HfxZr1−xO2 compositional control using co-injection atomic layer deposition (English)
- New search for: Consiglio, Steven
- New search for: Tapily, Kandabara
- New search for: Clark, Robert D.
- New search for: Nakamura, Genji
- New search for: Wajda, Cory S.
- New search for: Leusink, Gert J.
- New search for: Consiglio, Steven
- New search for: Tapily, Kandabara
- New search for: Clark, Robert D.
- New search for: Nakamura, Genji
- New search for: Wajda, Cory S.
- New search for: Leusink, Gert J.
In:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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31
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5
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2013
- Article (Journal) / Electronic Resource
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Title:HfxZr1−xO2 compositional control using co-injection atomic layer deposition
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Additional title:HfxZr1−xO2 compositional control using co-injection ALD
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Contributors:Consiglio, Steven ( author ) / Tapily, Kandabara ( author ) / Clark, Robert D. ( author ) / Nakamura, Genji ( author ) / Wajda, Cory S. ( author ) / Leusink, Gert J. ( author )
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Published in:
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Publisher:
- New search for: American Vacuum Society
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Publication date:2013-01-01
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Size:5 pages
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ISSN:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:English
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Keywords:
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Source:
Table of contents – Volume 31, Issue 1
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 10601
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Letters - Interface layer in hafnia/Si films as a function of ALD cyclesMani-Gonzalez, Pierre-Giovanni et al. | 2013
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Interface layer in hafnia/Si films as a function of ALD cyclesMani-Gonzalez, Pierre-Giovanni / Vazquez-Lepe, Milton-Oswaldo / Espinosa-Magaña, Francisco / Herrera-Gomez, Alberto et al. | 2013
- 11301
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Plasma Science and Technology - Modeling of inductively coupled plasma Ar/CI2/N2 plasma discharge: Effect of N2 on the plasma propertiesChanson, Romain et al. | 2013
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Modeling of inductively coupled plasma Ar/Cl2/N2 plasma discharge: Effect of N2 on the plasma propertiesChanson, Romain / Rhallabi, Ahmed / Fernandez, Marie Claude / Cardinaud, Christophe / Landesman, Jean Pierre et al. | 2013
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Can surface cracks and unipolar arcs explain breakdown and gradient limits?Insepov, Zeke / Norem, Jim et al. | 2013
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Reorganization of graphite surfaces into carbon micro- and nanoparticles under high flux hydrogen plasma bombardmentBystrov, Kirill / van der Vegt, Lenze / De Temmerman, Gregory / Arnas, Cécile / Marot, Laurent et al. | 2013
- 11501
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Thin Films - Low emissivity high-temperature tantalum thin film coatings for silicon devicesRinnerbauer, Veronika et al. | 2013
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Low emissivity high-temperature tantalum thin film coatings for silicon devicesRinnerbauer, Veronika / Senkevich, Jay J. / Joannopoulos, John D. / Soljačić, Marin / Celanovic, Ivan / Harl, Robert R. / Rogers, Bridget R. et al. | 2013
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Effects of the gas ambient in thermal activation of Mg-doped p-GaN on Hall effect and photoluminescenceLu, Wei / Aplin, David / Clawson, Arthur R. / Yu, Paul K. L. et al. | 2013
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Influence of inert gases on the reactive high power pulsed magnetron sputtering process of carbon-nitride thin filmsSchmidt, Susann / Czigány, Zsolt / Greczynski, Grzegorz / Jensen, Jens / Hultman, Lars et al. | 2013
