Generalized ellipsometry for orthorhombic, absorbing materials: dielectric functions, phonon modes and band-to-band transitions of Sb2S3 (English)
- New search for: Schubert, M.
- New search for: Hofmann, T.
- New search for: Herzinger, C. M.
- New search for: Dollase, W.
- New search for: Schubert, M.
- New search for: Hofmann, T.
- New search for: Herzinger, C. M.
- New search for: Dollase, W.
In:
THIN SOLID FILMS
;
455-456
;
619-623
;
2004
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ISSN:
- Article (Journal) / Print
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Title:Generalized ellipsometry for orthorhombic, absorbing materials: dielectric functions, phonon modes and band-to-band transitions of Sb2S3
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Contributors:Schubert, M. ( author ) / Hofmann, T. ( author ) / Herzinger, C. M. ( author ) / Dollase, W. ( author )
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Published in:THIN SOLID FILMS ; 455-456 ; 619-623
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Publisher:
- New search for: Elsevier Science B.V., Amsterdam.
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Publication date:2004-01-01
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Size:5 pages
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ISSN:
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Type of media:Article (Journal)
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Type of material:Print
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Language:English
- New search for: 530.4275
- Further information on Dewey Decimal Classification
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Classification:
DDC: 530.4275 -
Source:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Table of contents – Volume 455-456
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1
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Preface| 2004
- 3
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Expanding horizons: new developments in ellipsometry and polarimetryAspnes, D.E. et al. | 2003
- 14
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Multichannel Mueller matrix ellipsometer based on the dual rotating compensator principleChen, Chi / An, Ilsin / Ferreira, G.M. / Podraza, N.J. / Zapien, J.A. / Collins, R.W. et al. | 2003
- 24
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Spectroscopic ellipsometry using the grating division-of-amplitude photopolarimeter (G-DOAP)Krishnan, S. / Hampton, Scott / Azzam, R.M.A. et al. | 2003
- 33
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Comparison of the capabilities of rotating-analyzer and rotating-compensator ellipsometers by measurements on a single systemMori, T. / Aspnes, D.E. et al. | 2003
- 39
-
Generalized magneto-optical ellipsometry in ferromagnetic metalsNeuber, G. / Rauer, R. / Kunze, J. / Backstrom, J. / Rübhausen, M. et al. | 2003
- 43
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Mueller matrix spectroscopic ellipsometry: formulation and applicationLaskarakis, A. / Logothetidis, S. / Pavlopoulou, E. / Gioti, M. et al. | 2003
- 50
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Optical anisotropy relevant to rotating-compensator polarimeters: application to the monoplate retarderAsar, M. / Aspnes, D.E. et al. | 2003
- 54
-
Prism spectroscopic ellipsometerAzzam, R.M.A. / Sudradjat, F.F. / Nazim Uddin, M. et al. | 2003
- 61
-
Accurate calibration and optimized measurement: use of an achromatic compensator in rotating polarizer spectroscopic ellipsometryBroch, L. / En Naciri, A. / Johann, L. et al. | 2003
- 66
-
Precision in ellipsometrically determined sample parameters: simulation and experimentJohs, Blaine / Herzinger, Craig M. et al. | 2003
- 72
-
Precision auto-alignment for incident angle of an ellipsometer using specimen stagePark, Sunglim / Gweon, DaeGab / Kim, Young Dong et al. | 2003
- 78
-
In situ calibration technique for photoelastic modulator in ellipsometryWang, M.W. / Tsai, F.H. / Chao, Y.F. et al. | 2003
- 84
-
