A fast approach to model EUV mask 3D and shadowing effects [8352-23] (English)
- New search for: Li, Y.
- New search for: Peng, D.
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- New search for: Li, Y.
- New search for: Peng, D.
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In:
European mask and lithography conference
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8352 07
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2012
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ISBN:
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ISSN:
- Conference paper / Print
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Title:A fast approach to model EUV mask 3D and shadowing effects [8352-23]
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Contributors:Li, Y. ( author ) / Peng, D. ( author ) / Satake, M. ( author ) / Hu, P. ( author ) / Behringer, Uwe F. W. / Maurer, Wilhelm / SPIE (Society)
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Conference:28th, European mask and lithography conference ; 2012 ; Dresden, Germany
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Published in:European mask and lithography conference ; 8352 07PROCEEDINGS- SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING ; 8352 ; 8352 07
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Publisher:
- New search for: SPIE
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Place of publication:Bellingham, Wash.
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Publication date:2012-01-01
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Size:8352 07
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Remarks:Includes bibliographical references and index. Twenty-eighth European Mask and Lithography Conference. EMLC2012. European Mask and Lithography Conference 2012.
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ISBN:
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ISSN:
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Type of media:Conference paper
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Type of material:Print
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Language:English
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Keywords:
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Source:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Table of contents conference proceedings
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 83520A
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Correcting image placement errors using registration control (RegC) technology in the photomask peripheryCohen, Avi / Lange, Falk / Ben-Zvi, Guy / Graitzer, Erez / Dmitriev, Vladimir et al. | 2012
- 83520B
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Optimization method of photolithography process by means of atomic force microscopySierakowski, Andrzej / Janus, Paweł / Kopiec, Daniel / Nieradka, Konrad / Domanski, Krzysztof / Grabiec, Piotr / Gotszalk, Teodor et al. | 2012
- 83520C
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Investigation and mitigation of field-edge CDU fingerprint for ArFi lithography for 45-nm to sub-28-nm logic nodesLe-Gratiet, Bertrand / Finders, Jo / Mouraille, Orion / Queens, Rene / Escalante, Maryana / Smeets, Bart / Beltman, Jan / Jullian, Karine et al. | 2012
- 83520D
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Double exposure as a method to correct on-wafer CD variations: a proposalHotzel, Arthur / Bald, Holger et al. | 2012
- 83520E
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Lithographic aspects for the fabrication of BiCMOS embedded bio-MEMS and RF-MEMSKulse, P. / Birkholz, M. / Ehwald, K.-E. / Kaynak, M. / Wietstruck, M. / Bauer, J. / Drews, J. / Schulz, K. et al. | 2012
- 83520F
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MEMS: fabrication of cryogenic bolometersKunert, J. / Anders, S. / May, T. / Zakosarenko, V. / Zieger, G. / Kreysa, E. / Meyer, H.-G. et al. | 2012
- 83520G
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Impact of reticle absorber on the imaging properties in ArFi lithographyFinders, Jo / Mouraille, O. / Bouma, A. / Ngai, A. / Grim, K. / van Praagh, J. / Toma, C. / Miyazaki, J. / Higuchi, M. / Kojima, Y. et al. | 2012
- 83520H
