Preparation and properties of transparent conductive aluminum-doped zinc oxide thin films by sol–gel process (English)
- New search for: Alam, M. J.
- New search for: Cameron, D. C.
- New search for: Alam, M. J.
- New search for: Cameron, D. C.
In:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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19
, 4
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1642-1646
;
2001
- Article (Journal) / Electronic Resource
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Title:Preparation and properties of transparent conductive aluminum-doped zinc oxide thin films by sol–gel process
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Contributors:Alam, M. J. ( author ) / Cameron, D. C. ( author )
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Published in:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films ; 19, 4 ; 1642-1646
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Publisher:
- New search for: American Vacuum Society
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Publication date:2001-07-01
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Size:5 pages
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ISSN:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:English
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Keywords:
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Source:
Table of contents – Volume 19, Issue 4
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1037
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PART I - Biomaterial Interfaces - Biomaterial Interfaces Poster Session - Photovoltaic characteristics of BR-p-silicon heterostructures using surface photovoltage spectroscopyLi, Lin Song et al. | 2001
- 1037
-
Photovoltaic characteristics of BR/p-silicon heterostructures using surface photovoltage spectroscopyLi, Lin Song / Xu, Tao / Zhang, Yan Jie / Jin, Jian / Li, Tie Jin / Zou, Bingsuo / Wang, Jian-Ping et al. | 2001
- 1042
-
PART I - Biomaterial Interfaces - Biomaterial Interfaces Poster Session - Observation of the bone matrix structure of intact and regenerative zones of tibias by atomic force microscopyBaranauskas, Vitor et al. | 2001
- 1042
-
Observation of the bone matrix structure of intact and regenerative zones of tibias by atomic force microscopyBaranauskas, Vitor / Garavello-Freitas, I. / Jingguo, Z. / Cruz-Höfling, M. A. et al. | 2001
- 1046
-
PART I - Electronics - Electronics Poster Session - Structural and electrical characteristics of chemical vapor deposited W-n-Si0.83Ge0.17-Si(001) and chemical vapor deposited WSix-n-Si0.83Ge0.17-Si(001)Jang, Y.C. et al. | 2001
- 1046
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Structural and electrical characteristics of chemical vapor deposited and chemical vapor depositedJang, Y. C. / Shin, D. O. / Kim, K. S. / Shim, K.-H. / Lee, N.-E. / Youn, S. P. / Roh, K. J. / Roh, Y. H. et al. | 2001
- 1052
-
PART I - Electronics - Electronics Poster Session - Fabrication of smooth diamond films on SiO2 by the addition of nitrogen to the gas feed in hot-filament chemical vapor depositionBaranauskas, Vitor et al. | 2001
- 1052
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Fabrication of smooth diamond films on by the addition of nitrogen to the gas feed in hot-filament chemical vapor depositionBaranauskas, Vitor / Peterlevitz, Alfredo C. / Jingguo, Zhao / Durrant, Steven F. et al. | 2001
- 1057
-
PART I - Electronics - Electronics Poster Session - Micro-crystalline diamond and nano-carbon structures produced using a high argon concentration in hot-filament chemical vapor depositionBaranauskas, Vitor et al. | 2001
- 1057
-
Micro-crystalline diamond and nano-carbon structures produced using a high argon concentration in hot-filament chemical vapor depositionBaranauskas, Vitor / Peterlevitz, Alfredo C. / Ceragioli, Helder J. / Durrant, Steven F. et al. | 2001
- 1063
-
Damage in etching of thin films using inductively coupled plasmaChoi, Sung-Ki / Kim, Dong-Pyo / Kim, Chang-Il / Chang, Eui-Goo et al. | 2001
- 1063
-
PART I - Electronics - Electronics Poster Session - Damage in etching of (Ba, Sr)TiO3 thin films using inductively coupled plasmaChoi, Sung-Ki et al. | 2001
- 1068
-
Etch characteristics of thin films as a buffer layer for the application of ferroelectric random access memoryOh, Chang-Seok / Kim, Chang-Il / Kwon, Kwang-Ho et al. | 2001
- 1068
-
PART I - Electronics - Electronics Poster Session - Etch characteristics of CeO2 thin films as a buffer layer for the application of ferroelectric random access memoryOh, Chang-Seok et al. | 2001
- 1072
-
PART I - Electronics - Electronics Poster Session - Chemical interaction and adhesion characteristics at the interface of metals (Cu, Ta) and low-k cyclohexane-based plasma polymer (CHexPP) filmsKim, K.J. et al. | 2001
- 1072
-
Chemical interaction and adhesion characteristics at the interface of metals (Cu, Ta) and low-k cyclohexane-based plasma polymer (CHexPP) filmsKim, K. J. / Kim, K. S. / Lee, N.-E. / Choi, J. / Jung, D. et al. | 2001
- 1078
-
Low temperature deposition and characterization of polycrystalline Si films on polymer substratesXu, K. / Shah, S. I. / Guerin, D. et al. | 2001
- 1078
-
PART I - Flat Panel Displays - Flexible Displays - Low temperature deposition and characterization of polycrystalline Si films on polymer substratesXu, K. et al. | 2001
- 1083
-
Cross-sectional transmission electron microscopy investigation of the dead layer of ZnS:Ag,Al phosphors in field emission displaysKajiwara, K. et al. | 2001
- 1083
-
PART I - Flat Panel Displays - Luminescent Materials - Cross-sectional transmission electron microscopy investigation of the dead layer of ZnS:Ag,Al phosphors in field emission displaysKajiwara, K. et al. | 2001
- 1090
-
PART I - Flat Panel Displays - Flat Panel Displays Poster Session - Optical filters for plasma display panels using organic dyes and sputtered multilayer coatingsOkamura, T. et al. | 2001
- 1090
-
Optical filters for plasma display panels using organic dyes and sputtered multilayer coatingsOkamura, T. / Fukuda, S. / Koike, K. / Saigou, H. / Yoshikai, M. / Koyama, M. / Misawa, T. / Matsuzaki, Y. et al. | 2001
- 1095
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Effects of ZnO buffer layer on the luminous properties of thin-film phosphors deposited on ZnO/ITO/glass substratesKim, Young Jin / Chung, Sung Mook / Ho Jeong, Young / Lee, Yong Eui et al. | 2001
- 1095
-
PART I - Flat Panel Displays - Flat Panel Displays Poster Session - Effects of ZnO buffer layer on the luminous properties of thin-film phosphors deposited on ZnO-ITO- glass substratesKim, Young Jin et al. | 2001
- 1099
-
PART I - Flat Panel Displays - Flat Panel Displays Poster Session - Investigation of the outgassing characteristics of the materials comprising a plasma display panelHan, H.R. et al. | 2001
- 1099
-
Investigation of the outgassing characteristics of the materials comprising a plasma display panelHan, H. R. / Lee, Y. J. / Yeom, G. Y. et al. | 2001
- 1105
-
PART I - Industrial Ecology - Industrial Ecology Poster Session - In situ analysis of perfluoro compounds in semiconductor process exhaust: Use of Li+ ion-attachment mass spectrometryNakamura, M. et al. | 2001
- 1105
-
In situ analysis of perfluoro compounds in semiconductor process exhaust: Use of ion-attachment mass spectrometryNakamura, M. / Hino, K. / Sasaki, T. / Shiokawa, Y. / Fujii, T. et al. | 2001
- 1111
-
Quantitative comparison between Auger electron spectroscopy and secondary ion mass spectroscopy depth profiles of a double layer structure of AlAs in GaAs using the mixing-roughness-information depth modelHofmann, S. / Rar, A. / Moon, D. W. / Yoshihara, K. et al. | 2001
- 1111
-
PART I - Material Characterization - Depth Profiling - Quantitative comparison between Auger electron spectroscopy and secondary ion mass spectroscopy depth profiles of a double layer structure of AlAs in GaAs using the mixing-roughness-information depth modelHofmann, S. et al. | 2001
- 1116
-
Surface characterization of IM7/5260 composites by x-ray photoelectron spectroscopyOhno, Satomi / Lee, Moon-Hwan / Lin, Kuen Y. / Ohuchi, Fumio S. et al. | 2001
- 1116
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PART I - Material Characterization - Real World Surface Analysis - Surface characterization of IM7-5260 composites by x-ray photoelectron spectroscopyOhno, Satomi et al. | 2001
- 1121
-
Pt–metal oxide aerogel catalysts: X-ray photoemission investigationNelson, A. J. / Reynolds, John G. / Sanner, R. D. / Coronado, P. R. / Hair, L. M. et al. | 2001
- 1121
-
PART I - Material Characterization - Real World Surface Analysis - Pt-metal oxide aerogel catalysts: X-ray photoemission investigationNelson, A.J. et al. | 2001
- 1126
-
Scanning Auger microscopy studies of an ancient bronzePaparazzo, E. / Lea, A. S. / Baer, D. R. / Northover, J. P. et al. | 2001
- 1126
-
PART I - Material Characterization - Real World Surface Analysis - Scanning Auger microscopy studies of an ancient bronzePaparazzo, E. et al. | 2001
- 1134
-
PART I - Material Characterization - Quantitative Surface Analysis - Comparative ion yields by secondary ion mass spectrometry from microelectronic filmsParks, Christopher C. et al. | 2001
- 1134
-
