Economics of processing thin‐film solar cells (English)
- New search for: Russell, T. W. F.
- New search for: Baron, B. N.
- New search for: Rocheleau, R. E.
- New search for: Russell, T. W. F.
- New search for: Baron, B. N.
- New search for: Rocheleau, R. E.
In:
Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
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2
, 4
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840-844
;
1984
- Article (Journal) / Electronic Resource
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Title:Economics of processing thin‐film solar cells
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Additional title:Economics of processing thin‐film solar cells
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Contributors:
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Published in:
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Publisher:
- New search for: American Vacuum Society
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Publication date:1984-10-01
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Size:5 pages
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ISSN:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:English
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Keywords:SOLAR CELLS , COST , EFFICIENCY , MANUFACTURING , ECONOMICS , THIN FILMS , FEASIBILITY STUDIES , FABRICATION , (Ti,Si,N) , (Ti,Si,O) , (W,Si,O)
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Source:
Table of contents – Volume 2, Issue 4
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 613
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Effect of ion sputtering on interface chemistry and electrical properties of Au GaAs(100) Schottky contactsWang, Y.‐X. / Holloway, P. H. et al. | 1984
- 620
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A nonalloyed, low specific resistance Ohmic contact to n‐InPDautremont‐Smith, W. C. / Barnes, P. A. / Stayt, J. W. et al. | 1984
- 626
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Surface silicon oxynitride films obtained by implanting mixtures of oxygen and nitrogen ions into siliconStreb, W. / Hezel, R. et al. | 1984
- 630
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Influence of slight deviations from TaSi2 stoichiometry on the high‐temperature stability of tantalum silicide/silicon contactsOppolzer, H. / Neppl, F. / Hieber, K. / Huber, V. et al. | 1984
- 636
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Low defect density insulating films deposited on room temperature substratesMagerlein, J. H. / Baker, John M. / Proto, G. R. / Grebe, K. R. / Klepner, S. P. / Palmer, M. J. / Warnecke, A. J. et al. | 1984
- 641
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Maskless laser writing of silicon dioxideKrchnavek, R. R. / Gilgen, H. H. / Osgood, R. M. et al. | 1984
- 645
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An experimental system for surface reaction studies in microwave plasma etchingNinomiya, Ken / Suzuki, Keizo / Nishimatsu, Shigeru / Gotoh, Yoshitaka / Okada, Osami et al. | 1984
- 653
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Reactive ion etching of GaAs using BCl3Sonek, G. J. / Ballantyne, J. M. et al. | 1984
- 658
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Influences of molecular reflection on the lift‐off pattern edge qualityArai, K. / Yanagawa, F. / Kurosawa, S. et al. | 1984
- 665
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Resolution of a three‐layer resist using heavy metal as an intermediate layerSuzuki, Masanori / Namatsu, Hideo / Yoshikawa, Akira et al. | 1984
- 670
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Surface effects in γ‐ray‐induced changes of minority‐carrier lifetimeHava, S. et al. | 1984
- 675
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Photoemission studies of the interaction of hydrogen plasmas with GaAs(001)Friedel, P. / Larsen, P. K. / Gourrier, S. / Cabanie, J. P. / Gerits, W. M. et al. | 1984
- 681
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Large surface Fermi level shift in high temperature annealed metal–insulator–GaAs structures prepared in the presence of oxygenBlanchet, R. / Santinelli, C. / Chave, J. / Garrigues, M. / Krawczyk, S. / Viktorovitch, P. et al. | 1984
- 684
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Selective and anisotropic reactive ion etch of LPCVD silicon nitride with CHF3 based gasesMele, T. C. / Nulman, J. / Krusius, J. P. et al. | 1984
- 693
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Interactions in metallization systems for integrated circuitsMurarka, S. P. et al. | 1984
- 707
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Effects of deposition parameters on the growth of thermal oxide on silicides over single crystal siliconChu, Wileen / Bhandia, Aloke S. / Stimmell, James B. et al. | 1984
- 710
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Thermal‐wave measurements and monitoring of TaSix silicide film propertiesSmith, W. Lee / Opsal, Jon / Rosencwaig, Allan / Stimmell, James B. / Allison, Jane C. / Bhandia, Aloke S. et al. | 1984
- 714
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Impurities in refractory metals/silicidesLiang, S. C. et al. | 1984
- 718
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Dopant redistribution in silicides: Materials and process issuesCooper, C. B. / Powell, R. A. / Chow, R. et al. | 1984
- 723
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Radiation effects in TaSix/polysilicon MOS gate structuresDraper, Bruce L. / McKeon, Donald C. et al. | 1984
- 730
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Application of titanium polycide interconnects in a silicon‐gate processGilfillan, Celia D. / Spinella, Sal et al. | 1984
- 733
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Plasma‐enhanced CVD of titanium silicideRosler, Richard S. / Engle, George M. et al. | 1984
- 738
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Impurity effects in transition metal silicidesLien, C.‐D. / Nicolet, M‐A. et al. | 1984
- 748
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Applications of Rutherford backscattering spectrometry to refractory metal silicide characterizationHerman, Michael H. et al. | 1984
- 756
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Microstructural investigations of refractory metal silicide films on siliconMagee, T. J. / Woolhouse, G. R. / Kawayoshi, H. A. / Niemeyer, I. C. / Rodrigues, B. / Ormond, R. D. / Bhandia, A. S. et al. | 1984
- 762
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Oxygen redistribution during sintering of Ti/Si structuresMerchant, P. / Amano, Jun et al. | 1984
- 766
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Stoichiometric shifts in cosputtered refractory silicide films during subsequent heat treatmentBhandia, Aloke S. et al. | 1984
- 771
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Sputtering of refractory metal silicides from composite cathodes used in the Varian 3180/3190 sputtering systemNichols, Dennis R. et al. | 1984
- 775
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Influence of the interfacial oxide on titanium silicide formation by rapid thermal annealingPramanik, D. / Saxena, A. N. / Wu, Owen K. / Peterson, G. G. / Tanielian, M. et al. | 1984
- 781
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Phase equilibria in thin‐film metallizationsBeyers, R. / Sinclair, R. / Thomas, M. E. et al. | 1984
- 789
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Overview of coating technologies for large scale metallurgical, optical, and electronic applicationsBunshah, R. F. et al. | 1984
- 800
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New coatings for high temperature materials protectionBennett, M. J. et al. | 1984
- 806
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Diffusion coatings of steels: Formation mechanism and microstructure of aluminized heat‐resistant stainless steelsBangaru, N. V. / Krutenat, R. C. et al. | 1984
- 816
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Thin solid films to combat friction, wear, and corrosionHintermann, H. E. et al. | 1984
- 823
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Xerographic photoreceptorsMort, J. et al. | 1984
- 827
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Thin film transistors for large area electronicsThompson, Malcolm J. et al. | 1984
- 835
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Amorphous silicon solar cellsOvshinsky, S. R. et al. | 1984
- 840
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Economics of processing thin‐film solar cellsRussell, T. W. F. / Baron, B. N. / Rocheleau, R. E. et al. | 1984