New design of a spectroscopic ellipsometer by using a spectrometer with multiple gratings and a two-dimensional CCD array detectorYou, Hai-Yang / Jia, Jian-Hu / Chen, Jian-Ke / Han, Tao / Ni, Wei-Ming / Wang, Song-You / Li, Jin / Zhang, Rong-Jun / Yang, Yue-Mei / Chen, Liang-Yao et al. | 2003
- 90
-
Photo-interferometric spectroscopic ellipsometryMartinez-Antón, J.C. / Esteban, O. et al. | 2003
- 95
-
Evaluation of ellipsometric measurements using complex strategiesPolgár, O. / Fried, M. / Lohner, T. / Bársony, I. et al. | 2003
- 101
-
Error function for interpretations of ellipsometric measurementsPolovinkin, V.G. et al. | 2003
- 106
-
Application of spectral and temporal weighted error functions for data analysis in real-time spectroscopic ellipsometryZapien, J.A. / Ferlauto, A.S. / Collins, R.W. et al. | 2003
- 112
-
General methods for optimized design and calibration of Mueller polarimetersDe Martino, A. / Garcia-Caurel, E. / Laude, B. / Drévillon, B. et al. | 2003
- 120
-
Spectroscopic Mueller polarimeter based on liquid crystal devicesGarcia-Caurel, E. / De Martino, A. / Drévillon, B. et al. | 2003
- 124
-
Optical properties of anisotropic materials: an experimental approachAlonso, M.I. / Garriga, M. et al. | 2003
- 132
-
Calibration and data reduction for a UV-extended rotating-compensator multichannel ellipsometerAn, Ilsin / Zapien, J.A. / Chen, Chi / Ferlauto, A.S. / Lawrence, A.S. / Collins, R.W. et al. | 2003
- 138
-
Development and test of a new grating-polarimeter and its application in ellipsometric measurementsMasetti, E. / Krasilnikova, A. et al. | 2004
- 143
-
Far-infrared ellipsometry using a synchrotron light source—the dielectric response of the cuprate high Tc superconductorsBernhard, C. / Humlı́cek, J. / Keimer, B. et al. | 2004
- 150
-
Infrared spectroscopic ellipsometry applied to the characterization of ultra shallow junction on silicon and SOIDefranoux, C. / Emeraud, T. / Bourtault, S. / Venturini, J. / Boher, P. / Hernandez, M. / Laviron, C. / Noguchi, T. et al. | 2004
- 157
-
Optical purity evaluation of the noble metal by the ellipsometric methodZhou, Peng / Wang, Song-You / Li, Jing / Zhang, Rong-Jun / You, Hai-Yang / Shen, Zhuo-Chen / Chen, Liang-Yao et al. | 2003
- 161
-
Infrared dielectric functions and crystal orientation of a-plane ZnO thin films on r-plane sapphire determined by generalized ellipsometryBundesmann, C. / Ashkenov, N. / Schubert, M. / Rahm, A. / Wenckstern, H.v. / Kaidashev, E.M. / Lorenz, M. / Grundmann, M. et al. | 2003
- 167
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FTIR phase-modulated ellipsometry characterization of hydrogenated amorphous silicon nitride thin films with embedded nanoparticlesCanillas, A. / Pinyol, A. / Sancho-Parramon, J. / Ferré-Borrull, J. / Bertran, E. et al. | 2003
- 172
-
Infrared study of YBa2Cu3O7/La0.67Ca0.33MnO3 superlatticesDubroka, A. / Cristiani, G. / Habermeier, H.-U. / Humlı́ček, J. et al. | 2004
- 177
-
Diffraction effects in infrared ellipsometry of conducting samplesHumlı́ček, J. / Bernhard, C. et al. | 2004
- 183
-
Infrared ellipsometry of SiC/Si heterostructures with Ge modified interfacesZgheib, Ch. / Förster, Ch. / Weih, P. / Cimalla, V. / Kazan, M. / Masri, P. / Ambacher, O. / Pezoldt, J. et al. | 2003
- 187
-
Optical properties of silicon carbide polytypes below and around bandgapKildemo, M. et al. | 2003
- 196
-
Simultaneous determination of bulk isotropic and surface-induced anisotropic complex dielectric functions of semiconductors from high speed Mueller matrix ellipsometryChen, Chi / An, Ilsin / Collins, R.W. et al. | 2004
- 201
-
Optical characterization of aluminum-doped zinc oxide films by advanced dispersion theoriesPflug, Andreas / Sittinger, Volker / Ruske, Florian / Szyszka, Bernd / Dittmar, Georg et al. | 2004
- 207
-
Fine art painting characterization by spectroscopic ellipsometry: preliminary measurements on varnish layersChristofides, C. / Castellon, B. / Othonos, A. / Polikreti, K. / de Deyne, C. et al. | 2004
- 213
-
Optical properties study of MgB2Chvostová, D. / Železný, V. / Pajasová, L. / Tarasenko, A. / Plecenı́k, A. / Kúš, P. / Satrapinský, L. et al. | 2004
