Ge interactions on surfaces and kinetically driven patterning of Ge nanocrystals on (English)
- New search for: Stanley, Scott K.
- New search for: Joshi, Sachin V.
- New search for: Banerjee, Sanjay K.
- New search for: Ekerdt, John G.
- New search for: Stanley, Scott K.
- New search for: Joshi, Sachin V.
- New search for: Banerjee, Sanjay K.
- New search for: Ekerdt, John G.
In:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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24
, 1
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78-83
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2006
- Article (Journal) / Electronic Resource
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Title:Ge interactions on surfaces and kinetically driven patterning of Ge nanocrystals on
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Additional title:Ge interactions on surfaces and kinetically driven patterning
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Contributors:Stanley, Scott K. ( author ) / Joshi, Sachin V. ( author ) / Banerjee, Sanjay K. ( author ) / Ekerdt, John G. ( author )
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Published in:
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Publisher:
- New search for: American Vacuum Society
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Publication date:2006-01-01
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Size:6 pages
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ISSN:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:English
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Keywords:
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Source:
Table of contents – Volume 24, Issue 1
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1
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Etching of ruthenium coatings in - and -containing plasmasHsu, C. C. / Coburn, J. W. / Graves, D. B. et al. | 2006
- 9
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Free molecular background flow in a vacuum chamber equipped with two-sided pumpsCai, Chunpei / Boyd, Iain D. / Sun, Quanhua et al. | 2006
- 20
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Investigation of reaction with sputtered amorphous thin film on substrateQu, Xin-Ping / Duan, Peng / Wu, Yan-Qing / Chen, Tao / Wang, Guang-Wei / Ru, Guo-Ping / Li, Bing-Zong et al. | 2006
- 25
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Control of plasma flux composition incident on films during reactive magnetron sputtering and the effect on film microstructureMuratore, C. / Walton, S. G. / Leonhardt, D. / Fernsler, R. F. et al. | 2006
- 30
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Plasma etching of at elevated temperatures in chlorine-based chemistryHélot, M. / Chevolleau, T. / Vallier, L. / Joubert, O. / Blanquet, E. / Pisch, A. / Mangiagalli, P. / Lill, T. et al. | 2006
- 41
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Effectiveness of dilute plasmas in removing boron from Si after etching of films in plasmasWang, C. / Donnelly, V. M. et al. | 2006
- 45
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Ion-surface interactions on at the radiofrequency-powered electrode in low-pressure plasmas: Ex situ spectroscopic ellipsometry and Monte Carlo simulation studyAmassian, A. / Desjardins, P. / Martinu, L. et al. | 2006
- 55
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Optical depth profiling of strontium titanate and electro-optic lanthanum-modified lead zirconium titanate multilayer structures for active waveguide applicationsAmassian, A. / Gaidi, M. / Chaker, M. / Martinu, L. et al. | 2006
- 65
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Electrical properties of indium-tin oxide films deposited on nonheated substrates using a planar-magnetron sputtering system and a facing-targets sputtering systemIwase, Hideo / Hoshi, Youichi / Kameyama, Makoto et al. | 2006
- 70
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SiC formation by molecules as a precursor: A synchrotron-radiation photoemission study of the carbonization processCheng, C.-P. / Pi, T.-W. / Ouyang, C.-P. / Wen, J.-F. et al. | 2006
- 74
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Study of annealed Co thin films deposited by ion beam sputteringSharma, A. / Brajpuriya, R. / Tripathi, S. / Chaudhari, S. M. et al. | 2006
- 78
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Ge interactions on surfaces and kinetically driven patterning of Ge nanocrystals onStanley, Scott K. / Joshi, Sachin V. / Banerjee, Sanjay K. / Ekerdt, John G. et al. | 2006
- 84
