Enhancement of spatial resolution in generating point spread functions by Monte Carlo simulation in electron-beam lithography (English)
- New search for: Lee, S.-Y.
- New search for: Dai, Q.
- New search for: Lee, S.-H.
- New search for: Kim, B.-G.
- New search for: Cho, H.-K.
- New search for: Lee, S.-Y.
- New search for: Dai, Q.
- New search for: Lee, S.-H.
- New search for: Kim, B.-G.
- New search for: Cho, H.-K.
In:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
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29
, 6
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7
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2011
- Article (Journal) / Electronic Resource
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Title:Enhancement of spatial resolution in generating point spread functions by Monte Carlo simulation in electron-beam lithography
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Additional title:Enhancement of spatial resolution in generating point spread functions
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Contributors:Lee, S.-Y. ( author ) / Dai, Q. ( author ) / Lee, S.-H. ( author ) / Kim, B.-G. ( author ) / Cho, H.-K. ( author )
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Published in:
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Publisher:
- New search for: American Vacuum Society
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Publication date:2011-11-01
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Size:7 pages
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ISSN:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:English
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Keywords:
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Source:
Table of contents – Volume 29, Issue 6
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
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Plasmonics - Surface plasmon waveguide devices with Tg-bonded Cytop claddings 062601Chiu, Charles et al. | 2011
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Modeling the power spectrum of thermal line edge roughness in a lamellar diblock copolymer mesophase 06F202Bosse, August W et al. | 2011
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Fabrication of chevron patterns for patterned media with block copolymer directed assembly 06F204Liu, Guoliang et al. | 2011
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Comparison of hydrogen silsesquioxane development methods for sub-10 nm electron beam lithography using accurate linewidth inspection 06F307Macintyre, D S et al. | 2011
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Experimental evaluation method of point spread functions used for proximity effects correction in electron beam lithography 06F311Nilsson, Bengt A et al. | 2011
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Three-dimensional proximity effect correction for large-scale uniform patterns 06F314Dai, Q et al. | 2011
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Anisotropic filling phenomenon of cavities in UV nanoimprint lithography 06FC19Wang, Qing et al. | 2011
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PACS® Headings Used in the Present Index A32| 2011
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Influence of gun design on Coulomb interactions in a field emission gun 06F605Verduin, T et al. | 2011
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Nanoimprint Lithography - Combining nanoimprint lithography and a molecular weight selective thermal reflow for the generation of mixed 3D structures 06FC01Schleunitz, Arne et al. | 2011
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Soft patterning on cylindrical surface of plastic optical fiber 06FC07Mekaru, Harutaka et al. | 2011
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Liquid transfer imprint lithography: A new route to residual layer thickness control 06FC12Koo, Namil et al. | 2011
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Experimental analysis for process control in hybrid lithography 06FC14Dhima, Khalid et al. | 2011
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Recessed area patterning via nanoimprint lithographyChong, Karen S. L. / Lee, Yeong-Yuh / Yee Low, Hong et al. | 2011
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Fabrication of ultra-high-density nanodot array patterns (∼3 Tbits/in.2) using electron-beam lithographyLee, Min-Hyun / Kim, Hyun-Mi / Cho, Seong-Yong / Lim, Kipil / Park, Soo-Yeon / Jong Lee, Jae / Kim, Ki-Bum et al. | 2011
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Electron-beam-induced deposition of 3-nm-half-pitch patterns on bulk Sivan Oven, J. C. / Berwald, F. / Berggren, K. K. / Kruit, P. / Hagen, C. W. et al. | 2011
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Secondary-electron signal level measurements of self-assembled monolayers for spatial-phase-locked electron-beam lithographyLee Cheong, Lin / Lobez, Jose M. / Moon, Euclid E. / Hastings, Jeffrey T. / Smith, Henry I. et al. | 2011
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Analysis of a scheme for de-magnified Talbot lithographyUrbanski, L. / Marconi, M. C. / Isoyan, A. / Stein, A. / Menoni, C. S. / Rocca, J. J. et al. | 2011
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Actinic characterization of extreme ultraviolet bump-type phase defectsGoldberg, Kenneth A. / Mochi, Iacopo et al. | 2011
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Suitability of thin poly(dimethylsiloxane) as an antisticking layer for UV nanoimprintingOkada, Makoto / Haruyama, Yuichi / Kanda, Kazuhiro / Matsui, Shinji et al. | 2011
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Twelve nanometer half-pitch W–Cr–HSQ trilayer process for soft x-ray tungsten zone platesReinspach, Julia / Uhlén, Fredrik / Hertz, Hans M. / Holmberg, Anders et al. | 2011
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Improved time dependent performance of hydrogen silsesquioxane resist using a spin on top coatWestly, Daron A. / Tennant, Donald M. / Aida, Yukinori / Ohki, Hirofumi / Ohkubo, Takashi et al. | 2011
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Towards an all-track 300 mm process for directed self-assembly 06F203Liu, Chi-Chun et al. | 2011
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Recessed area patterning via nanoimprint lithography 060602Chong, Karen S L et al. | 2011
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Scanning proximal probe lithography for sub-10 nm resolution on calix[4]resorcinarene 06FD02Kaestner, Marcus et al. | 2011