- 217
-
Optical constants and interband transitions of Ge1−xSnx alloys (x<0.2) grown on Si by UHV-CVDCook, Candi S. / Zollner, Stefan / Bauer, Matthew R. / Aella, Pavan / Kouvetakis, John / Menendez, Jose et al. | 2003
- 222
-
Parametric modeling of the dielectric functions of Cd1−xMgxTe alloy filmsIhn, Y.S. / Kim, T.J. / Ghong, T.H. / Kim, Y.D. / Aspnes, D.E. / Kossut, J. et al. | 2004
- 228
-
Optical properties of ZnSe and Zn0.87Mn0.13Se epilayers determined by spectroscopic ellipsometryKvietkova, J. / Daniel, B. / Hetterich, M. / Schubert, M. / Spemann, D. et al. | 2003
- 231
-
Hydrogen implantation in InGaNAs studied by spectroscopic ellipsometryLeibiger, G. / Gottschalch, V. / Razek, N. / Schindler, A. / Schubert, M. et al. | 2003
- 235
-
Infrared to vacuum ultraviolet optical properties of 3C, 4H and 6H silicon carbide measured by spectroscopic ellipsometryLindquist, O.P.A. / Schubert, M. / Arwin, H. / Järrendahl, K. et al. | 2004
- 239
-
Ion implantation-caused damage in SiC measured by spectroscopic ellipsometryPetrik, P. / Shaaban, E.R. / Lohner, T. / Battistig, G. / Fried, M. / Garcia Lopez, J. / Morilla, Y. / Polgár, O. / Gyulai, J. et al. | 2004
- 244
-
Phase-modulated spectroscopic ellipsometry and polarized transmission intensity studies of wide-gap biaxial CaGa2S4Shim, Yonggu / Mamedov, Nazim / Yamamoto, Nobuyuki et al. | 2004
- 248
-
Optical properties of bulk c-ZrO2, c-MgO and a-As2S3 determined by variable angle spectroscopic ellipsometrySynowicki, R.A. / Tiwald, Thomas E. et al. | 2004
- 256
-
IR ellipsometry and photoluminescence investigations of Zn1−xBexSe and Zn1−x−yBexMnySe mixed crystalsWronkowska, A.A. / Bejtka, K. / Arwin, H. / Wronkowski, A. / Firszt, F. / Łęgowski, S. / Męczyńska, H. / Marasek, A. et al. | 2003
- 261
-
Gate oxide metrology and silicon piezoopticsZollner, Stefan / Liu, Ran / Volinsky, A.A. / White, Ted / Nguyen, Bich-Yen / Cook, C.S. et al. | 2003
- 266
-
Structure analysis of organic films by mid-infrared ellipsometryHinrichs, K. / Röseler, A. / Gensch, M. / Korte, E.H. et al. | 2004
- 272
-
Infrared spectroscopic ellipsometry study of molecular orientation induced anisotropy in polymer substratesBungay, Corey / Tiwald, Thomas E. et al. | 2003
- 278
-
Temperature dependence of ellipsometric spectra of poly(methyl-phenylsilane)Bonaventurová Zrzavecká, O. / Nebojsa, A. / Navrátil, K. / Nešpůrek, S. / Humlı́ček, J. et al. | 2004
- 283
-
IR–FUV ellipsometry studies on the optical, electronic and vibrational properties of polymeric membranesGioti, M. / Laskarakis, A. / Logothetidis, S. et al. | 2003
- 288
-
Envelope analysis in spectroscopic ellipsometry of thin films. Application to a weakly-absorbing polymer filmMartinez-Antón, J.C. / Gómez-Pedrero, J.A. / Álvarez-Herrero, A. et al. | 2004
- 292
-
Swelling of a thin B+ implanted polyimide layer—a dynamic spectroscopic ellipsometry studyEichhorn, K.-J. / Sahre, K. / Günther, M. / Suchaneck, G. / Gerlach, G. et al. | 2003
- 295
-
Infrared ellipsometry characterization of conducting thin organic filmsSchubert, M. / Bundesmann, C. / Jakopic, G. / Maresch, H. / Arwin, H. / Persson, N.-C. / Zhang, F. / Inganäs, O. et al. | 2003
- 301
-
Relationships among surface processing at the nanometer scale, nanostructure and optical properties of thin oxide filmsLosurdo, Maria et al. | 2003
- 313
-
Correlations between the microstructure of Ag-Si3N4 multilayers and their optical propertiesGirardeau, T. / Camelio, S. / Babonneau, D. / Toudert, J. / Barranco, A. et al. | 2004
- 318
-
Characterization of interfacial layer of ultrathin Zr silicate on Si(100) using spectroscopic ellipsometry and HRTEMAhn, H. / Chen, H.-W. / Landheer, D. / Wu, X. / Chou, L.J. / Chao, T.-S. et al. | 2004
- 323
-
Ellipsometric characterisation of heterogeneous 2D layersWormeester, Herbert / Stefan Kooij, E. / Mewe, Agnes / Rekveld, Sander / Poelsema, Bene et al. | 2004
- 335
-
Dielectric function of Si nanocrystals embedded in SiO2Gallas, B. / Kao, Chih-Cheng / Defranoux, C. / Fisson, S. / Vuye, G. / Rivory, J. et al. | 2003
