Hydrogenation characteristics and observation of disintegration conditions of Ti–Mo and Ni-coated Ti–Mo thin films (English)
- New search for: Shi, L. Q.
- New search for: Zhou, Z. Y.
- New search for: Zhao, G. Q.
- New search for: He, M. H.
- New search for: Shi, L. Q.
- New search for: Zhou, Z. Y.
- New search for: Zhao, G. Q.
- New search for: He, M. H.
In:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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19
, 1
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240-245
;
2001
- Article (Journal) / Electronic Resource
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Title:Hydrogenation characteristics and observation of disintegration conditions of Ti–Mo and Ni-coated Ti–Mo thin films
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Contributors:
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Published in:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films ; 19, 1 ; 240-245
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Publisher:
- New search for: American Vacuum Society
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Publication date:2001-01-01
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Size:6 pages
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ISSN:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:English
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Keywords:
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Source:
Table of contents – Volume 19, Issue 1
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1
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Review Articles - Surface science with nanosized particles in a carrier gasKeller, A. et al. | 2001
- 1
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Surface science with nanosized particles in a carrier gasKeller, A. / Fierz, M. / Siegmann, K. / Siegmann, H. C. / Filippov, A. et al. | 2001
- 9
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Nitridation of thermal films by radio-frequency plasma assisted electron cyclotron resonance: Effect of plasma modes and process parametersRaveh, A. / Brewer, J. / Irene, E. A. et al. | 2001
- 9
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Articles - Nitridation of thermal SiO2 films by radio-frequency plasma assisted electron cyclotron resonance: Effect of plasma modes and process parametersRaveh, A. et al. | 2001
- 17
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Nitridation of thermal films by radio-frequency plasma assisted electron cyclotron resonance: Layer structure and compositionRaveh, A. / Brewer, J. / Irene, E. A. et al. | 2001
- 17
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Articles - Nitridation of thermal SiO2 films by radio-frequency plasma assisted electron cyclotron resonance: Layer structure and compositionRaveh, A. et al. | 2001
- 25
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Articles - Surface etching mechanism of silicon nitride in fluorine and nitric oxide containing plasmasKastenmeier, B.E.E. et al. | 2001
- 25
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Surface etching mechanism of silicon nitride in fluorine and nitric oxide containing plasmasKastenmeier, B. E. E. / Matsuo, P. J. / Oehrlein, G. S. / Ellefson, R. E. / Frees, L. C. et al. | 2001
- 31
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In situ characterization of residues formed on a plasma-etching chamberKawada, Hiroki / Yamane, Miyuki / Kitsunai, Hiroyuki / Suzuki, Shinichi et al. | 2001
- 31
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Articles - In situ characterization of residues formed on a plasma-etching chamberKawada, Hiroki et al. | 2001
- 38
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Articles - Remote-plasma-enhanced reaction between a silicon surface and trifluoro-acetyl-fluoride gasSaito, Yoji et al. | 2001
- 38
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Remote-plasma-enhanced reaction between a silicon surface and trifluoro-acetyl-fluoride gasSaito, Yoji / Yamazaki, Hirofumi / Mouri, Isamu et al. | 2001
- 41
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Electrical conduction studies of plasma enhanced chemical vapor deposited silicon nitride filmsBose, Mohua / Basa, D. K. / Bose, D. N. et al. | 2001
- 41