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Lithography-patterning-fidelity-aware electron-optical system design optimization 06FD04Chen, Sheng-Yung et al. | 2011
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Nanobiology and Cell Guidance - Suspended, micron-scale corner cube retroreflectors as ultra-bright optical labels 06FA01Sherlock, Tim et al. | 2011
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New approach for measuring protrusive forces in cells 06FA02Mathur, A et al. | 2011
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Mechanical characteristics of imprinted nanostructures fabricated with a poly(dimethylsiloxane) mold 06FC10Kang, Yuji et al. | 2011
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Fabrication of a blue organic light-emitting diode with a novel thermal deposition boatLee, Sangmin / Tang, Ching W. et al. | 2011
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Surface plasmon waveguide devices with Tg-bonded Cytop claddingsChiu, Charles / Lisicka-Skrzek, Ewa / Niall Tait, R. / Berini, Pierre et al. | 2011
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Direct top-down ordering of diblock copolymers through nanoimprint lithographySalaün, M. / Kehagias, N. / Salhi, B. / Baron, T. / Boussey, J. / Sotomayor Torres, C. M. / Zelsmann, M. et al. | 2011
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Developer-free direct patterning of PMMA/ZEP 520A by low voltage electron beam lithographyAi Zhi Zheng, David / Ali Mohammad, Mohammad / Kelly Dew, Steven / Stepanova, Maria / 鄭愛智 et al. | 2011
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Nanopatterning of PMMA on insulating surfaces with various anticharging schemes using 30 keV electron beam lithographyMuhammad, Mustafa / Buswell, Steven C. / Dew, Steven K. / Stepanova, Maria et al. | 2011
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Density multiplication of nanostructures fabricated by ultralow voltage electron beam lithography using PMMA as positive- and negative-tone resistAdeyenuwo, Adegboyega P. / Stepanova, Maria / Dew, Steven K. et al. | 2011
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Imaging of extreme-ultraviolet mask patterns using coherent extreme-ultraviolet scatterometry microscope based on coherent diffraction imagingHarada, Tetsuo / Nakasuji, Masato / Kimura, Teruhiko / Watanabe, Takeo / Kinoshita, Hiroo / Nagata, Yutaka et al. | 2011
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Defined emission area and custom thermal electron sourcesMackie, William A. / Magera, Gerald G. et al. | 2011
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Ion beams in SEM: An experiment towards a high brightness low energy spread electron impact gas ion sourceJun, David S. / Kutchoukov, Vladimir G. / Kruit, Pieter et al. | 2011
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Evaluation of the curing process of UV resins in a 1,1,1,3,3-pentafluoropropane gas environment by photo differential scanning calorimetry and Fourier transform infrared spectroscopySawada, Yohei / Haruyama, Yuichi / Kanda, Kazuhiro / Matsui, Shinji / Okada, Makoto / Miyake, Hiroto / Ohsaki, Takeshi / Hirai, Yoshihiko / Hiroshima, Hiroshi et al. | 2011
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Atomic step patterning in nanoimprint lithography: Molecular dynamics studyTada, Kazuhiro / Yasuda, Masaaki / Tan, Geng / Miyake, Yumiko / Kawata, Hiroaki / Yoshimoto, Mamoru / Hirai, Yoshihiko et al. | 2011
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Anisotropic filling phenomenon of cavities in UV nanoimprint lithographyWang, Qing / Hiroshima, Hiroshi et al. | 2011
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Etch properties of resists modified by sequential infiltration synthesisTseng, Yu-Chih / Peng, Qing / Ocola, Leonidas E. / Czaplewski, David A. / Elam, Jeffrey W. / Darling, Seth B. et al. | 2011
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Investigating the effect of off-state stress on trap densities in AIGaN/GaN high electron mobility transistors 060603Liu, L et al. | 2011
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Electron-beam-induced deposition of 3-nm-half-pitch patterns on bulk Si 06F305van Oven, J C et al. | 2011
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Hard stamp processes for the EVG 620 full field nanoimprint system 06FC17Conway, James et al. | 2011
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Analysis of a scheme for de-magnified Talbot lithography 06F504Urbanski, L et al. | 2011
-
INDEX - Summary of the Physics and Astronomy Classification Scheme® — 2009 A31| 2011
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Review Article: Rare-earth monosulfides as durable and efficient cold cathodes 06F602Cahay, Marc et al. | 2011
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Microfluidics - Fabrication of fluidic devices with 30 nm nanochannels by direct imprinting 06F801Fernandez-Cuesta, Irene et al. | 2011
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Coexistence of guided mode resonance and extraordinary optical transmission in metal/dielectric/metal photonic crystal slab 06FF05Ou, Neil et al. | 2011
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Pulsed helium ion beam induced deposition: A means to high growth rates 06FG05Alkemade, Paul F A et al. | 2011
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Electron beam lithography writing strategies for low loss, high confinement silicon optical waveguidesBojko, Richard J. / Li, Jing / He, Li / Baehr-Jones, Tom / Hochberg, Michael / Aida, Yukinori et al. | 2011
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Fabrication of complex nanostructures of Poly(vinylidenefluoride-trifluoroethylene) by dual step hot-embossingWen, Juan-juan / Shen, Zhen-kui / Qiu, Zhi-jun / Jiang, An-quan / Liu, Ran / Chen, Yifang et al. | 2011
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Miniaturization of grayscale images 06F313Yang, Joel K W et al. | 2011
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Model based hybrid proximity effect correction scheme combining dose modulation and shape adjustments 06F315Klimpel, Thomas et al. | 2011
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Maskless Lithography - Charging effects during focused electron beam induced deposition of silicon oxide 06FD01de Boer, Sanne K et al. | 2011
-
Evaluation of fluorine additive effect on cationic UV-nanoimprint resin 06FC04Okada, Makoto et al. | 2011
