Effect of temperature on etch rate of iridium and platinum in CF~4/O~2 (English)
- New search for: Maa, J.-s.
- New search for: Ying, H.
- New search for: Zhang, F.
- New search for: Maa, J.-s.
- New search for: Ying, H.
- New search for: Zhang, F.
In:
JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A VACUUMS SURFACES AND FILMS
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19
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1312-1314
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2001
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ISSN:
- Article (Journal) / Print
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Title:Effect of temperature on etch rate of iridium and platinum in CF~4/O~2
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Contributors:
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Published in:
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Publisher:
- New search for: SLACK INCORPORATED
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Publication date:2001-01-01
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Size:3 pages
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ISSN:
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Type of media:Article (Journal)
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Type of material:Print
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Language:English
- New search for: 621.55
- Further information on Dewey Decimal Classification
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Classification:
DDC: 621.55 -
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© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Table of contents – Volume 19
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1
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Surface science with nanosized particles in a carrier gasKeller, A. / Fierz, M. / Siegmann, K. / Siegmann, H. C. / Filippov, A. et al. | 2001
- 1
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Review Articles - Surface science with nanosized particles in a carrier gasKeller, A. et al. | 2001
- 9
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Nitridation of thermal films by radio-frequency plasma assisted electron cyclotron resonance: Effect of plasma modes and process parametersRaveh, A. / Brewer, J. / Irene, E. A. et al. | 2001
- 9
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Articles - Nitridation of thermal SiO2 films by radio-frequency plasma assisted electron cyclotron resonance: Effect of plasma modes and process parametersRaveh, A. et al. | 2001
- 17
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Articles - Nitridation of thermal SiO2 films by radio-frequency plasma assisted electron cyclotron resonance: Layer structure and compositionRaveh, A. et al. | 2001
- 17
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Nitridation of thermal films by radio-frequency plasma assisted electron cyclotron resonance: Layer structure and compositionRaveh, A. / Brewer, J. / Irene, E. A. et al. | 2001
- 25
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Surface etching mechanism of silicon nitride in fluorine and nitric oxide containing plasmasKastenmeier, B. E. E. / Matsuo, P. J. / Oehrlein, G. S. / Ellefson, R. E. / Frees, L. C. et al. | 2001
- 25
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Articles - Surface etching mechanism of silicon nitride in fluorine and nitric oxide containing plasmasKastenmeier, B.E.E. et al. | 2001
- 31
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In situ characterization of residues formed on a plasma-etching chamberKawada, Hiroki / Yamane, Miyuki / Kitsunai, Hiroyuki / Suzuki, Shinichi et al. | 2001
- 31
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Articles - In situ characterization of residues formed on a plasma-etching chamberKawada, Hiroki et al. | 2001
- 38
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Articles - Remote-plasma-enhanced reaction between a silicon surface and trifluoro-acetyl-fluoride gasSaito, Yoji et al. | 2001
- 38
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Remote-plasma-enhanced reaction between a silicon surface and trifluoro-acetyl-fluoride gasSaito, Yoji / Yamazaki, Hirofumi / Mouri, Isamu et al. | 2001
- 41
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Electrical conduction studies of plasma enhanced chemical vapor deposited silicon nitride filmsBose, Mohua / Basa, D. K. / Bose, D. N. et al. | 2001
- 41
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Articles - Electrical conduction studies of plasma enhanced chemical vapor deposited silicon nitride filmsBose, Mohua et al. | 2001
- 45
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Articles - Absolute intensities of the vacuum ultraviolet spectra in oxide etch plasma processing dischargesWoodworth, J.R. et al. | 2001
- 45
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Absolute intensities of the vacuum ultraviolet spectra in oxide etch plasma processing dischargesWoodworth, J. R. / Riley, M. E. / Amatucci, V. A. / Hamilton, T. W. / Aragon, B. P. et al. | 2001
- 56
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Articles - Effects of ozone assisted deposition on the dielectric properties of 90(degree) off-axis radio frequency magnetron sputtered SrTiO3Gibbons, B.J. et al. | 2001
- 56
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Effects of ozone assisted deposition on the dielectric properties of 90^o off-axis radio frequency magnetron sputtered SrTiO~3Gibbons, B. J. / Fan, Y. / Findikoglu, A. T. / Jia, Q. X. / Reagor, D. W. et al. | 2001
- 56
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Effects of ozone assisted deposition on the dielectric properties of 90° off-axis radio frequency magnetron sputteredGibbons, B. J. / Fan, Y. / Findikoglu, A. T. / Jia, Q. X. / Reagor, D. W. et al. | 2001
- 62
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Thin film growth of reactive sputter deposited tungsten–carbon thin filmsRack, Philip D. / Peterson, Jeffrey J. / Li, Jie / Geiculescu, A. C. / Rack, H. J. et al. | 2001
- 62
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Articles - Thin film growth of reactive sputter deposited tungsten-carbon thin filmsRack, Philip D. et al. | 2001
- 66
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Plasma etching endpoint detection using multiple wavelengths for small open-area wafersYue, H. Henry / Qin, S. Joe / Wiseman, Joseph / Toprac, Anthony et al. | 2001
- 66
