- 813
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Deposition of TiO~2 Films by Liquid Injection ALD using New Titanium 2,5-dimethylpyrrolyl ComplexesDavies, H. / Jones, A. / Black, K. / Bacsa, J. / Chalker, P. / Marshall, P.A. / Heys, P.N. / Afzaal, M. / O Brien, P. et al. | 2009
- 821
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TiO~2 Strelitzia-like Hybrid Nanocomposites Obtained by a Synergic Combination of Vapor TechniquesBattiston, S. / Bolzan, M. / Fabrizio, M. / Gerbasi, R. / Guerriero, P. / Miorin, E. / Mortalo, C. / Pagura, C. / Visentin, F. et al. | 2009
- 829
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Surface modification of PMMA with DLC using RF-PECVDBarhai, P.K. / Sharma, R. / Yadav, A. / Singh, A. / Gaur, H. / Buck, V. et al. | 2009
- 837
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AlGaN Multiple Quantum Wells and AlN Grown in a Hot-wall MOCVD for Deep UV ApplicationsHenry, A. / Lundskog, A. / Palisaitis, J. / Ivanov, I. / Kakanakova-Georgieva, A. / Forsberg, U. / Persson, P. / Janzen, E. et al. | 2009
- 845
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Comparative Study of SiN~x and BN~x Nanolayers Prepared by Different Chemical Vapor Deposition MethodsBeshkov, G. / Nedev, N. / Spassov, D. / Terrazas, J. / Salas, B. / Krastev, V. et al. | 2009
- 853
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Photocatalytic Activity Dependence on the Structural Orientation of MOCVD TiO~2 Anatase FilmsGerbasi, R. / Bolzan, M. / El Habra, N. / Rossetto, G. / Schiavi, L. / Strini, A. et al. | 2009
- 861
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Growth of Carbon Nanotube Layers in a Thermal CVD Reactor on Substrates Prepared by Catalyst Spray DepositionTraxler, M. / Haubner, R. et al. | 2009
- 865
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Resistive Switching in Metal Oxide Films Deposited by Metalorganic Chemical Vapor DepositionNakamura, T. / Onogi, K. / Homma, K. / Tachibana, K. et al. | 2009
- 871
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Deposition of Ir Nanostructured Thin Films by Pulse CVDGelfond, N.V. / Semyannikov, P.P. / Trubin, S.V. / Morozova, N.B. / Igumenov, I.K. et al. | 2009
- 875
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HfO~2-High-k Dielectric for NanoelectronicsSmirnova, T.P. / Kuznetsov, F.A. / Yakovkina, L. / Kaichev, V. / Kosyakov, V. / Lebedev, M. / Kichai, V. et al. | 2009
- 881
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Pulse CVD Deposition of Ru Films from Ru(II) eta 3-Allylic ComplexTrubin, S.V. / Morozova, N.B. / Semyannikov, P.P. / Bessonov, A. / Gelfond, N.V. / Igumenov, I.K. et al. | 2009
- 887
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Preparation of Iridium Thin Film by Pulse CVD from Ir(acac)(CO)~2Semyannikov, P.P. / Morozova, N.B. / Zherikova, K. / Trubin, S.V. / Igumenov, I.K. / Gelfond, N.V. et al. | 2009
- 893
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Initial Stages of Thermally and Hot-Wire Assisted CVD Copper on SiLK® and LTO Substrates Activated with Mercaptopropyl Triethoxysilane Self-Assembled MonolayersPapadimitropoulos, G. / Speliotis, T. / Arapoyianni, A. / Davazoglou, D. et al. | 2009
- 901
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Capacitance-Voltage Analysis of ZrO~2 Thin Films Deposited by Thermal MOCVD TechniqueMih, T.A. / Paul, S. / Milanov, A.P. / Bhakta, R. / Devi, A. et al. | 2009
- 909
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Low-Temperature VUV-Stimulated MO CVD Process of Palladium Layer DepositionKuchumov, B.M. / Koretskaya, T.P. / Shevtsov, Y.V. / Trubin, S.V. / Zharkova, G.I. / Danilovich, V.S. / Igumenov, I.K. / Kruchinin, V. et al. | 2009
- 917
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Selective Growth of Carbon Nanotubes on Printed Fe~3O~4 NanoparticlesHaubner, R. / Schwinger, W. / Dittert, B. / Schoftner, R. et al. | 2009
- 921
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Synthesis and Thermal Stability of Nanocomposite SiC~xN~y:H Films from Cycle Siliconorganic PrecursorFainer, N.I. / Rumyantsev, Y. / Kesler, V. / Maximovski, E. / Kuznetsov, F.A. et al. | 2009
