Lattice disorder and texture in diamond coatings deposited by HFCVD on Co-cemented tungsten carbide (English)
- New search for: Scardi, P.
- New search for: Veneri, S.
- New search for: Leoni, M.
- New search for: Polini, R.
- New search for: Traversa, E.
- New search for: Scardi, P.
- New search for: Veneri, S.
- New search for: Leoni, M.
- New search for: Polini, R.
- New search for: Traversa, E.
- New search for: Sartwell, B. D.
- New search for: McGuire, G. E.
- New search for: Jehn, H. A.
- New search for: Petrov, I.
In:
23rd International Conference on Metallurgical Coatings and Thin Films
com
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136-142
;
1996
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ISSN:
- Article (Journal) / Print
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Title:Lattice disorder and texture in diamond coatings deposited by HFCVD on Co-cemented tungsten carbide
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Contributors:Scardi, P. ( author ) / Veneri, S. ( author ) / Leoni, M. ( author ) / Polini, R. ( author ) / Traversa, E. ( author ) / Sartwell, B. D. / McGuire, G. E. / Jehn, H. A. / Petrov, I.
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Published in:THIN SOLID FILMS ; 290//291, com ; 136-142
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Publisher:
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Publication date:1996-01-01
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Size:7 pages
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ISSN:
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Type of media:Article (Journal)
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Type of material:Print
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Language:English
- New search for: 530.4275
- Further information on Dewey Decimal Classification
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Classification:
DDC: 530.4275 -
Source:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Table of contents – Volume 290//291, Issue com
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1
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Highly transparent and conductive ZnO-In~2O~3 thin films prepared by d.c. magnetron sputteringMinami, T. / Kakumu, T. / Takeda, Y. / Takata, S. et al. | 1996
- 6
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Transparent-conductive indium tin oxide films fabricated by atmospheric r.f. plasma deposition techniqueLee, D. H. / Moss, R. W. / Vuong, K. D. / Dietrich, M. / Condrate, R. A. / Wang, X. W. et al. | 1996
- 10
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Influence of a parallel electric field on the conductivity of a growing indium oxide filmAlterkop, B. / Parkansky, N. / Boxman, R. L. / Goldsmith, S. et al. | 1996
- 13
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CdS thin film deposition by CW Nd:YAG laserTrujillo, O. / Moss, R. / Vuong, K. D. / Lee, D. H. / Noble, R. / Finnigan, D. / Orloff, S. / Tenpas, E. / Park, C. / Fagan, J. et al. | 1996
- 18
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A study on the double insulating layer for HgCdTe MIS structureJung, J. W. / Lee, H. C. / Wang, J. S. et al. | 1996
- 23
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Optical reflectance reduction of textured silicon surfaces coated with an antireflective thin filmKolesar, E. S. / Bright, V. M. / Sowders, D. M. et al. | 1996
- 30
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Thermochromism of rapid thermal annealed VO~2 and Sn-doped VO~2 thin filmsLee, M.-H. / Kim, M.-G. / Song, H.-K. et al. | 1996
- 34
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Residual stress in silicon dioxide thin films produced by ion-assisted depositionRobic, J. Y. / Leplan, H. / Pauleau, Y. / Rafin, B. et al. | 1996
- 40
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The calculation of thin film parameters from spectroscopic ellipsometry dataJellison, G. E. et al. | 1996
- 46
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Real time control of the growth of silicon alloy multilayers by multiwavelength ellipsometryKildemo, M. / Deniau, S. / Bulkin, P. / Drevillon, B. et al. | 1996
- 51
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An algorithm for analyzing ellipsometric data taken with multiple angles of incidenceComfort, J. C. / Urban, F. K. / Barton, D. et al. | 1996
- 57