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PSM and thin OMOG reticles aerial imaging metrology comparison studyCohen, Yaron / Finders, Jo / Mangan, Shmoolik / Englard, Ilan / Mouraille, Orion / Janssen, Maurice / Miyazaki, Junji / Connolly, Brid / Kojima, Yosuke / Higuchi, Masaru et al. | 2012
- 83520I
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Pointwise process proximity function calibration: PPFexplorer application resultsKrueger, M. / Banasch, M. / Galler, R. / Melzer, D. / Ramos, L. E. / Suelzle, M. / Weidenmueller, U. / Zeitner, U. et al. | 2012
- 83520J
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Mask write time reduction: deployment of advanced approaches and their impact on established work modelsSchulze, S. F. / Elayat, A. / Lin, T. / Sahouria, E. et al. | 2012
- 83520K
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Improvements on Corner2, a lossless layout image compression algorithm for maskless lithography systemsYang, Jeehong / Savari, Serap A. et al. | 2012
- 83520M
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Enhanced e-beam pattern writing for nano-optics based on character projectionKley, E.-Bernhard / Schmidt, Holger / Zeitner, Uwe / Banasch, Michael / Schnabel, Bernd et al. | 2012
- 83520N
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A novel tool for frequency assisted thermal nanoimprint (T-NIL)Mayer, Andre / Dhima, Khalid / Möllenbeck, Saskia / Wang, Si / Scheer, Hella-Christin et al. | 2012
- 83520O
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Nanoimprint activities in Austria in the research project cluster NILaustriaMühlberger, Michael / Fachberger, Hannes / Bergmair, Iris / Rohn, Michael / Dittert, Bernd / Schöftner, Rainer / Rothländer, Thomas / Nees, Dieter / Palfinger, Ursula / Haase, Anja et al. | 2012
- 83520P
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Phase-shift at subwavelength holographic lithography (SWHL)Borisov, Mikhail V. / Chelyubeev, Dmitriy A. / Chernik, Vitalij V. / Gavrikov, Alexander A. / Knyazkov, Dmitriy Yu. / Mikheev, Petr A. / Rakhovsky, Vadim I. / Shamaev, Alexey S. et al. | 2012
- 83520Q
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High quality mask storage in an advanced Logic-FabJähnert, Carmen / Fritsche, Silvio et al. | 2012
- 83520R
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Through pellicle management of haze formation in a wafer fabrication environmentFigliolini, Alexander / Archuletta, Michael / LeClaire, Jeff / Brinkley, David / Doerr, David / White, Roy / Bozak, Ron / Lee, David A. et al. | 2012
- 83520S
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Cleaning aspects of material choice for high end mask manufacturingNesladek, Pavel / Osborne, Steve / Rümmelin, Stefan et al. | 2012
- 83520T
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The effect of puddle megasonic cleaning for advanced photomask with subresolution assist features (SRAFs)Chen, Ming-Chih / Yang, Hsiang-Jen / Tseng, Chen-Rui et al. | 2012
- 83520U
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Integrated cleaning and handling automation of NXE3100 reticlesJonckheere, Rik / Waehler, Tobias / Baudemprez, Bart / Dietze, Uwe / Dress, Peter / Brux, Oliver / Ronse, Kurt et al. | 2012
- 83520V
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Towards the optical inspection sensitivity optimization of EUV masks and EUVL-exposed wafersOkoroanyanwu, U. / Heumann, J. / Zhu, X. / Clifford, C. H. / Jiang, F. / Mangat, P. / Ghaskadavi, R. / Mohn, E. / Moses, R. / Wood, O. et al. | 2012
- 83520W
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EUV mask defects and their removalRastegar, Abbas / Jindal, Vibhu et al. | 2012
- 83520X
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EUVL defect printability: an industry challengeKwon, Hyuk Joo / Teki, Ranganath / Harris-Jones, Jenah / Cordes, Aaron et al. | 2012
- 83520Y
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Advanced metrology techniques for the characterization of EUV mask blank defectsHarris-Jones, Jenah / Jindal, Vibhu / Lin, C. C. / Chakraborty, Tonmoy / Stinzianni, Emilio / Teki, Ranganath / Kwon, Hyuk Joo et al. | 2012
- 835201
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Front Matter: Volume 8352| 2012
- 835202
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Nanometer-level semiconductor imaging for micrometer-level MEMSLin, Burn J. et al. | 2012
- 835203