-
Optical Lithography, including Masks and Maskless - Evaluation of three exposure schemes for absorbance-modulated interference lithography 06FH01Foulkes, John E et al. | 2011
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3D Nanostructuring of hydrogen silsesquioxane resist by 100 keV electron beam lithographyVila-Comamala, Joan / Gorelick, Sergey / Guzenko, Vitaliy A. / David, Christian et al. | 2011
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Parallel electron-beam-induced deposition using a multi-beam scanning electron microscopePost, P. C. / Mohammadi-Gheidari, A. / Hagen, C. W. / Kruit, P. et al. | 2011
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Miniaturization of grayscale imagesYang, Joel K. W. / Duan, Huigao / Law, Jaslyn B. K. / Yee Low, Hong / Cord, Bryan et al. | 2011
-
Fabrication of a seamless roll mold using inorganic electron beam resist with postexposure bakeUnno, Noriyuki / Taniguchi, Jun / Ishikawa, Kiyoshi et al. | 2011
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High aspect ratio fine pattern transfer using a novel mold by nanoimprint lithographySakamoto, J. / Fujikawa, N. / Nishikura, N. / Kawata, H. / Yasuda, M. / Hirai, Y. et al. | 2011
-
Multitip atomic force microscope lithography system for high throughput nanopatterningOh, Young / Choi, Chulmin / Noh, Kunbae / Villwock, Diana / Jin, Sungho / Kwon, Gwangmin / Lee, Haiwon et al. | 2011
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Light trapping in plasmonic nanocavities on metal surfacesPolyakov, Aleksandr / Padmore, Howard A. / Liang, Xiaogan / Dhuey, Scott / Harteneck, Bruce / Schuck, James P. / Cabrini, Stefano et al. | 2011
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Coexistence of guided mode resonance and extraordinary optical transmission in metal/dielectric/metal photonic crystal slabOu, Neil / Shyu, Jia-Hong / Lee, Huang-Ming / Wu, Jong-Ching et al. | 2011
-
Gradually shifting surface plasmon resonance by controlling the diameter of a nanohole structure by self-assemblyTakagi, Takamitsu / Kometani, Reo / Ishihara, Sunao / Warisawa, Shinichi / Kurihara, Kazuma / Awazu, Koichi et al. | 2011
-
Nanofabrication of photonic crystal-based devices using electron beam spot lithographyJugessur, A. S. / Yagnyukova, M. / Aitchison, J. S. et al. | 2011
-
Multilayer infrared metamaterial fabrication using membrane projection lithographyBruce Burckel, D. / Wendt, Joel R. / Samora, Sally / Sinclair, Michael B. / Brener, Igal / Ginn, James C. et al. | 2011
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Computational study of electron-irradiation effects in carbon nanomaterials on substratesChihara, Yoshinori / Yasuda, Masaaki / Wakuda, Shinya / Kawata, Hiroaki / Hirai, Yoshihiko et al. | 2011
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Computational lithography: Exhausting the resolution limits of 193-nm projection lithography systemsMelville, David O. S. / Rosenbluth, Alan E. / Waechter, Andreas / Millstone, Marc / Tirapu-Azpiroz, Jaione / Tian, Kehan / Lai, Kafai / Inoue, Tadanobu / Sakamoto, Masaharu / Adam, Kostas et al. | 2011
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3D fabrication by stacking prepatterned, rigidly held membranes 06F402Patel, Amil A et al. | 2011
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High temperature focused ion beam response of graphite resulting in spontaneous nanosheet formation 061804Langegger, Rupert et al. | 2011
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Optimization of block copolymer self-assembly through graphoepitaxy: A detectivity study 06F206Tiron, Raluca et al. | 2011
-
Graphitic carbon film formation under Ni templates by radio-frequency sputtering for transparent electrode applications 061202Lin, Meng-Yu et al. | 2011
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Secondary-electron signal level measurements of self-assembled monolayers for spatial-phase-locked electron-beam lithography 06F308Cheong, Lin Lee et al. | 2011
-
Method to pattern etch masks in two inclined planes for three-dimensional nano- and microfabrication 061604Willem Tjerkstra, R et al. | 2011
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Electron bombardment of films used for reducing spurious charge in electrostatic electron optics 06F317Maldonado, Juan R et al. | 2011
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Imaging of extreme-ultraviolet mask patterns using coherent extreme-ultraviolet scatterometry microscope based on coherent diffraction imaging 06F503Harada, Tetsuo et al. | 2011
-
Metrology development for extreme ultraviolet lithography: Flare and out-of-band qualification 06F505Lorusso, G F et al. | 2011
-
Subject Index to Volume 29 A37| 2011
-
Micro- and Nano-Mechanics (MEMS, NEMS) - Investigation of graphene piezoresistors for use as strain gauge sensors 06FE01Chen, Xing et al. | 2011
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Process window modeling using focus balancing technique 06F903Isoyan, Artak et al. | 2011
-
Nanoelectronics - Novel method for fabrication of nanoscale single-electron transistors: Electron beam induced deposition of Pt and atomic layer deposition of tunnel barriers 06FB01George, Hubert C et al. | 2011
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Technology platform for the fabrication of titanium nanostructures 06FG06Ecoffey, Serge et al. | 2011
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Computational study of electron-irradiation effects in carbon nanomaterials on substrates 06FG09Chihara, Yoshinori et al. | 2011
-
Injection compression molding of high-aspect-ratio nanostructures 06FG10Nagato, Keisuke et al. | 2011
-
PEN/Si3N4 bilayer film for dc bus capacitors in power converters in hybrid electric vehiclesZou, Chen / Zhang, Qiming / Zhang, Shihai / Kushner, Douglas / Zhou, Xin / Bernard, Richard / Orchard, Raymond J. et al. | 2011
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Fabrication of nanogaps by a progressive electromigration technique using wires of various thicknessesSaha, Swatilekha / Qian, Guoguang / Lewis, Kim M. et al. | 2011
-
Laser nitriding of niobium for application to superconducting radio-frequency accelerator cavitiesSingaravelu, S. / Klopf, J. M. / Krafft, G. / Kelley, M. J. et al. | 2011
-
Interface and electrical properties of Tm2O3 gate dielectrics for gate oxide scaling in MOS devicesKouda, M. / Kawanago, T. / Ahmet, P. / Natori, K. / Hattori, T. / Iwai, H. / Kakushima, K. / Nishiyama, A. / Sugii, N. / Tsutsui, K. et al. | 2011