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Multilayer reference coatings for depth profile standardsBeck, U. / Reiners, G. / Wirth, T. / Hoffmann, V. / Praessler, F. et al. | 1996
- 63
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A new method for fabricating transparent barrier layersAffinito, J. D. / Gross, M. E. / Coronado, C. A. / Graff, G. L. / Greenwell, E. N. / Martin, P. M. et al. | 1996
- 68
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Improvement of the adhesion of silica layers to polypropylene induced by nitrogen plasma treatmentVallon, S. / Hofrichter, A. / Drevillon, B. / Klemberg-Sapieha, J. E. / Martinu, L. / Poncin-Epaillard, F. et al. | 1996
- 74
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Relaxation of mechanical stress in polyimide films by softbakingBhattacharya, P. K. / Bhosale, K. S. et al. | 1996
- 80
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Electron beam deposition of ZrO~2-ZnO filmsQadri, S. B. / Skelton, E. F. / Lubitz, P. / Nguyen, N. V. / Khan, H. R. et al. | 1996
- 84
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Transparent ZnO:Al films prepared by co-sputtering of ZnO:Al with either a Zn or an Al targetTominaga, K. / Kataoka, M. / Manabe, H. / Ueda, T. / Mori, I. et al. | 1996
- 88
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Influence of oxygen on some oxide films prepared by ion beam sputter depositionLee, C.-C. / Wei, D. T. / Hsu, J.-C. / Shen, C.-H. et al. | 1996
- 94
-
Synthesis and characterization of amorphous carbon nitride filmsHolloway, B. C. / Shuh, D. K. / Kelly, M. A. / Tong, W. / Carlisle, J. A. / Jimenez, I. / Sutherland, D. G. J. / Terminello, L. J. / Pianetta, P. / Hagstrom, S. et al. | 1996
- 99
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The effect of annealing on the structure of cathodic arc deposited amorphous carbon nitride filmsMcCulloch, D. G. / Merchant, A. R. et al. | 1996
- 103
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Investigation of carbon nitride films by cathodic arc evaporationChhowalla, M. / Alexandrou, I. / Kiely, C. / Amaratunga, G. A. J. / Aharonov, R. / Fontana, R. F. et al. | 1996
- 107
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Ion beam deposited carbon nitride films: characterization and identification of chemical sputteringHammer, P. / Baker, M. A. / Lenardi, C. / Gissler, W. et al. | 1996
- 112
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Plasma diagnostic studies to the carbon nitride film deposition by reactive r.f. magnetron sputteringKaltofen, R. / Sebald, T. / Weise, G. et al. | 1996
- 120
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Synthesis of cubic boron nitride films using a helicon wave plasma anti reduction of compressive stressKim, I.-H. / Kim, K.-S. / Kim, S.-H. / Lee, S.-R. et al. | 1996
- 126
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Transformation of sp^3 to sp^2 sites of diamond like carbon coatings during friction in vacuum and under water vapour environmentLe Huu, T. / Zaidi, H. / Paulmier, D. / Voumard, P. et al. | 1996
- 131
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Heteroepitaxial nucleation of diamond by bias pretreatment in an electron cyclotron resonance microwave chemical vapor deposition systemMarechal, N. / Yamashita, S. et al. | 1996
- 136
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Lattice disorder and texture in diamond coatings deposited by HFCVD on Co-cemented tungsten carbideScardi, P. / Veneri, S. / Leoni, M. / Polini, R. / Traversa, E. et al. | 1996
- 143
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Optical emission spectroscopy of the plasma during CVD diamond growth with nitrogen additionVandevelde, T. / Nesladek, M. / Quaeyhaegens, C. / Stals, L. et al. | 1996
- 148
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Structural phase transitions of carbon observed with photoelectron spectroscopyReinke, P. / Francz, G. / Oelhafen, P. et al. | 1996
- 153
-
Investigation of the field emission current from polycrystalline diamond filmsGlesener, J. W. / Morrish, A. A. et al. | 1996
- 157
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Fabrication of free-standing diamond membranesSalvadori, M. C. / Cattani, M. / Mammana, V. / Monteiro, O. R. / Ager, J. W. / Brown, I. G. et al. | 1996
- 161
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Effect of the cyclic growth/etching time ratio on the {100}-oriented texture growth of a diamond filmKim, S. H. / Park, Y. S. / Han, I. T. / Yun, W. S. / Lee, J.-W. et al. | 1996
