New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell (English)
- New search for: Bugot, Cathy
- New search for: Bouttemy, Muriel
- New search for: Schneider, Nathanaelle
- New search for: Etcheberry, Arnaud
- New search for: Lincot, Daniel
- New search for: Donsanti, Frédérique
- New search for: Bugot, Cathy
- New search for: Bouttemy, Muriel
- New search for: Schneider, Nathanaelle
- New search for: Etcheberry, Arnaud
- New search for: Lincot, Daniel
- New search for: Donsanti, Frédérique
In:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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36
, 6
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10
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2018
- Article (Journal) / Electronic Resource
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Title:New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
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Contributors:Bugot, Cathy ( author ) / Bouttemy, Muriel ( author ) / Schneider, Nathanaelle ( author ) / Etcheberry, Arnaud ( author ) / Lincot, Daniel ( author ) / Donsanti, Frédérique ( author )
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Published in:
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Publisher:
- New search for: American Vacuum Society
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Publication date:2018-11-01
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Size:10 pages
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ISSN:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:English
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Keywords:
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Source:
Table of contents – Volume 36, Issue 6
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
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Hydrophobic surface modification of polymethyl methacrylate by two-dimensional plasma jet array at atmospheric pressureLiu, Feng / Cai, Meiling / Zhang, Bo / Fang, Zhi / Jiang, Chunqi / Ostrikov, Kostya (Ken) et al. | 2018
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Influence of nitride buffer layers on superconducting properties of niobium nitrideGoldsmith, John H. / Gibson, Ricky / Cooper, Tim / Asel, Thaddeus J. / Mou, Shin / Look, Dave C. / Derov, John S. / Hendrickson, Joshua R. et al. | 2018
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Low-temperature homoepitaxial growth of two-dimensional antimony superlattices in siliconJewell, April D. / Hoenk, Michael E. / Carver, Alexander G. / Nikzad, Shouleh et al. | 2018
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Plasma-enhanced atomic layer deposition of titanium vanadium nitrideSowa, Mark J. / Ju, Ling / Kozen, Alexander C. / Strandwitz, Nicholas C. / Zeng, Guosong / Babuska, Tomas F. / Hsain, Zakaria / Krick, Brandon A. et al. | 2018
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Plasma enhanced chemical vapor deposition of SiO2 and SiNx on AlGaN: Band offsets and interface studies as a function of Al compositionReddy, Pramod / Washiyama, Shun / Mecouch, Will / Hernandez-Balderrama, Luis H. / Kaess, Felix / Hayden Breckenridge, M. / Sarkar, Biplab / Haidet, Brian B. / Franke, Alexander / Kohn, Erhard et al. | 2018
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Enhanced photodesorption from near- and mid-infrared plasmonic nanocrystal thin filmsHu, Weize / Filler, Michael A. et al. | 2018
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Probing covalency with oxidant K edge x-ray absorption spectroscopy of UF4 and UO2Tobin, J. G. / Yu, S.-W. / Qiao, R. / Yang, W. L. / Shuh, D. K. et al. | 2018
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Deposition of ZrON thin films by reactive magnetron sputtering using a hollow cylindrical targetIwata, Hiroshi / Ishii, Hiroki / Kato, Daiki / Kawashima, Shohei / Kodama, Kakeru / Furusawa, Masashi / Tanaka, Masatoshi / Sekiya, Takao et al. | 2018
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Role of the reactive sputtering deposition power in the phase control of cobalt oxide filmsAzevedo Neto, Nilton Francelosi / Leite, Douglas M. G. / Lisboa-Filho, Paulo N. / da Silva, José H. D. et al. | 2018
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Low damage patterning of In0.53Ga0.47As film for its integration as n-channel in a fin metal oxide semiconductor field effect transistor architectureBizouerne, Maxime / Pargon, Erwine / Petit-Etienne, Camille / Labau, Sébastien / David, Sylvain / Martin, Mickael / Burtin, Pauline et al. | 2018
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In situ XPS study of low temperature atomic layer deposition of B2O3 films on Si using BCl3 and H2O precursorsPilli, Aparna / Jones, Jessica / Lee, Veronica / Chugh, Natasha / Kelber, Jeffry / Pasquale, Frank / LaVoie, Adrien et al. | 2018
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Rapid atomic layer etching of Al2O3 using sequential exposures of hydrogen fluoride and trimethylaluminum with no purgingZywotko, David R. / Faguet, Jacques / George, Steven M. et al. | 2018
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Thermal atomic layer etching of HfO2 using HF for fluorination and TiCl4 for ligand-exchangeLee, Younghee / George, Steven M. et al. | 2018