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Photoluminescence characterization of polythiophene films incorporated with highly functional molecules such as metallophthalocyanineKobe, Hiroaki / Ohnaka, Kazumasa / Kato, Hitoshi / Takemura, Susumu / Shimada, Kazuhiro / Hiramatsu, Tomoyasu / Matsui, Kazunori et al. | 2013
- 13001
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Brief Reports and Comments - Direct comparison of spectroscopic data with cluster calculations of plutonium dioxide and uranium dioxideTobin, J G et al. | 2013
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Direct comparison of spectroscopic data with cluster calculations of plutonium dioxide and uranium dioxideTobin, J. G. / Yu, S.-W. / Chung, B. W. / Ryzhkov, M. V. / Mirmelstein, A. et al. | 2013
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Magnetically coupled ultrahigh vacuum manipulator with a sample grabberHeon Kim, Seong / de Lozanne, Alex et al. | 2013
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Atomic layer deposition of Al203 and AlxTi1-xOy thin films on N2O plasma pretreated carbon materialsMarkeev, Andrey M et al. | 2013
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Interfacial chemistry of hydrofluoric acid-treated In0.53Gao.47As(100) during atomic layer deposition of aluminum oxideGranados-Alpizar, Bernal et al. | 2013
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Excitation of radiative polaritons by polarized broadband infrared radiation in thin oxide films deposited by atomic layer depositionVincent-Johnson, Anita J. / Masters, Andrew E. / Hu, Xiaofeng / Scarel, Giovanna et al. | 2013
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Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositionsRoy, Amit K. / Deduytsche, Davy / Detavernier, Christophe et al. | 2013
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Characterization of low temperature deposited atomic layer deposition TiO2 for MEMS applicationsHuang, Yujian / Pandraud, Gregory / Sarro, Pasqualina M. et al. | 2013
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Aluminum-doped zinc oxide formed by atomic layer deposition for use as anodes in organic light emitting diodesGong, Su Cheol / Choi, Yong-June / Kim, Hyuncheol / Park, Chang-Sun / Park, Hyung-Ho / Jang, Ji Geun / Chang, Ho Jung / Yeom, Geun Young et al. | 2013
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Height distribution of atomic force microscopy images as a tool for atomic layer deposition characterizationKolanek, Krzysztof / Tallarida, Massimo / Schmeisser, Dieter et al. | 2013
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Low-temperature atomic layer deposition of Al2O3 on blown polyethylene films with plasma-treated surfacesBeom Lee, Gyeong / Sik Son, Kyung / Won Park, Suk / Hyung Shim, Joon / Choi, Byoung-Ho et al. | 2013
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Physical and electrical characteristics of atomic-layer deposition-HfO2 films deposited on Si substrates having different silanol Si-OH densitiesMolina, Joel / Zuniga, Carlos / Calleja, Wilfrido / Rosales, Pedro / Torres, Alfonso / Herrera-Gomez, Alberto et al. | 2013
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Atomic layer deposition of ZnO on Cu-nanoclusters for methanol synthesisZhang, Ziyu / Patterson, Matthew / Ren, Maoming / Wang, Ying / Flake, John C. / Sprunger, Phillip T. / Kurtz, Richard L. et al. | 2013
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Electrical conductivity and photoresistance of atomic layer deposited Al-doped ZnO filmsMundle, Rajeh M. / Terry, Hampton S. / Santiago, Kevin / Shaw, Dante / Bahoura, Messaoud / Pradhan, Aswini K. / Dasari, Kiran / Palai, Ratnakar et al. | 2013
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Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growthProfijt, H. B. / van de Sanden, M. C. M. / Kessels, W. M. M. et al. | 2013
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Atomic layer deposition of Al-doped ZnO thin filmsTynell, Tommi / Yamauchi, Hisao / Karppinen, Maarit / Okazaki, Ryuji / Terasaki, Ichiro et al. | 2013
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Atomic layer deposition of anatase TiO2 on porous electrodes for dye-sensitized solar cellsDirnstorfer, Ingo / Mähne, Hannes / Mikolajick, Thomas / Knaut, Martin / Albert, Matthias / Dubnack, Kristina et al. | 2013