Comparative ion yields by secondary ion mass spectrometry from microelectronic filmsParks, Christopher C. et al. | 2001
- 1139
-
PART I - Material Characterization - Material Characterization Poster Session - Surface potential measurement with high spatial resolution using a scanning Auger electron microscopeSakai, Y. et al. | 2001
- 1139
-
Surface potential measurement with high spatial resolution using a scanning Auger electron microscopeSakai, Y. / Kudo, M. / Nielsen, C. et al. | 2001
- 1143
-
PART I - Material Characterization - Material Characterization Poster Session - Chemical effects on F KLL Auger spectra in fluoridesKövér, L. et al. | 2001
- 1143
-
Chemical effects on F KLL Auger spectra in fluoridesKövér, L. / Uda, M. / Cserny, I. / Tóth, J. / Végh, J. / Varga, D. / Ogasawara, K. / Adachi, H. et al. | 2001
- 1150
-
PART I - Material Characterization - Material Characterization Poster Session - X-ray photoelectron spectroscopy, x-ray absorption spectroscopy, and x-ray diffraction characterization of CuO-TiO2-CeO2 catalyst systemFrancisco, M.S.P. et al. | 2001
- 1150
-
X-ray photoelectron spectroscopy, x-ray absorption spectroscopy, and x-ray diffraction characterization of catalyst systemFrancisco, M. S. P. / Nascente, P. A. P. / Mastelaro, V. R. / Florentino, A. O. et al. | 2001
- 1158
-
PART I - Material Characterization - Material Characterization Poster Session - Chemical and structural characterization of V2O5-TiO2 CatalystsRodella, C.B. et al. | 2001
- 1158
-
Chemical and structural characterization of catalystsRodella, C. B. / Nascente, P. A. P. / Mastelaro, V. R. / Zucchi, M. R. / Franco, R. W. A. / Magon, C. J. / Donoso, P. / Florentino, A. O. et al. | 2001
- 1164
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Interface formation and electrical properties of a structure for application in gate electrodesKim, K. S. / Jang, Y. C. / Kim, K. J. / Lee, N.-E. / Youn, S. P. / Roh, K. J. / Roh, Y. H. et al. | 2001
- 1164
-
PART I - Material Characterization - Material Characterization Poster Session - Interface formation and electrical properties of a TiNx-SiO2-Si structure for application in gate electrodesKim, K.S. et al. | 2001
- 1170
-
PART I - Material Characterization - Methods of Data Analysis - Interpretation of the Shirley background in x-ray photoelectron spectroscopy analysisCastle, J.E. et al. | 2001
- 1170
-
Interpretation of the Shirley background in x-ray photoelectron spectroscopy analysisCastle, J. E. / Salvi, A. M. et al. | 2001
- 1176
-
Formation of potentially protective oxide-free phosphate films on titanium characterized by valence band x-ray photoelectron spectroscopyRotole, John A. / Gaskell, Karen / Comte, Alex / Sherwood, Peter M. A. et al. | 2001
- 1176
-
PART I - Material Characterization - Methods of Data Analysis - Formation of potentially protective oxide-free phosphate films on titanium characterized by valence band x-ray photoelectron spectroscopyRotole, John A. et al. | 2001
- 1182
-
PART I - Magnetic Interfaces and Nanostructures - Thin Films and Multilayers - Growth and magnetic properties of ultrathin Fe on Pd(110)Cuenya, Beatriz Roldan et al. | 2001
- 1182
-
Growth and magnetic properties of ultrathin Fe on Pd(110)Cuenya, Beatriz Roldan / Pearson, J. / Yu, Chengtao / Li, Dongqi / Bader, S. D. et al. | 2001
- 1186
-
Effect of composition and microstructure on temperature coefficient of resistance of polycrystalline thin filmsLai, Chih-Huang / Hsu, C. F. / Chin, Y. C. / Chiang, Chengder et al. | 2001
- 1186
-
PART I - Magnetic Interfaces and Nanostructures - Thin Films and Multilayers - Effect of composition and microstructure on temperature coefficient of resistance of polycrystalline La1-xCaxMnO3 thin filmsLai, Chih-Huang et al. | 2001
- 1191
-
PART I - Magnetic Interfaces and Nanostructures - Magnetic Interfaces and Nanostructures Poster Session - Preparation of cross-sectional transmission electron microscopy specimens of obliquely deposited magnetic thin films on a flexible tapeKeim, Enrico G. et al. | 2001
- 1191
-
Preparation of cross-sectional transmission electron microscopy specimens of obliquely deposited magnetic thin films on a flexible tapeKeim, Enrico G. / Bijker, Martin D. / Lodder, J. Cock et al. | 2001
- 1195
-
PART I - Magnetic Interfaces and Nanostructures - Magnetic Devices: GMR & Tunneling - Determination of magnetostriction for spin-valve devices with 5.0 and 10.0 nm Permalloy layersGafron, T.J. et al. | 2001
- 1195
-
Determination of magnetostriction for spin-valve devices with 5.0 and 10.0 nm Permalloy layersGafron, T. J. / Russek, S. E. / Burkett, S. L. et al. | 2001
- 1199
-
PART I - Magnetic Interfaces and Nanostructures - Magnetic Devices: GMR & Tunneling - Analysis of tunneling magnetoresistance test structures by low energy electron nanoscale-luminescence spectroscopyGoss, S.H. et al. | 2001
- 1199
-
Analysis of tunneling magnetoresistance test structures by low energy electron nanoscale-luminescence spectroscopyGoss, S. H. / Parkin, S. S. P. / Brillson, L. J. et al. | 2001
- 1203
-
PART I - Magnetic Interfaces and Nanostructures - Magnetic Recording: Media and Heads - Corrosion behavior of Co-Sm based magnetic mediaZana, Iulica et al. | 2001
- 1203
-
Corrosion behavior of Co–Sm based magnetic mediaZana, Iulica / Zangari, Giovanni et al. | 2001
- 1207
-
Surface processing with gas-cluster ions to improve giant magnetoresistance filmsFenner, D. B. / Hautala, J. / Allen, L. P. / Tetreault, T. G. / Al-Jibouri, A. / Budnick, J. I. / Jones, K. S. et al. | 2001
- 1207
-
PART I - Magnetic Interfaces and Nanostructures - Magnetic Recording: Media and Heads - Surface processing with gas-cluster ions to improve giant magnetoresistance filmsFenner, D.B. et al. | 2001
- 1213
-
Study of exchange anisotropy for (111) epitaxial filmsLiu, Congxiao / Du, Jianhua / Barnard, J. A. / Mankey, G. J. et al. | 2001
- 1213
-
PART I - Magnetic Interfaces and Nanostructures - Magnetic Recording: Media and Heads - Study of exchange anisotropy for Ni80Fe20-Fe60Mn40 (111) epitaxial filmsLiu, Congxiao et al. | 2001
- 1219
-
Micro-electro-mechanical system fabrication technology applied to large area x-ray image sensor arraysDaniel, J. H. / Krusor, B. / Apte, R. B. / Mulato, M. / Van Schuylenbergh, K. / Lau, R. / Do, T. / Street, R. A. / Goredema, A. / Boils-Boissier, D. C. et al. | 2001
- 1219
-
PART I - Micro-Electro-Mechanical Systems - MEMS Processing - Micro-electro-mechanical system fabrication technology applied to large area x-ray image sensor arraysDaniel, J.H. et al. | 2001
- 1224
-
PART I - Micro-Electro-Mechanical Systems - MEMS Processing - A novel antistiction method using harmonic excitation on the microstructureLai, Wen Pin et al. | 2001
- 1224
-
A novel antistiction method using harmonic excitation on the microstructureLai, Wen Pin / Fang, Weileun et al. | 2001
- 1229
-
PART I - Micro-Electro-Mechanical Systems - MEMS Processing - Nano- and microchannel fabrication using column-void network deposited siliconNam, Wook Jun et al. | 2001
- 1229
-
Nano- and microchannel fabrication using column/void network deposited siliconNam, Wook Jun / Bae, Sanghoon / Kaan Kalkan, A. / Fonash, Stephen J. et al. | 2001
- 1234
-
PART I - Micro-Electro-Mechanical Systems - Material Science of MEMS - Investigation of the adhesion, friction, and wear properties of biphenyl thiol self-assembled monolayers by atomic force microscopyLiu, Huiwen et al. | 2001
- 1234
-
Investigation of the adhesion, friction, and wear properties of biphenyl thiol self-assembled monolayers by atomic force microscopyLiu, Huiwen / Bhushan, Bharat / Eck, Wolfgang / Stadler, Volker et al. | 2001
- 1241
-
PART I - Manufacturing Science and Technology - Advanced Modeling and Control for IC Manufacturing - Data requirements and communication issues for advanced process controlMarkle, Richard J. et al. | 2001
- 1241
-
Data requirements and communication issues for advanced process controlMarkle, Richard J. / Coss, Elfido et al. | 2001
- 1248
-
The application of in situ monitor of extremely rarefied particle clouds grown thermally above wafers by using laser light scattering method to the development of the mass-production condition of the tungsten thermal chemical vapor depositionIto, Natsuko / Moriya, Tsuyoshi / Uesugi, Fumihiko / Moriya, Shuji / Aomori, Masaru / Kato, Yoshinori / Tachibana, Mitsuhiro et al. | 2001
- 1248
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PART I - Manufacturing Science and Technology - Langmuir Award-Ultra Clean Society and Contamination Free Manufacturing - The application of in situ monitor of extremely rarefied particle clouds grown thermally above wafers by using laser light scattering method to the development of the mass-production condition of the tungsten thermal chemical vapor depositionIto, Natsuko et al. | 2001
- 1255
-
Study on temperature calibration of a silicon substrate in a temperature programmed desorption analysisHirashita, N. / Jimbo, T. / Matsunaga, T. / Matsuura, M. / Morita, M. / Nishiyama, I. / Nishizuka, M. / Okumura, H. / Shimazaki, A. / Yabumoto, N. et al. | 2001
- 1255
-
PART I - Manufacturing Science and Technology - Langmuir Award-Ultra Clean Society and Contamination Free Manufacturing - Study on temperature calibration of a silicon substrate in a temperature programmed desorption analysisHirashita, N. et al. | 2001