- 165
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High sensitivity thermal sensors on insulating diamondJob, R. / Denisenko, A. V. / Zaitsev, A. M. / Melnikov, A. A. / Werner, M. / Fahrner, W. R. et al. | 1996
- 171
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Field emission behavior of (nitrogen incorporated) diamond-like carbon filmsLee, K.-R. / Eun, K. Y. / Lee, S. / Jeon, D.-R. et al. | 1996
- 176
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Enhanced electron emission from phosphorus- and boron-doped diamond-clad Si field emitter arraysKu, T. K. / Chen, S. H. / Yang, C. D. / She, N. J. / Tarntair, F. G. / Wang, C. C. / Chen, C. F. / Hsieh, I. J. / Cheng, H. C. et al. | 1996
- 181
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Epitaxial growth of -SiC thin films using bis-trimethylsilylmethane on Si (100) with a polycrystalline buffer layerBahng, W. / Kim, H. J. et al. | 1996
- 186
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Enhanced diffusion of C in Fe under CVD diamond deposition conditionsWeiser, P. S. / Prawer, S. / Jamieson, D. N. / Manory, R. R. et al. | 1996
- 190
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Field emission observations from CVD diamond-coated silicon emittersRaiko, V. / Spitzl, R. / Aschermann, B. / Theirich, D. / Engemann, J. / Pupeter, N. / Habermann, T. / Mueller, G. et al. | 1996
- 196
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Chemical vapour deposition of diamond at low substrate temperatures using fluorinated precursorsHentschel, F. / Schmidt, I. / Benndorf, C. et al. | 1996
- 200
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Fe-C:H-film growth by plasma-assisted CVD from organometallic precursorsLuithardt, W. / Benndorf, C. et al. | 1996
- 206
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Nanoscale mechanical property measurements using modified atomic force microscopyKulkarni, A. V. / Bhushan, B. et al. | 1996
- 211
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Molecular dynamics investigations of the effects of debris molecules on the friction and wear of diamondPerry, M. D. / Harrison, J. A. et al. | 1996
- 216
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Measurement of the hardness of hard coatings using a force indentation functionFriedrich, C. / Berg, G. / Broszeit, E. / Berger, C. et al. | 1996
- 221
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Local yield map of hard coating with an interlayer under sliding contactDiao, D. et al. | 1996
- 226
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Characterization of TiN films deposited onto stainless steel strips by continuous dry-coating processArezzo, F. / Gimondo, P. / Hashimoto, M. / Ono, N. / Takahashi, T. et al. | 1996
- 232
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Mechanical properties of hard W-C physically vapor deposited coatings in monolayer and multilayer configurationJuliet, P. / Rouzaud, A. / Aabadi, K. / Monge-Cadet, P. / Pauleau, Y. et al. | 1996
- 238
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The ultimate vacuum pressure and the characteristics of sputtered coatingsCavaleiro, A. / Vieira, M. T. / Ramos, F. / Dias, J. P. et al. | 1996
- 243
-
Effects of deflection on bulge test measurements of enhanced modulus in multilayered filmsJankowski, A. F. / Tsakalakos, T. et al. | 1996
- 248
-
Residual stress and in-situ thermal stress measurement of aluminum film deposited on silicon waferKusaka, K. / Hanabusa, T. / Nishida, M. / Inoko, F. et al. | 1996
- 254
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Origins of the residual stress in CVD diamond filmsKuo, C. T. / Lin, C. R. / Lien, H. M. et al. | 1996
- 260
-
Effect of a plasma protection net on residual stress in AlN films deposited by a magnetron sputtering systemKusaka, K. / Hanabusa, T. / Tominaga, K. et al. | 1996
- 264
-
In situ IR ellipsometry study of the adhesion and growth of plasma deposited silica thin films on stainless steel substratesBertrand, N. / Drevillon, B. / Klemberg-Sapieha, J. E. / Martinu, L. et al. | 1996
- 271
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Non-destructive evaluation of thin film coatings using a laser-induced surface thermal lensing effectWu, Z. L. / Kuo, P. K. / Lu, Y. S. / Gu, S. T. / Krupka, R. et al. | 1996
- 278