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Atomic layer deposition of zinc indium sulfide films: Mechanistic studies and evidence of surface exchange reactions and diffusion processesGenevée, Pascal / Donsanti, Frédérique / Schneider, Nathanaelle / Lincot, Daniel et al. | 2013
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Characterization of atomic layer deposition HfO2, Al2O3, and plasma-enhanced chemical vapor deposition Si3N4 as metal–insulator–metal capacitor dielectric for GaAs HBT technologyYota, Jiro / Shen, Hong / Ramanathan, Ravi et al. | 2013
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Atomically precise surface engineering of silicon CCDs for enhanced UV quantum efficiencyGreer, Frank / Hamden, Erika / Jacquot, Blake C. / Hoenk, Michael E. / Jones, Todd J. / Dickie, Matthew R. / Monacos, Steve P. / Nikzad, Shouleh et al. | 2013
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Comprehensive comparison of structural, electrical, and reliability characteristics of HfO2 gate dielectic with H2O or O3 oxidentCheng, Yi-Lung et al. | 2013
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On the kinetics of spatial atomic layer depositionPoodt, Paul / van Lieshout, Joep / Illiberi, Andrea / Knaapen, Raymond / Roozeboom, Fred / van Asten, Almie et al. | 2013
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Atomic layer deposition of epitaxial TiO2 II on c-sapphireTarre, Aivar / Möldre, Kristel / Niilisk, Ahti / Mändar, Hugo / Aarik, Jaan / Rosental, Arnold et al. | 2013
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Shop Notes - Magnetically coupled ultrahigh vacuum manipulator with a sample grabberKim, Seong Heon et al. | 2013
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New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma dopingThomas, Matthew A. / Armstrong, Johnathan C. / Cui, Jingbiao et al. | 2013
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Comprehensive comparison of structural, electrical, and reliability characteristics of HfO2 gate dielectric with H2O or O3 oxidantCheng, Yi-Lung / Chang, You-Ling / Hsieh, Cheng-Yang / Lin, Jian-Run et al. | 2013
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Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasmaDonmez, Inci / Ozgit-Akgun, Cagla / Biyikli, Necmi et al. | 2013
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Atomic layer deposition of Ga-doped ZnO transparent conducting oxide substrates for CdTe-based photovoltaicsChalker, Paul R. / Marshall, Paul A. / Romani, Simon / Roberts, Joseph W. / Irvine, Stuart J. C. / Lamb, Daniel A. / Clayton, Andrew J. / Williams, Paul A. et al. | 2013
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Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer depositionJung, Tae-Hoon / Park, Jin-Seong / Kim, Dong-Ho / Jeong, Yongsoo / Park, Sung-Gyu / Kwon, Jung-Dae et al. | 2013
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Interfacial chemistry of hydrofluoric acid-treated In0.53Ga0.47As(100) during atomic layer deposition of aluminum oxideGranados-Alpizar, Bernal / Li Lie, Fee / Muscat, Anthony J. et al. | 2013
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Physical and electrical characteristics of atomic-layer deposition-HfO2 films deposited on Si substrates having different silanoi Si-OH densitiesMolina, Joel et al. | 2013
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Structural properties of as deposited and annealed ZrO2 influenced by atomic layer deposition, substrate, and doping 01A119Weinreich, Wenke et al. | 2013
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Gallium nitride MIS-HEMT using atomic layer deposited Al203 as gate dielectric dielectric with H2O or O3 oxidantLossy, Richard et al. | 2013
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Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H20 plasma and O2 plasma as oxidantKawamura, Yumi et al. | 2013
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Atomic layer deposition of zinc sulfide with Zn(TMHD)2Short, Andrew / Jewell, Leila / Doshay, Sage / Church, Carena / Keiber, Trevor / Bridges, Frank / Carter, Sue / Alers, Glenn et al. | 2013