- 927
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Pulsed MO CVD Processes of MgO Layer Deposition from Mg(thd)~2Kuchumov, B.M. / Shevtsov, Y.V. / Semyannikov, P.P. / Filatov, E.S. / Igumenov, I.K. et al. | 2009
- 935
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The Synthesis of Tantalum (V) Oxide Using Atmospheric Pressure Chemical Vapour Deposition for the Purposes of Photo-activated Water SplittingHyett, G. / Darr, J. / Mills, A. / Parkin, I. et al. | 2009
- 943
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Atmospheric Pressure Plasma Enhanced CVD of Fe NanoparticlesAlexandrov, S. / Kretusheva, I. / Mishin, M.V. et al. | 2009
- 953
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Dynamics of Pulsed DC Discharges Used for PACVD of a-C:H:SiTraxler, M. / Puchhammer, A. / Stori, H. / Muller, T. / Laimer, J. et al. | 2009
- 957
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Synthesis of ZnS Nanoparticles by Spray Pyrolysis: Morphology Control Using the Same Precursors in Different Reactor SystemsLiu, S. / Swihart, M.T. et al. | 2009
- 965
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Fabrication of ZnO thin film transistor by MO-CVD using Bis(acetylacetonato)zinc (II) Fiber and OzoneSakuma, M. / Seki, S. / Haga, K. et al. | 2009
- 973
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Exploring Multiple Precursors in Pulsed Pressure-MOCVDClearwater, D. / Hartshorn, R.M. / Krumdieck, S. et al. | 2009
- 979
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VUV-Stimulated MO CVD Processes of Copper Layer DepositionIgumenov, I.K. / Kuchumov, B.M. / Kozlova, S. / Koretskaya, T.P. / Trubin, S.V. / Sokuev, R. / Lyakh, V. / Kruchinin, V. et al. | 2009
- 987
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Pulsed-Pressure MOCVD Processing Investigation for TiO~2 Films on Si~3N~4 Substrate from TTIPSiriwongrungson, V. / Krumdieck, S. / Alkaisi, M. et al. | 2009
- 991
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Hierarchical Nanostructure Produced by Growing Carbon Nanotubes on Silicon Oxide NanowiresWoo, H. / Kim, J. / Choi, D. / Yoon, C.S. et al. | 2009
- 997
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Dynamic Study of Gas-Phase Species during Single-Walled Carbon Nanotubes Production by Chemical Vapor Deposition of EthanolKouravelou, K. / Verykios, X. et al. | 2009
- 1007
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A Single-Step APCVD Route to Novel Dual Functionality: Self-Cleaning Biocidal Titania-Copper FilmsEvans, P. / Ditta, I.B. / Foster, H. / Sheel, D.W. / Steele, A. / Yates, H.M. et al. | 2009
- 1007
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Single-step APCVD route to novel dual functionality: Self-cleaning biocidal titania-copper filmsEvans, P. / Ditta, I.B. / Foster, H.A. / Sheel, D.W. / Steele, A. / Yates, H.M. et al. | 2009
- 1015
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Deposition of Germanium Nanowires from Digermane Precursor: Influence of the Substrate PretreatmentDrinek, V. / Fajgar, R. / Klementova, M. / Subrt, J. et al. | 2009
- 1023
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ArF Laser-induced Deposition of Carbon Encapsulated CoFe NanoparticlesFajgar, R. / Bastl, Z. / Subrt, J. / Murafa, N. / Marysko, M. et al. | 2009
- 1031
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Strain Evaluation in SiC MEMS Test StructuresBosi, M. / Attolini, G. / Watts, B.E. / Frigeri, C. / Rossi, F. / Poggi, A. / Roncaglia, A. / Mancarella, F. / Martinez, O. / Hortelano, V. et al. | 2009
- 1039
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Silver Films Deposited by Liquid-Delivery MOCVD using (Tertbutylcarboxylate)(Triethylphosphine)Silver with Toluene as the SolventLisca, M. / Kalkofen, B. / Lisker, M. / Burte, E. / Szymanska, I. / Szlyk, E. et al. | 2009
- 1047
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Vertical Aligned Carbon Nanotube Deposition on Metallic Substrates by CVDDoerfler, S. / Meyer, A. / Althues, H. / Dani, I. / Kaskel, S. et al. | 2009