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Articles - Electrical conduction studies of plasma enhanced chemical vapor deposited silicon nitride filmsBose, Mohua et al. | 2001
- 45
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Articles - Absolute intensities of the vacuum ultraviolet spectra in oxide etch plasma processing dischargesWoodworth, J.R. et al. | 2001
- 45
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Absolute intensities of the vacuum ultraviolet spectra in oxide etch plasma processing dischargesWoodworth, J. R. / Riley, M. E. / Amatucci, V. A. / Hamilton, T. W. / Aragon, B. P. et al. | 2001
- 56
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Articles - Effects of ozone assisted deposition on the dielectric properties of 90(degree) off-axis radio frequency magnetron sputtered SrTiO3Gibbons, B.J. et al. | 2001
- 56
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Effects of ozone assisted deposition on the dielectric properties of 90° off-axis radio frequency magnetron sputteredGibbons, B. J. / Fan, Y. / Findikoglu, A. T. / Jia, Q. X. / Reagor, D. W. et al. | 2001
- 62
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Thin film growth of reactive sputter deposited tungsten–carbon thin filmsRack, Philip D. / Peterson, Jeffrey J. / Li, Jie / Geiculescu, A. C. / Rack, H. J. et al. | 2001
- 62
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Articles - Thin film growth of reactive sputter deposited tungsten-carbon thin filmsRack, Philip D. et al. | 2001
- 66
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Plasma etching endpoint detection using multiple wavelengths for small open-area wafersYue, H. Henry / Qin, S. Joe / Wiseman, Joseph / Toprac, Anthony et al. | 2001
- 66
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Articles - Plasma etching endpoint detection using multiple wavelengths for small open-area wafersYue, H.Henry et al. | 2001
- 76
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Wave propagation and power deposition in magnetically enhanced inductively coupled and helicon plasma sourcesKinder, Ronald L. / Kushner, Mark J. et al. | 2001
- 76
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Articles - Wave propagation and power deposition in magnetically enhanced inductively coupled and helicon plasma sourcesKinder, Ronald L. et al. | 2001
- 87
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Articles - Technology and realization of metallic curved waveguide mirrors in polymer film waveguides based on anisotropic plasma etchingWolff, S. et al. | 2001
- 87
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Technology and realization of metallic curved waveguide mirrors in polymer film waveguides based on anisotropic plasma etchingWolff, S. / Grosse, A. / Schimper, H.-J. / Giehl, A. R. / Kuhnke, M. / Grote, R. / Fouckhardt, H. et al. | 2001
- 90
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Predeposition ultraviolet treatment for adhesion improvement of thin films on mercury cadmium tellurideButcher, K. S. A. / Tansley, T. L. / Prince, K. / Leech, P. W. et al. | 2001
- 90
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Articles - Predeposition ultraviolet treatment for adhesion improvement of thin films on mercury cadmium tellurideButcher, K.S.A. et al. | 2001
- 97
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Quartz-crystal microbalance study for characterizing atomic oxygen in plasma ash toolsSrivastava, A. K. / Sakthivel, P. et al. | 2001
- 97
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Articles - Quartz-crystal microbalance study for characterizing atomic oxygen in plasma ash toolsSrivastava, A.K. et al. | 2001
- 101
-
Articles - Quantification of a radical beam source for methyl radicalsSchwarz-Selinger, T. et al. | 2001
- 101
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Quantification of a radical beam source for methyl radicalsSchwarz-Selinger, T. / Dose, V. / Jacob, W. / von Keudell, A. et al. | 2001
- 108
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Theoretical and experimental characterization of a low-pressure rf plasma and its optimization in electron-gas secondary-neutral mass spectrometryBieck, W. / Merz, E. / Gnaser, H. / Oechsner, H. et al. | 2001
- 108
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Articles - Theoretical and experimental characterization of a low-pressure rf plasma and its optimization in electron-gas secondary-neutral mass spectrometryBieck, W. et al. | 2001