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Articles - Plasma etching endpoint detection using multiple wavelengths for small open-area wafersYue, H.Henry et al. | 2001
- 76
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Wave propagation and power deposition in magnetically enhanced inductively coupled and helicon plasma sourcesKinder, Ronald L. / Kushner, Mark J. et al. | 2001
- 76
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Articles - Wave propagation and power deposition in magnetically enhanced inductively coupled and helicon plasma sourcesKinder, Ronald L. et al. | 2001
- 87
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Technology and realization of metallic curved waveguide mirrors in polymer film waveguides based on anisotropic plasma etchingWolff, S. / Grosse, A. / Schimper, H.-J. / Giehl, A. R. / Kuhnke, M. / Grote, R. / Fouckhardt, H. et al. | 2001
- 87
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Articles - Technology and realization of metallic curved waveguide mirrors in polymer film waveguides based on anisotropic plasma etchingWolff, S. et al. | 2001
- 90
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Predeposition ultraviolet treatment for adhesion improvement of thin films on mercury cadmium tellurideButcher, K. S. A. / Tansley, T. L. / Prince, K. / Leech, P. W. et al. | 2001
- 90
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Articles - Predeposition ultraviolet treatment for adhesion improvement of thin films on mercury cadmium tellurideButcher, K.S.A. et al. | 2001
- 97
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Quartz-crystal microbalance study for characterizing atomic oxygen in plasma ash toolsSrivastava, A. K. / Sakthivel, P. et al. | 2001
- 97
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Articles - Quartz-crystal microbalance study for characterizing atomic oxygen in plasma ash toolsSrivastava, A.K. et al. | 2001
- 101
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Quantification of a radical beam source for methyl radicalsSchwarz-Selinger, T. / Dose, V. / Jacob, W. / von Keudell, A. et al. | 2001
- 101
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Articles - Quantification of a radical beam source for methyl radicalsSchwarz-Selinger, T. et al. | 2001
- 108
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Theoretical and experimental characterization of a low-pressure rf plasma and its optimization in electron-gas secondary-neutral mass spectrometryBieck, W. / Merz, E. / Gnaser, H. / Oechsner, H. et al. | 2001
- 108
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Articles - Theoretical and experimental characterization of a low-pressure rf plasma and its optimization in electron-gas secondary-neutral mass spectrometryBieck, W. et al. | 2001
- 118
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Doped microshells prepared by radio frequency plasma enhanced chemical vapor deposition for inertial confinement fusion experimentsTheobald, M. / Baclet, P. / Legaie, O. / Durand, J. et al. | 2001
- 118
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Articles - Doped CHx microshells prepared by radio frequency plasma enhanced chemical vapor deposition for inertial confinement fusion experimentsTheobald, M. et al. | 2001
- 124
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Articles - Crystallization of nanostructured silicon films deposited under a low-pressure argon-silane pulsed-glow discharge: Correlation with the plasma durationHadjadj, A. et al. | 2001
- 124
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Crystallization of nanostructured silicon films deposited under a low-pressure argon–silane pulsed-glow discharge: Correlation with the plasma durationHadjadj, A. / Beorchia, A. / Boufendi, L. / Huet, S. / Roca i Cabarrocas, P. et al. | 2001
- 130
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Fracture resistance enhancement of diamond-like carbon/nitrogenated diamond-like carbon multilayer deposited by electron cyclotron resonance microwave plasma chemical vapor depositionQi, J. / Lai, K. H. / Bello, I. / Lee, C. S. / Lee, S. T. / Luo, J. B. / Wen, S. Z. et al. | 2001
- 130
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Articles - Fracture resistance enhancement of diamond-like carbon-nitrogenated diamond-like carbon multilayer deposited by electron cyclotron resonance microwave plasma chemical vapor depositionQi, J. et al. | 2001
- 136
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Chemical stability of species in thin filmsBarranco, A. / Mejı́as, J. A. / Espinós, J. P. / Caballero, A. / González-Elipe, A. R. / Yubero, F. et al. | 2001
- 136
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Articles - Chemical stability of Sin+ species in SiOx (x<2) thin filmsBarranco, A. et al. | 2001
- 145
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Articles - Effects of electron-beam irradiation on the properties of CN thin films deposited by direct dual ion beamsKim, Yong Hwan et al. | 2001
- 145
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Effects of electron-beam irradiation on the properties of CN thin films deposited by direct dual ion beamsKim, Yong Hwan / Lee, Deuk Yeon / Kim, In Kyo / Baik, Hong Koo et al. | 2001
- 153
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Fundamental study of ion-irradiation effects on the columnar growth of chromium films prepared by ion-beam and vapor depositionKuratani, Naoto / Ebe, Akinori / Ogata, Kiyoshi / Shimizu, Ippei / Setsuhara, Yuichi / Miyake, Shoji et al. | 2001
- 153
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Articles - Fundamental study of ion-irradiation effects on the columnar growth of chromium films prepared by ion-beam and vapor depositionKuratani, Naoto et al. | 2001
- 158
-
Observations of the microscopic growth mechanism of pillars and helices formed by glancing-angle thin-film depositionMalac, Marek / Egerton, Ray F. et al. | 2001
- 158
-
Articles - Observations of the microscopic growth mechanism of pillars and helices formed by glancing-angle thin-film depositionMalac, Marek et al. | 2001
- 167
-
Influence of sputtering pressure on physical structure of AIN thin films prepared on Y-128^o LiNbO~3 by rf magnetron sputteringWu, L. / Wu, S. / Song, H.-T. et al. | 2001
- 167
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Influence of sputtering pressure on physical structure of AlN thin films prepared on Y-128° by rf magnetron sputteringWu, Long / Wu, Sean / Song, Hong-Tie et al. | 2001
- 167
