Mask and Lithography Conference (EMLC), 2007 23rd European : date, 22-26 Jan. 2007 (English)
- New search for: European Mask and Lithography Conference
- New search for: European Mask and Lithography Conference
2007
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ISBN:
- Conference Proceedings / Electronic Resource
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Title:Mask and Lithography Conference (EMLC), 2007 23rd European : date, 22-26 Jan. 2007
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Additional title:2007 23rd European Mask and Lithography Conference (EMLC)
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Contributors:
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Conference:European Mask and Lithography Conference ; 23rd
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Publisher:
- New search for: [VDE?]
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Place of publication:[Berlin?]
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Publication date:2007
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Size:1 Online-Ressource
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Remarks:illustrations
Includes bibliographical references -
ISBN:
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Type of media:Conference Proceedings
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Type of material:Electronic Resource
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Language:English
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Keywords:
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Source:
Table of contents conference proceedings
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
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CDO BudgetingNesladek, Pavel / Wiswesser, Andreas / Sass, Björn / Mauermann, Sebastian et al. | 2008
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Phame(R) - high resolution off-axis phase shift measurements on 45nm node featuresButtgereit, Ute / Perlitz, Sascha / Seidel, Dirk et al. | 2008
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Status of EUVL Reticle ChuckingEngelstad, Roxann L. / Sohn, Jaewoong / Zeuske, Jacob R. / Battul, Venkata Siva / Vukkadala, Pradeep / Peski, Chris K. Van / Orvek, Kevin J. / Turner, Kevin T. / Mikkelson, Andrew R. / Nataraju, Madhura et al. | 2008
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Key improvement Schemes of Accuracies in EB Mask Writing for Double Patterning LithographySunaoshi, Hitoshi / Kamikubo, Takashi / Nishimura, Rieko / Tsuruta, Kaoru / Katsumata, Takehiko / Ohnishi, Takayuki / Anze, Hirohito / Takamatsu, Jun / Yoshitake, Shusuke / Tamamushi, Shuichi et al. | 2008
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Printing of sub resolution shots in electron beam direct write with variable shaped beam machinesThrum, Frank / Kretz, Johannes / Hohle, Christoph / Choi, Kang-Hoon / Keil, Katja et al. | 2008
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EUV Blank InspectionPeters, J. H. / Tonk, C. / Spriegel, D. / Han, Hak-Seung / Wurm, Stefan et al. | 2008
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Characterizing the imaging performance of Flash Memory masks using AIMS(TM)Setten, Eelco van / Wismans, Onno / Grim, Kees / Finders, Jo / Dusa, Mircea / Birkner, Robert / Richter, Rigo / Scherübl, Thomas et al. | 2008
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Comparative scatterometric CD and edge profile measurements on a MoSi mask using different scatterometersWurm, M. / Diener, A. / Bodermann, B. et al. | 2008
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New alignment marks for improved measurement maturityWeidenmueller, U. / Alves, H. / Schnabel, B. / Icard, B. / Le-Denmat, J-C. / Manakli, S. / Pradelles, J. et al. | 2008
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Overcoming Mask Etch Challenges for 45 nm & BeyondChandrachood, M. / Leung, T. Y. B. / Yu, K. / Grimbergen, M. / Panayil, S. / Ibrahim, I. / Sabharwal, A. / Kumar, A. et al. | 2008
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Desired IP Control methodology for EUV Mask in Current Mask ProcessYoshitake, S. / Tamamushi, S. / Ogasawara, M. et al. | 2008