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Rapid thermal oxidation of Ge-rich heterolayersBera, M. K. / Chakraborty, S. / Das, R. / Dalapati, G. K. / Chattopadhyay, S. / Samanta, S. K. / Yoo, W. J. / Chakraborty, A. K. / Butenko, Y. / Šiller, L. et al. | 2006
- 91
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Ultrasensitive leak detection during ultrahigh vacuum evacuation by quadrupole mass spectrometerChen, Xu / Huang, Tianbin / Wang, Ligong / Jin, Qiji / Cha, Liangzhen et al. | 2006
- 95
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How deposition parameters control growth dynamics of deposited by hot-wire chemical vapor depositionMoutinho, H. R. / To, B. / Jiang, C.-S. / Xu, Y. / Nelson, B. P. / Teplin, C. W. / Jones, K. M. / Perkins, J. / Al-Jassim, M. M. et al. | 2006
- 103
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Low-resistivity atomic-layer-deposited- with atomic-layer-deposited-/physical-vapor-deposited-Ta multilayer structure for multilevel Cu damascene interconnectFuruya, Akira / Ohtsuka, Nobuyuki / Ohashi, Naofumi / Kondo, Seiichi / Ogawa, Shinichi et al. | 2006
- 106
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High-rate deposition of MgO by reactive ac pulsed magnetron sputtering in the transition modeKupfer, H. / Kleinhempel, R. / Richter, F. / Peters, C. / Krause, U. / Kopte, T. / Cheng, Y. et al. | 2006
- 114
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Spectroscopic study of gas and surface phase chemistries of plasmas in an inductively coupled modified gaseous electronics conference reactorZhou, Baosuo / Joseph, Eric A. / Overzet, Lawrence J. / Goeckner, Matthew J. et al. | 2006
- 126
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In situ Fourier transform infrared characterization of the plasma chemistry in varying pulsed cycles of a 1,3-butadiene discharge in an inductively coupled gaseous electronics conference cellJindal, A. K. / Prengler, A. J. / Overzet, L. J. / Goeckner, M. J. et al. | 2006
- 133
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Effects of , , and Ar plasma treatments on the removal of crystallized filmChen, Jinghao / Yoo, Won Jong / Chan, Daniel S. H. et al. | 2006
- 141
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Influence of excitonic singlet-triplet splitting on the photoluminescence of multiple quantum wells fabricated by remote plasma-enhanced chemical-vapor depositionRölver, R. / Först, M. / Winkler, O. / Spangenberg, B. / Kurz, H. et al. | 2006
- 146
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Optimization of multilayer wear-resistant thin films using finite element analysis on stiff and compliant substratesLakkaraju, R.K. et al. | 2006
- 146
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Optimization of multilayer wear-resistant thin films using finite element analysis on stiff and compliant substratesa)Lakkaraju, R. K. / Bobaru, F. / Rohde, S. L. et al. | 2006
- 156
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Conduction anisotropy in porous thin films with chevron microstructuresVick, D. et al. | 2006
- 156
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Conduction anisotropy in porous thin films with chevron microstructuresa)Vick, D. / Brett, M. J. et al. | 2006
- 165
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Characterization of low dielectric constant plasma polymer films deposited by plasma-enhanced chemical vapor deposition using decamethyl-cyclopentasiloxane and cyclohexane as the precursorsYang, Jaeyoung / Lee, Sungwoo / Park, Hyoungsun / Jung, Donggeun / Chae, Heeyeop et al. | 2006
- 170
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Effect of assistant rf field on phase composition of iron nitride film prepared by magnetron sputtering processLi, W.L. et al. | 2006
- 170
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Effect of assistant rf field on phase composition of iron nitride film prepared by magnetron sputtering processa)Li, W. L. / Zheng, F. / Fei, W. D. et al. | 2006
- 174
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Effects of Al content on grain growth of solid solution (Ti,AI)N filmsLiu, Z.-J. et al. | 2006
- 174
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Effects of Al content on grain growth of solid solution (Ti,Al)N filmsLiu, Z.-J. / Shen, Y. G. et al. | 2006
- 178
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CUMULATIVE AUTHOR INDEX| 2006
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An international journal devoted to Vacuum, Surfaces, and Films| 2006
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Information for Contributors| 2006