- 339
-
Spectroscopic ellipsometry of carbon nanotube formation in SiC surface decompositionMatsumoto, K. / Maeda, H. / Kawaguchi, Y. / Takahashi, K. / Aoyama, M. / Yamaguchi, T. / Postava, K. et al. | 2003
- 344
-
Depth distribution of disorder and cavities in high dose helium implanted silicon characterized by spectroscopic ellipsometryPetrik, P. / Cayrel, F. / Fried, M. / Polgár, O. / Lohner, T. / Vincent, L. / Alquier, D. / Gyulai, J. et al. | 2004
- 349
-
The simultaneous determination of n, k, and t from polarimetric dataFlock, K. et al. | 2004
- 356
-
Water adsorption in porous TiO2–SiO2 sol–gel films analyzed by spectroscopic ellipsometryAlvarez-Herrero, A. / Ramos, G. / del Monte, F. / Bernabeu, E. / Levy, D. et al. | 2004
- 361
-
Determination of refractive index of printed and unprinted paper using spectroscopic ellipsometryBakker, J.W.P. / Bryntse, G. / Arwin, H. et al. | 2004
- 366
-
Description of the porosity of inhomogeneous porous low-k films using solvent adsorption studied by spectroscopic ellipsometry in the visible rangeBourgeois, A. / Brunet Bruneau, A. / Jousseaume, V. / Rochat, N. / Fisson, S. / Demarets, B. / Rivory, J. et al. | 2003
- 370
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Visible and infrared ellipsometry applied to the study of metal-containing diamond-like carbon coatingsCorbella, C. / Pascual, E. / Canillas, A. / Bertran, E. / Andújar, J.L. et al. | 2003
- 376
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Application of in-situ ellipsometry to the fabrication of multi-layer optical coatings with sub-nanometre accuracyDligatch, Svetlana / Netterfield, Roger P. / Martin, Barry et al. | 2004
- 380
-
Complete wetting transition at the fluid–vapour interface of Ga–Bi studied by spectroscopic ellipsometryDogel, S. / Nattland, D. / Freyland, W. et al. | 2003
- 384
-
Spectroscopic ellipsometry characterization of ZnO–In2O3 systemsEl Rhaleb, H. / En Naciri, A. / Dounia, R. / Johann, L. / Hakam, A. / Addou, M. et al. | 2004
- 388
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Analytical model for the optical functions of amorphous semiconductors and its applications for thin film solar cellsFerlauto, A.S. / Ferreira, G.M. / Pearce, J.M. / Wronski, C.R. / Collins, R.W. / Deng, X. / Ganguly, G. et al. | 2003
- 393
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Optical properties of diamond-like carbon films containing SiOx studied by the combined method of spectroscopic ellipsometry and spectroscopic reflectometryFranta, Daniel / Ohlı́dal, Ivan / Buršı́ková, Vilma / Zajı́čková, Lenka et al. | 2003
- 399
-
Complete characterization of rough polymorphous silicon films by atomic force microscopy and the combined method of spectroscopic ellipsometry and spectroscopic reflectometryFranta, Daniel / Ohlı́dal, Ivan / Klapetek, Petr / Roca i Cabarrocas, Pere et al. | 2003
- 404
-
Dose-dependence of ion implantation-caused damage in silicon measured by ellipsometry and backscattering spectrometryFried, M. / Petrik, P. / Lohner, T. / Khánh, N.Q. / Polgár, O. / Gyulai, J. et al. | 2004
- 410
-
Characterisation of porous silicon composite material by spectroscopic ellipsometryGaillet, M. / Guendouz, M. / Ben Salah, M. / Le Jeune, B. / Le Brun, G. et al. | 2004
- 417
-
Spectroellipsometric characterization of sol–gel TiO2–CuO thin coatingsGartner, M. / Scurtu, R. / Ghita, A. / Zaharescu, M. / Modreanu, M. / Trapalis, C. / Kokkoris, M. / Kordas, G. et al. | 2004
- 422
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Ex situ spectroscopic ellipsometry investigations of chemical vapor deposited nanocomposite carbon thin filmsGupta, S. / Weiner, B.R. / Morell, G. et al. | 2003
- 429
-
Optical and magnetooptical properties of bismuth and gallium substituted iron garnet filmsHansteen, Fredrik / Egil Helseth, Lars / Johansen, Tom H. / Hunderi, Ola / Kirilyuk, Andrei / Rasing, Theo et al. | 2003
- 433
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Contributions to the static dielectric constant of low-k xerogel films derived from ellipsometry and IR spectroscopyHimcinschi, C. / Friedrich, M. / Frühauf, S. / Schulz, S.E. / Gessner, T. / Zahn, D.R.T. et al. | 2003