- 1261
-
Friction force microscopy study on photodegradation of organosilane self-assembled monolayers irradiated with a vacuum ultraviolet light at 172 nmSugimura, Hiroyuki / Hayashi, Kazuyuki / Amano, Yukihiro / Takai, Osamu / Hozumi, Atsushi et al. | 2001
- 1261
-
PART I - Organic Films and Devices - Self-Assembled Monolayers: Electron Transfer and Film Properties - Friction force microscopy study on photodegradation of organosilane self-assembled monolayers irradiated with a vacuum ultraviolet light at 172 nmSugimura, Hiroyuki et al. | 2001
- 1266
-
PART I - Organic Films and Devices - Organic Films and Devices Poster Session - Monolayer formation of 6-deoxy-6-thiol-b-cyclodextrin on a Au(111) surface studied by scanning tunneling microscopyYasuda, Satoshi et al. | 2001
- 1266
-
Monolayer formation of 6-deoxy-6-thiol-β-cyclodextrin on a Au(111) surface studied by scanning tunneling microscopyYasuda, Satoshi / Futaba, Don Norimi / Takeuchi, Osamu / Suzuki, Iwao / Yase, Kiyoshi / Sumaoka, Jun / Komiyama, Makoto / Shigekawa, Hidemi et al. | 2001
- 1270
-
PART I - Organic Films and Devices - Organic Films and Devices Poster Session - Investigation of the morphology of the initial growth of the aromatic molecule p-quaterphenyl on NaCl (001)Kintzel Jr, E.J. et al. | 2001
- 1270
-
Investigation of the morphology of the initial growth of the aromatic molecule p-quaterphenyl on NaCl (001)Kintzel, E. J. / Smilgies, D.-M. / Skofronick, J. G. / Safron, S. A. / Van Winkle, D. H. / Trelenberg, T. W. / Akhadov, E. A. / Flaherty, F. A. et al. | 2001
- 1277
-
PART I - Photonics - Photonics Poster Session - Effect of dry etching conditions on surface morphology and optical properties of GaN films in chlorine-based inductively coupled plasmasHahn, Y.B. et al. | 2001
- 1277
-
Effect of dry etching conditions on surface morphology and optical properties of GaN films in chlorine-based inductively coupled plasmasHahn, Y. B. / Im, Y. H. / Park, J. S. / Nahm, K. S. / Lee, Y. S. et al. | 2001
- 1282
-
Observation of surface reaction layers formed in highly selective etchingMatsui, Miyako / Tatsumi, Tetsuya / Sekine, Makoto et al. | 2001
- 1282
-
PART I - Plasma Science and Technology - Plasma-Surface Interactions I - Observation of surface reaction layers formed in highly selective SiO2 etchingMatsui, Miyako et al. | 2001
- 1289
-
PART I - Plasma Science and Technology - Plasma Science and Technology Poster Session - Etching mechanism of YMnO3 thin films in Cl2-Ar gas chemistriesMin, Byung-Jun et al. | 2001
- 1289
-
Etching mechanism of thin films in gas chemistriesMin, Byung-Jun / Kim, Chang-Il / Kim, Yong-Tae et al. | 2001
- 1294
-
Ion compositions and energies in inductively coupled plasmas containingGoyette, A. N. / Wang, Yicheng / Olthoff, J. K. et al. | 2001
- 1294
-
PART I - Plasma Science and Technology - Plasma Science and Technology Poster Session - Ion compositions and energies in inductively coupled plasmas containing SF6Goyette, A.N. et al. | 2001
- 1298
-
Ion energy and angular distribution at the radio frequency biased electrode in an inductively coupled plasma apparatusMizutani, Naoki / Hayashi, Toshio et al. | 2001
- 1298
-
PART I - Plasma Science and Technology - Plasma Science and Technology Poster Session - Ion energy and angular distribution at the radio frequency biased electrode in an inductively coupled plasma apparatusMizutani, Naoki et al. | 2001
- 1304
-
Spatial distribution of carbon species in laser ablation of graphite targetIkegami, T. / Ishibashi, S. / Yamagata, Y. / Ebihara, K. / Thareja, R. K. / Narayan, J. et al. | 2001
- 1304
-
PART I - Plasma Science and Technology - Plasma Science and Technology Poster Session - Spatial distribution of carbon species in laser ablation of graphite targetIkegami, T. et al. | 2001
- 1308
-
PART I - Plasma Science and Technology - Plasma Science and Technology Poster Session - Improved etch characteristics of SiO2 by the enhanced inductively coupled plasmaCho, S.-B. et al. | 2001
- 1308
-
Improved etch characteristics of by the enhanced inductively coupled plasmaCho, S.-B. / Song, H.-Y. / Park, S.-G. / O, B.-H. et al. | 2001
- 1312
-
Effect of temperature on etch rate of iridium and platinum inMaa, Jer-shen / Ying, Hong / Zhang, Fengyan et al. | 2001
- 1312
-
PART I - Plasma Science and Technology - Plasma Science and Technology Poster Session - Effect of temperature on etch rate of iridium and platinum in CF4-O2Maa, Jer-shen et al. | 2001
- 1315
-
Dry etching of thin films in inductively coupled plasmasIm, Y. H. / Park, J. S. / Choi, C. S. / Choi, R. J. / Hahn, Y. B. / Lee, S.-H. / Lee, J.-K. et al. | 2001
- 1315
-
PART I - Plasma Science and Technology - Plasma Science and Technology Poster Session - Dry etching of SrBi2Ta2O9 thin films in Cl2-NF3-O2-Ar inductively coupled plasmasIm, Y.H. et al. | 2001
- 1320
-
PART I - Plasma Science and Technology - Plasma Science and Technology Poster Session - Structure control of pulsed laser deposited ZrO2-Y2O3 filmsVoevodin, A.A. et al. | 2001
- 1320
-
Structure control of pulsed laser deposited filmsVoevodin, A. A. / Jones, J. G. / Zabinski, J. S. et al. | 2001
- 1325
-
PART I - Plasma Science and Technology - Plasma Science and Technology Poster Session - Ion energy distributions in a pulsed, electron beam-generated plasmaWalton, S.G. et al. | 2001
- 1325
-
Ion energy distributions in a pulsed, electron beam-generated plasmaWalton, S. G. / Leonhardt, D. / Blackwell, D. D. / Fernsler, R. F. / Murphy, D. P. / Meger, R. A. et al. | 2001
- 1330
-
PART I - Plasma Science and Technology - Plasma Science and Technology Poster Session - Probe diagnostic development for electron beam produced plasmasBlackwell, D.D. et al. | 2001
- 1330
-
Probe diagnostic development for electron beam produced plasmasBlackwell, D. D. / Walton, S. G. / Leonhardt, D. / Murphy, D. P. / Fernsler, R. F. / Amatucci, W. E. / Meger, R. A. et al. | 2001
- 1336
-
PART I - Plasma Science and Technology - Plasma Science and Technology Poster Session - Ion-assisted deposition of silicon nitride films using electron cyclotron resonance plasmaVargheese, K.Deenamma et al. | 2001
- 1336
-
Ion-assisted deposition of silicon nitride films using electron cyclotron resonance plasmaVargheese, K. Deenamma / Rao, G. Mohan et al. | 2001
- 1341
-
PART I - Plasma Science and Technology - Plasma Science and Technology Poster Session - Plasma etching of lead germanate (PGO) ferroelectric thin filmYing, Hong et al. | 2001
- 1341
-
Plasma etching of lead germanate (PGO) ferroelectric thin filmYing, Hong / Li, Tingkai / Maa, Jer-shen / Zhang, Fengyan / Teng Hsu, Sheng / Gao, Yufei / Engelhard, Mark et al. | 2001
- 1346
-
Simulation of the production of atomic hydrogen in a low-pressure-arc-discharge-based sourceKagadei, V. A. / Kozyrev, A. V. / Proskurovsky, D. I. / Osipov, I. V. et al. | 2001
- 1346
-
PART I - Plasma Science and Technology - Plasma Science and Technology Poster Session - Simulation of the production of atomic hydrogen in a low-pressure-arc-discharge-based sourceKagadei, V.A. et al. | 2001
- 1353
-
Physical and electrical properties of noncrystalline prepared by remote plasma enhanced chemical vapor depositionJohnson, Robert S. / Lucovsky, Gerald / Baumvol, Isreal et al. | 2001
- 1353
-
PART I - Plasma Science and Technology - Dielectrics II - Physical and electrical properties of noncrystalline Al2O3 prepared by remote plasma enhanced chemical vapor depositionJohnson, Robert S. et al. | 2001
- 1361
-
PART I - Plasma Science and Technology - Dielectrics II - Etching of high-k dielectric Zr1-xAlxOy films in chlorine-containing plasmasPelhos, K. et al. | 2001
- 1361
-
Etching of high-k dielectric films in chlorine-containing plasmasPelhos, K. / Donnelly, V. M. / Kornblit, A. / Green, M. L. / Van Dover, R. B. / Manchanda, L. / Hu, Y. / Morris, M. / Bower, E. et al. | 2001
- 1367
-
PART I - Plasma Science and Technology I - Emerging Plasma Applications - Plasma diagnostics in large area plasma processing systemLeonhardt, D. et al. | 2001
- 1367
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Plasma diagnostics in large area plasma processing systemLeonhardt, D. / Walton, S. G. / Blackwell, D. D. / Amatucci, W. E. / Murphy, D. P. / Fernsler, R. F. / Meger, R. A. et al. | 2001
- 1374
-
Relationship between deprotection and film thickness loss during plasma etching of positive tone chemically amplified resistsMahorowala, A. P. / Medeiros, D. R. et al. | 2001
- 1374
-
PART I - Plasma Science and Technology I - Plasma-Surface Interactions II - Relationship between deprotection and film thickness loss during plasma etching of positive tone chemically amplified resistsMahorowala, A.P. et al. | 2001
- 1379
-
Novel technique to enhance etch selectivity of carbon antireflective coating over photoresist based on gas chemistryHong, J. / Jeon, J. S. / Kim, Y. B. / Min, G. J. / Ahn, T. H. et al. | 2001
- 1379
-
PART I - Plasma Science and Technology I - Plasma-Surface Interactions II - Novel technique to enhance etch selectivity of carbon antireflective coating over photoresist based on O2-CHF3-Ar gas chemistryHong, J. et al. | 2001
- 1384
-
PART I - Plasma Science and Technology II - Feature Evolution - Understanding the evolution of trench profiles in the via-first dual damascene integration schemeKropewnicki, Tom et al. | 2001