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Chemistry of Cu(acac)2 on Ni(110) and Cu(110) surfaces: Implications for atomic layer deposition processesMa, Qiang / Zaera, Francisco et al. | 2013
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Atomic layer deposition of aluminum-doped zinc oxide films for the light harvesting enhancement of a nanostructured silicon solar cellChen, Sheng-Hui / Chan, Shih-Hao / Chen, Chun-Ko / Tseng, Shao-Ze / Hsu, Chieh-Hsiang / Cho, Wen-Hao et al. | 2013
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CUMULATIVE AUTHOR INDEX| 2013
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Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer depositionLei, Wenwen / Chen, Qiang et al. | 2013
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Atomic layer deposition of Al2O3 and AlxTi1−xOy thin films on N2O plasma pretreated carbon materialsMarkeev, Andrey M. / Chernikova, Anna G. / Chouprik, Anastasya A. / Zaitsev, Sergey A. / Ovchinnikov, Dmitry V. / Althues, Holger / Dörfler, Susanne et al. | 2013
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Low-temperature (≤200 °C) plasma enhanced atomic layer deposition of dense titanium nitride thin filmsSamal, Nigamananda / Du, Hui / Luberoff, Russell / Chetry, Krishna / Bubber, Randhir / Hayes, Alan / Devasahayam, Adrian et al. | 2013
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HfxZr1−xO2 compositional control using co-injection atomic layer depositionConsiglio, Steven / Tapily, Kandabara / Clark, Robert D. / Nakamura, Genji / Wajda, Cory S. / Leusink, Gert J. et al. | 2013
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Structural properties of as deposited and annealed ZrO2 influenced by atomic layer deposition, substrate, and dopingWeinreich, Wenke / Wilde, Lutz / Müller, Johannes / Sundqvist, Jonas / Erben, Elke / Heitmann, Johannes / Lemberger, Martin / Bauer, Anton J. et al. | 2013
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Electrical characterization of atomic-layer-deposited hafnium oxide films from hafnium tetrakis(dimethylamide) and water/ozone: Effects of growth temperature, oxygen source, and postdeposition annealingGarcía, Hector / Castán, Helena / Dueñas, Salvador / Bailón, Luis / Campabadal, Francesca / Beldarrain, Oihane / Zabala, Miguel / González, Mireia Bargallo / Rafí, Joan Marc et al. | 2013
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Low-temperature atomic layer deposition of Al203 on blown polyethylene films with plasma-treated surfacesLee, Gyeong Beom et al. | 2013
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Atomic layer deposition of cobalt oxide thin films using cyclopentadienylcobalt dicarbonyl and ozone at low temperaturesHan, Byeol / Ha Choi, Kyu / Min Park, Jae / Woo Park, Jung / Jung, Jongwan / Lee, Won-Jun et al. | 2013
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TEMAZ/O3 atomic layer deposition process with doubled growth rate and optimized interface properties in metal–insulator–metal capacitorsWeinreich, Wenke / Tauchnitz, Tina / Polakowski, Patrick / Drescher, Maximilian / Riedel, Stefan / Sundqvist, Jonas / Seidel, Konrad / Shirazi, Mahdi / Elliott, Simon D. / Ohsiek, Susanne et al. | 2013
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Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidantKawamura, Yumi / Hattori, Nozomu / Miyatake, Naomasa / Uraoka, Yukiharu et al. | 2013
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Blistering of atomic layer deposition Al203 layers grown on silicon and its effect on metal-insulator-semiconductor structuresBeldarrain, Oihane et al. | 2013
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Atomic layer deposition of Ti-HfO2 dielectricsWerner, Matthew / King, Peter J. / Hindley, Sarah / Romani, Simon / Mather, Sean / Chalker, Paul R. / Williams, Paul A. / van den Berg, Jakob A. et al. | 2013
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Crystal AIN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer depositionLei, Wenwen et al. | 2013
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Copper deposition on TiO2 from copper(II)hexafluoroacetylacetonateRayner, David G. / Mulley, James S. / Bennett, Roger A. et al. | 2013