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Patterned atomic layer epitaxy of Si/Si(001):HOwen, James H. G. / Ballard, Joshua / Randall, John N. / Alexander, Justin / Von Ehr, James R. et al. | 2011
-
Selective placement of DNA origami on substrates patterned by nanoimprint lithographyPenzo, Erika / Wang, Risheng / Palma, Matteo / Wind, Shalom J et al. | 2011
-
Di-block copolymer directed anodization of hexagonally ordered nanoporous aluminum oxideNoh, Kunbae / Choi, Chulmin / Kim, Hyunsu / Oh, Young / Kim, Jin-Yeol / Jung, Se-Yeon / Seong, Tae-Yeon / Jin, Sungho et al. | 2011
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Characterization of pentafluoropropane dissolved UV-nanoimprint resinChinen, Mika / Sawada, Yohei / Haruyama, Yuichi / Matsui, Shinji / Okada, Makoto / Hiroshima, Hiroshi et al. | 2011
-
Carbon nanomechanical resonator fabrication from PMMA by FIB/electron-beam dual-beam lithographyKometani, Reo / Hatakeyama, Taiki / Kuroda, Kouhei / Warisawa, Shin’ichi / Ishihara, Sunao et al. | 2011
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Injection compression molding of high-aspect-ratio nanostructuresNagato, Keisuke / Hamaguchi, Tetsuya / Nakao, Masayuki et al. | 2011
-
Pulsed-laser atom probe tomography of p-type field effect transistors on Si-on-insulator substratesJin, S. / Jones, K. S. / Ronsheim, P. A. / Hatzistergos, M. et al. | 2011
-
Comparison of passivation layers for AlGaN/GaN high electron mobility transistorsFitch, R. C. / Walker, D. E. / Chabak, K. D. / Gillespie, J. K. / Kossler, M. / Trejo, M. / Crespo, A. / Liu, L. / Kang, T. S. / Lo, C.-F. et al. | 2011
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Fabrication of two-dimensional tungsten photonic crystals for high-temperature applicationsAraghchini, M. / Yeng, Y. X. / Jovanovic, N. / Bermel, P. / Kolodziejski, L. A. / Soljacic, M. / Celanovic, I. / Joannopoulos, J. D. et al. | 2011
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Morphology of the Au-Si interface formed during solidification of liquid Au/Si(111) islandsJungwirth, Nick / Dailey, Eric / Madras, Prashanth / Drucker, Jeff et al. | 2011
-
3D fabrication by stacking prepatterned, rigidly held membranesPatel, Amil A. / Fucetola, Corey P. / Moon, Euclid E. / Smith, Henry I. et al. | 2011
-
Review Article: Rare-earth monosulfides as durable and efficient cold cathodesa)Cahay, Marc / Boolchand, Punit / Fairchild, Steven B. / Grazulis, Larry / Murray, Paul T. / Back, Tyson C. / Semet, Vincent / Binh, Vu Thien / Wu, Xiaohua / Poitras, Daniel et al. | 2011
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Fabrication of fluidic devices with 30 nm nanochannels by direct imprintingFernandez-Cuesta, Irene / Laura Palmarelli, Anna / Liang, Xiaogan / Zhang, Jingyu / Dhuey, Scott / Olynick, Deirdre / Cabrini, Stefano et al. | 2011
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Dynamic characteristics control of DLC nano-resonator fabricated by focused-ion-beam chemical vapor depositionKometani, Reo / Nishi, Shunjiro / Warisawa, Shin’ichi / Ishihara, Sunao et al. | 2011
-
Large area 3D helical photonic crystalsRaub, A. K. / Brueck, S. R. J. et al. | 2011
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Oxide nanotube analogues: CuO nanobarrels 061806Farrell, H H et al. | 2011
-
PAPERS FROM THE 55TH INTERNATIONAL CONFERENCE ON ELECTRON, ION, AND PHOTON BEAM TECHNOLOGY AND NANOFABRICATION - Directed Assembly - Patterned atomic layer epitaxy of Si/Si(001):H 06F201Owen, James H G et al. | 2011
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Temperature mapping using single wavelength pyrometry during epitaxial growth 060604Paquette, Bernard et al. | 2011
-
Nanometer Science & Technology - Growth mechanism of multilayer-graphene-capped, vertically aligned multiwalled carbon nanotube arrays 061801Matsuoka, Yuki et al. | 2011
-
Computational lithography: Exhausting the resolution limits of 193-nm projection lithography systems 06FH04Melville, David O S et al. | 2011
-
Electron or Ion Sources and Systems - Defined emission area and custom thermal electron sourcesMackie, William A et al. | 2011
-
Carbon nanomechanical resonator fabrication from PMMA by FIB/electron-beam dual-beam lithography 06FE06Kometani, Reo et al. | 2011
-
Gradually shifting surface plasmon resonance by controlling the diameter of a nanohole structure by self-assembly 06FF03Takagi, Takamitsu et al. | 2011
-
Local, direct-write, damage-free thinning of germanium nanowires 06FB03Roediger, Peter et al. | 2011
-
Nanofabrication of photonic crystal-based devices using electron beam spot lithography 06FF06Jugessur, A S et al. | 2011
-
Flexible poly(dimethyl siloxane) support layers for the evanescent characterization of near-field lithography systems 06FH02Moore, Ciaran P et al. | 2011
-
Letters - Large-area suspended graphene on GaN nanopillars 060601Lee, Chongmin et al. | 2011
-
Comparison of passivation layers for AIGaN/GaN high electron mobility transistors 061204Fitch, R C et al. | 2011
-
Energy Conversion and Storage Devices - PEN/Si3N4 bilayer film for dc bus capacitors in power converters in hybrid electric vehicles 061401Zou, Chen et al. | 2011
-
Fabrication of two-dimensional tungsten photonic crystals for high-temperature applications 061402Araghchini, M et al. | 2011
-
Fabrication of ultra-high-density nanodot array patterns (~3Tbits/in.2) using electron-beam lithography 061602Lee, Min-Hyun et al. | 2011
-
Simulation and Modeling - Modeling of charging effect on ion induced secondary electron emission from nanostructured materials 06F901Ohya, Kaoru et al. | 2011
-
Multilayer infrared metamaterial fabrication using membrane projection lithography 06FF04Bruce Burckel, D et al. | 2011
-
Suppression of boron diffusion in deep submicron devicesGribelyuk, Michael A. / Oldiges, Phil / Ronsheim, Paul A. / Yuan, Jun / Kimball, Leon et al. | 2011
-
Room temperature nanoimprinting using spin-coated hydrogen silsesquioxane with high boiling point solventKang, Yuji / Okada, Makoto / Omoto, Shinya / Haruyama, Yuichi / Kanda, Kazuhiro / Matsui, Shinji et al. | 2011
-
Fabrication of silicon template with smooth tapered sidewall for nanoimprint lithographyHe, Jian / Richter, K. / Bartha, J. W. / Howitz, S. et al. | 2011
-
Quality factor enhancement on nanomechanical resonators utilizing stiction phenomenaAshiba, Hiroki / Kometani, Reo / Warisawa, Shin’ichi / Ishihara, Sunao et al. | 2011
-
Low frequency tantalum electromechanical systems for biomimetical applicationsLatif, Rhonira / Mastropaolo, Enrico / Bunting, Andrew / Cheung, Rebecca / Koickal, Thomas / Hamilton, Alister / Newton, Michael / Smith, Leslie et al. | 2011