- 438
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Study of structure and optical properties of silver oxide films by ellipsometry, XRD and XPS methodsGao, Xiao-Yong / Wang, Song-You / Li, Jing / Zheng, Yu-Xiang / Zhang, Rong-Jun / Zhou, Peng / Yang, Yue-Mei / Chen, Liang-Yao et al. | 2003
- 443
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Dielectric function of thin metal films by combined in situ transmission ellipsometry and intensity measurementsPribil, G.K. / Johs, B. / Ianno, N.J. et al. | 2003
- 450
-
Mn1−xFex alloy films studied by optical and magneto-optical spectroscopiesKim, J.B. / Park, S.Y. / Lee, Y.P. / Kudryavtsev, Y.V. / Gontarz, R. / Szymański, B. et al. | 2004
- 453
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Effect of ion irradiation on the optical properties and room temperature oxidation of copper surfacePoperenko, L.V. / Ramadan Shaaban, Essam / Khánh, N.Q. / Stashchuk, V.S. / Vinnichenko, M.V. / Yurgelevich, I.V. / Nosach, D.V. / Lohner, T. et al. | 2004
- 457
-
Spectroscopic ellipsometry characterization of interface reactivity in GaAs-based superlatticesLosurdo, M. / Giuva, D. / Giangregorio, M.M. / Bruno, G. / Brown, A.S. et al. | 2003
- 462
-
The finite difference time domain method as a numerical tool for studying the polarization optical response of rough surfacesLehner, B. / Hingerl, K. et al. | 2004
- 468
-
Ellipsometric and XPS analysis of the interface between silver and SiO2, TiO2 and SiNx thin filmsMasetti, E. / Bulir, J. / Gagliardi, S. / Janicki, V. / Krasilnikova, A. / Di Santo, G. / Coluzza, C. et al. | 2003
- 473
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Spectroscopic ellipsometry of TaNx and VN filmsMistrik, J. / Takahashi, K. / Antos, R. / Aoyama, M. / Yamaguchi, T. / Anma, Y. / Fukuda, Y. / Takeyama, M.B. / Noya, A. / Jiang, Z.-T. et al. | 2003
- 478
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Spectroscopic ellipsometry of pulsed laser irradiated c-Ge surfacesMistrik, J. / Antos, R. / Murakami, K. / Aoyama, M. / Yamaguchi, T. / Anma, Y. / Fukuda, Y. / Medvid’, A. / Michko, A. et al. | 2003
- 482
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Spectroscopic ellipsometry analysis for investigation of the modification of thin film p-a-Si1−xCx:H after ultraviolet treatment in an Argon ambientMyong, Seung Yeop / Kim, Sang Soo / Lim, Koeng Su et al. | 2004
- 486
-
Correlation between silicon nanocrystalline size effect and spectroscopic ellipsometry responsesEn Naciri, A. / Mansour, M. / Johann, L. / Grob, J.J. / Eckert, C. et al. | 2003
- 491
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Ellipsometry characterization of oxidized copper layers for chemical mechanical polishing processNishizawa, H. / Tateyama, Y. / Saitoh, T. et al. | 2004
- 495
-
Optical characterization of ferroelectric strontium–bismuth–tantalate (SBT) thin filmsSchmidt, C. / Petrik, P. / Schneider, C. / Fried, M. / Lohner, T. / Bársony, I. / Gyulai, J. / Ryssel, H. et al. | 2003
- 500
-
UV-VUV spectroscopic ellipsometry of ternary MgxZn1-xO (0x<=0.53) thin filmsSchmidt-Grund, R. / Schubert, M. / Rheinlander, B. / Fritsch, D. / Schmidt, H. / Kaidashev, E. M. / Lorenz, M. / Herzinger, C. M. / Grundmann, M. et al. | 2004
- 500
-
UV–VUV spectroscopic ellipsometry of ternary MgxZn1−xO (0≤x≤0.53) thin filmsSchmidt-Grund, R. / Schubert, M. / Rheinländer, B. / Fritsch, D. / Schmidt, H. / Kaidashev, E.M. / Lorenz, M. / Herzinger, C.M. / Grundmann, M. et al. | 2003
- 505
-
Vacuum ultraviolet spectroscopic ellipsometry investigations of guanine layers on H-passivated Si(111) surfacesSilaghi, S.D. / Friedrich, M. / Scholz, R. / Kampen, T.U. / Cobet, C. / Esser, N. / Richter, W. / Braun, W. / Zahn, D.R.T. et al. | 2002
- 509
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Spectroellipsometric study of the sol–gel nanocrystalline ITO multilayer filmsStoica, T.F. / Gartner, M. / Losurdo, M. / Teodorescu, V. / Blanchin, M. / Stoica, T. / Zaharescu, M. et al. | 2003