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Preparation and phase structures of Zn–Ti–O ternary compounds by atomic layer depositionQian, Xu / Gao, Mo-Yun / Cao, Yan-Qiang / Guo, Bing-Lei / Li, Ai-Dong et al. | 2013
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Probing the properties of atomic layer deposited ZrO2 films on p-Germanium substratesKerasidou, Ariadne P. / Botzakaki, Martha A. / Xanthopoulos, Nikolaos / Kennou, Stella / Ladas, Spyridon / Georga, Stavroula N. / Krontiras, Christoforos A. et al. | 2013
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Low-temperature (Samal, N. / Du, H. / Luberoff, R. / Chetry, K. / Bubber, R. / Hayes, A. / Devasahayam, A. et al. | 2013
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Blistering of atomic layer deposition Al2O3 layers grown on silicon and its effect on metal–insulator–semiconductor structuresBeldarrain, Oihane / Duch, Marta / Zabala, Miguel / Rafí, Joan Marc / González, Mireia Bargalló / Campabadal, Francesca et al. | 2013
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Epitaxial strontium titanate films grown by atomic layer deposition on SrTiO3-buffered Si(001) substratesMcDaniel, Martin D. / Posadas, Agham / Ngo, Thong Q. / Dhamdhere, Ajit / Smith, David J. / Demkov, Alexander A. / Ekerdt, John G. et al. | 2013
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Gallium nitride MIS-HEMT using atomic layer deposited Al2O3 as gate dielectricLossy, Richard / Gargouri, Hassan / Arens, Michael / Würfl, Joachim et al. | 2013
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Ion conduction in nanoscale yttria-stabilized zirconia fabricated by atomic layer deposition with various doping ratesSik Son, Kyung / Bae, Kiho / Woo Kim, Jun / Suk Ha, Jeong / Hyung Shim, Joon et al. | 2013
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Combining dynamic and static depth profiling in low energy ion scatteringter Veen, Rik / Fartmann, Michael / Kersting, Reinhard / Hagenhoff, Birgit et al. | 2013
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HfxZr1-xO2 compositional control using co-injection atomic layer deposition 01A115Consiglio, Steven et al. | 2013
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Low temperature deposition of Ga203 thin films using trimethylgallium and oxygen plasmaDonmez, Inci et al. | 2013
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Evaluating Al203 gas diffusion barriers grown directly on Ca films using atomic layer deposition techniquesBertrand, Jacob A et al. | 2013
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X-ray photoelectron spectroscopy study on the chemistry involved in tin oxide film growth during chemical vapor deposition processesMannie, Gilbère J. A. / Gerritsen, Gijsbert / Abbenhuis, Hendrikus C. L. / van Deelen, Joop / Thüne, Peter C. et al. | 2013
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Stability and annealing of alucones and alucone alloysGhazaryan, Lilit / Kley, Ernst-Bernhard / Tünnermann, Andreas / Viorica Szeghalmi, Adriana et al. | 2013
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Special Issue: Atomic Layer Deposition (ALD) - Aluminum-doped zinc oxide formed by atomic layer deposition for use as anodes in organic light emitting diodesGong, Su Cheol et al. | 2013
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Atomic layer deposition onto carbon fiber: From single layer deposition via multilayer structure to metal oxide microtubesKnohl, Stefan / Kumar Roy, Amit / Goedel, Werner A. / Schulze, Steffen / Hietschold, Michael et al. | 2013
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Effect of in situ hydrogen plasma treatment on zigc oxide grown using low temperature atomic layer depositionJung, Tae-Hoon et al. | 2013
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Evaluating Al2O3 gas diffusion barriers grown directly on Ca films using atomic layer deposition techniquesBertrand, Jacob A. / George, Steven M. et al. | 2013
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Effect of the amido Ti precursors on the atomic layer deposition of TiN with NH3Cho, Gihee / Rhee, Shi-Woo et al. | 2013
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Copper deposition on TiO2 from copper(ll)hexafluoroacetylacetonateRayner, David G et al. | 2013
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Information for Contributors| 2013