Advanced high order field-to-field modeling for wafer edge control (English)
- New search for: Habets, Boris
- New search for: Buhl, Stefan
- New search for: Kim, Wan-Soo
- New search for: Lomtscher, Patrick
- New search for: Bald, Holger
- New search for: Hoeer, Tobias
- New search for: Habets, Boris
- New search for: Buhl, Stefan
- New search for: Kim, Wan-Soo
- New search for: Lomtscher, Patrick
- New search for: Bald, Holger
- New search for: Hoeer, Tobias
In:
Optical Microlithography XXXIII
;
113270U-113270U-20
;
2020
-
ISBN:
-
ISSN:
- Conference paper / Print
-
Title:Advanced high order field-to-field modeling for wafer edge control
-
Contributors:Habets, Boris ( author ) / Buhl, Stefan ( author ) / Kim, Wan-Soo ( author ) / Lomtscher, Patrick ( author ) / Bald, Holger ( author ) / Hoeer, Tobias ( author )
-
Conference:Optical Microlithography XXXIII
-
Published in:Optical Microlithography XXXIII ; 113270U-113270U-20Proceedings of SPIE, the International Society for Optical Engineering ; 11327 ; 113270U-113270U-20
-
Publisher:
- New search for: SPIE
-
Publication date:2020-01-01
-
Size:113270U-113270U-20
-
ISBN:
-
ISSN:
-
Type of media:Conference paper
-
Type of material:Print
-
Language:English
-
Source:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Table of contents conference proceedings
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 113270A
-
Physics based feature vector design: a critical step towards machine learning based inverse lithographyShi, Xuelong / Zhao, Yuhang / Chen, Shoumian / Li, Chen et al. | 2020
- 113270B
-
Accurate etch modeling with massive metrology and deep-learning technologyLu, Yifei / Zhao, Yuhang / Li, Ming / Yuan, Wei / Peng, Xiang / Hu, Hongmei / Yao, Shuxin / Liu, Zhunhua / Tian, Yu / Gao, Ying et al. | 2020
- 113270C
-
SRAF printing prediction using artificial neural networkKwon, Yonghwi / Yang, Jinho / Kim, Sungho / Kim, Cheolkyun / Shin, Youngsoo et al. | 2020
- 113270D
-
Improving ORC methods and hotspot detection with the usage of aerial images metrologyWeisbuch, Francois / Thaler, Thomas / Buttgereit, Ute / Stötzel, Christian / Zeuner, Thomas et al. | 2020
- 113270F
-
Fast all-angle Mask 3D for ILT patterningPearman, Ryan / Meyer, Mike / Ungar, Jeff / Yu, Henry / Pang, Leo / Fujimura, Aki et al. | 2020
- 113270G
-
Resist shrinkage during development: rigorous simulations and first compact model for OPCGranik, Yuri / Khaira, Daman et al. | 2020
- 113270H
-
Compact resist model using single convolution kernelKimura, Taiki / Matsunawa, Tetsuaki / Mimotogi, Shoji et al. | 2020
- 113270I
-
Rigorous simulation of implant resist on topographic waferSchatz, Jirka / Küchler, Bernd / Hoppe, Wolfgang / Tsamados, Dimitrios et al. | 2020
- 113270J
-
Rigorous vase data fitting for ultrathin filmsZhu, Zhimin / Lowes, Joyce / Ye, Shawn / Fan, Zhiqiang / Collins, Darin / Lamb, James / Limmer, Tim et al. | 2020
- 113270K
-
TrueMask ILT MWCO: full-chip curvilinear ILT in a day and full mask multi-beam and VSB writing in 12 hrs for 193iPang, Linyong (Leo) / Ungar, P. Jeffrey / Bouaricha, Ali / Sha, Lu / Pomerantsev, Michael / Niewczas, Mariusz / Wang, Kechang / Su, Bo / Pearman, Ryan / Fujimura, Aki et al. | 2020
- 113270M
-
Divided spectrum illumination for high resolution flat panel display exposure toolsHakko, Manabu / Suzuki, Kanji / Takasaki, Koichi / Ando, Miwako / Nagano, Kouhei / Izumi, Nozomu et al. | 2020
- 113270N
-
Investigating the fine line lithography process on the large-size organic panels for advanced packaging and developmentSohara, Naoya / Takahashi, Ryotaro / Takamatsu, Hirosuke et al. | 2020
- 113270O
-
Accuracy improvement in advance lithography focus controlHsu, Chris / Yang, Dongyue / Dineen, Cassidy / Hao, Xueli / Kim, Young Ki / Hsu, Poya / Morgenfeld, Bradley et al. | 2020
- 113270S
-
Holistic alignment approach for on-product overlay improvement on DUV lithography process with combined solutionsMa, Jigang / Yu, Miao / Lambregts, Cees / Tsiachris, Sotirios / Böcker, Paul / Kim, Jun-Yeob / Ma, Won-Kwang / Han, Sang-Jun / Park, Chan-Ha / Kim, Kyong-Seok et al. | 2020
- 113270T