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Articles - Influence of sputtering pressure on physical structure of AlN thin films prepared on Y-128(degree) LiNbO3 by rf magnetron sputteringWu, Long et al. | 2001
- 171
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Influence of deposition conditions on the thermal stability of ZnO:Al films grown by rf magnetron sputteringHaug, F.-J. / Geller, Zs. / Zogg, H. / Tiwari, A. N. / Vignali, C. et al. | 2001
- 171
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Articles - Influence of deposition conditions on the thermal stability of ZnO:Al films grown by rf magnetron sputteringHaug, F.-J. et al. | 2001
- 175
-
Articles - Atomistic simulation of fluorocarbon deposition on Si by continuous bombardment with energetic CF+ and CF+-2Abrams, Cameron F. et al. | 2001
- 175
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Atomistic simulation of fluorocarbon deposition on Si by continuous bombardment with energetic andAbrams, Cameron F. / Graves, David B. et al. | 2001
- 182
-
Synchrotron x-ray diffraction and transmission electron microscopy studies of interfacial reaction paths and kinetics during annealing of fully-002-textured Al/TiN bilayersChun, J.-S. / Carlsson, J. R. A. / Desjardins, P. / Bergstrom, D. B. / Petrov, I. / Greene, J. E. / Lavoie, C. / Cabral, C. / Hultman, L. et al. | 2001
- 182
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Articles - Synchrotron x-ray diffraction and transmission electron microscopy studies of interfacial reaction paths and kinetics during annealing of fully-002-textured Al-TiN bilayersChun, J.-S. et al. | 2001
- 192
-
Structural and electrical characteristics of films grown on oxidized Si(100) surfaceCho, M.-H. / Ko, D.-H. / Choi, Y. G. / Jeong, K. / Lyo, I. W. / Noh, D. Y. / Kim, H. J. / Whang, C. N. et al. | 2001
- 192
-
Articles - Structural and electrical characteristics of Y2O3 films grown on oxidized Si(100) surfaceCho, M.-H. et al. | 2001
- 200
-
Thickness dependence of films grown on an oxidized Si surfaceCho, M.-H. / Ko, D.-H. / Choi, Y. K. / Lyo, I. W. / Jeong, K. / Whang, C. N. / Kim, H. J. / Noh, D. Y. et al. | 2001
- 200
-
Articles - Thickness dependence of Y2O3 films grown on an oxidized Si surfaceCho, M.-H. et al. | 2001
- 207
-
Interfacial chemistry of the nanostructureKirsch, P. D. / Ekerdt, J. G. et al. | 2001
- 207
-
Articles - Interfacial chemistry of the Ba-SiOxNy-Si(100) nanostructureKirsch, P.D. et al. | 2001
- 215
-
Anomalies in kinetics of hydrogen evolution from austenitic stainless steel from 300 to 1000^oCNemanic, V. / Zajec, B. / Setina, J. et al. | 2001
- 215
-
Anomalies in kinetics of hydrogen evolution from austenitic stainless steel from 300 to 1000 °CNemanič, Vincenc / Zajec, Bojan / Šetina, Janez et al. | 2001
- 215
-
Articles - Anomalies in kinetics of hydrogen evolution from austenitic stainless steel from 300 to 1000 (degree)CNemanic, Vincenc et al. | 2001
- 223
-
Intrinsic stress of alloy filmsJen, S. U. / Chung, C. M. et al. | 2001
- 223
-
Articles - Intrinsic stress of Co35Pd65 alloy filmsJen, S.U. et al. | 2001
- 228
-
Thin-walled vacuum chambers of austenitic stainless steelMoore, Boude C. et al. | 2001
- 228
-
Articles - Thin-walled vacuum chambers of austenitic stainless steelMoore, Boude C. et al. | 2001
- 232
-
Articles - Microstructure and secondary phases in coevaporated CuInS2 films: Dependence on growth temperature and chemical compositionÁlvarez-Garcia, J. et al. | 2001
- 232
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Microstructure and secondary phases in coevaporated films: Dependence on growth temperature and chemical compositionÁlvarez-Garcı́a, J. / Pérez-Rodrı́guez, A. / Romano-Rodrı́guez, A. / Morante, J. R. / Calvo-Barrio, L. / Scheer, R. / Klenk, R. et al. | 2001
- 232
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Microstructure and secondary phases in coevaporated CulnS~2 films: Dependence on growth temperature and chemical compositionAlvarez-Garcia, J. / Perez-Rodriguez, A. / Romano-Rodriguez, A. / Morante, J. R. / Calvo-Barrio, L. / Scheer, R. / Klenk, R. et al. | 2001
- 240
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Hydrogenation characteristics and observation of disintegration conditions of Ti–Mo and Ni-coated Ti–Mo thin filmsShi, L. Q. / Zhou, Z. Y. / Zhao, G. Q. / He, M. H. et al. | 2001
- 240
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Articles - Hydrogenation characteristics and observation of disintegration conditions of Ti-Mo and Ni-coated Ti-Mo thin filmsShi, L.Q. et al. | 2001
- 246
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Structural characterization of polycrystalline Cd–Te–In filmsZapata-Torres, M. / Castro-Rodrı́guez, R. / Martel, A. / Mascarenhas, Y. P. / Guevara, J. / Melendez-Lira, M. / Peña, J. L. et al. | 2001
- 246
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Articles - Structural characterization of polycrystalline Cd-Te-In filmsZapata-Torres, M. et al. | 2001
- 251
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Articles - Efficient modeling of thin film deposition for low sticking using a three-dimensional microstructural simulatorSmy, T. et al. | 2001
- 251
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Efficient modeling of thin film deposition for low sticking using a three-dimensional microstructural simulatorSmy, T. / Dew, S. K. / Joshi, R. V. et al. | 2001
- 262
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Articles - Hydrocarbon thin films produced from adamantane-diamond surface deposition: Molecular dynamics simulationsPlaisted, Thomas A. et al. | 2001
- 262
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Hydrocarbon thin films produced from adamantane–diamond surface deposition: Molecular dynamics simulationsPlaisted, Thomas A. / Sinnott, Susan B. et al. | 2001
- 267
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Articles - Effects of chemical etching with nitric acid on glass surfacesJang, H.K. et al. | 2001
- 267
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Effects of chemical etching with nitric acid on glass surfacesJang, H. K. / Chung, Y. D. / Whangbo, S. W. / Kim, T. G. / Whang, C. N. / Lee, S. J. / Lee, S. et al. | 2001
- 275
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Articles - Electron-beam-assisted evaporation of epitaxial CeO2 thin films on Si substratesInoue, Tomoyasu et al. | 2001
- 275
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Electron-beam-assisted evaporation of epitaxial thin films on Si substratesInoue, Tomoyasu / Yamamoto, Yasuhiro / Satoh, Masataka et al. | 2001
