Shape-memory alloy rings as tight couplers between ultrahigh-vacuum pipes: Design and experimental assessment (English)
- New search for: Niccoli, Fabrizio
- New search for: Garion, Cedric
- New search for: Maletta, Carmine
- New search for: Chiggiato, Paolo
- New search for: Niccoli, Fabrizio
- New search for: Garion, Cedric
- New search for: Maletta, Carmine
- New search for: Chiggiato, Paolo
In:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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35
, 3
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11
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2017
- Article (Journal) / Electronic Resource
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Title:Shape-memory alloy rings as tight couplers between ultrahigh-vacuum pipes: Design and experimental assessment
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Additional title:Shape-memory alloy rings as tight couplers
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Contributors:Niccoli, Fabrizio ( author ) / Garion, Cedric ( author ) / Maletta, Carmine ( author ) / Chiggiato, Paolo ( author )
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Published in:
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Publisher:
- New search for: American Vacuum Society
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Publication date:2017-05-01
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Size:11 pages
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ISSN:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:English
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Keywords:
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Source:
Table of contents – Volume 35, Issue 3
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
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Experimental investigation of SF6–O2 plasma for advancement of the anisotropic Si etch processAlshaltami, Khaled A. / Morshed, Muhammad / Gaman, Cezar / Conway, Jim / Daniels, Stephen et al. | 2017
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Correcting defects in area selective molecular layer depositionClosser, Richard G. / Bergsman, David S. / Ruelas, Luis / Hashemi, Fatemeh Sadat Minaye / Bent, Stacey F. et al. | 2017
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Multiscale approach for simulation of silicon etching using SF6/C4F8 Bosch processLe Dain, Guillaume / Rhallabi, Ahmed / Fernandez, Marie Claude / Boufnichel, Mohamed / Roqueta, Fabrice et al. | 2017
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Quasiatomic layer etching of silicon oxide selective to silicon nitride in topographic structures using fluorocarbon plasmasWang, Mingmei / Ventzek, Peter L. G. / Ranjan, Alok et al. | 2017
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Growth of lead thin films on silicon and niobium substrates by sputtering techniqueGontad, Francisco / Lorusso, Antonella / Di Giulio, Massimo / Eriksson, Fredrik / Broitman, Esteban / Perrone, Alessio et al. | 2017
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Impact of atmospheric pressure nonequilibrium plasma discharge on polymer surface metrologyScally, Laurence / Lalor, James / Cullen, Patrick J. / Milosavljević, Vladimir et al. | 2017
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Surface degradation of uranium tetrafluorideTobin, J. G. / Duffin, A. M. / Yu, S.-W. / Qiao, R. / Yang, W. L. / Booth, C. H. / Shuh, D. K. et al. | 2017
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Ion beam assisted organic chemical vapor etch of magnetic thin filmsChen, Jack Kun-Chieh / Kim, Taeseung / Altieri, Nicholas D. / Chen, Ernest / Chang, Jane P. et al. | 2017
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Vacuum system of positron damping ring for SuperKEKBShibata, Kyo / Suetsugu, Yusuke / Ishibashi, Takuya / Shirai, Mitsuru / Terui, Shinji / Kanazawa, Ken-ichi / Hisamatsu, Hiromi et al. | 2017
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Shape-memory alloy rings as tight couplers between ultrahigh-vacuum pipes: Design and experimental assessmentNiccoli, Fabrizio / Garion, Cedric / Maletta, Carmine / Chiggiato, Paolo et al. | 2017
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Step-type and step-density influences on CO adsorption probed by reflection absorption infrared spectroscopy using a curved Pt(1 1 1) surfaceWalsh, Anton J. / van Lent, Richard / Auras, Sabine V. / Gleeson, Michael A. / Berg, Otto T. / Juurlink, Ludo B. F. et al. | 2017
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Plasma source development for fusion-relevant material testingCaughman, John B. O. / Goulding, Richard H. / Biewer, Theodore M. / Bigelow, Timothy S. / Campbell, Ian H. / Caneses, Juan / Diem, Stephanie J. / Fadnek, Andy / Fehling, Dan T. / Isler, Ralph C. et al. | 2017
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Time-resolved photoemission studies of exciton dissociation in organic photovoltaicsRobey, Steven W. et al. | 2017
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Temperature and wall coating dependence of alkali vapor transport speed in micron-scale capillariesGiraud-Carrier, Matthieu / Decker, Trevor / McClellan, Joshua / Bennett, Linsey / Hawkins, Aaron / Black, Jennifer / Almquist, Soren / Schmidt, Holger et al. | 2017
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Reaction of aqueous ammonium sulfide on SiGe 25%Heslop, Stacy L. / Peckler, Lauren / Muscat, Anthony J. et al. | 2017