- 1053
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Shape Optimization of a Showerhead System for the Control of Growth Uniformity in a MOCVD Reactor Using CFD-based Evolutionary AlgorithmsXenidou, T.C. / Prud Homme, N. / Aloui, L. / Vahlas, C. / Markatos, N.C. / Boudouvis, A.G. et al. | 2009
- 1061
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Preparation of High Permittivity GdScO~3 Films by Liquid Injection MOCVDHusekova, K. / Jurkovic, M. / Cico, K. / Machajdik, D. / Dobrocka, E. / Luptak, R. / Mackova, A. / Frohlich, K. et al. | 2009
- 1065
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Plasma Composition and Kinetic Reaction Rates in a LEPECVD Ar-SiH~4-H~2 Plasma During nc-Si Films Deposition for Photovoltaic ApplicationssMoiseev, T. / Chrastina, D. / Isella, G. / Cavallotti, C. et al. | 2009
- 1073
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Memory Structures Based on the Self-organization of Cu Nanoparticles Deposited by Hot-Wire CVD on Polythiophene LayersDimitrakis, P. / Papadimitropoulos, G. / Palilis, L. / Vasilopoulou, M. / Normand, P. / Argitis, P. / Davazoglou, D. et al. | 2009
- 1081
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Doped Iron Oxide Thin Films for Photoelectrochemical Generation of Hydrogen from WaterSheel, D.W. / Lewis, J. / Robinson, A. / Yates, H.M. et al. | 2009
- 1087
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Combination of Electron or Laser Beam Irradiation with High Vacuum Chemical Vapor Deposition (HV-CVD) of Al~2O~3 for in-situ Local Structuring on Wafer Scale SubstrateKuzminykh, Y. / Multone, X. / Hoffmann, P. et al. | 2009
- 1093
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Tailoring of Optical Properties of Alumina films deposited by High Vacuum CVD (HV-CVD)Multone, X. / Afra, B. / Kuzminykh, Y. / Hoffmann, P. et al. | 2009
- 1099
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Combustion-Driven Synthesis of Non-Oxide Nanoparticles in a High Temperature Reducing JetScharmach, W.J. / Papavassiliou, V. / Pacouloute, P. / Buchner, R. / Swihart, M.T. et al. | 2009
- 1107
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Thin Films of Tb(pobz)~3 (Hpobz=2-phenoxybenzoic acid): Reactive CVD and Optical PropertiesKotova, O. / Utochnikova, V. / Samoilenkov, S. / Kuzmina, N.P. et al. | 2009
- 1115
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Local Area Deposition of SiOC Films by using a Very-high-frequency Atmospheric Pressure Microplasma Jet from TetraethoxysilaneDing, Y. / Kobayashi, T. / Jia, H. / Shirai, H. et al. | 2009
- 1121
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ZrO~2 Thin Films Grown on 2D and 3D Silicon Surfaces by DLI-MOCVD for Electronic DevicesGalicka-Fau, K. / Andrieux, M. / Legros, C. / Herbst-Ghysel, M. / Gallet, I. / Brunet, M. / Scheid, E. / Schamm, S. et al. | 2009
- 1129
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Phase Change Memory using InSbTe Chalcogenide Materials Deposited by Metal-organic Chemical Vapor DepositionAhn, J. / Park, K. / Jung, H. / Pammi, S. / Hur, S. / Yoon, S. et al. | 2009
- 1135
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Processing and Characterization of Nanocomposite Coatings using Aerosol-assisted Chemical Vapor Deposition (AACVD) MethodHou, X. / Choy, K. / Serin, V. / Fleischer, N. et al. | 2009
- 1145
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Growth Mechanisms and Size-Dependent Characteristics of Si and Si~1~-~xGe~x NanowiresRedwing, J.M. / Nimmatoori, P. / Lew, K. / Zhang, X. / Zhang, Q. / Clark, T. / Pan, L. / Dickey, E. et al. | 2009
- 1153
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Preparation and Functional Characterizations of Ta~2O~5 Deposits Organized at the Micro- and Nano-scaleTerranova, M. / Guglielmotti, V. / Orlanducci, S. / Sessa, V. / Tamburri, E. / Rossi, M. et al. | 2009
- 1159