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Optical and calorimetric evaluation of Z-93-P and other thermal control coatingsJaworske, D. A. et al. | 1996
- 283
-
The in situ characterization of metal film resistance during depositionRycroft, I. M. / Evans, B. L. et al. | 1996
- 289
-
Spectrophotometric study of oxide growth on arc evaporated TiN and ZrN coatings during hot air oxidation testsLuridiana, S. / Miotello, A. et al. | 1996
- 294
-
Impulsive stimulated thermal scattering for sub-micron-thickness film characterizationMaznev, A. A. / Nelson, K. A. / Yagi, T. et al. | 1996
- 299
-
Filtered cathodic vacuum arc (FCVA) deposition of thin film siliconBilek, M. M. M. / Milne, W. I. et al. | 1996
- 305
-
Non-destructive characterization and evaluation of thin films by laser-induced ultrasonic surface wavesSchneider, D. / Tucker, M. D. et al. | 1996
- 312
-
Comparison of atomic force microscope and Rutherford backscattering spectrometry data of nanometre size zinc islandsTabet, M. F. / Urban, F. K. et al. | 1996
- 317
-
The structure of tetrahedral amorphous carbon thin filmsSilva, S. R. P. / Xu, S. / Tay, B. K. / Tan, H. S. / Scheibe, H.-J. / Chhowalla, M. / Milne, W. I. et al. | 1996
- 323
-
XPS investigation of Ti-O containing diamond-like carbon filmsMueller, U. / Hauert, R. et al. | 1996
- 328
-
Pretreatment of GaAs (001) for sulfur passivation with (NH~4)~2S~xKang, M.-G. / Park, H.-H. / Suh, K.-S. / Lee, J.-L. et al. | 1996
- 334
-
Valence band photoemission study of the Ti-Mo-N systemSanjines, R. / Wiemer, C. / Almeida, J. / Levy, F. et al. | 1996
- 339
-
Study on d.c. magnetron sputter deposition of titanium aluminium nitride thin films: effect of aluminium content on coatingWuhrer, R. / Yeung, W. Y. / Phillips, M. R. / McCredie, G. et al. | 1996
- 343
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Corrosion behaviour of hybrid coatingsBrandl, W. / Gendig, C. et al. | 1996
- 348
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Localised micro-hardness measurements with a combined scanning force microscope/nanoindentation systemRandall, N. X. / Christoph, R. / Droz, S. / Julia-Schmutz, C. et al. | 1996
- 355
-
STM and XPS study of filtered vacuum arc deposited Sn-O filmsKaplan, L. / Rusman, I. / Boxman, R. L. / Goldsmith, S. / Nathan, M. / Ben-Jacob, E. et al. | 1996
- 362
-
Modelling and finite element analysis of ultra-microhardness indentation of thin filmsGan, L. / Ben-Nissan, B. / Ben-David, A. et al. | 1996
- 367
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Effect of oxygen plasma etching on adhesion between polyimide films and metalNakamura, Y. / Suzuki, Y. / Watanabe, Y. et al. | 1996
- 370
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Influence of Ni-P electroless coating on the fatigue behavior of plain carbon steelsPuchi, E. S. / Staia, M. H. / Hintermann, H. / Pertuz, A. / Chitty, J. et al. | 1996
- 376
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Study by X-ray photoelectron spectroscopy and X-ray diffraction of the growth of TiN thin films obtained by nitridation of Ti layersSantucci, S. / Lozzi, L. / Passacantando, M. / Picozzi, P. / Alfonsetti, R. / Diamanti, R. / Moccia, G. et al. | 1996
- 381
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Plasma wall interaction for TiN~x film deposition in a hollow cathode arc dischargeEggs, C. / Kersten, H. / Wagner, H.-E. / Wulff, H. et al. | 1996
- 386
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Deposition of titanium in a hollow cathode arc discharge: correlation between deposition conditions and film propertiesSteffen, H. / Eggs, C. / Kersten, H. et al. | 1996
- 390
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Studies of phase transformations in some metal phthalocyanine thin films using measurements of current as a function of temperatureShihub, S. I. / Gould, R. D. et al. | 1996
- 395
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Physical properties of CdTe-Sb thin filmsPicos-Vega, A. / Ramirez-Bon, R. / Espinoza-Beltran, F. J. / Zelaya-Angel, O. / Alvarez-Fregoso, O. / Mendoza-Alvarez, J. G. et al. | 1996
- 401
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Ageing effects of thin films prepared by ion beam assisted deposition: a multi-technique characterizationBeghi, M. G. / Bottani, C. E. / Calliari, L. / Bonelli, M. / Miotello, A. / Ossi, P. M. / Kovac, J. / Scarel, G. / Sancrotti, M. et al. | 1996
- 406