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Practical use of hard mask process to fabricate fine photomasks for 45nm node and beyondKushida, Yasuyuki / Handa, Hitoshi / Maruyama, Hiroshi / Abe, Yuuki / Fujimura, Yukihiro / Yokoyama, Toshifumi et al. | 2008
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Phase-shifting photomask repair and repair validation procedure for transparent & opaque defects relevant for the 45nm node and beyondEhrlich, Christian / Buttgereit, Ute / Boehm, Klaus / Scheruebl, Thomas / Edinger, Klaus / Bret, Tristan et al. | 2008
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Influences on accuracy of SEM based CD mask metrology with a view to the 32 nm nodeHäßler-Grohne, W. / Frase, C. G. / Gnieser, D. / Bosse, H. / Richter, J. / Wiswesser, A. et al. | 2008
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Top surface imaging study by selective chemisorptions of poly(dimethyl siloxane) on diazoketo-functionalized polymeric surfaceGanesan, Ramakrishnan / Youn, Seul Ki / Yun, Jei-Moon / Kim, Jin-Baek et al. | 2008
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Wafer Based Mask Characterization for Double Patterning LithographyKruif, Robert de / Bubke, Karsten / Janssen, Gert-Jan / Heijden, Eddy van der / Fochler, Jörg / Dusa, Mircea / Peters, Jan Hendrik / Haas, Paul de / Connolly, Brid et al. | 2008
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Alternative Approach to Transparent Stamps for UV-based Nanoimprint Lithography – Techniques and MaterialsKlukowska, Anna / Vogler, Marko / Kolander, Anett / Reuther, Freimut / Gruetzner, Gabi / Muehlberger, Michael / Bergmair, Iris / Schoeftner, Rainer et al. | 2008
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Strategies for hybrid techniques of UV lithography and thermal nanoimprintWissen, M. / Bogdanski, N. / Moellenbeck, S. / Scheer, H.-C. et al. | 2008
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Progress of Nil Template MakingYusa, Satoshi / Hiraka, Takaaki / Mizuochi, Jun / Fujii, Akiko / Sakai, Yuko / Kuriyama, Koki / Sakaki, Masashi / Sasaki, Shiho / Morikawa, Yasutaka / Mohri, Hiroshi et al. | 2008
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MEDEA+ project 2T302 MUSCLE “Masks through user’s supply chain: leadership by excellence”Torsy, Andreas et al. | 2008
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Photomask cleaning process improvement to minimize ArF hazeGraham, Michael / McDonald, Andrew et al. | 2008
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3-Dimensional bridged structures by thermal-UV imprint using a novel maskOkuda, Keisuke / Kawata, Hiroaki / Hirai, Yoshihiko et al. | 2008
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Introduction of new database reflected tritone algorithm for application in mask productionSchulmeyer, Thomas / Schmalfuss, Heiko / Heumann, Jan / Lang, Michael et al. | 2008
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Inspection results of advanced (sub-50nm design rule) reticles using the TeraScanHRSier, Jean-Paul / Broadbent, William / Yu, Paul et al. | 2008
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Mask Industry Assessment Trend AnalysisShelden, Gilbert / Marmillion, Patrica / Hughes, Greg et al. | 2008
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Three Dimensional Mask Effects in OPC Process Model Development From First Principles SimulationMelvin III, Lawrence S. / Schmoeller, Thomas / Kalus, Christian K. / Lia, Jianliang et al. | 2008
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Theoretical Study of Mask Haze FormationWu, Banqiu / Kumar, Ajay et al. | 2008
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High-resolution and high-precision pattern placement metrology for the 45 nm node and beyondKlose, G. / Buttgereit, U. / Arnz, M. / Rosenkranz, N. et al. | 2008
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New Results from DUV Water Immersion Microscopy Using the CD Metrology System LWM500 WI with a High NA CondenserHillmann, Frank / Scheuring, Gerd / Brück, Hans-Jürgen et al. | 2008