- 280
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GaN grown on two-step cleaned C-terminated 6H–SiC by molecular-beam epitaxyGuan, Z. P. / Cai, A. L. / Porter, H. / Cabalu, J. / Chen, J. / Huang, S. / Giedd, R. E. et al. | 2001
- 280
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Articles - GaN grown on two-step cleaned C-terminated 6H-SiC by molecular-beam epitaxyGuan, Z.P. et al. | 2001
- 287
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Model of crystal lattice strained along the preferential direction by anisotropic stress for GaAs heteroepitaxial films grown on vicinal Si(001) and Si(110) substrates by molecular-beam epitaxyYodo, T. et al. | 2001
- 287
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Articles - Model of crystal lattice strained along the preferential direction by anisotropic stress for GaAs heteroepitaxial films grown on vicinal Si(001) and Si(110) substrates by molecular-beam epitaxyYodo, T. et al. | 2001
- 292
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In situ determination of growth rate by pyrometric interferometry during molecular-beam epitaxy: Application to the growth of AlGaN/GaN quantum wellsNg, H. M. / Chu, S. N. G. / Cho, A. Y. et al. | 2001
- 292
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Articles - In situ determination of growth rate by pyrometric interferometry during molecular-beam epitaxy: Application to the growth of AlGaN-GaN quantum wellsNg, H.M. et al. | 2001
- 295
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Enhancement of tribological properties of 9Cr18 stainless steel by dual Mo and S Co implantationZhang, Tao / Song, Jiaohua / Li, Guoqing / Chu, Paul K. / Brown, Ian G. et al. | 2001
- 295
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Articles - Enhancement of tribological properties of 9Cr18 stainless steel by dual Mo and S Co implantationZhang, Tao et al. | 2001
- 299
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Preparation of AIN films by pulsed laser deposition using sintered aluminum nitride and elemental aluminum as raw materialsWu, J. D. / Sun, J. / Ying, Z. F. / Shi, W. / Ling, H. / Li, F. M. / Zhou, Z. Y. / Wang, K. L. / Ding, X. M. et al. | 2001
- 299
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Preparation of AlN films by pulsed laser deposition using sintered aluminum nitride and elemental aluminum as raw materialsWu, J. D. / Sun, J. / Ying, Z. F. / Shi, W. / Ling, H. / Li, F. M. / Zhou, Z. Y. / Wang, K. L. / Ding, X. M. et al. | 2001
- 299
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Articles - Preparation of AlN films by pulsed laser deposition using sintered aluminum nitride and elemental aluminum as raw materialsWu, J.D. et al. | 2001
- 306
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Structural properties of CdS-doped glass nanocrystallites grown by pulsed laser deposition in high vacuumWang, H. / Zhu, Y. / Ong, P. P. et al. | 2001
- 306
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Articles - Structural properties of CdS-doped glass nanocrystallites grown by pulsed laser deposition in high vacuumWang, H. et al. | 2001
- 311
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Effect of chamber pressure and atmosphere on the microstructure and nanomechanical properties of amorphous carbon films prepared by pulsed laser depositionWei, Q. / Sankar, J. / Sharma, A. K. / Yamagata, Y. / Narayan, J. et al. | 2001
- 311
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Articles - Effect of chamber pressure and atmosphere on the microstructure and nanomechanical properties of amorphous carbon films prepared by pulsed laser depositionWei, Q. et al. | 2001
- 317
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Measurements of viscosity, velocity slip coefficients, and tangential momentum accommodation coefficients using a modified spinning rotor gaugeBentz, J. A. / Tompson, R. V. / Loyalka, S. K. et al. | 2001
- 317
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Articles - Measurements of viscosity, velocity slip coefficients, and tangential momentum accommodation coefficients using a modified spinning rotor gaugeBentz, J.A. et al. | 2001
- 325
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Articles - Heat dissipation in thin-film vacuum sensorBerlicki, T.M. et al. | 2001
- 325
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Heat dissipation in thin-film vacuum sensorBerlicki, T. M. et al. | 2001
- 329
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Articles - Transient analysis of carrier gas saturation in liquid source vapor generatorsMayer, Bruce et al. | 2001
- 329
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Transient analysis of carrier gas saturation in liquid source vapor generatorsMayer, Bruce / Collins, Craig C. / Walton, Mike et al. | 2001
- 345
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Articles - Process and fabrication of a lead zirconate titanate thin film pressure sensorZakar, E. et al. | 2001
- 345
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Process and fabrication of a lead zirconate titanate thin film pressure sensorZakar, E. / Dubey, M. / Piekarski, B. / Conrad, J. / Piekarz, R. / Widuta, R. et al. | 2001
- 349
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Vacuum gauge system with a self-compensator for photoelectrons produced in the SPring-8 storage ringSaeki, Hiroshi / Aoki, Tsuyoshi / Yonehara, Hiroto / Momose, Takashi et al. | 2001
- 349
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Articles - Vacuum gauge system with a self-compensator for photoelectrons produced in the SPring-8 storage ringSaeki, Hiroshi et al. | 2001
- 353
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Articles - Thermal micropressure sensor for pressure monitoring in a minute packageWang, S.N. et al. | 2001
- 353
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Thermal micropressure sensor for pressure monitoring in a minute packageWang, S. N. / Mizuno, K. / Fujiyoshi, M. / Funabashi, H. / Sakata, J. et al. | 2001
- 358
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Modeling a microfluidic system using Knudsen’s empirical equation for flow in the transition regimeRobertson, J. K. / Wise, Kensall D. et al. | 2001
- 358
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Articles - Modeling a microfluidic system using Knudsen's empirical equation for flow in the transition regimeRobertson, J.K. et al. | 2001
- 365