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Mask industry assessment trend analysis: 2012Chan, Y. David et al. | 2012
- 835204
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Mask readiness for EUVL pilot lineHayashi, Naoya / Abe, Tsukasa / Takikawa, Tadahiko et al. | 2012
- 835205
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NXE:3100 full wafer imaging performance and budget verificationvan Setten, Eelco / van Ingen Schenau, Koen / O'Mahony, Mark / Hollink, Thijs / Wittebrood, Friso / Davydova, Natalia / Eurlings, Mark / Feenstra, Kees / Finders, Jo / Dusa, Mircea et al. | 2012
- 835207
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A fast approach to model EUV mask 3D and shadowing effectsLi, Ying / Peng, Danping / Satake, Masaki / Hu, Peter et al. | 2012
- 835208
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EUVL mask performance and optimizationDavydova, Natalia / de Kruif, Robert / van Setten, Eelco / Connolly, Brid / Mehagnoul, Karolien / Zimmerman, John / Harned, Noreen / Kalk, Franklin et al. | 2012
- 835209
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AIMS D2DB simulation for DUV and EUV mask inspectionPeng, Danping / Li, Ying / Satake, Masaki / Hu, Peter / Chen, Jerry / Hsu, S. C. / Lai, Rick / Lin, C. S. / Tuo, Laurent C. C. et al. | 2012
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Impact of reticle absorber on the imaging properties in ArFi lithography (Invited Paper) [8352-03]Finders, J. / Mouraille, O. / Bouma, A. / Ngai, A. / Grim, K. / van Praagh, J. / Toma, C. / Miyazaki, J. / Higuchi, M. / Kojima, Y. et al. | 2012
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AIMS D2DB simulation for DUV and EUV mask inspection [8352-18]Peng, D. / Li, Y. / Satake, M. / Hu, P. / Chen, J. / Hsu, S.C. / Lai, R. / Lin, C.S. / Tuo, L.C.C. / SPIE (Society) et al. | 2012
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Investigation and mitigation of field-edge CDU fingerprint for ArFi lithography for 45-nm to sub-28-nm logic nodes [8352-10]Le-Gratiet, B. / Finders, J. / Mouraille, O. / Queens, R. / Escalante, M. / Smeets, B. / Beltman, J. / Jullian, K. / SPIE (Society) et al. | 2012
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Through pellicle management of haze formation in a wafer fabrication environment [8352-07]Figliolini, A. / Archuletta, M. / LeClaire, J. / Brinkley, D. / Doerr, D. / White, R. / Bozak, R. / Lee, D.A. / SPIE (Society) et al. | 2012
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EUVL defect printability: an industry challenge [8352-26]Kwon, H.J. / Teki, R. / Harris-Jones, J. / Cordes, A. / SPIE (Society) et al. | 2012
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MEMS: fabrication of cryogenic bolometers [8352-34]Kunert, J. / Anders, S. / May, T. / Zakosarenko, V. / Zieger, G. / Kreysa, E. / Meyer, H.-G. / SPIE (Society) et al. | 2012
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PSM and thin OMOG reticles aerial imaging metrology comparison study [8352-12]Cohen, Y. / Finders, J. / Mangan, S. / Englard, I. / Mouraille, O. / Janssen, M. / Miyazaki, J. / Connolly, B. / Kojima, Y. / Higuchi, M. et al. | 2012
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Mask readiness for EUVL pilot line (Invited Paper) [8352-28]Hayashi, N. / Abe, T. / Takikawa, T. / SPIE (Society) et al. | 2012
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Optimization method of photolithography process by means of atomic force microscopy [8352-05]Sierakowski, A. / Janus, P. / Kopiec, D. / Nieradka, K. / Domanski, K. / Grabiec, P. / Gotszalk, T. / SPIE (Society) et al. | 2012
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Mask write time reduction: deployment of advanced approaches and their impact on established work models [8352-33]Schulze, S.F. / Elayat, A. / Lin, T. / Sahouria, E. / SPIE (Society) et al. | 2012
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Integrated cleaning and handling automation of NXE3100 reticles (Invited Paper) [8352-31]Jonckheere, R. / Waehler, T. / Baudemprez, B. / Dietze, U. / Dress, P. / Brux, O. / Ronse, K. / SPIE (Society) et al. | 2012
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Advanced metrology techniques for the characterization of EUV mask blank defects [8352-24]Harris-Jones, J. / Jindal, V. / Lin, C.C. / Chakraborty, T. / Stinzianni, E. / Teki, R. / Kwon, H.J. / SPIE (Society) et al. | 2012