- 1384
-
Understanding the evolution of trench profiles in the via-first dual damascene integration schemeKropewnicki, Tom / Doan, Kenny / Tang, Betty / Björkman, Claes et al. | 2001
- 1388
-
Trench etch processes for dual damascene patterning of low- dielectricsJiang, P. / Celii, F. G. / Dostalik, W. W. / Newton, K. J. / Sakima, H. et al. | 2001
- 1388
-
PART I - Plasma Science and Technology II - Dielectrics I - Trench etch processes for dual damascene patterning of low-k dielectricsJiang, P. et al. | 2001
- 1392
-
PART I - Surface Engineering - Coatings for Extreme Environments: Wear Resistant, Lubricious, Anticorrosive, High Temperature - Influence of the interface composition on the corrosion behavior of unbalanced magnetron grown niobium coatings on steelSchönjahn, C. et al. | 2001
- 1392
-
Influence of the interface composition on the corrosion behavior of unbalanced magnetron grown niobium coatings on steelSchönjahn, C. / Paritong, H. / Münz, W.-D / Twesten, R. D. / Petrov, I. et al. | 2001
- 1399
-
PART I - Surface Engineering - Coatings for Extreme Environments: Wear Resistant, Lubricious, Anticorrosive, High Temperature - Tribological performance of a novel high wear resistant high Si Al-Si alloy weld overlayOtt, R.D. et al. | 2001
- 1399
-
Tribological performance of a novel high wear resistant high Si Al–Si alloy weld overlayOtt, R. D. / Blue, C. A. / Santella, M. L. / Blau, P. J. et al. | 2001
- 1404
-
PART I - Surface Engineering - Interface Engineering and Graded Films: Structure and Characterization - Interface engineering and graded films: Structure and characterizationBull, S.J. et al. | 2001
- 1404
-
Interface engineering and graded films: Structure and characterizationBull, S. J. et al. | 2001
- 1415
-
PART I - Surface Engineering - Interface Engineering and Graded Films: Structure and Characterization - Optimization of in situ substrate surface treatment in a cathodic arc plasma: A study by TEM and plasma diagnosticsSchönjahn, C. et al. | 2001
- 1415
-
Optimization of in situ substrate surface treatment in a cathodic arc plasma: A study by TEM and plasma diagnosticsSchönjahn, C. / Ehiasarian, A. P. / Lewis, D. B. / New, R. / Münz, W.-D. / Twesten, R. D. / Petrov, I. et al. | 2001
- 1421
-
Laterally graded multilayers and their applicationsLiu, Chian / Macrander, A. / Als-Nielsen, J. / Zhang, K. et al. | 2001
- 1421
-
PART I - Surface Engineering - Interface Engineering and Graded Films: Structure and Characterization - Laterally graded multilayers and their applicationsLiu, Chian et al. | 2001
- 1425
-
PART I - Surface Engineering - Surface Engineering: Surface Preparation to Postcoating Surface Finishing - Enhanced passivity of austenitic AlSi 304 stainless steel by low-temperature ion nitridingRudenja, S. et al. | 2001
- 1425
-
Enhanced passivity of austenitic AISI 304 stainless steel by low-temperature ion nitridingRudenja, S. / Pan, J. / Wallinder, I. Odnevall / Leygraf, C. / Kulu, P. / Mikli, V. et al. | 2001
- 1432
-
General rule for predicting surface segregation of substrate metal on film surfaceYoshitake, Michiko / Aparna, Yarrama-Reddy / Yoshihara, Kazuhiro et al. | 2001
- 1432
-
PART I - Surface Engineering - Surface Engineering Poster Session - General rule for predicting surface segregation of substrate metal on film surfaceYoshitake, Michiko et al. | 2001
- 1438
-
High rate sputtering for Ni films by an rf-dc coupled magnetron sputtering system with multipolar magnetic plasma confinementKawabata, K. / Tanaka, T. / Kitabatake, A. / Yamada, K. / Mikami, Y. / Kajioka, H. / Toiyama, K. et al. | 2001
- 1438
-
PART I - Surface Engineering - Surface Engineering Poster Session - High rate sputtering for Ni films by an rf-dc coupled magnetron sputtering system with multipolar magnetic plasma confinementKawabata, K. et al. | 2001
- 1442
-
PART I - Surface Engineering - Surface Engineering Poster Session - Corrosion resistance of chromium nitride on low alloy steels by cathodic arc depositionHan, S. et al. | 2001
- 1442
-
Corrosion resistance of chromium nitride on low alloy steels by cathodic arc depositionHan, S. / Lin, J. H. / Wang, D. Y. / Lu, F.-H. / Shih, H. C. et al. | 2001
- 1447
-
Electrochemical characterization and surface analysis of bulk amorphous alloys in aqueous solutions at differentSchennach, R. / Grady, T. / Naugle, D. G. / McWhinney, H. / Hays, C. C. / Johnson, W. L. / Cocke, D. L. et al. | 2001
- 1447
-
PART I - Surface Science - Surface Science Poster Session - Electrochemical characterization and surface analysis of bulk amorphous alloys in aqueous solutions at different p*HSchennach, R. et al. | 2001
- 1454
-
PART I - Surface Science - Surface Science Poster Session - Tribocharging in electrostatic beneficiation of coal: Effects of surface composition on work function as measured by x-ray photoelectron spectroscopy and ultraviolet photoelectron spectroscopy in airTrigwell, S. et al. | 2001
- 1454
-
Tribocharging in electrostatic beneficiation of coal: Effects of surface composition on work function as measured by x-ray photoelectron spectroscopy and ultraviolet photoelectron spectroscopy in airTrigwell, S. / Mazumder, M. K. / Pellissier, R. et al. | 2001
- 1460
-
PART I - Surface Science - Surface Science Poster Session - Study of high- and low-work-function surfaces for hyperthermal surface ionization using an absolute Kelvin probeBaikie, I.D. et al. | 2001
- 1460
-
Study of high- and low-work-function surfaces for hyperthermal surface ionization using an absolute Kelvin probeBaikie, I. D. / Peterman, U. / Lägel, B. / Dirscherl, K. et al. | 2001
- 1467
-
PART I - Surface Science - Surface Science Poster Session - Oxygen loss and recovering induced by ultrahigh vacuum and oxygen annealing on WO3 thin film surfaces: Influences on the gas response propertiesSantucci, S. et al. | 2001
- 1467
-
Oxygen loss and recovering induced by ultrahigh vacuum and oxygen annealing on thin film surfaces: Influences on the gas response propertiesSantucci, S. / Lozzi, L. / Maccallini, E. / Passacantando, M. / Ottaviano, L. / Cantalini, C. et al. | 2001
- 1474
-
PART I - Surface Science - Surface Science Poster Session - Adsorption, decomposition, and stabilization of 1,2-dibromoethane on Cu(111)Chan, Ally S.Y. et al. | 2001
- 1474
-
Adsorption, decomposition, and stabilization of 1,2-dibromoethane on Cu(111)Chan, Ally S. Y. / Jones, Robert G. et al. | 2001
- 1481
-
Resonances in electron-stimulated desorption of Eu atomsAgeev, V. N. / Kuznetsov, Yu. A. / Madey, T. E. et al. | 2001
- 1481
-
PART I - Surface Science - Surface Science Poster Session - Resonances in electron-stimulated desorption of Eu atomsAgeev, V.N. et al. | 2001
- 1485
-
PART I - Surface Science - Surface Science Poster Session - Photon-stimulated ion desorption from mono- and multilayered silicon alkoxide on silicon by core-level excitationBaba, Y. et al. | 2001
- 1485
-
Photon-stimulated ion desorption from mono- and multilayered silicon alkoxide on silicon by core-level excitationBaba, Y. / Wu, G. / Sekiguchi, T. / Shimoyama, I. et al. | 2001
- 1490
-
PART I - Surface Science - Surface Science Poster Session - Surface treatment and characterization of PMMA, PHEMA, and PHPMALim, Hyuneui et al. | 2001
- 1490
-
Surface treatment and characterization of PMMA, PHEMA, and PHPMALim, Hyuneui / Lee, Yeonhee / Han, Seunghee / Cho, Jeonghee / Kim, Kang-Jin et al. | 2001
- 1497
-
PART I - Surface Science I - Atomic-Scale Studies of Model Catalysts - Adsorption and reaction of ethene on oxide-supported Pd, Rh, and Ir particlesFrank, Martin et al. | 2001
- 1497
-
Adsorption and reaction of ethene on oxide-supported Pd, Rh, and Ir particlesFrank, Martin / Bäumer, Marcus / Kühnemuth, Ralf / Freund, Hans-Joachim et al. | 2001
- 1502
-
Effect of surface treatment on the surface: A comprehensive study of oxidation and reduction by scanning tunneling microscopy and low-energy electron diffractionTanner, Robert E. / Altman, Eric I. et al. | 2001
- 1502
-
PART I - Surface Science I - Atomic-Scale Studies of Model Catalysts - Effect of surface treatment on the g-WO3(001) surface: A comprehensive study of oxidation and reduction by scanning tunneling microscopy and low-energy electron diffractionTanner, Robert E. et al. | 2001
- 1510
-
PART I - Surface Science I - Mechanisms and Control of Surface Reactions - Surface science models for CoMo hydrodesulfurization catalysts: Influence of the support on hydrodesulfurization activityCoulier, L. et al. | 2001
- 1510
-
Surface science models for CoMo hydrodesulfurization catalysts: Influence of the support on hydrodesulfurization activityCoulier, L. / Kishan, G. / van Veen, J. A. R. / Niemantsverdriet, J. W. et al. | 2001
- 1516
-
Reaction kinetics on supported model catalysts: Molecular beam/in situ time-resolved infrared reflection absorption spectroscopy study of the CO oxidation on alumina supported Pd particlesLibuda, J. / Meusel, I. / Hoffmann, J. / Hartmann, J. / Freund, H.-J. et al. | 2001
- 1516
-
PART I - Surface Science I - Mechanisms and Control of Surface Reactions - Reaction kinetics on supported model catalysts: Molecular beam-in situ time-resolved infrared reflection absorption spectroscopy study of the CO oxidation on alumina supported Pd particlesLibuda, J. et al. | 2001