-
A novel projection lens manipulator for high frequent overlay tuningPollak, Thilo / Emer, Wolfgang / Thüring, Bernd / Fahrni, Francis / Klinkhamer, Friso / de Boeij, Wim / Bouman, Wim et al. | 2020
- 113270U
-
Advanced high order field-to-field modeling for wafer edge controlHabets, Boris / Buhl, Stefan / Kim, Wan-Soo / Lomtscher, Patrick / Bald, Holger / Hoeer, Tobias et al. | 2020
- 113270V
-
Application of intra-field alignment to reduce wafer-to-wafer variationKim, Jangsun / Lee, Seonho / Ha, Hyunjun / Habets, Boris / Bellmann, Enrico / Bald, Holger / Hoeer, Tobias / Kim, Seop et al. | 2020
- 113270W
-
Novel overlay correction using inline alignment station (iAS) for scannerKikuchi, Takahisa / Sugimoto, Ayako / Eto, Shigeru / Okutomi, Akira / Morita, Naoki et al. | 2020
- 113270X
-
Improvement of SADP CD control in 7nm BEOL applicationLin, Qi / Hisamura, Toshiyuki / Chong, Nui / Chang, Jonathan et al. | 2020
- 113270Y
-
Through-the-mask (TTM) optical alignment for high volume manufacturing nanoimprint lithography systemsKomaki, Takamitsu / Unno, Yasuyuki / Matsumoto, Takahiro / Iwai, Toshiki / Hayashi, Nozomu / Taki, Tomokazu / Kawashima, Tohru / Iino, Satoshi / Hirai, Shinichirou / Minoda, Ken et al. | 2020
- 113270Z
-
Design and fabrication of UVLED array aligner for proximity and soft contact exposureHuang, Jiun-Woei et al. | 2020
- 113271A
-
Target recovery process optimization to improve image based overlay performance for critical recording head manufacturing processesLiu, Yi / Yu, Dan / Bowser, Aaron et al. | 2020
- 113271B
-
KrF excimer laser-based patterning system for dual applications in both lithography and ablationSantillan, Julius Joseph / Uemori, Nobutaka / Yamaoka, Hiroshi / Itani, Toshiro et al. | 2020
- 113271C
-
Evaluating and correcting pattern variability induced by OPC within regular array layoutGardin, C. / La Greca, R. / Pena, J. N. / Depre, L. / Sungauer, E. et al. | 2020
- 1132701
-
Front Matter: Volume 11327| 2020
- 1132705
-
Pixelated mask optimization on quantum computersOkudaira, Yosuke / Yashiki, Satoshi et al. | 2020
- 1132706
-
Establishing fast, practical, full-chip ILT flows using machine learningCecil, Thomas / Braam, Kyle / Omran, Ahmed / Poonawala, Amyn / Shu, Jason / Vandam, Clark et al. | 2020
- 1132707
-
Mask synthesis using machine learning software and hardware platformsLiu, Peng et al. | 2020
- 1132709
-
Model based CAOPC flow for memory chips to improve performance and consistency of RET solutionsJayaram, Srividya / Hany Mousa, Sherif / Rathi, Ashutosh / LaCour, Pat / Zheng, Zhenguo / Zhang, Lei / Feng, Yaobin / Yao, Jun et al. | 2020
- 1132711
-
Proteus SMO for process window improvementChen, Kun-Yuan / Lan, Andy / Yang, Richer / Liu, Jing Jing / Xu, Ting Ting / Lin, Cheng-Shuan / Ding, Hua / Lee, Chih-Jie / Dam, Thuc / Jia, Jianjun et al. | 2020
- 1132712
-
Advanced spectral engineering: Lithography performance improvements by high performance light sourceFujii, Kouichi / Kumazaki, Takahito / Hattori, Masakazu / Fujimaki, Yosuke / Oga, Toshihiro / Kakizaki, Kouji / Fujimoto, Junichi / Mizoguchi, Hakaru et al. | 2020
- 1132713
-
Approach for lightsource utilization improvement by extending Preventive Maintenance (PM) cycle along with performance monitoring featureSato, Futoshi / Hu, Sophia / Oga, Toshihiro / Yamazaki, Taku et al. | 2020
- 1132716
-
Comparison of different lithographic source optimization methods based on compressive sensingWang, Zhiqiang / Ma, Xu / Chen, Rui / Arce, Gonzalo R. / Dong, Lisong / Stock, Hans-Juergen / Wei, Yayi et al. | 2020
- 1132717
-
Imaging performance enhancement by improvements of spectral performance stability and controllability on the cutting-edgeIgarashi, Miwa / Miyamoto, Hirotaka / Katou, Masahide / Tsushima, Hiroaki / Moriya, Masato / Kurosu, Akihiko / Tanaka, Hiroshi / Tanaka, Satoshi / Ohta, Takeshi / Bushida, Satoru et al. | 2020
- 1132719
-
Fast algorithm of the scanning lithographic metrics based on a quadratic imaging model and an integral transfer functionYang, Zhiyong / Chen, Xiuguo / Shi, Yating / Jiang, Hao / Liu, Shiyuan et al. | 2020