-
Evaluation of three exposure schemes for absorbance-modulated interference lithographyFoulkes, John E. / Holzwarth, Charles W. / Blaikie, Richard J. et al. | 2011
-
Growth mechanism of multilayer-graphene-capped, vertically aligned multiwalled carbon nanotube arraysMatsuoka, Yuki / Clark, Ian T. / Yoshimura, Masamichi et al. | 2011
-
High temperature focused ion beam response of graphite resulting in spontaneous nanosheet formationLangegger, Rupert / Lugstein, Alois / Glaser, Markus / Bertagnolli, Emmerich / Steiger-Thirsfeld, Andreas et al. | 2011
-
Towards an all-track 300 mm process for directed self-assemblyLiu, Chi-Chun / Thode, Christopher J. / Rincon Delgadillo, Paulina A. / Craig, Gordon S. W. / Nealey, Paul F. / Gronheid, Roel et al. | 2011
-
Comparison between ZEP and PMMA resists for nanoscale electron beam lithography experimentally and by numerical modelingKoshelev, Kirill / Ali Mohammad, Mohammad / Fito, Taras / Westra, Kenneth L. / Dew, Steven K. / Stepanova, Maria et al. | 2011
-
Mask roughness challenges in extreme ultraviolet mask developmentNaulleau, Patrick / McClinton, Brittany / Goldberg, Kenneth A. / Mochi, Iacopo / Rastegar, Abbas et al. | 2011
-
Metrology development for extreme ultraviolet lithography: Flare and out-of-band qualificationLorusso, G. F. / Hendrickx, E. / Davydova, N. / Peng, Y. / Eurlings, M. / Feenstra, K. / Jiang, J. et al. | 2011
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Local, direct-write, damage-free thinning of germanium nanowiresRoediger, Peter / Mijic, Mario / Zeiner, Clemens / Lugstein, Alois / Wanzenboeck, Heinz D. / Bertagnolli, Emmerich et al. | 2011
-
New approach for measuring protrusive forces in cellsMathur, A. / Roca-Cusachs, P. / Rossier, O. M. / Wind, S. J. / Sheetz, M. P. / Hone, J. et al. | 2011
-
Evaluation of fluorine additive effect on cationic UV-nanoimprint resinOkada, Makoto / Haruyama, Yuichi / Matsui, Shinji / Miyake, Hiroto / Iyoshi, Shuso / Yukawa, Takao / Takeuchi, Hidekazu et al. | 2011
-
Mechanical characterization of a piezo-operated thermal imprint systemMayer, Andre / Moellenbeck, Sakia / Dhima, Khalid / Wang, Si / Scheer, Hella-Christin et al. | 2011
-
Charging effects during focused electron beam induced deposition of silicon oxidede Boer, Sanne K. / van Dorp, Willem F. / De Hosson, Jeff Th. M. et al. | 2011
-
Lithography-patterning-fidelity-aware electron-optical system design optimizationChen, Sheng-Yung / Ng, Hoi-Tou / Ma, Shiau-Yi / Chen, Hsing-Hong / Liu, Chun-Hung / Tsai, Kuen-Yu / 陳勝勇 / 伍海濤 / 馬學億 / 陳信宏 et al. | 2011
-
Nanofabrication down to 10 nm on a plastic substrateTao, Li / Lee, Jongho / Akinwande, Deji et al. | 2011
-
Technology platform for the fabrication of titanium nanostructuresEcoffey, Serge / Guilmain, Marc / Morissette, Jean-François / Bourque, Frédéric / Pont, Jérémy / Sang, Bruno Lee / Drouin, Dominique et al. | 2011
-
In situ study of hydrogen silsesquioxane dissolution rate in salty and electrochemical developersHarry, Katherine J. / Strobel, Sebastian / Yang, Joel K. W. / Duan, Huigao / Berggren, Karl K. et al. | 2011
-
Electron beam lithography writing strategies for low loss, high confinement silicon optical waveguides 06F309Bojko, Richard J et al. | 2011
-
Lithography - Integration of moth-eye structures into a poly(dimethylsiloxane) stamp for the replication of functionalized microlenses using UV-nanoimprint lithography 061601Senn, Tobias et al. | 2011
-
Fast aerial image simulations using one basis mask pattern for optical proximity correction 06FH03Liu, Shiyuan et al. | 2011
-
Fabrication of silicon template with smooth tapered sidewall for nanoimprint lithography 06FC16He, Jian et al. | 2011
-
Multitip atomic force microscope lithography system for high throughput nanopatterning 06FD03Oh, Young et al. | 2011
-
Nanomachining with a focused neon beam: A preliminary investigation for semiconductor circuit editing and failure analysis 06F604Tan, Shida et al. | 2011
-
MEMS process compatibility of multiwall carbon nanotubes 06FE04Cook, Eugene H et al. | 2011
-
Room temperature nanoimprinting using spin-coated hydrogen silsesquioxane with high boiling point solvent 06FC03Kang, Yuji et al. | 2011
-
Large-diameter roll mold fabrication method using a small-diameter quartz roll mold and UV nanoimprint lithography 06FC08Taniguchi, Jun et al. | 2011
-
Atomic step patterning in nanoimprint lithography: Molecular dynamics study 06FC11Tada, Kazuhiro et al. | 2011
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MEMS & NEMS - Semiconductor nanopores formed by chemical vapor deposition of heteroepitaxial SiC films on SOI(100) substrates 062001Ikoma, Yoshifumi et al. | 2011
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Organic Electronics and Optoelectronics - Fabrication of a blue organic light-emitting diode with a novel thermal deposition boat 062401Lee, Sangmin et al. | 2011
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Review Article - Functional semiconductor nanowires via vapor deposition 060801Shi, Jian et al. | 2011
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Emerging Technologies - 3D nanostructures by stacking pre-patterned fluid-supported single-crystal Si membranes 06F401Ghadarghadr, Shabnam et al. | 2011
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High aspect ratio fine pattern transfer using a novel mold by nanoimprint lithography 06FC15Sakamoto, J et al. | 2011
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AUTHOR INDEX A27| 2011
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Materials Index to Volume 29 A111| 2011
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Nanostructures and Pattern Transfer - Etch properties of resists modified by sequential infiltration synthesis 06FG01Tseng, Yu-Chih et al. | 2011
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Twelve nanometer half-pitch W-Cr-HSQ trilayer process for soft x-ray tungsten zone plates 06FG02Reinspach, Julia et al. | 2011
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Evaluation of the curing process of UV resins in a 1,1,1,3,3-pentafluoropropane gas environment by photo differential scanning calorimetry and Fourier transform infrared spectroscopy 06FC05Sawada, Yohei et al. | 2011
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Temperature mapping using single wavelength pyrometry during epitaxial growthPaquette, Bernard / Gsib, Badii / Arès, Richard et al. | 2011