- 118
-
Doped microshells prepared by radio frequency plasma enhanced chemical vapor deposition for inertial confinement fusion experimentsTheobald, M. / Baclet, P. / Legaie, O. / Durand, J. et al. | 2001
- 118
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Articles - Doped CHx microshells prepared by radio frequency plasma enhanced chemical vapor deposition for inertial confinement fusion experimentsTheobald, M. et al. | 2001
- 124
-
Articles - Crystallization of nanostructured silicon films deposited under a low-pressure argon-silane pulsed-glow discharge: Correlation with the plasma durationHadjadj, A. et al. | 2001
- 124
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Crystallization of nanostructured silicon films deposited under a low-pressure argon–silane pulsed-glow discharge: Correlation with the plasma durationHadjadj, A. / Beorchia, A. / Boufendi, L. / Huet, S. / Roca i Cabarrocas, P. et al. | 2001
- 130
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Fracture resistance enhancement of diamond-like carbon/nitrogenated diamond-like carbon multilayer deposited by electron cyclotron resonance microwave plasma chemical vapor depositionQi, J. / Lai, K. H. / Bello, I. / Lee, C. S. / Lee, S. T. / Luo, J. B. / Wen, S. Z. et al. | 2001
- 130
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Articles - Fracture resistance enhancement of diamond-like carbon-nitrogenated diamond-like carbon multilayer deposited by electron cyclotron resonance microwave plasma chemical vapor depositionQi, J. et al. | 2001
- 136
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Chemical stability of species in thin filmsBarranco, A. / Mejı́as, J. A. / Espinós, J. P. / Caballero, A. / González-Elipe, A. R. / Yubero, F. et al. | 2001
- 136
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Articles - Chemical stability of Sin+ species in SiOx (x<2) thin filmsBarranco, A. et al. | 2001
- 145
-
Effects of electron-beam irradiation on the properties of CN thin films deposited by direct dual ion beamsKim, Yong Hwan / Lee, Deuk Yeon / Kim, In Kyo / Baik, Hong Koo et al. | 2001
- 145
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Articles - Effects of electron-beam irradiation on the properties of CN thin films deposited by direct dual ion beamsKim, Yong Hwan et al. | 2001
- 153
-
Fundamental study of ion-irradiation effects on the columnar growth of chromium films prepared by ion-beam and vapor depositionKuratani, Naoto / Ebe, Akinori / Ogata, Kiyoshi / Shimizu, Ippei / Setsuhara, Yuichi / Miyake, Shoji et al. | 2001
- 153
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Articles - Fundamental study of ion-irradiation effects on the columnar growth of chromium films prepared by ion-beam and vapor depositionKuratani, Naoto et al. | 2001
- 158
-
Articles - Observations of the microscopic growth mechanism of pillars and helices formed by glancing-angle thin-film depositionMalac, Marek et al. | 2001
- 158
-
Observations of the microscopic growth mechanism of pillars and helices formed by glancing-angle thin-film depositionMalac, Marek / Egerton, Ray F. et al. | 2001
- 167
-
Articles - Influence of sputtering pressure on physical structure of AlN thin films prepared on Y-128(degree) LiNbO3 by rf magnetron sputteringWu, Long et al. | 2001
- 167
-
Influence of sputtering pressure on physical structure of AlN thin films prepared on Y-128° by rf magnetron sputteringWu, Long / Wu, Sean / Song, Hong-Tie et al. | 2001
- 171
-
Influence of deposition conditions on the thermal stability of ZnO:Al films grown by rf magnetron sputteringHaug, F.-J. / Geller, Zs. / Zogg, H. / Tiwari, A. N. / Vignali, C. et al. | 2001
- 171
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Articles - Influence of deposition conditions on the thermal stability of ZnO:Al films grown by rf magnetron sputteringHaug, F.-J. et al. | 2001
- 175
-
Articles - Atomistic simulation of fluorocarbon deposition on Si by continuous bombardment with energetic CF+ and CF+-2Abrams, Cameron F. et al. | 2001
- 175
-
Atomistic simulation of fluorocarbon deposition on Si by continuous bombardment with energetic andAbrams, Cameron F. / Graves, David B. et al. | 2001
- 182
-