- 513
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Photopolarimetric investigations of liquid crystals–electrochromic oxides interfaceStrangi, G. / Versace, C. / Scaramuzza, N. / Cazzanelli, E. / Bruno, V. / Vena, C. / D'Elia, S. / Bartolino, R. et al. | 2003
- 519
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Spectroscopic ellipsometry (SE) and grazing X-ray reflectometry (GXR) analyses on tungsten carbide films for diffusion barrier in copper metallization schemesSun, Lianchao / Fouere, Jean-Claude / Sammet, Timo / Hatzistergos, Michael / Efstathiadis, Harry et al. | 2004
- 525
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Spectroscopic ellipsometry study on e-beam deposited titanium dioxide filmsSun, Lianchao / Hou, Ping et al. | 2004
- 530
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Spectroscopic ellipsometry investigation of amorphous carbon films with different sp3 content: relation with protein adsorptionVinnichenko, M. / Gago, R. / Huang, N. / Leng, Y.X. / Sun, H. / Kreissig, U. / Kulish, M.P. / Maitz, M.F. et al. | 2003
- 535
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The ideal vehicle for optical model development: porous silicon multilayersVolk, J. / Fried, M. / Tóth, A.L. / Bársony, I. et al. | 2004
- 540
-
Spectroscopic ellipsometry study of focused ion beam induced GaAs surface modificationBasnar, B. / Lugstein, A. / Bertagnolli, E. / Gornik, E. et al. | 2004
- 545
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Ellipsometric analysis of gamma radiation effects on standard optical coatings used in aerospace applicationsFernández-Rodrı́guez, M. / Ramos, G. / del Monte, F. / Levy, D. / Alvarado, C.G. / Núñez, A. / Álvarez-Herrero, A. et al. | 2004
- 551
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Determination of the anisotropic dielectric function for metal free phthalocyanine thin filmsGordan, O.D. / Friedrich, M. / Zahn, D.R.T. et al. | 2003
- 557
-
Investigation of optical anisotropy of Langmuir–Blodgett films of long-chain acetylenic acidsBadmaeva, I.A. / Nenasheva, L.A. / Polovinkin, V.G. / Repinsky, S.M. / Sveshnikova, L.L. et al. | 2003
- 563
-
Far-infrared magnetooptic generalized ellipsometry: determination of free-charge-carrier parameters in semiconductor thin film structuresSchubert, Mathias / Hofmann, Tino / Herzinger, Craig M. et al. | 2003
- 571
-
Analysis of the optical properties and structure of sculptured thin films from spectroscopic Mueller matrix ellipsometryPodraza, N.J. / Chen, Chi / An, Ilsin / Ferreira, G.M. / Rovira, P.I. / Messier, R. / Collins, R.W. et al. | 2003
- 576
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Anisotropic optical functions of pentaerythrytol, an uniaxial organic crystalSassella, A. / Wagner, Th. / Herzinger, C. / Su, Genbo / He, Youping / Chen, Chenjia et al. | 2003
- 581
-
Generalized ellipsometry for the characterization of anisotropic materials: influence of the sample adjustment on the extracted optical indicesBoher, P. / Piel, J.P. / Sacépé, B. et al. | 2004
- 586
-
VASE and IR spectroscopy: excellent tools to study biaxial organic molecular thin films: DiMe-PTCDI on S-passivated GaAs(100)Friedrich, M. / Himcinschi, C. / Salvan, G. / Anghel, M. / Paraian, A. / Wagner, Th. / Kampen, T.U. / Zahn, D.R.T. et al. | 2003
- 591
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Mueller-matrix characterization of liquid crystalsHilfiker, J.N. / Herzinger, C.M. / Wagner, T. / Marino, Antigone / Delgais, Guiseppe / Abbate, Giancarlo et al. | 2004
- 596
-
Generalized spectroscopic ellipsometry and Mueller-matrix study of twisted nematic and super twisted nematic liquid crystalsHilfiker, J.N. / Johs, B. / Herzinger, C.M. / Elman, J.F. / Montbach, E. / Bryant, D. / Bos, P.J. et al. | 2004
- 601
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Far-infrared dielectric function and phonon modes of spontaneously ordered (AlxGa1−x)0.52In0.48PHofmann, Tino / Schubert, Mathias / Gottschalch, Volker et al. | 2003
- 605
-