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Effects of proton irradiation on dc characteristics of InAlN/GaN high electron mobility transistorsLo, C. F. / Liu, L. / Ren, F. / Kim, H.-Y. / Kim, J. / Pearton, S. J. / Laboutin, O. / Cao, Yu / Johnson, J. W. / Kravchenko, I. I. et al. | 2011
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Oxide nanotube analogues: CuO nanobarrelsFarrell, H. H. / Parra, Ruben D. et al. | 2011
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Modeling the power spectrum of thermal line edge roughness in a lamellar diblock copolymer mesophase a)Bosse, August W. et al. | 2011
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Probe field enhancement in photonic crystals by upconversion nanoparticlesZhang, Jingyu / Pick, Teresa E. / Gargas, Daniel / Dhuey, Scott / Chan, Emory M. / Wu, Ying / Liang, Xiaogan / Schuck, P. James / Olynick, Deirdre L. / Helms, Brett A. et al. | 2011
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Scanning proximal probe lithography for sub-10 nm resolution on calix[4]resorcinareneKaestner, Marcus / Rangelow, Ivo W. et al. | 2011
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New diamond nanofabrication process for hard x-ray zone platesUhlén, Fredrik / Lindqvist, Sandra / Nilsson, Daniel / Reinspach, Julia / Vogt, Ulrich / Hertz, Hans M. / Holmberg, Anders / Barrett, Ray et al. | 2011
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Selective graphene growth from DLC thin film patterned by focused-ion-beam chemical vapor depositionHatakeyama, Taiki / Kometani, Reo / Warisawa, Shin’ichi / Ishihara, Sunao et al. | 2011
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Fast aerial image simulations using one basis mask pattern for optical proximity correctionLiu, Shiyuan / Wu, Xiaofei / Liu, Wei / Zhang, Chuanwei et al. | 2011
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Flexible poly(dimethyl siloxane) support layers for the evanescent characterization of near-field lithography systemsMoore, Ciaran P. / Blaikie, Richard J. et al. | 2011
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Di-block copolymer directed anodization of hexagonally ordered nanoporous aluminum oxide 06F207Noh, Kunbae et al. | 2011
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Pulsed-laser atom probe tomography of p-type field effect transistors on Si-on-insulator substrates 061203Jin, S et al. | 2011
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Parallel electron-beam-induced deposition using a multi-beam scanning electron microscope 06F310Post, P C et al. | 2011
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Density multiplication of nanostructures fabricated by ultralow voltage electron beam lithography using PMMA as positive- and negative-tone resist 06F312Adeyenuwo, Adegboyega P et al. | 2011
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Measurement of surface potential of insulating film on a conductive substrate in a scanning electron microscope specimen chamber 06F316Kotera, Masatoshi et al. | 2011
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Extreme Ultraviolet Lithography - Mask roughness challenges in extreme ultraviolet mask development 06F501Naulleau, Patrick et al. | 2011
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Resists - In situ study of hydrogen silsesquioxane dissolution rate in salty and electrochemical developers 06FJ01Harry, Katherine J et al. | 2011
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Author Index to Volume 29 A84| 2011
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Dynamic characteristics control of DLC nano-resonator fabricated by focused-ion-beam chemical vapor deposition 06FE03Kometani, Reo et al. | 2011
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Low frequency tantalum electromechanical systems for biomimetical applications 06FE05Latif, Rhonira et al. | 2011
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Micro- and Nano-Photonics, Plasmonics - Light trapping in plasmonic nanocavities on metal surfaces 06FF01Polyakov, Aleksandr et al. | 2011
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New diamond nanofabrication process for hard x-ray zone plates 06FG03Uhlén, Fredrik et al. | 2011
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Suitability of thin poly(dimethylsiloxane) as an antisticking layer for UV nanoimprinting 06FC09Okada, Makoto et al. | 2011
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Investigation of polarity effects on the degradation of Pd/Ti/Pt ohmic contacts to p-type SiC under current stressDowney, B. P. / Flemish, J. R. / Mohney, S. E. et al. | 2011
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Development of an experimental technique for testing rheological properties of ultrathin polymer films used in nanoimprint lithographyJarzabek, Dariusz M. / Rymuza, Zygmunt / Horiba, Akira / Hirai, Yoshihiko et al. | 2011
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3D nanostructures by stacking pre-patterned fluid-supported single-crystal Si membranesGhadarghadr, Shabnam / Fucetola, Corey P. / Lee Cheong, Lin / E. Moon, Euclid / I. Smith, Henry et al. | 2011
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Influence of gun design on Coulomb interactions in a field emission gunVerduin, T. / Cook, B. / Kruit, P. et al. | 2011
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Mechanical characteristics of imprinted nanostructures fabricated with a poly(dimethylsiloxane) moldKang, Yuji / Okada, Makoto / Nakai, Yasuki / Haruyama, Yuichi / Kanda, Kazuhiro / Matsui, Shinji et al. | 2011
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Hard stamp processes for the EVG 620 full field nanoimprint systemConway, James / Kruger, James B. / Mansourpour, Mahnaz / Rissman, Paul et al. | 2011
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Investigation of graphene piezoresistors for use as strain gauge sensorsChen, Xing / Zheng, Xiaohu / Kim, Ji-Kwan / Li, Xinxin / Lee, Dong-Weon et al. | 2011
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MEMS process compatibility of multiwall carbon nanotubesCook, Eugene H. / Carter, David J. D. et al. | 2011
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Pulsed helium ion beam induced deposition: A means to high growth ratesAlkemade, Paul F. A. / Miro, Hozanna / van Veldhoven, Emile / Maas, Diederik J. / Smith, Daryl A. / Rack, Philip D. et al. | 2011
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Large-area suspended graphene on GaN nanopillarsLee, Chongmin / Kim, Byung-Jae / Ren, Fan / Pearton, S. J. / Kim, Jihyun et al. | 2011