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Double exposure as a method to correct on-wafer CD variations: a proposal [8352-32]Hotzel, A. / Bald, H. / SPIE (Society) et al. | 2012
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Improvements on Corner2, a lossless layout image compression algorithm for maskless lithography systems [8352-30]Yang, J. / Savari, S.A. / SPIE (Society) et al. | 2012
-
A novel tool for frequency assisted thermal nanoimprint (T-NIL) [8352-06]Mayer, A. / Dhima, K. / Mollenbeck, S. / Wang, S. / Scheer, H.-C. / SPIE (Society) et al. | 2012
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Cleaning aspects of material choice for high end mask manufacturing [8352-16]Nesladek, P. / Osborne, S. / Rummelin, S. / SPIE (Society) et al. | 2012
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The effect of puddle megasonic cleaning for advanced photomask with subresolution assist features (SRAFs) [8352-20]Chen, M.-C. / Yang, H.-J. / Tseng, C.-R. / SPIE (Society) et al. | 2012
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Mask industry assessment trend analysis: 2012 (Invited Paper) [8352-36]Chan, Y.D. / SPIE (Society) et al. | 2012
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EUVL mask performance and optimization [8352-19]Davydova, N. / de Kruif, R. / van Setten, E. / Connolly, B. / Mehagnoul, K. / Zimmerman, J. / Harned, N. / Kalk, F. / SPIE (Society) et al. | 2012
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Phase-shift at subwavelength holographic lithography (SWHL) [8352-02]Borisov, M.V. / Chelyubeev, D.A. / Chernik, V.V. / Gavrikov, A.A. / Knyazkov, D.Y. / Mikheev, P.A. / Rakhovsky, V.I. / Shamaev, A.A. / SPIE (Society) et al. | 2012
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EUV mask defects and their removal [8352-37]Rastegar, A. / Jindal, V. / SPIE (Society) et al. | 2012
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Lithographic aspects for the fabrication of BiCMOS embedded bio-MEMS and RF-MEMS [8352-04]Kulse, P. / Birkholz, M. / Ehwald, K.-E. / Kaynak, M. / Wietstruck, M. / Bauer, J. / Drews, J. / Schulz, K. / SPIE (Society) et al. | 2012
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Correcting image placement errors using registration control (RegC) technology in the photomask periphery (Best Paper of EMLC 2012) [8352-11]Cohen, A. / Lange, F. / Ben-Zvi, G. / Graitzer, E. / Dmitriev, V. / SPIE (Society) et al. | 2012
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High quality mask storage in an advanced Logic-Fab [8352-27]Jahnert, C. / Fritsche, S. / SPIE (Society) et al. | 2012
-
A fast approach to model EUV mask 3D and shadowing effects [8352-23]Li, Y. / Peng, D. / Satake, M. / Hu, P. / SPIE (Society) et al. | 2012
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Pointwise process proximity function calibration: PPFexplorer application results [8352-17]Krueger, M. / Banasch, M. / Galler, R. / Melzer, D. / Ramos, L.E. / Suelzle, M. / Weidenmueller, U. / Zeitner, U. / SPIE (Society) et al. | 2012
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Enhanced e-beam pattern writing for nano-optics based on character projection [8352-15]Kley, E.-B. / Schmidt, H. / Zeitner, U. / Banasch, M. / Schnabel, B. / SPIE (Society) et al. | 2012
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Nanometer-level semiconductor imaging for micrometer-level MEMS (Keynote Paper) [8352-100]Lin, B.J. / SPIE (Society) et al. | 2012
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NXE:3100 full wafer imaging performance and budget verification [8352-09]van Setten, E. / van Ingen Schenau, K. / O Mahony, M. / Hollink, T. / Wittebrood, F. / Davydova, N. / Eurlings, M. / Feenstra, K. / Finders, J. / Dusa, M. et al. | 2012
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Nanoimprint activities in Austria in the research project cluster NILaustria [8352-21]Muhlberger, M. / Fachberger, H. / Bergmair, I. / Rohn, M. / Dittert, B. / Schoftner, R. / Rothlander, T. / Nees, D. / Palfinger, U. / Haase, A. et al. | 2012
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Towards the optical inspection sensitivity optimization of EUV masks and EUVL-exposed wafers [8352-29]Okoroanyanwu, U. / Heumann, J. / Zhu, X. / Clifford, C.H. / Jiang, F. / Mangat, P. / Ghaskadvi, R. / Mohn, E. / Moses, R. / Wood, O. et al. | 2012