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Polarization-induced astigmatism caused by topographic masksRuoff, Johannes / Neumann, Jens Timo / Schmitt-Weaver, Emil / Setten, Eelco van / Masson, Nicolas le / Progler, Chris / Geh, Bernd et al. | 2008
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Double Exposure Technology for KrF LithographyGeisler, S. / Bauer, J. / Haak, U. / Stolarek, D. / Schulz, K. / Wolf, H. / Meier, W. / Trojahn, M. / Matthus, E. / Beyer, H. et al. | 2008
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Topological and Model Based approach to Pitch decomposition for Double PatterningNikolsky, Peter / Davydova, Natalia / Goossens, Ronald et al. | 2008
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High Resolution Patterning and Simulation on Mo/Si Multilayer for EUV MasksTsikrikas, N. / Patsis, G. P. / Raptis, I. / Gerardino, A. et al. | 2008
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Design of pattern-specific mask grating for giving the effect of an off-axis illuminationKim, Young-Seok / Song, Seok Ho / Lee, Jong Ung / Oh, Sung Hyun / Choi, Yong Kyoo / Kim, Munsik / O, Beom-Hoan / Park, Se-Geun / Lee, El-Hang / Lee, Seung Gol et al. | 2008
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Fast rigorous simulation of mask diffraction using the waveguide method with parallelized decomposition techniqueShao, Feng / Evanschitzky, Peter / Reibold, David / Erdmann, Andreas et al. | 2008
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Assessment of molecular contamination in mask podForay, Jean Marie / Dejaune, Patrice / Sergent, Pierre / Gough, Stuart / Davene, Magali / Favre, Arnaud / Rude, C. / Trautmann, T. / Tissier, Michel / Cheung, D. et al. | 2008
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Mask CD measurement approach by diffraction intensity for lithography equivalentNagai, Takaharu / Mesuda, Kei / Sutou, Takanori / Inazuki, Yuichi / Hashimoto, Hiroyuki / Yokoyama, Toshifumi / Toyama, Nobuhito / Morikawa, Yasutaka / Mohri, Hiroshi / Hayashi, Naoya et al. | 2008
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Advances in Fabrication of X-ray Masks based on Vitreous Carbon using a new UV sensitive positive ResistVoigt, Anja / Kouba, Josef / Heinrich, Marina / Gruetzner, Gabi / Scheunemann, Heinz-Ulrich / Rudolph, I. / Waberski, Christoph et al. | 2008
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Controlling Linewidth Roughness in Step and Flash Imprint LithographySchmid, Gerard M. / Khusnatdinov, Niyaz / Brooks, Cynthia B. / LaBrake, Dwayne / Thompson, Ecron / Resnick, Douglas J. / Owens, Jordan / Ford, Arnie / Sasaki, Shiho / Toyama, Nobuhito et al. | 2008
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Mask Data Rank (MDR) and its ApplicationKato, Kokoro / Endo, Masakazu / Inoue, Tadao / Yamabe, Masaki et al. | 2008
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Optical Proximity Correction for 0.13 micrometer SiGe:C BiCMOSGeisler, S. / Bauer, J. / Haak, U. / Jagdhold, U. / Pliquett, R. / Matthus, E. / Schrader, R. / Wolf, H. / Baetz, U. / Beyer, H. et al. | 2008
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Assessment and application of focus drilling for DRAM contact hole fabricationNoelscher, Christoph / Jauzion-Graverolle, Franck / Henkel, Thomas et al. | 2008
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Use of EUV scatterometry for the characterization of line profiles and line roughness on photomasksScholze, Frank / Laubis, Christian et al. | 2008
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45nm Node Registration Metrology on LTEM EUV ReticlesLaske, Frank / Kinoshita, Hiroshi / Nishida, Naoki / Kenmochi, Daisuke / Ota, Hitoshi / Tanioka, Yukitake / Czerkas, Slawomir / Schmidt, Karl-Heinrich / Adam, Dieter / Roeth, Klaus-Dieter et al. | 2008
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Measuring Contact Hole Corner Rounding Uniformity Using Optical ScatterometryLam, John C. / Gray, Alexander / Chen, Stanley / Richter, Jan et al. | 2008
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Very High Sensitivity Mask DUV Transmittance Mapping and Measurements Based on Non Imaging OpticsBen-Zvi, Guy / Dmitriev, Vladimir / Graitzer, Erez / Zait, Eitan / Sharoni, Ofir / Cohen, Avi et al. | 2008