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Functional semiconductor nanowires via vapor depositionShi, Jian / Wang, Xudong et al. | 2011
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Experimental evaluation method of point spread functions used for proximity effects correction in electron beam lithographyNilsson, Bengt A. et al. | 2011
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Model based hybrid proximity effect correction scheme combining dose modulation and shape adjustmentsKlimpel, Thomas / Schulz, Martin / Zimmermann, Rainer / Stock, Hans-Jürgen / Zepka, Alex et al. | 2011
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Electron bombardment of films used for reducing spurious charge in electrostatic electron opticsMaldonado, Juan R. / Pease, Fabian / Hitzman, Charles J. / Brodie, Alan D. / Petric, Paul / Bevis, Chris / McCord, Mark / Tong, William M. / Kidwingira, Francoise / Pianetta, Piero et al. | 2011
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Modeling of charging effect on ion induced secondary electron emission from nanostructured materialsOhya, Kaoru / Takami, Daiki / Yamanaka, Takuya et al. | 2011
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Influence of surface patterning on bacterial growth behaviorNill, Peter / Kern, Dieter P. / Goehring, Nadine / Peschel, Andreas et al. | 2011
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Novel method for fabrication of nanoscale single-electron transistors: Electron beam induced deposition of Pt and atomic layer deposition of tunnel barriersGeorge, Hubert C. / Orlova, Tatyana A. / Orlov, Alexei O. / Snider, Gregory L. et al. | 2011
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Fabrication of hybrid metal island/silicon single electron transistorLee, Yen-Chun / Orlov, Alexei O. / Snider, Gregory L. et al. | 2011
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Macro-optical inspection method for deterioration evaluation of release-coated mold surfaces for nanoimprint lithographyTaniguchi, Jun / Takahashi, Junki / Uda, Mitsuru / Kohayase, Atushi / Kotaki, Kenichi et al. | 2011
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Combining nanoimprint lithography and a molecular weight selective thermal reflow for the generation of mixed 3D structuresSchleunitz, Arne / Spreu, Christian / Vogler, Marko / Atasoy, Hakan / Schift, Helmut et al. | 2011
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Soft patterning on cylindrical surface of plastic optical fiberMekaru, Harutaka / Takagi, Hideki / Ohtomo, Akihiro / Kokubo, Mitsunori / Goto, Hiroshi et al. | 2011
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Experimental analysis for process control in hybrid lithographyDhima, Khalid / Steinberg, Christian / Möllenbeck, Saskia / Mayer, Andre / Wang, Si / Sheer, Hella-Christin et al. | 2011
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Morphology of the Au-Si interface formed during solidification of liquid Au/Si(111) islands 061805Jungwirth, Nick et al. | 2011
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Interface and electrical properties of Tm2O3 gate dielectrics for gate oxide scaling in MOS devices 062202Kouda, M et al. | 2011
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Selective placement of DNA origami on substrates patterned by nanoimprint lithography 06F205Penzo, Erika et al. | 2011
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Direct top-down ordering of diblock copolymers through nanoimprint lithography 06F208Salaün, M et al. | 2011
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Electron or Ion Beam Lithography - 3D Nanostructuring of hydrogen silsesquioxane resist by 100 keV electron beam lithography 06F301Vila-Comamala, Joan et al. | 2011
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Developer-free direct patterning of PMMA/ZEP 520A by low voltage electron beam lithography 06F303Zhi Zheng, David Ai et al. | 2011
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Comparison between ZEP and PMMA resists for nanoscale electron beam lithography experimentally and by numerical modeling 06F306Koshelev, Kirill et al. | 2011
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Investigation of polarity effects on the degradation of Pd/Ti/Pt ohmic contacts to p-type SiC under current stress 061205Downey, B P et al. | 2011
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Probe field enhancement in photonic crystals by upconversion nanoparticles 06F403Zhang, Jingyu et al. | 2011
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Improved time dependent performance of hydrogen silsesquioxane resist using a spin on top coat 06RJ02Westly, Daron A et al. | 2011
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Ion beams in SEM: An experiment towards a high brightness low energy spread electron impact gas ion source 06F603Jun, David S et al. | 2011
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Quality factor enhancement on nanomechanical resonators utilizing stiction phenomena 06FE02Ashiba, Hiroki et al. | 2011
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Enhancement of spatial resolution in generating point spread functions by Monte Carlo simulation in electron-beam lithography 06F902Lee, S-Y et al. | 2011
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Influence of surface patterning on bacterial growth behavior 06FA03Nill, Peter et al. | 2011
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Fabrication of hybrid metal island/silicon single electron transistor 06FB02Lee, Yen-Chun et al. | 2011
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Fabrication of complex nanostructures of Poly(vinylidenefluoride-trifluoroethylene) by dual step hot-embossing 06FG08Wen, Juan-juan et al. | 2011
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Microelectronic & Nanoelectronic Devices - Suppression of boron diffusion in deep submicron devices 062201Gribelyuk, Michael A et al. | 2011
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Selective profile transformation of electron-beam exposed multilevel resist structures based on a molecular weight dependent thermal reflow 06F302Schleunitz, Arne et al. | 2011
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Nanopatterning of PMMA on insulating surfaces with various anticharging schemes using 30 keV electron beam lithography 06F304Muhammad, Mustafa et al. | 2011