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Electronic and optical properties of rocksalt-phase tungsten nitride (B1-WN)Metaxa, Chrysoula / Ozsdolay, Brian D. / Zorba, Triantafillia / Paraskevopoulos, Konstantinos / Gall, Daniel / Patsalas, Panos et al. | 2017
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Melt ejection from copper target in air in the presence of magnetic field using nanosecond pulsed laser ablationSingh, Khwairakpam Shantakumar / Sharma, Ashwini Kumar et al. | 2017
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Reactive high-power impulse magnetron sputtering of ZrO2 films with gradient ZrOx interlayers on pretreated steel substratesBelosludtsev, Alexandr / Vlček, Jaroslav / Houška, Jiří / Čerstvý, Radomír et al. | 2017
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Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistorsJung, Hanearl / Oh, Il-Kwon / Yeo, Seungmin / Kim, Hyungjun / Lee, Su Jeong / Kim, Yun Cheol / Myoung, Jae-Min / Kim, Soo-Hyun / Lim, Jun Hyung / Lee, Sunhee et al. | 2017
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Surface passivation of aluminum hydride particles via atomic layer depositionChen, Rong / Duan, Chen-Long / Liu, Xiao / Qu, Kai / Tang, Gen / Xu, Xing-Xing / Shan, Bin et al. | 2017
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Insights to scaling remote plasma sources sustained in NF3 mixturesHuang, Shuo / Volynets, Vladimir / Hamilton, James R. / Lee, Sangheon / Song, In-Cheol / Lu, Siqing / Tennyson, Jonathan / Kushner, Mark J. et al. | 2017
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Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methodsNepal, Neeraj / Anderson, Virginia R. / Johnson, Scooter D. / Downey, Brian P. / Meyer, David J. / DeMasi, Alexander / Robinson, Zachary R. / Ludwig, Karl F. / Eddy, Charles R. et al. | 2017
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Detailed analysis of impact collision ion scattering spectroscopy of bismuth selenideZhou, Weimin / Zhu, Haoshan / Yarmoff, Jory A. et al. | 2017
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Atomic layer deposited ultrathin metal nitride barrier layers for ruthenium interconnect applicationsDey, Sonal / Yu, Kai-Hung / Consiglio, Steven / Tapily, Kandabara / Hakamata, Takahiro / Wajda, Cory S. / Leusink, Gert J. / Jordan-Sweet, Jean / Lavoie, Christian / Muir, David et al. | 2017
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High performance flexible copper indium gallium selenide core–shell nanorod array photodetectorsBadradeen, Emad / Brozak, Matthew / Keles, Filiz / Al-Mayalee, Khalidah / Karabacak, Tansel et al. | 2017
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Y2O3 wall interactions in Cl2 etching and NF3 cleaning plasmasMa, Tianyu / List, Tyler / Donnelly, Vincent M. et al. | 2017
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Fabrication of single-phase SnS film by H2 annealing of amorphous SnSx prepared by atomic layer depositionJang, Byeonghyeon / Yeo, Seungmin / Kim, Hyungjun / Shin, Byungha / Kim, Soo-Hyun et al. | 2017
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Metalorganic chemical vapor deposition-regrown Ga-rich InGaP films on SiGe virtual substrates for Si-based III-V optoelectronic device applicationsKim, TaeWan / Wang, Bing / Wang, Cong / Kohen, David A. / Hwang, Jeong Woo / Shin, Jae Cheol / Kang, Sang-Woo / Michel, Jürgen et al. | 2017
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Achievements and problems in the first commissioning of superKEKB vacuum systemSuetsugu, Yusuke / Shibata, Kyo / Ishibashi, Takuya / Fukuma, Hitoshi / Tobiyama, Makoto / Flanagan, John / Mulyani, Emy / Shirai, Mitsuru / Terui, Shinji / Kanazawa, Ken-ichi et al. | 2017
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Increased drift carrier lifetime in semiconducting boron carbides deposited by plasma enhanced chemical vapor deposition from carboranes and benzenePeterson, George Glenn / Echeverria, Elena / Dong, Bin / Silva, Joseph P. / Wilson, Ethiyal R. / Kelber, Jeffry A. / Nastasi, Michael / Dowben, Peter A. et al. | 2017
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Atomic layer etching of 3D structures in silicon: Self-limiting and nonideal reactionsHuard, Chad M. / Zhang, Yiting / Sriraman, Saravanapriyan / Paterson, Alex / Kanarik, Keren J. / Kushner, Mark J. et al. | 2017
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Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scatteringAnderson, Virginia R. / Nepal, Neeraj / Johnson, Scooter D. / Robinson, Zachary R. / Nath, Anindya / Kozen, Alexander C. / Qadri, Syed B. / DeMasi, Alexander / Hite, Jennifer K. / Ludwig, Karl F. et al. | 2017
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Properties of sputtered ZnS and ZnS:A (A = Er, Yb) films grown at low substrate temperaturesOrtiz, Carlos A. / Giraldo-Betancur, Astrid L. / Hernández-Landaverde, Martín A. / Ramírez-Cardona, Marius / Mendoza-Galván, Arturo / Jiménez-Sandoval, Sergio et al. | 2017
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Variation in the density, optical polarizabilities, and crystallinity of TiO2 thin films deposited via atomic layer deposition from 38 to 150 °C using the titanium tetrachloride-water reactionPiercy, Brandon D. / Leng, Collen Z. / Losego, Mark D. et al. | 2017