Concentration and size dependence of optical properties of Ag:Bi2O3 composite films by using the co-sputtering methodZhou, Peng / You, Hai-Yang / Jia, Jian-Hu / Li, Jing / Han, Tao / Wang, Song-You / Zhang, Rong-Jun / Zheng, Yu-Xiang / Chen, Liang-Yao et al. | 2003
- 609
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Ellipsometry on uniaxial ZnO and Zn1−xMgxO thin films grown on (0001) sapphire substrateKang, T.D. / Lee, Hosun / Park, Won-Il / Yi, Gyu-Chul et al. | 2003
- 615
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Magneto-optical ellipsometry of systems containing thick layersPostava, K. / Životský, O. / Pištora, J. / Yamaguchi, T. et al. | 2003
- 619
-
Generalized ellipsometry for orthorhombic, absorbing materials: dielectric functions, phonon modes and band-to-band transitions of Sb2S3Schubert, M. / Hofmann, T. / Herzinger, C.M. / Dollase, W. et al. | 2003
- 624
-
Mueller matrix ellipsometry study of uniaxial deuterated potassium dihydrogen phosphate (DKDP)Synowicki, R.A. / Hilfiker, James N. / Whitman, Pamela K. et al. | 2004
- 628
-
Coherent and incoherent interference modelling and measurement of anisotropic multilayer stacks using conventional ellipsometryTouir, H. / Stchakovsky, M. / Ossikovski, R. / Warenghem, M. et al. | 2003
- 632
-
General virtual interface algorithm for in situ spectroscopic ellipsometric data analysisJohs, Blaine et al. | 2003
- 639
-
Integrated rotating-compensator polarimeter for real-time measurements and analysis of organometallic chemical vapor depositionFlock, K. / Kim, S.-J. / Asar, M. / Kim, I.K. / Aspnes, D.E. et al. | 2004
- 645
-
Control of etch depth in patterned semiconductor substrates using real time spectroscopic ellipsometryCho, S.-J. / Snyder, P.G. / Ianno, N.J. / Herzinger, C.M. / Johs, B. et al. | 2004
- 650
-
Spectroellipsometric evaluation of colour and oxidation resistance of TiMgN coatingsBanakh, O. / Balzer, M. / Fenker, M. / Blatter, A. et al. | 2003
- 656
-
An in situ study of mesostructured CTAB-silica film formation using infrared ellipsometry: evolution of water contentBrunet-Bruneau, A. / Bourgeois, A. / Cagnol, F. / Grosso, D. / Sanchez, C. / Rivory, J. et al. | 2003
- 661
-
In-situ spectroscopic ellipsometry investigation and control of GaN growth mode in metal-organic vapor phase epitaxy at low pressures of 20 TorrCao, B. / Xu, K. / Ishitani, Y. / Yoshikawa, A. et al. | 2004
- 665
-
Evaluation of compositional depth profiles in mixed-phase (amorphous+crystalline) silicon films from real time spectroscopic ellipsometryFerlauto, A.S. / Ferreira, G.M. / Koval, R.J. / Pearce, J.M. / Wronski, C.R. / Collins, R.W. / Al-Jassim, M.M. / Jones, K.M. et al. | 2003
- 670
-
Real-time studies of amorphous and microcrystalline Si:H growth by spectroscopic ellipsometry and infrared spectroscopyFujiwara, Hiroyuki / Kondo, Michio / Matsuda, Akihisa et al. | 2003
- 675
-
Observation of the cascaded phase transformation of Ge–Sb–Te alloy at elevated temperature by using nanosecond time resolved ellipsometryKim, Sang Jun / Park, Young D. / An, Sung Hyuck / Kim, Sang Youl et al. | 2004
- 679
-
In-situ studies of the growth of amorphous and nanocrystalline silicon using real time spectroscopic ellipsometryLevi, D.H. / Nelson, B.P. / Iwanizcko, E. / Teplin, C.W. et al. | 2003
- 684
-
In-situ growth monitoring by spectroscopy ellipsometry of MOCVD cubic-GaN(001)Montaigne Ramil, A. / Schmidegg, K. / Bonanni, A. / Sitter, H. / Stifter, D. / Shunfeng, Li / As, D.J. / Lischka, K. et al. | 2004
- 688
-
In situ ellipsometry for control of Hg1−xCdxTe nanolayer structures and inhomogeneous layers during MBE growthShvets, V.A. / Rykhlitski, S.V. / Spesivtsev, E.V. / Aulchenko, N.A. / Mikhailov, N.N. / Dvoretsky, S.A. / Sidorov, Yu.G. / Smirnov, R.N. et al. | 2003
- 695
-
In situ spectroscopic ellipsometry of hydrogen-argon plasma cleaned silicon surfacesFörster, Ch. / Schnabel, F. / Weih, P. / Stauden, Th. / Ambacher, O. / Pezoldt, J. et al. | 2003
- 700
-
Time-resolved microellipsometry for rapid thermal processes monitoringSpesivtsev, E.V. / Rykhlitsky, S.V. / Shvets, V.A. / Chikichev, S.I. / Mardezhov, A.S. / Nazarov, N.I. / Volodin, V.A. et al. | 2003