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Electronic & Optoelectronic Materials, Devices & Processing - Effects of proton irradiation on dc characteristics of InAIN/GaN high electron mobility transistors 061201Lo, C F et al. | 2011
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Development of an experimental technique for testing rheological properties of ultrathin polymer films used in nanoimprint lithography 061603Jarzabek, Dariusz M et al. | 2011
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Fabrication of nanogaps by a progressive electromigration technique using wires of various thicknesses 061802Saha, Swatilekha et al. | 2011
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Laser nitriding of niobium for application to superconducting radio-frequency accelerator cavities 061803Singaravelu, S et al. | 2011
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Actinic characterization of extreme ultraviolet bump-type phase defects 06F502Goldberg, Kenneth A et al. | 2011
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Characterization of pentafluoropropane dissolved UV-nanoimprint resin 06FC18Chinen, Mika et al. | 2011
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Large area 3D helical photonic crystals 06FF02Raub, A K et al. | 2011
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Macro-optical inspection method for deterioration evaluation of release-coated mold surfaces for nanoimprint lithography 06FC02Taniguchi, Jun et al. | 2011
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Selective graphene growth from DLC thin film patterned by focused-ion-beam chemical vapor deposition 06FG04Hatakeyama, Taiki et al. | 2011
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Nanofabrication down to 10 nm on a plastic substrate 06FG07Tao, Li et al. | 2011
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Mechanical characterization of a piezo-operated thermal imprint system 06FC13Mayer, Andre et al. | 2011
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Investigating the effect of off-state stress on trap densities in AlGaN/GaN high electron mobility transistorsLiu, L. / Ren, F. / Pearton, S. J. / Fitch, R. C. / Walker, D. E. / Chabak, K. D. / Gillespie, J. K. / Kossler, M. / Trejo, M. / Via, David et al. | 2011
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Graphitic carbon film formation under Ni templates by radio-frequency sputtering for transparent electrode applicationsLin, Meng-Yu / Sheng, Yung-Shuan / Chen, Shu-Han / Su, Ching-Yuan / Li, Lain-Jong / Lin, Shih-Yen et al. | 2011
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Integration of moth-eye structures into a poly(dimethylsiloxane) stamp for the replication of functionalized microlenses using UV-nanoimprint lithographySenn, Tobias / Kutz, Oliver / Weniger, Christian / Li, Junming / Schoengen, Max / Löchel, Heike / Wolf, Johannes / Göttert, Philipp / Löchel, Bernd et al. | 2011
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Method to pattern etch masks in two inclined planes for three-dimensional nano- and microfabricationTjerkstra, R. Willem / Woldering, Léon A. / van den Broek, Johanna M. / Roozeboom, Fred / Setija, Irwan D. / Vos, Willem L. et al. | 2011
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Semiconductor nanopores formed by chemical vapor deposition of heteroepitaxial SiC films on SOI(100) substratesIkoma, Yoshifumi / Yahaya, Hafizal / Kuriyama, Keiji / Sakita, Hirofumi / Nishino, Yuta / Motooka, Teruaki et al. | 2011
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Fabrication of chevron patterns for patterned media with block copolymer directed assemblyLiu, Guoliang / Nealey, Paul F. / Ruiz, Ricardo / Dobisz, Elizabeth / Patel, Kanaiyalal C. / Albrecht, Thomas R. et al. | 2011
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Optimization of block copolymer self-assembly through graphoepitaxy: A defectivity studyTiron, Raluca / Chevalier, Xavier / Couderc, Christophe / Pradelles, Jonathan / Bustos, Jessy / Pain, Laurent / Navarro, Christophe / Magnet, Stephanie / Fleury, Guillaume / Hadziioannou, Georges et al. | 2011
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Selective profile transformation of electron-beam exposed multilevel resist structures based on a molecular weight dependent thermal reflowSchleunitz, Arne / Guzenko, Vitaliy A. / Schander, Andreas / Vogler, Marko / Schift, Helmut et al. | 2011
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Comparison of hydrogen silsesquioxane development methods for sub-10 nm electron beam lithography using accurate linewidth inspectionMacintyre, D. S. / Thoms, S. et al. | 2011
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Three-dimensional proximity effect correction for large-scale uniform patternsDai, Q. / Lee, S.-Y. / Lee, S.-H. / Kim, B.-G. / Cho, H.-K. et al. | 2011
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Measurement of surface potential of insulating film on a conductive substrate in a scanning electron microscope specimen chamberKotera, Masatoshi / Osada, Akira / Otani, Masaru / Ohara, Yasuhiro et al. | 2011
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Nanomachining with a focused neon beam: A preliminary investigation for semiconductor circuit editing and failure analysisTan, Shida / Livengood, Richard / Hack, Paul / Hallstein, Roy / Shima, Darryl / Notte, John / McVey, Shawn et al. | 2011
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Enhancement of spatial resolution in generating point spread functions by Monte Carlo simulation in electron-beam lithographyLee, S.-Y. / Dai, Q. / Lee, S.-H. / Kim, B.-G. / Cho, H.-K. et al. | 2011
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Process window modeling using focus balancing techniqueIsoyan, Artak / Croffie, Ebo / Melvin, Lawrence S. et al. | 2011
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Suspended, micron-scale corner cube retroreflectors as ultra-bright optical labelsSherlock, Tim / Nasrullah, Azeem / Litvinov, Julia / Cacao, Eliedonna / Knoop, Jennifer / Kemper, Steven / Kourentzi, Katerina / Kar, Archana / Ruchhoeft, Paul / Willson, Richard et al. | 2011
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Large-diameter roll mold fabrication method using a small-diameter quartz roll mold and UV nanoimprint lithographyTaniguchi, Jun / Unno, Noriyuki / Maruyama, Hiroki et al. | 2011
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Liquid transfer imprint lithography: A new route to residual layer thickness controlKoo, Namil / Wuk Kim, Jung / Otto, Martin / Moormann, Christian / Kurz, Heinrich et al. | 2011