Articles - Synchrotron x-ray diffraction and transmission electron microscopy studies of interfacial reaction paths and kinetics during annealing of fully-002-textured Al-TiN bilayersChun, J.-S. et al. | 2001
- 182
-
Synchrotron x-ray diffraction and transmission electron microscopy studies of interfacial reaction paths and kinetics during annealing of fully-002-textured Al/TiN bilayersChun, J.-S. / Carlsson, J. R. A. / Desjardins, P. / Bergstrom, D. B. / Petrov, I. / Greene, J. E. / Lavoie, C. / Cabral, C. / Hultman, L. et al. | 2001
- 192
-
Articles - Structural and electrical characteristics of Y2O3 films grown on oxidized Si(100) surfaceCho, M.-H. et al. | 2001
- 192
-
Structural and electrical characteristics of films grown on oxidized Si(100) surfaceCho, M.-H. / Ko, D.-H. / Choi, Y. G. / Jeong, K. / Lyo, I. W. / Noh, D. Y. / Kim, H. J. / Whang, C. N. et al. | 2001
- 200
-
Articles - Thickness dependence of Y2O3 films grown on an oxidized Si surfaceCho, M.-H. et al. | 2001
- 200
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Thickness dependence of films grown on an oxidized Si surfaceCho, M.-H. / Ko, D.-H. / Choi, Y. K. / Lyo, I. W. / Jeong, K. / Whang, C. N. / Kim, H. J. / Noh, D. Y. et al. | 2001
- 207
-
Articles - Interfacial chemistry of the Ba-SiOxNy-Si(100) nanostructureKirsch, P.D. et al. | 2001
- 207
-
Interfacial chemistry of the nanostructureKirsch, P. D. / Ekerdt, J. G. et al. | 2001
- 215
-
Articles - Anomalies in kinetics of hydrogen evolution from austenitic stainless steel from 300 to 1000 (degree)CNemanic, Vincenc et al. | 2001
- 215
-
Anomalies in kinetics of hydrogen evolution from austenitic stainless steel from 300 to 1000 °CNemanič, Vincenc / Zajec, Bojan / Šetina, Janez et al. | 2001
- 223
-
Intrinsic stress of alloy filmsJen, S. U. / Chung, C. M. et al. | 2001
- 223
-
Articles - Intrinsic stress of Co35Pd65 alloy filmsJen, S.U. et al. | 2001
- 228
-
Articles - Thin-walled vacuum chambers of austenitic stainless steelMoore, Boude C. et al. | 2001
- 228
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Thin-walled vacuum chambers of austenitic stainless steelMoore, Boude C. et al. | 2001
- 232
-
Microstructure and secondary phases in coevaporated films: Dependence on growth temperature and chemical compositionÁlvarez-Garcı́a, J. / Pérez-Rodrı́guez, A. / Romano-Rodrı́guez, A. / Morante, J. R. / Calvo-Barrio, L. / Scheer, R. / Klenk, R. et al. | 2001
- 232
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Articles - Microstructure and secondary phases in coevaporated CuInS2 films: Dependence on growth temperature and chemical compositionÁlvarez-Garcia, J. et al. | 2001
- 240
-
Articles - Hydrogenation characteristics and observation of disintegration conditions of Ti-Mo and Ni-coated Ti-Mo thin filmsShi, L.Q. et al. | 2001
- 240
-
Hydrogenation characteristics and observation of disintegration conditions of Ti–Mo and Ni-coated Ti–Mo thin filmsShi, L. Q. / Zhou, Z. Y. / Zhao, G. Q. / He, M. H. et al. | 2001
- 246
-
Structural characterization of polycrystalline Cd–Te–In filmsZapata-Torres, M. / Castro-Rodrı́guez, R. / Martel, A. / Mascarenhas, Y. P. / Guevara, J. / Melendez-Lira, M. / Peña, J. L. et al. | 2001
- 246
-
Articles - Structural characterization of polycrystalline Cd-Te-In filmsZapata-Torres, M. et al. | 2001
- 251
-
Articles - Efficient modeling of thin film deposition for low sticking using a three-dimensional microstructural simulatorSmy, T. et al. | 2001
- 251
-
Efficient modeling of thin film deposition for low sticking using a three-dimensional microstructural simulatorSmy, T. / Dew, S. K. / Joshi, R. V. et al. | 2001
- 262
-
Articles - Hydrocarbon thin films produced from adamantane-diamond surface deposition: Molecular dynamics simulationsPlaisted, Thomas A. et al. | 2001
- 262
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Hydrocarbon thin films produced from adamantane–diamond surface deposition: Molecular dynamics simulationsPlaisted, Thomas A. / Sinnott, Susan B. et al. | 2001
- 267
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Articles - Effects of chemical etching with nitric acid on glass surfacesJang, H.K. et al. | 2001
- 267
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Effects of chemical etching with nitric acid on glass surfacesJang, H. K. / Chung, Y. D. / Whangbo, S. W. / Kim, T. G. / Whang, C. N. / Lee, S. J. / Lee, S. et al. | 2001
- 275