- 1524
-
Comparison of phosgene formation from adsorption of carbon tetrachloride on oxygen modified Ir(111) and oxygen modified Ir(110)Meyer, R. J. / Reeves, C. T. / Safarik, D. J. / Allen, D. T. / Mullins, C. B. et al. | 2001
- 1524
-
PART I - Surface Science I - Mechanisms and Control of Surface Reactions - Comparison of phosgene formation from adsorption of carbon tetrachloride on oxygen modified Ir(111) and oxygen modified Ir(110)Meyer, R.J. et al. | 2001
- 1531
-
PART I - Surface Science II - Stimulated Surface Processes - Chemistry and aging of organosiloxane and fluorocarbon films grown from hyperthermal polyatomic ionsHanley, Luke et al. | 2001
- 1531
-
Chemistry and aging of organosiloxane and fluorocarbon films grown from hyperthermal polyatomic ionsHanley, Luke / Fuoco, Erick / Wijesundara, Muthu B. J. / Beck, Alison J. / Brookes, Pat N. / Short, Robert D. et al. | 2001
- 1537
-
Interaction of chlorodifluoromethane with ultrathin solid water filmsSafarik, D. J. / Meyer, R. J. / Mullins, C. B. et al. | 2001
- 1537
-
PART I - Surface Science III - Water-Surface Interactions - Interaction of chlorodifluoromethane with ultrathin solid water filmsSafarik, D.J. et al. | 2001
- 1543
-
PART I - Surface Science III - Gas-Surface Dynamics - Molecular dynamics simulations of the trapping of ethane on Si(100)-(2X1): Effect of rotational energy and surface temperatureReeves, C.T. et al. | 2001
- 1543
-
Molecular dynamics simulations of the trapping of ethane on Effect of rotational energy and surface temperatureReeves, C. T. / Stiehl, J. D. / Mullins, C. B. / Sitz, G. O. et al. | 2001
- 1549
-
Characteristic structures of the surface step studied by scanning tunneling microscopyMiyake, K. / Okawa, S. / Takeuchi, O. / Futaba, D. N. / Hata, K. / Morita, R. / Yamashita, M. / Shigekawa, H. et al. | 2001
- 1549
-
PART I - Surface Science III - Surface and Interface Structure II - Characteristic structures of the Si(111)-7X7 surface step studied by scanning tunneling microscopyMiyake, K. et al. | 2001
- 1553
-
PART II - Thin Films - Thin Films in the 21st Century - Transition from thermally grown gate dielectrics to deposited gate dielectrics for advanced silicon devices: A classification scheme based on bond ionicityLucovsky, Gerald et al. | 2001
- 1553
-
Transition from thermally grown gate dielectrics to deposited gate dielectrics for advanced silicon devices: A classification scheme based on bond ionicityLucovsky, Gerald et al. | 2001
- 1562
-
PART II - Thin Films - Mechanical Properties of Thin Films - Tungsten silicide for the alternate gate metal in metal-oxide-semiconductor devicesRoh, K. et al. | 2001
- 1562
-
Tungsten silicide for the alternate gate metal in metal-oxide-semiconductor devicesRoh, K. / Youn, S. / Yang, S. / Roh, Y. et al. | 2001
- 1566
-
Influence of annealing temperature on simultaneous vapor deposited calcium phosphate thin filmsHamdi, M. / Ektessabi, A. M. et al. | 2001
- 1566
-
PART II - Thin Films - Thin Film Poster Session - Influence of annealing temperature on simultaneous vapor deposited calcium phosphate thin filmsHamdi, M. et al. | 2001
- 1571
-
PART II - Thin Films - Thin Film Poster Session - Deposition of electronic quality amorphous silicon, a-Si:H, thin films by a hollow cathode plasma-jet reactive sputtering systemPribil, G. et al. | 2001
- 1571
-
Deposition of electronic quality amorphous silicon, a-Si:H, thin films by a hollow cathode plasma-jet reactive sputtering systemPribil, G. / Hubička, Z. / Soukup, R. J. / Ianno, N. J. et al. | 2001
- 1577
-
Supermagnetron plasma chemical vapor deposition and qualitative analysis of electrically conductive diamond-like amorphous carbon filmsKinoshita, Haruhisa / Yoshida, Masahiro et al. | 2001
- 1577
-
PART II - Thin Films - Thin Film Poster Session - Supermagnetron plasma chemical vapor deposition and qualitative analysis of electrically conductive diamond-like amorphous carbon filmsKinoshita, Haruhisa et al. | 2001
- 1582
-
PART II - Thin Films - Thin Film Poster Session - Energetic oxygen ions in the reactive sputtering of the Zr target in Ar+O2 atmosphereTominaga, Kikuo et al. | 2001
- 1582
-
Energetic oxygen ions in the reactive sputtering of the Zr target in atmosphereTominaga, Kikuo / Kikuma, Takuya et al. | 2001
- 1586
-
PART II - Thin Films - Thin Film Poster Session - Low temperature aluminum nitride deposition on aluminum by rf reactive sputteringTait, R.N. et al. | 2001
- 1586
-
Low temperature aluminum nitride deposition on aluminum by rf reactive sputteringTait, R. N. / Mirfazli, A. et al. | 2001
- 1591
-
PART II - Thin Films - Thin Film Poster Session - Investigation of the W-TiN metal gate for metal-oxide-semiconductor devicesYoun, Sunpil et al. | 2001
- 1591
-
Investigation of the W–TiN metal gate for metal–oxide–semiconductor devicesYoun, Sunpil / Roh, Kwanchong / Yang, Sungwoo / Roh, Yonghan / Kim, Ki-Su / Jang, Young-Chul / Lee, Nae-Eung et al. | 2001
- 1595
-
Effect of interlayer on thermal stability of nickel silicideMaa, Jer-shen / Ono, Yoshi / Tweet, Douglas J. / Zhang, Fengyan / Hsu, Sheng Teng et al. | 2001
- 1595
-
PART II - Thin Films - Thin Film Poster Session - Effect of interlayer on thermal stability of nickel silicideMaa, Jer-shen et al. | 2001
- 1600
-
Optical and structural properties of sol-gel layers containing cobaltRamos-Mendoza, A. / Tototzintle-Huitle, H. / Mendoza-Galván, A. / González-Hernández, J. / Chao, B. S. et al. | 2001
- 1600
-
PART II - Thin Films - Thin Film Poster Session - Optical and structural properties of sol-gel SiO2 layers containing cobaltRamos-Mendoza, A. et al. | 2001
- 1606
-
Deposition and properties of tetrahedral amorphous carbon films prepared on magnetic hard disksChan, C. Y. / Lai, K. H. / Fung, M. K. / Wong, W. K. / Bello, I. / Huang, R. F. / Lee, C. S. / Lee, S. T. / Wong, S. P. et al. | 2001
- 1606
-
PART II - Thin Films - Thin Film Poster Session - Deposition and properties of tetrahedral amorphous carbon films prepared on magnetic hard disksChan, C.Y. et al. | 2001
- 1611
-
PART II - Thin Films - Thin Film Poster Session - Structural, morphological, and mechanical properties of plasma deposited hydrogenated amorphous carbon thin films: Ar gas dilution effectsValentini, L. et al. | 2001
- 1611
-
Structural, morphological, and mechanical properties of plasma deposited hydrogenated amorphous carbon thin films: Ar gas dilution effectsValentini, L. / Kenny, J. M. / Mariotto, G. / Tosi, P. / Carlotti, G. / Socino, G. / Lozzi, L. / Santucci, S. et al. | 2001
- 1617
-
Wet oxidation behaviors of polycrystalline filmsKang, S.-K. / Ko, D.-H. / Lee, K. C. / Lee, T. W. / Lee, Y. H. / Ahn, T. H. / Yeo, I. S. / Oh, S. H. / Park, C. G. et al. | 2001
- 1617
-
PART II - Thin Films - Thin Film Poster Session - Wet oxidation behaviors of polycrystalline Si1-xGex filmsKang, S.-K. et al. | 2001
- 1623
-
PART II - Thin Films - Thin Film Poster Session - Mechanism of the isotermic amorphous-to-crystal line phase transition in Ge:Sb:Te ternary alloysGonzález-Hernández, J. et al. | 2001
- 1623
-
Mechanism of the isotermic amorphous-to-crystalline phase transition in Ge:Sb:Te ternary alloysGonzález-Hernández, J. / Prokhorov, E. F. / Vorobiev, Yu. V. / Morales-Sánchez, E. / Mendoza-Galván, A. / Kostylev, S. A. / Gorobets, Yu. I. / Zakharchenko, V. N. / Zakharchenko, R. V. et al. | 2001
- 1630
-
Extension velocities for level set based surface profile evolutionRichards, David F. / Bloomfield, Max O. / Sen, Suchira / Cale, Timothy S. et al. | 2001
- 1630
-
PART II - Thin Films - Modeling of Thin Film Growth - Extension velocities for level set based surface profile evolutionRichards, David F. et al. | 2001
- 1636
-
PART II - Thin Films - Transparent Optical Coatings - Effects of excess oxygen introduced during sputter deposition on carrier mobility in as-deposited and postannealed indium-tin-oxide filmsKikuchi, Naoto et al. | 2001
- 1636
-
Effects of excess oxygen introduced during sputter deposition on carrier mobility in as-deposited and postannealed indium–tin–oxide filmsKikuchi, Naoto / Kusano, Eiji / Kishio, Etsuro / Kinbara, Akira / Nanto, Hidehito et al. | 2001
- 1642
-
Preparation and properties of transparent conductive aluminum-doped zinc oxide thin films by sol–gel processAlam, M. J. / Cameron, D. C. et al. | 2001
- 1642
-
PART II - Thin Films - Transparent Optical Coatings - Preparation and properties of transparent conductive aluminum-doped zinc oxide thin films by sol-gel processAlam, M.J. et al. | 2001
- 1647
-
PART II - Thin Films - Transparent Optical Coatings - Synthesis and characterization of transparent conducting oxide cobalt-nickel spinel filmsWindisch Jr, Charles F. et al. | 2001
- 1647
-
Synthesis and characterization of transparent conducting oxide cobalt–nickel spinel filmsWindisch, Charles F. / Ferris, Kim F. / Exarhos, Gregory J. et al. | 2001
- 1652
-
Measurements of photon stimulated desorption from thick and thin oxide of KEKB collider copper beam chambers and a stainless steel beam chamberFoerster, C. L. / Lanni, C. / Kanazawa, K. et al. | 2001
- 1652
-
PART II - Vacuum Technology - Sorption Processes and Leak Detection - Measurements of photon stimulated desorption from thick and thin oxide of KEKB collider copper beam chambers and a stainless steel beam chamberFoerster, C.L. et al. | 2001