- 705
-
Realtime layer-by-layer analysis for multilayer fabrication monitoring by an automatic null ellipsometerTsuru, T. / Tsutou, T. / Yamamoto, M. et al. | 2004
- 710
-
In situ measurements of chemical sensor film dynamics by spectroscopic ellipsometry. Three case studiesZudans, Imants / Heineman, William R. / Seliskar, Carl J. et al. | 2004
- 716
-
Protein monolayers monitored by internal reflection ellipsometryPoksinski, M. / Arwin, H. et al. | 2004
- 722
-
Application of FTIR ellipsometry to detect and classify microorganismsGarcia-Caurel, Enric / Nguyen, Jacqueline / Schwartz, Laurent / Drévillon, Bernard et al. | 2004
- 726
-
Protein adsorption in porous silicon gradients monitored by spatially-resolved spectroscopic ellipsometryKarlsson, L.M. / Schubert, M. / Ashkenov, N. / Arwin, H. et al. | 2004
- 731
-
Spectroscopic ellipsometry on biological materials – investigation of hydration dynamics and structural propertiesSchulz, B. / Chan, D. / Bäckström, J. / Rübhausen, M. et al. | 2004
- 735
-
In situ ellipsometric and electrochemical monitoring of the oxidation of a Pb–Ca–Sn alloy used in the lead acid batteriesStein, N. / Bourguignon, G. / Raboin, L. / Broch, L. / Johann, L. / Rocca, E. et al. | 2003
- 742
-
Use of in-situ spectroscopic ellipsometry to study aluminium/oxide surface modifications in chloride and sulfuric solutionsVan Gils, S. / Melendres, C.A. / Terryn, H. / Stijns, E. et al. | 2004
- 747
-
CO2 sorption of a ceramic separation membraneWormeester, Herbert / Benes, Nieck E. / Spijksma, Gerald I. / Verweij, Henk / Poelsema, Bene et al. | 2004
- 752
-
Reflection anisotropy spectroscopy of molecular assembly at metal surfacesMartin, D.S. / Weightman, P. et al. | 2003
- 759
-
Atomic-layer resolved monitoring of thermal oxidation of Si(001) by reflectance difference oscillation techniqueYasuda, Tetsuji / Nishizawa, Masayasu / Kumagai, Naoto / Yamasaki, Satoshi / Oheda, Hitoshi / Yamabe, Kikuo et al. | 2003
- 764
-
Calculation of surface optical properties: from qualitative understanding to quantitative predictionsSchmidt, W.G. / Seino, K. / Hahn, P.H. / Bechstedt, F. / Lu, W. / Wang, S. / Bernholc, J. et al. | 2003
- 772
-
Industrial applications of spectroscopic ellipsometryTompkins, Harland G. et al. | 2004
- 779
-
Biplate artifacts in rotating-compensator ellipsometersEbert, K. / Aspnes, D.E. et al. | 2004
- 784
-
Ellipsometric monitoring of molecular evolution in freely suspended films of M12/10 ferroelectric liquid crystalBortchagovsky, E.G. / Deineka, A. / Glogarová, M. / Hamplová, V. / Jastrabı́k, L. / Kašpar, M. et al. | 2004
- 790
-
Performance analysis of ellipsometer systemsAsinovski, Leo et al. | 2003
- 794
-
Spectroscopic ellipsometry for in-line monitoring of silicon nitridesCook, Candi S. / Daly, Terry / Liu, Ran / Canonico, Michael / Xie, Q. / Gregory, R.B. / Zollner, Stefan et al. | 2003
- 798
-
Automated metrology system including VUV spectroscopic ellipsometry and X-ray reflectometry for 300 mm silicon microelectronicsBoher, P / Evrard, P / Condat, O / Dos Reis, C / Defranoux, C / Piel, J.Ph / Stehle, J.L / Bellandi, E et al. | 2004
- 804
-
Application of the genetic algorithms in spectroscopic ellipsometryKudla, Andrzej et al. | 2003
- 809
-
A new multiple wavelength ellipsometric imager: design, limitations and applicationsBoher, P. / Thomas, O. / Piel, J.P. / Stehle, J.L. et al. | 2004
- 819
-
Oxidation behaviour of thin silver films deposited on plastic web characterized by spectroscopic ellipsometry (SE)Sahm, H / Charton, C / Thielsch, R et al. | 2003
- 824
-
A memory application of light reflection from anisotropic micro-structured thin filmsTazawa, M. / Xu, G. / Jin, P. / Arwin, H. et al. | 2003
- 828
-
Spectroscopic ellipsometry and reflectometry from gratings (Scatterometry) for critical dimension measurement and in situ, real-time process monitoringHuang, Hsu-Ting / Terry Jr, Fred L. et al. | 2004
- 837
-
Author Index| 2004
- 840
-
Subject Index| 2004
- iii
-
Editorial Board| 2004