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Electron-beam-assisted evaporation of epitaxial thin films on Si substratesInoue, Tomoyasu / Yamamoto, Yasuhiro / Satoh, Masataka et al. | 2001
- 275
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Articles - Electron-beam-assisted evaporation of epitaxial CeO2 thin films on Si substratesInoue, Tomoyasu et al. | 2001
- 280
-
Articles - GaN grown on two-step cleaned C-terminated 6H-SiC by molecular-beam epitaxyGuan, Z.P. et al. | 2001
- 280
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GaN grown on two-step cleaned C-terminated 6H–SiC by molecular-beam epitaxyGuan, Z. P. / Cai, A. L. / Porter, H. / Cabalu, J. / Chen, J. / Huang, S. / Giedd, R. E. et al. | 2001
- 287
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Model of crystal lattice strained along the preferential direction by anisotropic stress for GaAs heteroepitaxial films grown on vicinal Si(001) and Si(110) substrates by molecular-beam epitaxyYodo, T. et al. | 2001
- 287
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Articles - Model of crystal lattice strained along the preferential direction by anisotropic stress for GaAs heteroepitaxial films grown on vicinal Si(001) and Si(110) substrates by molecular-beam epitaxyYodo, T. et al. | 2001
- 292
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In situ determination of growth rate by pyrometric interferometry during molecular-beam epitaxy: Application to the growth of AlGaN/GaN quantum wellsNg, H. M. / Chu, S. N. G. / Cho, A. Y. et al. | 2001
- 292
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Articles - In situ determination of growth rate by pyrometric interferometry during molecular-beam epitaxy: Application to the growth of AlGaN-GaN quantum wellsNg, H.M. et al. | 2001
- 295
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Articles - Enhancement of tribological properties of 9Cr18 stainless steel by dual Mo and S Co implantationZhang, Tao et al. | 2001
- 295
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Enhancement of tribological properties of 9Cr18 stainless steel by dual Mo and S Co implantationZhang, Tao / Song, Jiaohua / Li, Guoqing / Chu, Paul K. / Brown, Ian G. et al. | 2001
- 299
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Articles - Preparation of AlN films by pulsed laser deposition using sintered aluminum nitride and elemental aluminum as raw materialsWu, J.D. et al. | 2001
- 299
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Preparation of AlN films by pulsed laser deposition using sintered aluminum nitride and elemental aluminum as raw materialsWu, J. D. / Sun, J. / Ying, Z. F. / Shi, W. / Ling, H. / Li, F. M. / Zhou, Z. Y. / Wang, K. L. / Ding, X. M. et al. | 2001
- 306
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Structural properties of CdS-doped glass nanocrystallites grown by pulsed laser deposition in high vacuumWang, H. / Zhu, Y. / Ong, P. P. et al. | 2001
- 306
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Articles - Structural properties of CdS-doped glass nanocrystallites grown by pulsed laser deposition in high vacuumWang, H. et al. | 2001
- 311
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Articles - Effect of chamber pressure and atmosphere on the microstructure and nanomechanical properties of amorphous carbon films prepared by pulsed laser depositionWei, Q. et al. | 2001
- 311
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Effect of chamber pressure and atmosphere on the microstructure and nanomechanical properties of amorphous carbon films prepared by pulsed laser depositionWei, Q. / Sankar, J. / Sharma, A. K. / Yamagata, Y. / Narayan, J. et al. | 2001
- 317
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Measurements of viscosity, velocity slip coefficients, and tangential momentum accommodation coefficients using a modified spinning rotor gaugeBentz, J. A. / Tompson, R. V. / Loyalka, S. K. et al. | 2001
- 317
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Articles - Measurements of viscosity, velocity slip coefficients, and tangential momentum accommodation coefficients using a modified spinning rotor gaugeBentz, J.A. et al. | 2001
- 325
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Articles - Heat dissipation in thin-film vacuum sensorBerlicki, T.M. et al. | 2001
- 325