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Articles - True and measured outgassing rates of a vacuum chamber with a reversibly adsorbed phaseAkaishi, K. et al. | 2001
- 365
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True and measured outgassing rates of a vacuum chamber with a reversibly adsorbed phaseAkaishi, K. / Nakasuga, M. / Funato, Y. et al. | 2001
- 372
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Calculated energetics for adsorption and desorption steps during etching of Si(110) surface by ClHalicioglu, Timur et al. | 2001
- 372
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Brief Reports and Comments - Calculated energetics for adsorption and desorption steps during etching of Si(110) surface by ClHalicioglu, Timur et al. | 2001
- 376
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Brief Reports and Comments - Analysis of Langmuir probe data: Analytical parametrization, and the importance of the end effectNarasimhan, G. et al. | 2001
- 376
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Analysis of Langmuir probe data: Analytical parametrization, and the importance of the end effectNarasimhan, G. / Steinbrüchel, Ch. et al. | 2001
- 379
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Enhanced coercivity by substrate bias configuration in Co-based alloy thin filmJin, Ding / Wang, Jian Ping / Gong, Hao et al. | 2001
- 379
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Rapid Communications - Enhanced coercivity by substrate bias configuration in Co-based alloy thin filmJin, Ding et al. | 2001
- 383
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Molecular beam epitaxy system at an undergraduate institutionCelinski, Z. et al. | 2001
- 383
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Shop Notes - Molecular beam epitaxy system at an undergraduate institutionCelinski, Z. et al. | 2001
- 386
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Shop Notes - All-metal ultrahigh vacuum optical fiber feedthroughMiller, D.L. et al. | 2001
- 386
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All-metal ultrahigh vacuum optical fiber feedthroughMiller, D. L. / Moshegov, N. T. et al. | 2001
- 388
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Errata - Erratum: "Evolution of integrated-circuit vacuum processes: 1959-1975" (J. Vac. Sci. Technol. A 18, 1736 (2000))Waits, Robert K. et al. | 2001
- 388
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Erratum: “Evolution of integrated-circuit vacuum processes: 1959–1975” [J. Vac. Sci. Technol. A 18, 1736 (2000)]Waits, Robert K. et al. | 2001
- 389
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CUMULATIVE AUTHOR INDEX| 2001
- 391
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Epitaxial growth of thin films by pulsed laser deposition on GaAs(100) substratesLiu, Xiaohua / Chen, X. Y. / Yin, J. / Liu, Z. G. / Liu, J. M. / Yin, X. B. / Chen, G. X. / Wang, M. et al. | 2001
- 394
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Waveguide structure of Er-doped films on different substrates by pulsed-laser depositionWang, Ke-Ming / Shi, Bo-Rong / Cue, Nelson / Zhu, Yong-Yuan / Xiao, Rong-Fu / Lu, Fei / Hu, Hui / Liu, Yao-Gang et al. | 2001
- 398
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Anisotropic etching of polymer films by high energy (∼100s of eV) oxygen atom neutral beamsPanda, Siddhartha / Economou, Demetre J. / Chen, Lee et al. | 2001
- 405
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Microstructure of Fe–N thin films prepared using an atomic nitrogen beamTelling, N. D. / Jones, G. A. / Faunce, C. A. / Grundy, P. J. / Blythe, H. J. / Joyce, D. E. et al. | 2001
- 410
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Epitaxial growth of thin films on using ionized beam depositionWhangbo, S. W. / Choi, Y. K. / Chung, K. B. / Jang, H. K. / Whang, C. N. et al. | 2001
- 414
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Properties of aluminum-doped zinc oxide films deposited by high rate mid-frequency reactive magnetron sputteringMalkomes, N. / Vergöhl, M. / Szyszka, B. et al. | 2001
- 420
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Pulsed dc magnetron discharge for high-rate sputtering of thin filmsMusil, Jindřich / Leština, Jan / Vlček, Jaroslav / Tölg, Tomáš et al. | 2001
- 425
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Plasma enhanced direct current planar magnetron sputtering technique employing a twinned microwave electron cyclotron resonance plasma sourceJun, Xu / Xinlu, Deng / Shiji, Yu / Wenqi, Lu / Tengcai, Ma et al. | 2001
- 429
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Frequency-dependent pulsed direct current magnetron sputtering of titanium oxide filmsKim, J.-Y. / Barnat, E. / Rymaszewski, E. J. / Lu, T.-M. et al. | 2001
- 435
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High-density plasma patterning of low dielectric constant polymers: A comparison between polytetrafluoroethylene, parylene-N, and poly(arylene ether)Standaert, T. E. F. M. / Matsuo, P. J. / Li, X. / Oehrlein, G. S. / Lu, T.-M. / Gutmann, R. / Rosenmayer, C. T. / Bartz, J. W. / Langan, J. G. / Entley, W. R. et al. | 2001
- 447
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Study of surface chemical changes and erosion rates for CV-1144-O silicone under electron cyclotron resonance oxygen plasma exposureYan, Li / Gao, Xiang / Bungay, Corey / Woollam, John A. et al. | 2001
- 455
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Characterization of titanium nitride etch rate and selectivity to silicon dioxide in a helicon-wave plasmaChiu, H. K. / Lin, T. L. / Hu, Y. / Leou, K. C. / Lin, H. C. / Tsai, M. S. / Huang, T. Y. et al. | 2001
- 460
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Effects of gas-flow structures on radical and etch-product density distributions on wafers in magnetomicrowave plasma etching reactorsIkegawa, Masato / Kobayashi, Jun’ichi / Fukuyama, Ryoji et al. | 2001
- 467
-
Cavity ring down detection of in a remote plasma and comparison with model calculations and mass spectrometryKessels, W. M. M. / Leroux, A. / Boogaarts, M. G. H. / Hoefnagels, J. P. M. / van de Sanden, M. C. M. / Schram, D. C. et al. | 2001
- 477
-
HBr concentration and temperature measurements in a plasma etch reactor using diode laser absorption spectroscopyChou, Shang-I / Baer, Douglas S. / Hanson, Ronald K. / Collison, Wenli Z. / Ni, Tom Q. et al. | 2001
- 485
-
Electron cyclotron wave resonance plasma assisted deposition of cubic boron nitride thin filmsCao, Z. X. et al. | 2001
- 490
-