- 1657
-
PART II - Vacuum Technology - Sorption Processes and Leak Detection - Study of the exposure-dose-dependent photon-stimulated-desorption phenomenaHsiung, G.Y. et al. | 2001
- 1657
-
Study of the exposure-dose-dependent photon-stimulated-desorption phenomenaHsiung, G. Y. / Young, K. Y. / Hsu, Y. J. / Chen, J. R. et al. | 2001
- 1662
-
PART II - Vacuum Technology - Sorption Processes and Leak Detection - Vacuum characteristics of sprayed metal filmsMinato, Michio et al. | 2001
- 1662
-
Vacuum characteristics of sprayed metal filmsMinato, Michio / Iwamoto, Hideo et al. | 2001
- 1666
-
Edison’s vacuum coating patentsWaits, Robert K. et al. | 2001
- 1666
-
PART II - Vacuum Technology - Sorption Processes and Leak Detection - Edison's vacuum coating patentsWaits, Robert K. et al. | 2001
- 1674
-
Method for calculation of gas flow in the whole pressure regime through ducts of any lengthLivesey, R. G. et al. | 2001
- 1674
-
PART II - Vacuum Technology - Vacuum Gas Dynamics - Method for calculation of gas flow in the whole pressure regime through ducts of any lengthLivesey, R.G. et al. | 2001
- 1679
-
Free jets in vacuum technologiesRebrov, A. K. et al. | 2001
- 1679
-
PART II - Vacuum Technology - Vacuum Gas Dynamics - Free jets in vacuum technologiesRebrov, A.K. et al. | 2001
- 1688
-
Development of the quadrupole mass spectrometer with the Bessel–Box type energy analyzer: Function of the energy analyzer in the partial pressure measurementsTakahashi, N. / Hayashi, T. / Akimichi, H. / Tuzi, Y. et al. | 2001
- 1688
-
PART II - Vacuum Technology - Vacuum Technology Poster Session - Development of the quadrupole mass spectrometer with the Bessel-Box type energy analyzer: Function of the energy analyzer in the partial pressure measurementsTakahashi, N. et al. | 2001
- 1693
-
PART II - Vacuum Technology - Vacuum Technology Poster Session - Summary of quick disconnect vacuum flangesMapes, M. et al. | 2001
- 1693
-
Summary of quick disconnect vacuum flangesMapes, M. et al. | 2001
- 1699
-
PART II - Vacuum Technology - Vacuum Technology Poster Session - Cornell Electron Storage Ring phase-III interaction region vacuum chamberHe, Yun et al. | 2001
- 1699
-
Cornell Electron Storage Ring phase-III interaction region vacuum chamberHe, Yun / Li, Yulin / Mistry, Nariman B. / Greenwald, Shlomo et al. | 2001
- 1704
-
PART II - Vacuum Technology - Vacuum Technology Poster Session - Rapid cooling dual slot load locks for liquid crystal displayHosokawa, Akihiro et al. | 2001
- 1704
-
Rapid cooling dual slot load locks for liquid crystal displayHosokawa, Akihiro / Blonigan, W. / Kurita, S. et al. | 2001
- 1708
-
PART II - Vacuum Technology - Pumps and Large Vacuum Systems - Design and operation of scroll-type dry primary vacuum pumpsLiepert, A. et al. | 2001
- 1708
-
Design and operation of scroll-type dry primary vacuum pumpsLiepert, A. / Lessard, P. et al. | 2001
- 1712
-
Practical guide to the use of Bayard–Alpert ionization gaugesSingleton, J. H. et al. | 2001
- 1712
-
PART II - Vacuum Technology - Pressure and Flow Measurements - Practical guide to the use of Bayard-Alpert ionization gaugesSingleton, J.H. et al. | 2001
- 1720
-
PART II - Dielectrics-Electronics-Manufacturing Science and Technology - Alternate Gate Dielectrics - Study of ZrO2 thin films for gate oxide applicationsNam, Seok-Woo et al. | 2001
- 1720
-
Study of thin films for gate oxide applicationsNam, Seok-Woo / Yoo, Jung-Ho / Kim, Hae-Young / Kang, Sung-Kwan / Ko, Dae-Hong / Yang, Cheol-Woong / Lee, Hoo-Jeong / Cho, Mann-Ho / Ku, Ja-Hum et al. | 2001
- 1725
-
PART II - Dielectrics-Electronics-Manufacturing Science and Technology - Ultrathin Dielectrics and Interfaces - Oxidation of H-covered flat and vicinal Si(111)-1X1 surfacesZhang, X. et al. | 2001
- 1725
-
Oxidation of H-covered flat and vicinal Si(111)-1×1 surfacesZhang, X. / Chabal, Y. J. / Christman, S. B. / Chaban, E. E. / Garfunkel, E. et al. | 2001
- 1730
-
Process window extension of TiN diffusion barrier using preoxidation of Ru and film for dielectric filmYoon, Dong-Soo / Hong, Kwon / Roh, Jae Sung et al. | 2001
- 1730
-
PART II - Dielectrics-Electronics-Manufacturing Science and Technology - High K Dielectrics: Perovskites - Process window extension of TiN diffusion barrier using preoxidation of Ru and RuOx film for (Ba,Sr)TlO3 dielectric filmYoon, Dong-Soo et al. | 2001
- 1737
-
PART II - Electronics-Nanometer-Scale Science and Technology - Nanoelectronics - Technology for the fabrication of ultrashort channel metal-oxide-semiconductor field-effect transistorsKnoch, J. et al. | 2001
- 1737
-
Technology for the fabrication of ultrashort channel metal–oxide–semiconductor field-effect transistorsKnoch, J. / Appenzeller, J. / Lengeler, B. / Martel, R. / Solomon, P. / Avouris, Ph. / Dieker, Ch. / Lu, Y. / Wang, K. L. / Scholvin, J. et al. | 2001
- 1742
-
Oxide phosphor thin-film electroluminescent devices fabricated by magnetron sputtering with rapid thermal annealingMinami, Tadatsugu / Toda, Hidenobu / Miyata, Toshihiro et al. | 2001
- 1742
-
PART II - Flat Panel Displays-Vacuum Technology - Emissive Displays and Device Reliability - Oxide phosphor thin-film electroluminescent devices fabricated by magnetron sputtering with rapid thermal annealingMinami, Tadatsugu et al. | 2001
- 1747
-
Low- materials etching in magnetic neutral loop discharge plasmaMorikawa, Y. / Yasunami, S. / Chen, W. / Hayashi, T. / Uchida, T. et al. | 2001
- 1747
-
PART II - Industrial Ecology-Plasma Science and Technology-Manufacturing Science and Technology-Surface Engineering - Environmentally Friendly Process Development - Low-k materials etching in magnetic neutral loop discharge plasmaMorikawa, Y. et al. | 2001
- 1752
-
Scanning spreading resistance microscopy study of a metalorganic chemical vapor deposited grown InP optoelectronic structureDixon-Warren, St. J. / Lu, R. P. / Ingrey, S. / Macquistan, D. / Bryskiewicz, T. / Smith, G. / Bryskiewicz, B. et al. | 2001
- 1752
-
PART II - Material Characterization-Nanometer-Scale Science and Technology - Characterization of Interfaces and Thin Films - Scanning spreading resistance microscopy study of a metalorganic chemical vapor deposited grown InP optoelectronic structureDixon-Warren, St J. et al. | 2001
- 1758
-
Fabrication of ferromagnetic/semiconductor waveguide structures and application to microwave bandstop filterWu, W. / Lee, C. C. / Tsai, C. S. / Su, J. / So, W. / Yoo, J. / Chuang, R. et al. | 2001
- 1758
-
PART II - Magnetic Interfaces and Nanostructures-Electronics - Magnetic Semiconductors and Hybrid Structures II - Fabrication of ferromagnetic-semiconductor waveguide structures and application to microwave bandstop filterWu, W. et al. | 2001
- 1763
-
PART II - Magnetic Interface and Nanostructure-Nanometer-Scale Science and Technology-NANO 6 - Magnetic Imaging I - Calibrated magnetic force microscopy measurement of current-carrying linesYongsunthon, R. et al. | 2001
- 1763
-
Calibrated magnetic force microscopy measurement of current-carrying linesYongsunthon, R. / McCoy, J. / Williams, E. D. et al. | 2001
- 1769
-
Scanning Hall probe microscopy on an atomic force microscope tipChong, B. K. / Zhou, H. / Mills, G. / Donaldson, L. / Weaver, J. M. R. et al. | 2001
- 1769
-
PART II - Magnetic Interface and Nanostructure-Nanometer-Scale Science and Technology-NANO 6 - Magnetic Imaging I - Scanning Hall probe microscopy on an atomic force microscope tipChong, B.K. et al. | 2001
- 1773
-
Ferromagnetic resonance of monodisperse Co particlesWiedwald, U. / Spasova, M. / Farle, M. / Hilgendorff, M. / Giersig, M. et al. | 2001
- 1773
-
PART II - Magnetic Interface and Nanostructure-Nanometer-Scale Science and Technology-NANO 6 - Nanomagnetism - Ferromagnetic resonance of monodisperse Co particlesWiedwald, U. et al. | 2001
- 1777
-
PART II - Micro-Electro-Mechanical Systems-Vacuum Technology - MEMS Actuators, Pumps, Power Devices, and Tribology - Static friction and surface roughness studies of surface micromachined electrostatic micromotors using an atomic force-friction force microscopeSundararajan, Sriram et al. | 2001
- 1777
-
Static friction and surface roughness studies of surface micromachined electrostatic micromotors using an atomic force/friction force microscopeSundararajan, Sriram / Bhushan, Bharat et al. | 2001
- 1786
-
PART II - Nanotubes-Nanometer-Scale Science and Technology - Carbon Nanotubes: Nanoelectronics and Field Emission - Field-emission properties of vertically aligned carbon-nanotube array dependent on gas exposures and growth conditionsLim, S.C. et al. | 2001
- 1786
-
Field-emission properties of vertically aligned carbon-nanotube array dependent on gas exposures and growth conditionsLim, S. C. / Jeong, H. J. / Park, Y. S. / Bae, D. S. / Choi, Y. C. / Shin, Y. M. / Kim, W. S. / An, K. H. / Lee, Y. H. et al. | 2001
- 1790
-
PART II - Nanotubes-Nanometer-Scale Science and Technology - Carbon Nanotubes: Nanoelectronics and Field Emission - Carbon nanotube-based electron gun for electron microscopyLeopold, John G. et al. | 2001
- 1790
-
Carbon nanotube-based electron gun for electron microscopyLeopold, John G. / Zik, Ory / Cheifetz, Eli / Rosenblatt, David et al. | 2001
- 1796