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Heat dissipation in thin-film vacuum sensorBerlicki, T. M. et al. | 2001
- 329
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Transient analysis of carrier gas saturation in liquid source vapor generatorsMayer, Bruce / Collins, Craig C. / Walton, Mike et al. | 2001
- 329
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Articles - Transient analysis of carrier gas saturation in liquid source vapor generatorsMayer, Bruce et al. | 2001
- 345
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Process and fabrication of a lead zirconate titanate thin film pressure sensorZakar, E. / Dubey, M. / Piekarski, B. / Conrad, J. / Piekarz, R. / Widuta, R. et al. | 2001
- 345
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Articles - Process and fabrication of a lead zirconate titanate thin film pressure sensorZakar, E. et al. | 2001
- 349
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Vacuum gauge system with a self-compensator for photoelectrons produced in the SPring-8 storage ringSaeki, Hiroshi / Aoki, Tsuyoshi / Yonehara, Hiroto / Momose, Takashi et al. | 2001
- 349
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Articles - Vacuum gauge system with a self-compensator for photoelectrons produced in the SPring-8 storage ringSaeki, Hiroshi et al. | 2001
- 353
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Articles - Thermal micropressure sensor for pressure monitoring in a minute packageWang, S.N. et al. | 2001
- 353
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Thermal micropressure sensor for pressure monitoring in a minute packageWang, S. N. / Mizuno, K. / Fujiyoshi, M. / Funabashi, H. / Sakata, J. et al. | 2001
- 358
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Articles - Modeling a microfluidic system using Knudsen's empirical equation for flow in the transition regimeRobertson, J.K. et al. | 2001
- 358
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Modeling a microfluidic system using Knudsen’s empirical equation for flow in the transition regimeRobertson, J. K. / Wise, Kensall D. et al. | 2001
- 365
-
Articles - True and measured outgassing rates of a vacuum chamber with a reversibly adsorbed phaseAkaishi, K. et al. | 2001
- 365
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True and measured outgassing rates of a vacuum chamber with a reversibly adsorbed phaseAkaishi, K. / Nakasuga, M. / Funato, Y. et al. | 2001
- 372
-
Calculated energetics for adsorption and desorption steps during etching of Si(110) surface by ClHalicioglu, Timur et al. | 2001
- 372
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Brief Reports and Comments - Calculated energetics for adsorption and desorption steps during etching of Si(110) surface by ClHalicioglu, Timur et al. | 2001
- 376
-
Analysis of Langmuir probe data: Analytical parametrization, and the importance of the end effectNarasimhan, G. / Steinbrüchel, Ch. et al. | 2001
- 376
-
Brief Reports and Comments - Analysis of Langmuir probe data: Analytical parametrization, and the importance of the end effectNarasimhan, G. et al. | 2001
- 379
-
Enhanced coercivity by substrate bias configuration in Co-based alloy thin filmJin, Ding / Wang, Jian Ping / Gong, Hao et al. | 2001
- 379
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Rapid Communications - Enhanced coercivity by substrate bias configuration in Co-based alloy thin filmJin, Ding et al. | 2001
- 383
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Molecular beam epitaxy system at an undergraduate institutionCelinski, Z. et al. | 2001
- 383
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Shop Notes - Molecular beam epitaxy system at an undergraduate institutionCelinski, Z. et al. | 2001
- 386
-
Shop Notes - All-metal ultrahigh vacuum optical fiber feedthroughMiller, D.L. et al. | 2001
- 386
-
All-metal ultrahigh vacuum optical fiber feedthroughMiller, D. L. / Moshegov, N. T. et al. | 2001
- 388
-
Erratum: “Evolution of integrated-circuit vacuum processes: 1959–1975” [J. Vac. Sci. Technol. A 18, 1736 (2000)]Waits, Robert K. et al. | 2001
- 388
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Errata - Erratum: "Evolution of integrated-circuit vacuum processes: 1959-1975" (J. Vac. Sci. Technol. A 18, 1736 (2000))Waits, Robert K. et al. | 2001
- 389
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CUMULATIVE AUTHOR INDEX| 2001