Use of radio frequency bias in the large area plasma processing systemManheimer, Wallace M. / Lampe, Martin / Fernsler, Richard F. et al. | 2001
- 499
-
Comparison of pulsed laser deposition films grown from organic and inorganic targetsGonzález, P. / Soto, R. / León, B. / Pérez-Amor, M. et al. | 2001
- 503
-
Influence of the different operations of gas in the large microwave plasmasWu, Cong-Feng / Huang, Wei-Dong / Zhan, Ru-Juan et al. | 2001
- 507
-
Fluorinated–chlorinated films prepared at low temperature by remote plasma-enhanced chemical-vapor deposition using mixtures of andAlonso, J. C. / Pichardo, E. / Rodrı́guez-Fernandez, L. / Cheang-Wong, J. C. / Ortiz, A. et al. | 2001
- 515
-
Microcrystalline silicon by plasma enhanced chemical vapor deposition from silicon tetrafluorideCicala, G. / Capezzuto, P. / Bruno, G. et al. | 2001
- 524
-
Investigations of surface reactions during plasma etching of with equipment and feature scale modelsZhang, Da / Kushner, Mark J. et al. | 2001
- 539
-
Characteristics of a large diameter reactive ion beam generated by an electron cyclotron resonance microwave plasma sourceGeisler, St. / Brockhaus, A. / Engemann, J. et al. | 2001
- 547
-
Thermal imidization of fluorinated poly(amic acid) precursors on a glycidyl methacrylate graft-polymerized Si(100) surfaceZhang, Yan / Tan, K. L. / Liaw, B. Y. / Liaw, D. J. / Kang, E. T. / Neoh, K. G. et al. | 2001
- 557
-
Characterization of (Ti, Al)N films deposited by off-plane double bend filtered cathodic vacuum arcCheng, Y. H. / Tay, B. K. / Lau, S. P. / Shi, X. / Chua, H. C. et al. | 2001
- 563
-
Adsorption of and initial stages of Ti growth on Si(001)Mitsui, Toshiyuki / Hill, Eric / Curtis, Robert / Ganz, Eric et al. | 2001
- 568
-
Negative cesium sputter ion source for generating cluster primary ion beams for secondary ion mass spectrometry analysisGillen, Greg / King, Lance / Freibaum, Brian / Lareau, Richard / Bennett, Joe / Chmara, Frank et al. | 2001
- 576
-
Study of chromium oxide film growth by chemical vapor deposition using infrared reflection absorption spectroscopyBermudez, V. M. / DeSisto, W. J. et al. | 2001
- 584
-
Real-time spectroscopic ellipsometry as a characterization tool for oxide molecular beam epitaxyGibbons, B. J. / Hawley, M. E. / Trolier-McKinstry, S. / Schlom, D. G. et al. | 2001
- 591
-
Energy spectra of electrons in a dc glow discharge with a semitransparent anodePletnev, Vladimir / Zukotynski, Stefan et al. | 2001
- 599
-
Development of vacuum ultraviolet absorption spectroscopy technique employing nitrogen molecule microdischarge hollow cathode lamp for absolute density measurements of nitrogen atoms in process plasmasTakashima, Seigou / Arai, Shigeo / Hori, Masaru / Goto, Toshio / Kono, Akihiro / Ito, Masafumi / Yoneda, Katsumi et al. | 2001
- 603
-
Use of angle resolved x-ray photoelectron spectroscopy for determination of depth and thickness of compound layer structuresSpruytte, S. / Coldren, C. / Harris, J. / Pantelidis, D. / Lee, H.-J. / Bravman, J. / Kelly, M. et al. | 2001
- 609
-
Microstructure and tribological performance of co-sputtered compositesSimmonds, M. C. / Savan, A. / Pflüger, E. / Van Swygenhoven, H. et al. | 2001
- 614
-
Texture studies of thin films by x-ray diffraction and transmission electron microscopyQin, W. / Ast, D. G. / Kamins, T. I. et al. | 2001
- 621
-
Real-time growth rate metrology for a tungsten chemical vapor deposition process by acoustic sensingHenn-Lecordier, L. / Kidder, J. N. / Rubloff, G. W. / Gogol, C. A. / Wajid, A. et al. | 2001
- 627
-
Microscopic composition difference related to oxidizing humidity near the ultrathin silicon oxide–Si(100) interfaceYamada, Hiroshi et al. | 2001
- 633
-
Microstructural investigation of alpha-Al~2O~3-epitaxially coated cemented carbide cutting toolsIshii, T. / Shima, N. / Ueda, H. / Okayama, S. / Gonda, M. et al. | 2001
- 633
-
Microstructural investigation of -epitaxially coated cemented carbide cutting toolsIshii, Toshio / Shima, Nobuhiko / Ueda, Hiroshi / Okayama, Shirou / Gonda, Masayuki et al. | 2001
- 633
-
Microstructural investigation of a-Al2O3-epitaxially coated cemented carbide cutting toolsIshii, Toshio et al. | 2001
- 640
-
Mechanism of ultralow outgassing rates in pure copper and chromium–copper alloy vacuum chambers: Reexamination by the pressure-rise methodWatanabe, Fumio et al. | 2001
- 646
-
Study of a mechanically clamped cryo-chuck device in a high density plasma for deep anisotropic etching of siliconHibert, C. / Aachboun, S. / Boufnichel, M. / Ranson, P. et al. | 2001
- 651
-
Fixed-bed microreactor for transient kinetic experiments with strongly adsorbing gases under high vacuum conditionsvan Veen, A. C. / Zanthoff, H. W. / Hinrichsen, O. / Muhler, M. et al. | 2001
- 656
-
Spiral channel flows in a disk-type drag pumpHeo, Joong-Sik / Hwang, Young-Kyu et al. | 2001
- 662
-
Three-dimensional rarefied flows in rotating helical channelsHwang, Young-Kyu / Heo, Joong-Sik et al. | 2001
- 673
-
Calibrated variable leak for use in ion source operationLangley, Robert A. / Dastoor, Paul C. / O’Connor, D. John et al. | 2001
- 675
-
Speed distribution of molecular beam scattered through chattering collision on a LiF(001) surfaceTomii, Takashi / Kondo, Takahiro / Yagyu, Shinjiro / Yamamoto, Shigehiko et al. | 2001
- 681
-
Laser damage studies on thin filmsProtopapa, Maria Lucia / De Tomasi, Ferdinando / Perrone, Maria Rita / Piegari, Angela / Masetti, Enrico / Ristau, Detlev / Quesnel, Etienne / Duparré, Angela et al. | 2001
- 689
-
Brief Reports and Comments - Analysis of the molecular structure of fluorocarbon deposits produced by C4F8 and C4F8-H2 plasmasTakada, N. et al. | 2001
- 689
-
Analysis of the molecular structure of fluorocarbon deposits produced by and plasmasTakada, N. / Shibagaki, K. / Sasaki, K. / Kadota, K. / Oyama, K.-I. et al. | 2001
- 693
-
Reconsideration of the seal mechanism in the ConFlat® systemKurokouchi, Satoshi / Morita, Shinsaku / Okabe, Masayuki et al. | 2001
- 693
-
Brief Reports and Comments - Reconsideration of the seal mechanism in the ConFlat(R) systemKurokouchi, Satoshi et al. | 2001
- 697
-
Brief Reports and Comments - Gravity-related transport in reactive off-axis sputtering deposition?Zhu, Shen et al. | 2001
- 697
-
Gravity-related transport in reactive off-axis sputtering deposition?Zhu, Shen / Su, C.-H. / Lehozeky, S. L. et al. | 2001
- 700
-
Brief Reports and Comments - Radio-frequency transient match monitoring using a fast Fourier transform for plasma diagnosisKim, Byungwhan et al. | 2001
- 700
-