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Modeling of selective tungsten low-pressure chemical vapor depositionKuijlaars, K. J. / Kleijn, C. R. / Van den Akker, H. E. A. et al. | 1996
- 411
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Encapsulation of silver by nitridation of Ag-Ti alloy/bilayer structuresLaursen, T. / Adams, D. / Alford, T. L. / Tu, K.-N. / Deng, F. / Morton, R. / Lau, S. S. et al. | 1996
- 417
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Effects of Au overlayers on the electrical and morphological characteristics of Pd/Sn ohmic contacts to n-GaAsIslam, M. S. / McNally, P. J. / Cameron, D. C. / Herbert, P. A. F. et al. | 1996
- 422
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Optimization of SiO~2 film conformality in TEOS/O~3 APCVDYuan, Z. / Mokhtari, S. / Ferdinand, A. / Eakin, J. / Bartholomew, L. et al. | 1996
- 427
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Plasma and surface diagnostics during plasma-enhanced chemical vapor deposition of SiO~2 from SiH~4/O~2/Ar dischargesHan, S. M. / Aydil, E. S. et al. | 1996
- 435
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Multi-level interconnects for heterojunction bipolar transistor integrated circuit technologiesPatrizi, G. A. / Lovejoy, M. L. / Enquist, P. M. / Schneider, R. P. / Hou, H. Q. et al. | 1996
- 440
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Tantalum pentoxide for advanced DRAM applicationsMcKinley, K. A. / Sandler, N. P. et al. | 1996
- 447
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The addition of surfactant to slurry for polymer CMP: effects on polymer surface, removal rate and underlying CuNeirynck, J. M. / Yang, G.-R. / Murarka, S. P. / Gutmann, R. J. et al. | 1996
- 453
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Chemical-mechanical polishing of PECVD silicon nitrideHu, Y. Z. / Yang, G.-R. / Chow, T. P. / Gutmann, R. J. et al. | 1996
- 458
-
Effects of mechanical characteristics on the chemical-mechanical polishing of dielectric thin filmsTseng, W.-T. / Liu, C. / Dai, B.-T. / Yeh, C.-F. et al. | 1996
- 464
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Crystallization of amorphous SiGe thin filmsTong, H. Y. / King, T. J. / Shi, F. G. et al. | 1996
- 469
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TiSi~2 phase transformation characteristics on narrow devicesMiles, G. L. / Mann, R. W. / Bertsch, J. E. et al. | 1996
- 473
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Materials aspects of Ti and Co silicidation of narrow polysilicon linesKittl, J. A. / Hong, Q. Z. et al. | 1996
- 477
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Prediction of silicide formation and stability using heats of formationPretorius, R. et al. | 1996
- 485
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Evaluation of barriers for B and P diffusion into As-doped polysiliconNaeem, M. D. / Parks, C. / Wangemann, K. / Glawischnig, H. et al. | 1996
- 493
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NiGeW ohmic contacts on GaAs heterostructure epitaxial layersHuang, J. H. / Tehrani, S. / Durlam, M. / Martinez, M. J. / Schirmann, E. / Cody, N. et al. | 1996
- 497
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A low-resistance Pd/Ge/Ti/Au ohmic contact to a high-low doped GaAs field-effect transistorKwak, J. S. / Baik, H. K. / Lee, J.-L. / Park, C. G. / Kim, H. / Suh, K.-S. et al. | 1996
- 503
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Adhesion studies of GaAs-based ohmic contact and bond pad metallizationSeigal, P. K. / Briggs, R. D. / Rieger, D. J. / Baca, A. G. / Howard, A. J. et al. | 1996
- 508
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A study of P-type ohmic contacts to InAlAs/InGaAs heterostructuresBriggs, R. D. / Howard, A. J. / Baca, A. G. / Hafich, M. J. / Vawter, G. A. et al. | 1996
- 513
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Thin-film tantalum-nitride resistor technology for phosphide-based optoelectronicsLovejoy, M. L. / Patrizi, G. A. / Rieger, D. J. / Barbour, J. C. et al. | 1996
- 518
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Quantitative investigation of copper/indium multilayer thin film reactionsLindahl, K. A. / Moore, J. J. / Olson, D. L. / Noufi, R. / Lanning, B. et al. | 1996
- 525
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Formation of iron silicides on Si(110) by reactive deposition epitaxyWu, J. / Shimizu, S. et al. | 1996