Formation of porous silicon using an ammonium fluoride based electrolyte for application as a sacrificial layer (English)
- New search for: Kuhl, M.
- New search for: O'Halloran, G. M.
- New search for: Gennissen, P. T. J.
- New search for: French, P. J.
- New search for: Kuhl, M.
- New search for: O'Halloran, G. M.
- New search for: Gennissen, P. T. J.
- New search for: French, P. J.
In:
JOURNAL OF MICROMECHANICS AND MICROENGINEERING
;
8
, 4
;
317-322
;
1998
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ISSN:
- Article (Journal) / Print
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Title:Formation of porous silicon using an ammonium fluoride based electrolyte for application as a sacrificial layer
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Contributors:Kuhl, M. ( author ) / O'Halloran, G. M. ( author ) / Gennissen, P. T. J. ( author ) / French, P. J. ( author )
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Published in:JOURNAL OF MICROMECHANICS AND MICROENGINEERING ; 8, 4 ; 317-322
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Publisher:
- New search for: IOP PUBLISHING LTD
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Publication date:1998-01-01
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Size:6 pages
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ISSN:
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Type of media:Article (Journal)
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Type of material:Print
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Language:English
- New search for: 620
- Further information on Dewey Decimal Classification
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Classification:
DDC: 620 -
Source:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Table of contents – Volume 8, Issue 4
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 251
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Microprocessing at the fingertipsGreger Thornell / Stefan Johansson et al. | 1998
- 251
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PAPERS - Microprocessing at the fingertipsThornell, G. et al. | 1998
- 263
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Design of bulk micromachined suspensionsWeileun Fang et al. | 1998
- 263
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PAPERS - Design of bulk micromachined suspensionsFang, Weileun et al. | 1998
- 272
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Advanced deep reactive ion etching: a versatile tool for microelectromechanical systemsP-A Clerc / L Dellmann / F Grétillat / M-A Grétillat / P-F Indermühle / S Jeanneret / Ph Luginbuhl / C Marxer / T L Pfeffer / G-A Racine et al. | 1998
- 272
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PAPERS - Advanced deep reactive ion etching: A versatile tool for microelectromechanical systemsClerc, P.-A. et al. | 1998
- 279
-
One-mask procedure for the fabrication of movable high-aspect-ratio 3D microstructuresWenmin Qu / Christian Wenzel / Andreas Jahn et al. | 1998
- 279
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PAPERS - One-mask procedure for the fabrication of movable high-aspect-ratio 3D microstructuresQu, Wenmin et al. | 1998
- 284
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Issues associated with the design, fabrication and testing of a crystalline silicon ring gyroscope with electromagnetic actuation and sensingA J Harris / J S Burdess / D Wood / R Langford / G Williams / M C L Ward / M E McNie et al. | 1998
- 284
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PAPERS - Issues associated with the design, fabrication and testing of a crystalline silicon ring gyroscope with electromagnetic actuation and sensingHarris, A.J. et al. | 1998
- 293
-
Resist dissolution rate and inclined-wall structures in deep x-ray lithographyZ Liu / F Bouamrane / M Roulliay / R K Kupka / A Labèque / S Megtert et al. | 1998
- 293
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PAPERS - Resist dissolution rate and inclined-wall structures in deep x-ray lithographyLiu, Z. et al. | 1998
- 301
-
PAPERS - Injection-moulded fibre ribbon connectors for parallel optical links fabricated by the LIGA techniqueDunkel, K. et al. | 1998
- 301
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Injection-moulded fibre ribbon connectors for parallel optical links fabricated by the LIGA techniqueKarlheinz Dunkel / Hans-Dieter Bauer / Wolfgang Ehrfeld / Jens Hoßfeld / Lutz Weber / Günter Hörcher / Gottfried Müller et al. | 1998
- 307
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Development of magnetic materials and processing techniques applicable to integrated micromagnetic devicesJ Y Park / M G Allen et al. | 1998
- 307
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PAPERS - Development of magnetic materials and processing techniques applicable to integrated micromagnetic devicesPark, J.Y. et al. | 1998
- 317
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Formation of porous silicon using an ammonium fluoride based electrolyte for application as a sacrificial layerM Kuhl / G M O'Halloran / P T J Gennissen / P J French et al. | 1998
- 317
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PAPERS - Formation of porous silicon using an ammonium fluoride based electrolyte for application as a sacrificial layerKuhl, M. et al. | 1998
- 323
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Displacement sensing using geometrical modulation in reflection mode (GM-RM) of coupled optical waveguidesDan Haronian et al. | 1998
- 323
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PAPERS - Displacement sensing using geometrical modulation in reflection mode (GM-RM) of coupled optical waveguidesHaronian, D. et al. | 1998
- 327
-
Precision alignment of mask etching with respect to crystal orientationJ M Lai / W H Chieng / Y-C Huang et al. | 1998
- 327
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PAPERS - Precision alignment of mask etching with respect to crystal orientationLai, J.M. et al. | 1998
- 330
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The effects of post-deposition processes on polysilicon Young's modulusSangwoo Lee / Changho Cho / Jongpal Kim / Sangjun Park / Sangwoo Yi / Jongjun Kim / Dong-il Dan Cho et al. | 1998
- 330
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PAPERS - The effects of post-deposition processes on polysilicon Young's modulusLee, Sangwoo et al. | 1998
- 338
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Mechanical lapping, handling and transfer of ultra-thin wafersS Pinel / J Tasselli / J P Bailbé / A Marty / P Puech / D Estève et al. | 1998
- 338
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PAPERS - Mechanical lapping, handling and transfer of ultra-thin wafersPinel, S. et al. | 1998
- 343
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Silicon nitride microclips for the kinematic location of optic fibres in silicon V-shaped groovesR M Bostock / J D Collier / R-J E Jansen / R Jones / D F Moore / J E Townsend et al. | 1998
- 343
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PAPERS - Silicon nitride microclips for the kinematic location of optic fibres in silicon V-shaped groovesBostock, R.M. et al. | 1998
- 361
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Author index with titles| 1998