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Effect of thermal annealing and chemical treatments on secondary electron emission properties of atomic layer deposited MgOProdanovic´, Violeta / Chan, Hong Wah / Mane, Anil U. / Elam, Jeffrey W. / Minjauw, Matthias M. / Detavernier, Christophe / van der Graaf, Harry / Sarro, Pasqualina M. et al. | 2018
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Transient behavior in quasi-atomic layer etching of silicon dioxide and silicon nitride in fluorocarbon plasmasHuard, Chad M. / Sriraman, Saravanapriyan / Paterson, Alex / Kushner, Mark J. et al. | 2018
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Atomic layer deposition of Al2O3 and TiO2 on MoS2 surfacesKropp, Jaron A. / Cai, Yuhang / Yao, Zihan / Zhu, Wenjuan / Gougousi, Theodosia et al. | 2018
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Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer depositionIwashita, Shinya / Moriya, Tsuyoshi / Uedono, Akira et al. | 2018
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Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer depositionKrylov, Igor / Xu, Xianbin / Zoubenko, Ekaterina / Weinfeld, Kamira / Boyeras, Santiago / Palumbo, Felix / Eizenberg, Moshe / Ritter, Dan et al. | 2018
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Review Article: Atomic layer deposition for oxide semiconductor thin film transistors: Advances in research and developmentSheng, Jiazhen / Lee, Jung-Hoon / Choi, Wan-Ho / Hong, TaeHyun / Kim, MinJung / Park, Jin-Seong et al. | 2018
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Metalliclike thermoelectric Ti-V oxide nanocompositesMusic, Denis / Holzapfel, Damian M. et al. | 2018
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SiO2 etch characteristics and environmental impact of Ar/C3F6O chemistryLee, Ho Seok / Yang, Kyung Chae / Kim, Soo Gang / Shin, Ye Ji / Suh, Dae Woong / Song, Han Dock / Lee, Nae Eung / Yeom, Geun Young et al. | 2018
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Ab initio analysis of nucleation reactions during tungsten atomic layer deposition on Si(100) and W(110) substratesKing, Mariah J. / Theofanis, Patrick L. / Lemaire, Paul C. / Santiso, Erik E. / Parsons, Gregory N. et al. | 2018
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New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cellBugot, Cathy / Bouttemy, Muriel / Schneider, Nathanaelle / Etcheberry, Arnaud / Lincot, Daniel / Donsanti, Frédérique et al. | 2018
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Thermal atomic layer deposition of Sn metal using SnCl4 and a vapor phase silyl dihydropyrazine reducing agentStevens, Eric C. / Mousa, Moataz Bellah M. / Parsons, Gregory N. et al. | 2018
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Precise control of ion and radical production using electron beam generated plasmasBoris, David R. / Walton, Scott G. et al. | 2018
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Growth and properties of epitaxial Ti1−xMgxN(001) layersWang, Baiwei / Kerdsongpanya, Sit / McGahay, Mary E. / Milosevic, Erik / Patsalas, Panos / Gall, Daniel et al. | 2018
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Chemical vapor deposition of magnetic iron-cobalt alloy thin films: Use of ammonia to stabilize growth from carbonyl precursorsZhang, Pengyi / Zhang, Zhejun / Abelson, John R. / Girolami, Gregory S. et al. | 2018
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Responding to the growing issue of research reproducibilityBaer, Donald R. / Gilmore, Ian S. et al. | 2018
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Corrosion resistance of sintered SiC against fluorinated plasmasGoto, Tetsuya / Miyahara, Michito / Sasaki, Masaru / Sugawa, Shigetoshi et al. | 2018
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Epitaxial growth and electrical properties of VO2 on [LaAlO3]0.3[Sr2AlTaO6]0.7 (111) substrateLiu, Yang / Niu, Shanyuan / Orvis, Thomas / Zhang, Haimeng / Zhao, Huan / Wang, Han / Ravichandran, Jayakanth et al. | 2018
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Low temperature (Ts/Tm < 0.1) epitaxial growth of HfN/MgO(001) via reactive HiPIMS with metal-ion synchronized substrate biasVillamayor, Michelle Marie S. / Keraudy, Julien / Shimizu, Tetsuhide / Viloan, Rommel Paulo B. / Boyd, Robert / Lundin, Daniel / Greene, Joseph E. / Petrov, Ivan / Helmersson, Ulf et al. | 2018
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Titanium coverage for plasma-induced uniform HfSiON film from Hf nanoscale islands on SiO2/SiKitajima, Takeshi / Kage, Ryosuke / Nakano, Toshiki et al. | 2018
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Argon clustering in silicon under low-energy irradiation: Molecular dynamics simulation with different Ar–Si potentialsSycheva, Anastasia A. / Voronina, Ekaterina N. / Rakhimova, Tatyana V. / Rakhimov, Alexander T. et al. | 2018
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Nanoscale investigation of Si nanoribbon growth on Ag(110)Daher Mansour, Michel / Parret, Romain / Masson, Laurence et al. | 2018
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Enhanced silicon nitride etching in the presence of F atoms: Quantum chemistry simulationBarsukov, Yuri V. / Volynets, Vladimir / Kobelev, Anton A. / Andrianov, Nikolai A. / Tulub, Alexander V. / Smirnov, Alexander S. et al. | 2018
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Perspective: Nonequilibrium dynamics of localized and delocalized excitons in colloidal quantum dot solidsLee, Elizabeth M. Y. / Tisdale, William A. / Willard, Adam P. et al. | 2018