Radio-frequency transient match monitoring using a fast Fourier transform for plasma diagnosisKim, Byungwhan et al. | 2001
- 703
-
Formation of macroparticles in arc ion-plated nitride coatingsShiao, Ming-Hua / Shieu, Fuh-Sheng et al. | 2001
- 703
-
Rapid Communications - Formation of macroparticles in arc ion-plated nitride coatingsShiao, Ming-Hua et al. | 2001
- 706
-
Silicon bonding for ultrahigh vaccuum surface science studiesGokhale, Shubha / Fink, Andreas / Trischberger, Peter / Eberle, Karl / Widdra, Wolf et al. | 2001
- 706
-
Shop Notes - Silicon bonding for ultrahigh vaccuum surface science studiesGokhale, Shubha et al. | 2001
- 711
-
Profile evolution during polysilicon gate etching with low-pressure high-density plasma chemistriesTuda, Mutumi / Shintani, Kenji / Ootera, Hiroki et al. | 2001
- 711
-
Articles - Profile evolution during polysilicon gate etching with low-pressure high-density Cl2-HBr-O2 plasma chemistriesTuda, Mutumi et al. | 2001
- 718
-
Measurements of neutral and ion composition, neutral temperature, and electron energy distribution function in a inductively coupled plasmaSingh, Harmeet / Coburn, J. W. / Graves, David B. et al. | 2001
- 718
-
Articles - Measurements of neutral and ion composition, neutral temperature, and electron energy distribution function in a CF4 inductively coupled plasmaSingh, Harmeet et al. | 2001
- 730
-
Articles - Angular dependence of the redeposition rates during SiO2 etching in a CF4 PlasmaCho, Byeong-Ok et al. | 2001
- 730
-
Angular dependence of the redeposition rates during etching in a plasmaCho, Byeong-Ok / Hwang, Sung-Wook / Lee, Gyeo-Re / Moon, Sang Heup et al. | 2001
- 736
-
Influence of substrate bias on the structure and properties of (Ti, Al)N films deposited by filtered cathodic vacuum arcCheng, Y. H. / Tay, B. K. / Lau, S. P. / Shi, X. et al. | 2001
- 736
-
Articles - Influence of substrate bias on the structure and properties of (Ti, Al)N films deposited by filtered cathodic vacuum arcCheng, Y.H. et al. | 2001
- 743
-
Articles - Study of the early stage of SiO2 growth by a TEOS-O2 plasma mixture using a three-dimensional Monte Carlo modelRhallabi, A. et al. | 2001
- 743
-
Study of the early stage of growth by a plasma mixture using a three-dimensional Monte Carlo modelRhallabi, A. / Turban, G. et al. | 2001
- 750
-
Real-time feedback control of electron density in inductively coupled plasmasChang, Cheng-Hung / Leou, Keh-Chyang / Lin, Chaung et al. | 2001
- 750
-
Articles - Real-time feedback control of electron density in inductively coupled plasmasChang, Cheng-Hung et al. | 2001
- 757
-
Articles - Spectral plasma temperature determination of thermionic vacuum arc in the titanium vaporsBiloiu, Costel et al. | 2001
- 757
-
Spectral plasma temperature determination of thermionic vacuum arc in the titanium vaporsBiloiu, Costel / Ehrich, Horst / Musa, Geavit et al. | 2001
- 762
-
Damage in III/V semiconductors caused by hard- and soft-etching plasmasFranz, Gerhard et al. | 2001
- 762
-
Articles - Damage in III-V semiconductors caused by hard- and soft-etching plasmasFranz, Gerhard et al. | 2001
- 773
-
Deposition of trimethylsilane in glow dischargesYasuda, H. K. / Yu, Q. S. et al. | 2001
- 773
-
Articles - Deposition of trimethylsilane in glow dischargesYasuda, H.K. et al. | 2001
- 782
-
Synthesis of fluorinated diamond-like carbon films by the plasma immersion ion processing techniqueHakovirta, M. / Lee, D. H. / He, X. M. / Nastasi, M. et al. | 2001
- 782
-
Articles - Synthesis of fluorinated diamond-like carbon films by the plasma immersion ion processing techniqueHakovirta, M. et al. | 2001
- 785
-
Articles - Stabilizing inductively coupled plasma source impedance and plasma uniformity using a Faraday shieldKhater, Marwan H. et al. | 2001
- 785
-
Stabilizing inductively coupled plasma source impedance and plasma uniformity using a Faraday shieldKhater, Marwan H. / Overzet, Lawrence J. et al. | 2001
- 793
-
Diffusion and oxidation of plasma-enhanced chemical-vapor-deposition silicon nitride and underlying metalsHan, G. C. / Luo, P. / Li, K. B. / Wu, Y. H. et al. | 2001
- 793
-
Articles - Diffusion and oxidation of plasma-enhanced chemical-vapor-deposition silicon nitride and underlying metalsHan, G.C. et al. | 2001
- 798
-
Characterization and modeling of electrical resistivity of sputtered tungsten filmsLigot, J. / Benayoun, S. / Hantzpergue, J. J. et al. | 2001
- 798
-
Articles - Characterization and modeling of electrical resistivity of sputtered tungsten filmsLigot, J. et al. | 2001
- 805
-
Theoretical sputtering yields of Al and Mg targets in physical vapor deposition processesBordes, J. M. / Bordes, Ch. / Ehret, E. / Gschwind, R. / Bauer, Ph. et al. | 2001
- 805
-
Articles - Theoretical sputtering yields of Al and Mg targets in physical vapor deposition processesBordes, J.M. et al. | 2001
- 812
-
Depth of origin of sputtered atoms for elemental Al and Mg targets in physical vapor deposition processesBordes, J. M. / Bauer, Ph. et al. | 2001
- 812
-
Articles - Depth of origin of sputtered atoms for elemental Al and Mg targets in physical vapor deposition processesBordes, J.M. et al. | 2001
- 820
-
Molecular dynamics simulations of ion self-sputtering of Ni and Al surfacesHanson, D. E. / Stephens, B. C. / Saravanan, C. / Kress, J. D. et al. | 2001
- 820
-
Articles - Molecular dynamics simulations of ion self-sputtering of Ni and Al surfacesHanson, D.E. et al. | 2001
- 826
-
Refractive indices change at 633 nm of antimony thin films prepared by heliconwave-plasma sputtering methodShima, Takayuki / Kim, Jooho / Tominaga, Junji / Atoda, Nobufumi et al. | 2001
- 826
-
Articles - Refractive indices change at 633 nm of antimony thin films prepared by heliconwave-plasma sputtering methodShima, Takayuki et al. | 2001
- 830
-
Axisymmetrical particle-in-cell/Monte Carlo simulation of narrow gap planar magnetron plasmas. I. Direct current-driven dischargeKondo, Shuji / Nanbu, Kenichi et al. | 2001
- 830
-
Articles - Axisymmetrical particle-in-cell-Monte Carlo simulation of narrow gap planar magnetron plasmas. I. Direct current-driven dischargeKondo, Shuji et al. | 2001
- 838
-
Axisymmetrical particle-in-cell/Monte Carlo simulation of narrow gap planar magnetron plasmas. II. Radio frequency-driven dischargeKondo, Shuji / Nanbu, Kenichi et al. | 2001
- 838
-
Articles - Axisymmetrical particle-in-cell-Monte Carlo simulation of narrow gap planar magnetron plasmas. II. Radio frequency-driven dischargeKondo, Shuji et al. | 2001
- 848
-