-
Growth of well-aligned carbon nanotubes on nickel by hot-filament-assisted dc plasma chemical vapor deposition in a plasmaHayashi, Yasuaki / Negishi, Tetsu / Nishino, Shigehiro et al. | 2001
- 1796
-
PART II - Nanotubes-Nanometer-Scale Science and Technology - Carbon Nanotubes: Synthesis - Growth of well-aligned carbon nanotubes on nickel by hot-filament-assisted dc plasma chemical vapor deposition in a CH4-H2 plasmaHayashi, Yasuaki et al. | 2001
- 1800
-
PART II - Nanotubes-Nanometer-Scale Science and Technology - Carbon Nanotubes: Synthesis - Gas-phase production of carbon single-walled nanotubes from carbon monoxide via the HiPco process: A parametric studyBronikowski, Michael J. et al. | 2001
- 1800
-
Gas-phase production of carbon single-walled nanotubes from carbon monoxide via the HiPco process: A parametric studyBronikowski, Michael J. / Willis, Peter A. / Colbert, Daniel T. / Smith, K. A. / Smalley, Richard E. et al. | 2001
- 1806
-
PART II - Nanometer-Scale Science and Technology-NANO 6 - Nanoscale Modification of Materials - Selective-area chemical-vapor deposition of Si using a bilayer dielectric mask patterned by proximal probe oxidationGwo, S. et al. | 2001
- 1806
-
Selective-area chemical-vapor deposition of Si using a bilayer dielectric mask patterned by proximal probe oxidationGwo, S. / Yasuda, T. / Yamasaki, S. et al. | 2001
- 1812
-
Amino-terminated self-assembled monolayer on a surface formed by chemical vapor depositionHozumi, Atsushi / Yokogawa, Yoshiyuki / Kameyama, Tetsuya / Sugimura, Hiroyuki / Hayashi, Kazuyuki / Shirayama, Haruyuki / Takai, Osamu et al. | 2001
- 1812
-
PART II - Nanometer-Scale Science and Technology-NANO 6 - Nanometer-Scale Science and Technology-NANO 6 Poster Session - Amino-terminated self-assembled monolayer on a SiO2 surface formed by chemical vapor depositionHozumi, Atsushi et al. | 2001
- 1817
-
Surface acoustic wave investigation by ultrahigh vacuum scanning tunneling microscopyVoigt, P. U. / Krauß, S. / Chilla, E. / Koch, R. et al. | 2001
- 1817
-
PART II - Nanometer-Scale Science and Technology-NANO 6-Material Characterization - Nanomechanical and Interface Measurements - Surface acoustic wave investigation by ultrahigh vacuum scanning tunneling microscopyVoigt, P.U. et al. | 2001
- 1822
-
Method for navigating two scanning probes to a common point without additional microscopesOkamoto, Hiroshi / Chen, Dongmin et al. | 2001
- 1822
-
PART II - Nanometer-Scale Science and Technology-NANO 6-Material Characterization - Nanomechanical and Interface Measurements - Method for navigating two scanning probes to a common point without additional microscopesOkamoto, Hiroshi et al. | 2001
- 1825
-
Nanomechanical properties of molecular organic thin filmsCaro, J. / Fraxedas, J. / Gorostiza, P. / Sanz, F. et al. | 2001
- 1825
-
PART II - Nanometer-Scale Science and Technology-NANO 6-Micro-Electro-Mechanical Systems - Nanomechanics - Nanomechanical properties of molecular organic thin filmsCaro, J. et al. | 2001
- 1829
-
PART II - Nanometer-Scale Science and Technology-NANO 6-Surface Science-Material Characterization - Self-Assembly and Self-Organization - Self-organization of large-area periodic nanowire arrays by glancing incidence ion bombardment of CaF2(111) surfacesBatzill, Matthias et al. | 2001
- 1829
-
Self-organization of large-area periodic nanowire arrays by glancing incidence ion bombardment of surfacesBatzill, Matthias / Bardou, François / Snowdon, Ken J. et al. | 2001
- 1835
-
Aspect ratio dependent plasma-induced charging damage in rf precleaning of a metal contactKim, J. / Shin, K. S. / Park, W. J. / Kim, Y. J. / Kang, C. J. / Ahn, T. H. / Moon, J. T. et al. | 2001
- 1835
-
PART II - Plasma Science and Technology-Manufacturing Science and Technology - Plasma-Induced Damage - Aspect ratio dependent plasma-induced charging damage in rf precleaning of a metal contactKim, J. et al. | 2001
- 1840
-
Reactive magnetron sputter-deposition of NbN and (Nb, Ti)N films related to sputtering source characterization and optimizationIosad, N. N. / Jackson, B. D. / Polyakov, S. N. / Dmitriev, P. N. / Klapwijk, T. M. et al. | 2001
- 1840
-
PART II - Plasma Science and Technology I-Manufacturing Science and Technology - Sensors and Control in Plasma Processing - Reactive magnetron sputter-deposition of NbN and (Nb, Ti)N films related to sputtering source characterization and optimizationIosad, N.N. et al. | 2001
- 1846
-
Process development for small-area GaN/AlGaN heterojunction bipolar transistorsLee, K. P. / Zhang, A. P. / Dang, G. / Ren, F. / Han, J. / Hobson, W. S. / Lopata, J. / Abenathy, C. R. / Pearton, S. J. / Lee, J. W. et al. | 2001
- 1846
-
PART II - Semiconductors-Electronics - III-Nitride Processing and Devices - Process development for small-area GaN-AlGaN heterojunction bipolar transistorsLee, K.P. et al. | 2001
- 1850
-
PART II - Semiconductors-Electronics-Surface Science - Compound Semiconductors - Two-step metalorganic chemical vapor deposition growth of piezoelectric ZnO thin film on SiO2-Si substrateMuthukumar, S. et al. | 2001
- 1850
-
Two-step metalorganic chemical vapor deposition growth of piezoelectric ZnO thin film on substrateMuthukumar, S. / Emanetoglu, N. W. / Patounakis, G. / Gorla, C. R. / Liang, S. / Lu, Y. et al. | 2001
- 1854
-
Characterization of residues formed by anhydrous hydrogen fluoride etching of doped oxidesMuscat, Anthony J. / Thorsness, Adam G. / Montaño-Miranda, Gerardo et al. | 2001
- 1854
-
PART II - Semiconductors-Electronics-Surface Science - Passivation and Etching of Semiconductors - Characterization of residues formed by anhydrous hydrogen fluoride etching of doped oxidesMuscat, Anthony J. et al. | 2001
- 1862
-
Critical behavior of epitaxial islandsBudiman, R. Arief / Ruda, Harry E. / Perović, D. D. / Bahierathan, B. et al. | 2001
- 1862
-
PART II - Semiconductors-Electronics-Surface Science - Semiconductors Alloys - Critical behavior of epitaxial Si1-xGex-Si(001) islandsBudiman, R.Arief et al. | 2001
- 1868
-
PART II - Semiconductors-Electronics-Surface Science - Semiconductors Alloys - Adatom assisted stabilizatiod of ad dimers on Ge(001)Zoethout, E. et al. | 2001
- 1868
-
Adatom assisted stabilization of ad dimers on Ge(001)Zoethout, E. / Zandvliet, H. J. W. / Poelsema, Bene et al. | 2001
- 1871
-
PART II - Semiconductors-Electronics-Surface Science - Semiconductors-Electronics-Surface Science Poster Session - Investigation of the penetration of atomic hydrogen from the gas phase into SiO2-GaAsKagadei, V.A. et al. | 2001
- 1871
-
Investigation of the penetration of atomic hydrogen from the gas phase intoKagadei, V. A. / Nefyodtsev, E. V. / Proskurovsky, D. I. et al. | 2001
- 1878
-
High density plasma via hole etching in SiCCho, H. / Lee, K. P. / Leerungnawarat, P. / Chu, S. N. G. / Ren, F. / Pearton, S. J. / Zetterling, C.-M. et al. | 2001
- 1878
-
PART II - Semiconductors-Electronics-Surface Science - Semiconductors-Electronics-Surface Science Poster Session - High density plasma via hole etching in SiCCho, H. et al. | 2001
- 1882
-
Reflection high-energy electron diffraction study of ion-beam induced carbonization for 3C–SiC heteroepitaxial growth on Si (100)Tsubouchi, Nobuteru / Chayahara, Akiyoshi / Mokuno, Yoshiaki / Kinomura, Atsushi / Horino, Yuji et al. | 2001
- 1882
-
PART II - Semiconductors-Electronics-Surface Science - Semiconductors-Electronics-Surface Science Poster Session - Reflection high-energy electron diffraction study of ion-beam induced carbonization for 3C-SiC heteroepitaxial growth on Si (100)Tsubouchi, Nobuteru et al. | 2001
- 1887
-
PART II - Semiconductors-Electronics-Surface Science - Semiconductors-Electronics-Surface Science Poster Session - Epitaxial growth of cubic SiC thin films on silicon using single molecular precursors by metalorganic chemical vapor depositionBoo, J.-H. et al. | 2001
- 1887
-
Epitaxial growth of cubic SiC thin films on silicon using single molecular precursors by metalorganic chemical vapor depositionBoo, J.-H. / Lee, S.-B. / Lee, K.-W. / Yu, K.-S. / Kim, Y. / Yeon, S. H. / Jung, I. N. et al. | 2001
- 1894
-
PART II - Semiconductors-Electronics-Surface Science - Semiconductors-Electronics-Surface Science Poster Session - Visible emission from amorphous AlN thin-film phosphors with Cu, Mn, or CrMartin, A.L. et al. | 2001
- 1894
-
Visible emission from amorphous AlN thin-film phosphors with Cu, Mn, or CrMartin, A. L. / Spalding, C. M. / Dimitrova, V. I. / Van Patten, P. G. / Caldwell, M. L. / Kordesch, M. E. / Richardson, H. H. et al. | 2001
- 1898
-
PART II - Semiconductors-Electronics-Surface Science - Semiconductors-Electronics-Surface Science Poster Session - Investigation of polycrystalline silicon grain structure with single wafer chemical vapor deposition techniqueBu, H. et al. | 2001
- 1898
-
Investigation of polycrystalline silicon grain structure with single wafer chemical vapor deposition techniqueBu, H. / Hu, C. / Bevan, M. / Wang, S. / Sanchez, E. / Luo, L. et al. | 2001
- 1902
-
PART II - Semiconductors-Electronics-Surface Science - Semiconductors-Electronics-Surface Science Poster Session - Cluster deposition study by molecular dynamics simulation: Al and Cu clusterKang, Jeong Won et al. | 2001
- 1902
-