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Chemical Vapor Deposition of Silica Nanowires using Heteroleptic Bis(ethylmethylamino)silane PrecursorKim, H. / Park, S. / Heo, J. et al. | 2009
- 1169
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Multi-Functional Copper Oxide Nanosystems for H~2 Sustainable Production and SensingGasparotto, A. / Barreca, D. / Fornasiero, P. / Gombac, V. / Lebedev, O. / Maccato, C. / Montini, T. / Tondello, E. / van Tendeloo, G. / Comini, E. et al. | 2009
- 1177
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CVD Synthesis of Shape and Size Controlled ZnO Nanoparticles for Application as UV FiltersBacsa, R.R. / Sienkiewicz, A. / Pierzchala, K. / Dexpert-Ghys, J. / Forro, L. / Serp, P. et al. | 2009
- 1185
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MOCVD Grown Thin Film Nanocomposites Based on YBCO with Columnar Defects Comprised of Self-Assembled InclusionsBoytsova, O.V. / Samoilenkov, S. / Vasiliev, A. / Kaul, A. / Kalinov, A. / Voloshin, I. et al. | 2009
- 1193
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Supercritical Chemical Fluid Deposition of High Quality Compound SemiconductorsAfzaal, M. / Aksomaityte, G. / O Brien, P. / Cheng, F. / George, M. / Hector, A. / Howdle, S. / Hyde, J. / Levason, W. / Malik, M. et al. | 2009
- 1199
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Comparative Study on the Step Coverage Quality of Cu Film by SCFD and CVDShimogaki, Y. / Momose, T. / Sugiyama, M. et al. | 2009
- 1209
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Pulsed-Pressure MOCVD Science, Materials and TechnologyKrumdieck, S. et al. | 2009
- 1221
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Combinatorial Chemical Vapor Deposition of Lithium Niobate Thin FilmsDabirian, A. / Kuzminykh, Y. / Sandu, S. / Wagner, E. / Benvenuti, G. / Parsons, C. / Rushworth, S. / Hoffmann, P. et al. | 2009
- 1229
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Initiated Chemical Vapor Deposition (iCVD) of Hydrogel PolymersBose, R. / Nejati, S. / Lau, K.K. et al. | 2009
- 1239
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Combinatorial CVD: New Oxy-nitride PhotocatalystsParkin, I. / Kafizas, A. / Dunnill, C.W. / Hyett, G. et al. | 2009
- 1251
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Liquid Droplet Evaporation in Simulations of the Flow in Pulsed-Pressure MOCVDLim, C. / Cave, H. / Jermy, M. / Krumdieck, S. et al. | 2009
- 1259
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Influence of the Heating Mode and the Spray Introduction on Chemically Vapour Deposited Aluminium Doped Zinc Oxide Thin FilmsGarnier, J. / Sreekumar, R. / Bouteville, A. et al. | 2009
- 1267
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Study of TiC Coatings on Nicalon Fibre Prepared by Pressure-Pulsed Reactive Chemical Vapour Deposition at Low PressureJouanny, I. / Jacques, S. / Weisbecker, P. / Rufino, B. / Maille, L. / Pailler, R. et al. | 2009
- 1275
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Fibre-scale Modeling of C/C Processing by Chemical Vapour Infiltration using Xray CMT Images and Random WalkersVignoles, G.L. / Germain, C. / Coindreau, O. / Mulat, C. / Ros, W. et al. | 2009
- 1285
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Fabrication of Micro- and Nano-electrodes by Selective Chemical Vapor Deposition of Cu on Si Substrates Patterned with AZ5214™ and PMMAPapadimitropoulos, G. / Cibella, S. / Leoni, R. / Arapoyianni, A. / Davazoglou, D. et al. | 2009
- 1293
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Dy^3^+:Al~2O~3 and (Dy^3^++Cr^3^+): Al~2O~3 Films for Temperature Sensor Applications Derived by Thermal CVD and Sol-Gel TechniquesEckert, C. / Pflitsch, C. / Atakan, B. et al. | 2009
- 1301
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Mass Spectrometry as a Tool to Study MOCVD ProcessTurgambaeva, A.E. / Krisyuk, V. / Prud Homme, N. / Vahlas, C. et al. | 2009
- 1309
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Residual Stress Mechanisms in Aluminium Oxide Films Grown by MOCVDSoni, S. / Samelor, D. / Sheldon, B.W. / Vahlas, C. / Gleizes, A.N. et al. | 2009