Articles - Interface configuration and metal adhesion in Au-polycarbonate bilayer structure: Influence of 27Al+ ion mixingPatnaik, Archita et al. | 2001
- 848
-
Interface configuration and metal adhesion in Au-polycarbonate bilayer structure: Influence of ^2^7Al^+ ion mixingPatnaik, A. / Li, C. / Xie, S. / Yang, D. et al. | 2001
- 848
-
Interface configuration and metal adhesion in Au-polycarbonate bilayer structure: Influence of ion mixingPatnaik, Archita / Li, Changlin / Xie, Shuping / Yang, Dequan et al. | 2001
- 856
-
Articles - High resolution electron energy loss spectroscopy investigation of plasma-modified polystyrene surfacesWild, S. et al. | 2001
- 856
-
High resolution electron energy loss spectroscopy investigation of plasma-modified polystyrene surfacesWild, S. / Kesmodel, L. L. et al. | 2001
- 861
-
Growth of GaInTlAs layers on InP by molecular beam epitaxySánchez-Almazán, F. / Gendry, M. / Regreny, P. / Bergignat, E. / Grenet, G. / Hollinger, G. / Olivares, J. / Bremond, G. / Marty, O. / Pitaval, M. et al. | 2001
- 861
-
Articles - Growth of GaInTlAs layers on InP by molecular beam epitaxySánchez-Almazán, F. et al. | 2001
- 871
-
Fluorocarbon polymer formation, characterization, and reduction in polycrystalline–silicon etching with -added plasmaXu, Songlin / Sun, Zhiwen / Chen, Arthur / Qian, Xueyu / Podlesnik, Dragan et al. | 2001
- 871
-
Articles - Fluorocarbon polymer formation, characterization, and reduction in polycrystalline-silicon etching with CF4-added plasmaXu, Songlin et al. | 2001
- 878
-
Thermal model of Knudsen cells for organic molecular beam depositionPinotti, E. / Sassella, A. / Borghesi, A. et al. | 2001
- 878
-
Articles - Thermal model of Knudsen cells for organic molecular beam depositionPinotti, E. et al. | 2001
- 883
-
Articles - Optical properties of oxygen-ion-implanted benzocyclobutene filmsMada, Yoichi et al. | 2001
- 883
-
Optical properties of oxygen-ion-implanted benzocyclobutene filmsMada, Yoichi / Sugitani, Suehiro / Arai, Kunihiro / Yamasaki, Kimiyoshi et al. | 2001
- 887
-
Synthesis and structural, electrochromic characterization of pulsed laser deposited vanadium oxide thin filmsFang, Guo Jia / Liu, Z. L. / Wang, Yu / Liu, Y. H. / Yao, K. L. et al. | 2001
- 887
-
Articles - Synthesis and structural, electrochromic characterization of pulsed laser deposited vanadium oxide thin filmsFang, Guo Jia et al. | 2001
- 893
-
Low energy and beam-induced profile broadening effects in SiDeenapanray, Prakash N. K. / Petravic, Mladen et al. | 2001
- 893
-
Articles - Low energy O+-2 and N+-2 beam-induced profile broadening effects in SiDeenapanray, Prakash N.K. et al. | 2001
- 899
-
Articles - Preparation and characterization of p-type Sb2Te3 and n-type Bi2Te3 thin films grown by coevaporationZou, Helin et al. | 2001
- 899
-
Preparation and characterization of -type and -type thin films grown by coevaporationZou, Helin / Rowe, D. M. / Min, Gao et al. | 2001
- 904
-
Microstructure characterization of sol-gel prepared thin films for oxygen gas sensorsLi, Yongxiang / Galatsis, Kosmas / Wlodarski, Wojtek / Ghantasala, Muralihdar / Russo, Salvy / Gorman, John / Santucci, Sandra / Passacantando, Maurizio et al. | 2001
- 904
-
Articles - Microstructure characterization of sol-gel prepared MoO3-TiO2 thin films for oxygen gas sensorsLi, Yongxiang et al. | 2001
- 910
-
Chemical and structural characterization of thin films prepared by pulsed-laser depositionDecorse, P. / Quenneville, E. / Poulin, S. / Meunier, M. / Yelon, A. / Morin, F. et al. | 2001
- 910
-
Articles - Chemical and structural characterization of La0.5Sr0.5MnO3 thin films prepared by pulsed-laser depositionDecorse, P. et al. | 2001
- 916
-
Influence of ion bombardment on the chemical states of thin films fabricated by metalorganic decompositionPark, Yoon-Baek / Min, Kyung-youl / Cho, Kwang-Jun / Heo, Sung / Lim, Choul-Ho / Lee, Moon-Keun / Lee, Tae-Kwon / Kim, Ho-Joung / Lee, Soun-Young / Kim, Yil-Wook et al. | 2001
- 916
-
Articles - Influence of Ar+ ion bombardment on the chemical states of SrBi2Ta2O9 thin films fabricated by metalorganic decompositionPark, Yoon-Baek et al. | 2001
- 922
-
Articles - Structural and optical properties of titanium aluminum nitride films (Ti1-xAlxN)Schüler, Andreas et al. | 2001
- 922
-
Structural and optical properties of titanium aluminum nitride filmsSchüler, Andreas / Thommen, Verena / Reimann, Peter / Oelhafen, Peter / Francz, Gilbert / Zehnder, Thomas / Düggelin, Marcel / Mathys, Daniel / Guggenheim, Richard et al. | 2001
- 930
-
Epitaxial growth and electric characteristics of thin filmsWang, H. H. / Yang, G. Z. / Cui, D. F. / Lu, H. B. / Zhao, T. / Chen, F. / Zhou, Y. L. / Chen, Z. H. / Lan, Y. C. / Ding, Y. et al. | 2001
- 930
-
Articles - Epitaxial growth and electric characteristics of SrMoO3 thin filmsWang, H.H. et al. | 2001
- 934
-
Band offset and structure of heterojunctionsChambers, S. A. / Liang, Y. / Yu, Z. / Droopad, R. / Ramdani, J. et al. | 2001
- 934
-
Articles - Band offset and structure of SrTiO3-Si(001) heterojunctionsChambers, S.A. et al. | 2001
- 940
-
Modeling particle formation during low-pressure silane oxidation: Detailed chemical kinetics and aerosol dynamicsSuh, S.-M. / Zachariah, M. R. / Girshick, S. L. et al. | 2001
- 940
-
Articles - Modeling particle formation during low-pressure silane oxidation: Detailed chemical kinetics and aerosol dynamicsSuh, S.-M. et al. | 2001
- 952
-
Structure, stability, and mechanical properties of epitaxial W/NbN superlatticesMadan, A. / Barnett, S. A. / Misra, A. / Kung, H. / Nastasi, M. et al. | 2001
- 952
-
Articles - Structure, stability, and mechanical properties of epitaxial W-NbN superlatticesMadan, A. et al. | 2001
- 958
-
Articles - Electrically operated hydrogen and oxygen vacuum leaks using ceramic high-temperature ionic conductorsSchober, T. et al. | 2001
- 958
-
Electrically operated hydrogen and oxygen vacuum leaks using ceramic high-temperature ionic conductorsSchober, T. / Meuffels, P. et al. | 2001
- 963
-
Structural, electrical, and optical properties of transparent conductive oxide ZnO:Al films prepared by dc magnetron reactive sputteringChen, M. / Pei, Z. L. / Wang, X. / Sun, C. / Wen, L. S. et al. | 2001
- 963
-
Articles - Structural, electrical, and optical properties of transparent conductive oxide ZnO:Al films prepared by dc magnetron reactive sputteringChen, M. et al. | 2001
- 971
-
Hard graphitic-like amorphous carbon films with high stress and local microscopic densityLacerda, R. G. / Hammer, P. / Lepienski, C. M. / Alvarez, F. / Marques, F. C. et al. | 2001