Cluster deposition study by molecular dynamics simulation: Al and Cu clusterKang, Jeong Won / Choi, Ki Seok / Kang, Jin Cheol / Kang, Eu Seok / Byun, Ki Ryang / Hwang, Ho Jung et al. | 2001
- 1907
-
PART II - Semiconductors I-Electronics-Surface Science - Chemistry of Silicon Oxides and Nitrides - Atomic-order thermal nitridation of Si(100) and subsequent growth of SiWatanabe, T. et al. | 2001
- 1907
-
Atomic-order thermal nitridation of Si(100) and subsequent growth of SiWatanabe, T. / Sakuraba, M. / Matsuura, T. / Murota, J. et al. | 2001
- 1912
-
PART II - Surface Engineering-Thin Films - Hard and Superhard Coatings - Structure and mechanical properties of Ti-Si-C coatings deposited by magnetron sputteringKoutzaki, S.H. et al. | 2001
- 1912
-
Structure and mechanical properties of Ti–Si–C coatings deposited by magnetron sputteringKoutzaki, S. H. / Krzanowski, J. E. / Nainaparampril, J. J. et al. | 2001
- 1919
-
PART II - Surface Engineering-Thin Films - Hard and Superhard Coatings - Multilayered (Ti, Al) ceramic coating for high-speed machining applicationsZeng, X.T. et al. | 2001
- 1919
-
Multilayered (Ti, Al) ceramic coating for high-speed machining applicationsZeng, X. T. / Zhang, Sam / Tan, L. S. et al. | 2001
- 1923
-
PART II - Surface Science-Material Characterization - Characterization of Oxides and Thin Films - Controlled coordination and oxidation states of copper and manganese cations in complex nickel-copper-cobalt-manganese oxide thin filmsKukuruznyak, Dmitry A. et al. | 2001
- 1923
-
Controlled coordination and oxidation states of copper and manganese cations in complex nickel–copper–cobalt–manganese oxide thin filmsKukuruznyak, Dmitry A. / Han, Sang-Wook / Lee, Moon-Hwan / Omland, Kimberly A. / Gregg, Michael C. / Stern, Edward A. / Ohuchi, Fumio S. et al. | 2001
- 1929
-
Ultraviolet photoemission spectroscopy study of ultrahigh-vacuum-fractured surfaceAiura, Y. / Kawanaka, H. / Bando, H. / Yasue, T. et al. | 2001
- 1929
-
PART II - Surface Science-Material Characterization - Characterization of Oxides and Thin Films - Ultraviolet photoemission spectroscopy study of ultrahigh-vacuum-fractured CaVO3 surfaceAiura, Y. et al. | 2001
- 1933
-
PART II - Surface Science-Material Characterization - Characterization of Oxides and Thin Films - Reactions of acetaldehyde on UO2(111) single crystal surfaces. Evidence of benzene formationChong, S.V. et al. | 2001
- 1933
-
Reactions of acetaldehyde on single crystal surfaces. Evidence of benzene formationChong, S. V. / Idriss, H. et al. | 2001
- 1938
-
PART II - Surface Science I-Material Characterization - Oxide Surfaces, Interfaces, and Defects - Metallic electronic states on SrTiO3 (110) surface: An in situ conduction measurementBando, Hiroshi et al. | 2001
- 1938
-
Metallic electronic states on (110) surface: An in situ conduction measurementBando, Hiroshi / Ochiai, Yuichi / Aiura, Yoshihiro / Haruyama, Yuichi / Yasue, Tomoyoshi / Nishihara, Yoshikazu et al. | 2001
- 1942
-
Self-diffusion in ceriaPerkins, Craig L. / Henderson, Michael A. / Peden, Charles H. F. / Herman, Gregory S. et al. | 2001
- 1942
-
PART II - Surface Science I-Material Characterization - Oxide Surfaces, Interfaces, and Defects - Self-diffusion in ceriaPerkins, Craig L. et al. | 2001
- 1947
-
Behavior of ultrathin films in very high electric fields: Scanning tunneling microscope-induced void formation and dielectric breakdownNiu, C. / Magtoto, N. P. / Kelber, J. A. et al. | 2001
- 1947
-
PART II - Surface Science I-Material Characterization - Oxide Applications and Oxidation - Behavior of ultrathin Al2O3 films in very high electric fields: Scanning tunneling microscope-induced void formation and dielectric breakdownNiu, C. et al. | 2001
- 1953
-
Tin-oxide overlayer formation by oxidation of Pt–Sn(111) surface alloysBatzill, Matthias / Beck, David E. / Jerdev, Dmitri / Koel, Bruce E. et al. | 2001
- 1953
-
PART II - Surface Science I-Material Characterization - Oxide Applications and Oxidation - Tin-oxide overlayer formation by oxidation of Pt-Sn(111) surface alloysBatzill, Matthias et al. | 2001
- 1959
-
Surface characterization of oxidative corrosion of U–Nb alloysKelly, Dan / Lillard, Jennifer A. / Manner, William L. / Hanrahan, Robert / Paffett, Mark T. et al. | 2001
- 1959
-
PART II - Surface Science I-Material Characterization - Oxide Applications and Oxidation - Surface characterization of oxidative corrosion of U-Nb alloysKelly, Dan et al. | 2001
- 1965
-
PART II - Surface Science I-Material Characterization - Oxide Applications and Oxidation - Plasma oxidation as a tool to design oxide films at low temperaturesSchennach, R. et al. | 2001
- 1965
-
Plasma oxidation as a tool to design oxide films at low temperaturesSchennach, R. / Grady, T. / Naugle, D. G. / Parga, J. R. / McWhinney, H. / Cocke, D. L. et al. | 2001
- 1971
-
Making superior corrosion resistant aluminum oxide films using ozone-electrochemical and electron microscopy studiesKuznetsova, A. / Popova, I. / Zhukov, V. / Yates, J. T. / Zhou, G. / Yang, J. C. / Chen, X. et al. | 2001
- 1971
-
PART II - Surface Science I-Material Characterization - Oxidation and Molecule-Oxide Interactions - Making superior corrosion resistant aluminum oxide films using ozone-electrochemical and electron microscopy studiesKuznetsova, A. et al. | 2001
- 1977
-
Nature of oxygen at rocksalt and spinel oxide surfacesLangell, M. A. / Kim, J. G. / Pugmire, D. L. / McCarroll, W. et al. | 2001
- 1977
-
PART II - Surface Science I-Material Characterization - Oxidation and Molecule-Oxide Interactions - Nature of oxygen at rocksalt and spinel oxide surfacesLangell, M.A. et al. | 2001
- 1983
-
PART II - Surface Science II-Electronics - Electronic Structure and Excitations - Fermi contours and adsorbate phonon anomalies for Li-Mo(110) and Li-W(110)Rotenberg, Eli et al. | 2001
- 1983
-
Fermi contours and adsorbate phonon anomalies for Li/Mo(110) and Li/W(110)Rotenberg, Eli / Kevan, S. D. et al. | 2001
- 1988
-
Adsorption of hydrogen on clean and potassium modified low index copper surfaces: Cu(100) and Cu(110)Thomsen, L. / Onsgaard, J. / Godowski, P. J. / Møller, P. / Hoffmann, S. V. et al. | 2001
- 1988
-
PART II - Surface Science II-Vacuum Technology - Adsorption and Desorption Phenomena II - Adsorption of hydrogen on clean and potassium modified low index copper surfaces: Cu(100) and Cu(110)Thomsen, L. et al. | 2001
- 1993
-
Scanning tunneling microscopy study of the molecular arrangement of meta- and para-xylene on Pd(111)Futaba, D. N. / Landry, J. P. / Loui, A. / Chiang, S. et al. | 2001
- 1993
-
PART II - Surface Science II-Vacuum Technology - Adsorption and Desorption Phenomena II - Scanning tunneling microscopy study of the molecular arrangement of meta- and para-xylene on Pd(111)Futaba, D.N. et al. | 2001
- 1996
-
Behavior of zirconium surfaces in the presence of oxygen, nitrogen, and hydrogen containing adsorbatesKang, Y. C. / Clauss, D. A. / Ramsier, R. D. et al. | 2001
- 1996
-
PART II - Surface Science II-Vacuum Technology - Adsorption and Desorption Phenomena II - Behavior of zirconium surfaces in the presence of oxygen, nitrogen, and hydrogen containing adsorbatesKang, Y.C. et al. | 2001
- 2001
-
PART II - Surface Science II-Vacuum Technology - Adsorption and Desorption Phenomena II - Chlorosilane adsorption on clean Si surfaces: Scanning tunneling microscopy and Fourier-transform infrared absorption spectroscopy studiesNishizawa, Masayasu et al. | 2001
- 2001
-
Chlorosilane adsorption on clean Si surfaces: Scanning tunneling microscopy and Fourier-transform infrared absorption spectroscopy studiesNishizawa, Masayasu / Yasuda, Tetsuji / Yamasaki, Satoshi / Shinohara, Masanori / Kamakura, Nozomu / Kimura, Yasuo / Niwano, Michio et al. | 2001
- 2007
-
Line of sight techniques: Providing an inventory of all species arriving at and departing from a surfaceChan, A. S. Y. / Skegg, M. P. / Jones, Robert G. et al. | 2001
- 2007
-
PART II - Surface Science II-Material Characterization - Technique Innovations: Experiment, Theory, and Simulation - Line of sight techniques: Providing an inventory of all species arriving at and departing from a surfaceChan, A.S.Y. et al. | 2001
- 2013
-
Near-edge valence-band structure of amorphous hydrogenated Si–C thin films characterized by Auger and photoemission processesLee, Moon-Hwan / Ohuchi, Fumio S. et al. | 2001
- 2013
-
PART II - Thin Films-Electronics - In-Situ Characterization of Thin Film Growth - Near-edge valence-band structure of amorphous hydrogenated Si-C thin films characterized by Auger and photoemission processesLee, Moon-Hwan et al. | 2001
- 2017
-
PART II - Thin Films-Electronics - In-Situ Characterization of Thin Film Growth - In situ characterization of thin film growth: Boron nitride on siliconFukarek, W. et al. | 2001
- 2017
-
In situ characterization of thin film growth: Boron nitride on siliconFukarek, W. et al. | 2001
- 2025
-
PART II - Thin Films-Nanometer-Scale Science and Technology - Cluster beam synthesis of nanostructured thin filmsMilani, P. et al. | 2001
- 2025
-
Cluster beam synthesis of nanostructured thin filmsMilani, P. / Piseri, P. / Barborini, E. / Podesta, A. / Lenardi, C. et al. | 2001
- 2034
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CUMULATIVE AUTHOR INDEX| 2001
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PART I - Preface| 2001