The role of plasma in plasma-enhanced atomic layer deposition of crystalline films (English)
- New search for: Boris, David R.
- New search for: Wheeler, Virginia D.
- New search for: Nepal, Neeraj
- New search for: Qadri, Syed B.
- New search for: Walton, Scott G.
- New search for: Eddy, Charles (Chip) R.
- New search for: Boris, David R.
- New search for: Wheeler, Virginia D.
- New search for: Nepal, Neeraj
- New search for: Qadri, Syed B.
- New search for: Walton, Scott G.
- New search for: Eddy, Charles (Chip) R.
In:
Journal of Vacuum Science & Technology A
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38
, 4
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26
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2020
- Article (Journal) / Electronic Resource
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Title:The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
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Contributors:Boris, David R. ( author ) / Wheeler, Virginia D. ( author ) / Nepal, Neeraj ( author ) / Qadri, Syed B. ( author ) / Walton, Scott G. ( author ) / Eddy, Charles (Chip) R. ( author )
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Published in:Journal of Vacuum Science & Technology A ; 38, 4 ; 26
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Publisher:
- New search for: American Vacuum Society
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Publication date:2020-07-01
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Size:26 pages
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ISSN:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:English
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Keywords:
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Source:
Table of contents – Volume 38, Issue 4
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
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Practical guides for x-ray photoelectron spectroscopy: Quantitative XPSShard, Alexander G. et al. | 2020
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Influence of precursor dose and residence time on the growth rate and uniformity of vanadium dioxide thin films by atomic layer depositionNiang, Kham M. / Bai, Guandong / Robertson, John et al. | 2020
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Causes of anisotropy in thermal atomic layer etching of nanostructuresFischer, Andreas / Routzahn, Aaron / Wen, Sandy / Lill, Thorsten et al. | 2020
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High power impulse magnetron sputtering of diamond-like carbon coatingsKubart, Tomas / Aijaz, Asim / Andersson, Joakim / Ferreira, Fabio / Oliveira, João Carlos / Sobetkii, Arcadie / Parau, Anca Constantina / Vitelaru, Catalin et al. | 2020
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X-ray photoelectron spectroscopy: A perspective on quantitation accuracy for composition analysis of homogeneous materialsBrundle, Christopher Richard / Crist, Bruce Vincent et al. | 2020
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Antioxidation protection for Ce metal by atomic layer deposition upon air exposureZhou, Lihua / Chen, Yiwu / Yang, Qiang / Zhu, Yingxi / Zhao, Jing / Li, Tianfu / Zou, Xiaoyu / Wang, Jian / Yang, Tinggui et al. | 2020
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Comprehensive characterization of copper oxide atomic layer deposition using water or ozone with enhanced bis-(dimethylamino-2-propoxide) copper deliveryAvila, Jason R. / Eddy, Charles R. / Wheeler, Virginia D. et al. | 2020
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Plasma resistance of sintered and ion-plated yttrium oxyfluorides with various Y, O, and F composition ratios for use in plasma process chamberGoto, Tetsuya / Shiba, Yoshinobu / Teramoto, Akinobu / Kishi, Yukio / Sugawa, Shigetoshi et al. | 2020
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The role of plasma in plasma-enhanced atomic layer deposition of crystalline filmsBoris, David R. / Wheeler, Virginia D. / Nepal, Neeraj / Qadri, Syed B. / Walton, Scott G. / Eddy, Charles (Chip) R. et al. | 2020
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In situ, in vivo, and in operando imaging and spectroscopy of liquids using microfluidics in vacuumYu, Xiao-Ying et al. | 2020
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Structural and optical properties of (Zn,Mn)O thin films prepared by atomic layer depositionGhods, Amirhossein / Zhou, Chuanle / Ferguson, Ian T. et al. | 2020
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Patterning nickel for extreme ultraviolet lithography mask application. II. Hybrid reactive ion etch and atomic layer etch processingSang, Xia / Chang, Jane P. et al. | 2020
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Effect of substrate bias on microstructure of epitaxial film grown by HiPIMS: An atomistic simulationKateb, Movaffaq / Gudmundsson, Jon Tomas / Ingvarsson, Snorri et al. | 2020
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Utilizing plasma modified SnO2 paper gas sensors to better understand gas-surface interactions at low temperaturesHiyoto, Kimberly A. M. / Fisher, Ellen R. et al. | 2020
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Carbon impurity concentrations in BaSnO3 films grown by molecular beam epitaxy using a tin oxide sourceWu, Wangzhou / Combs, Nicholas G. / Mates, Thomas E. / Stemmer, Susanne et al. | 2020
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Cyclic etching of copper thin films using HBr and Ar gasesLim, Eun Taek / Cha, Moon Hwan / Park, Sung Yong / Lee, Ji Su / Chung, Chee Won et al. | 2020
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In vacuo atomic layer deposition and electron tunneling characterization of ultrathin dielectric films for metal/insulator/metal tunnel junctionsWu, Judy Z. / Acharya, Jagaran / Goul, Ryan et al. | 2020
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Role of organic molecules in enabling modern technologyCaroca, Eric / Sandoval, Tania et al. | 2020
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Effects of deposition environment and temperature on photoluminescence, particle morphology, and crystal structure of pulsed laser deposited Ga2O3 thin filmsOgugua, Simon N. / Swart, Hendrik C. / Ntwaeaborwa, Odireleng M. et al. | 2020
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Lab-based operando x-ray photoelectron spectroscopy for probing low-volatile liquids and their interfaces across a variety of electrosystemsAydogan Gokturk, Pinar / Taner Camci, Merve / Suzer, Sefik et al. | 2020
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3D-printed and injection molded polymer matrix composites with 2D layered materialsGamboa, Gerardo / Mazumder, Sangram / Hnatchuk, Nathalie / Catalan, Jorge A. / Cortes, Damaris / Chen, IKang / Perez, Perla / Brostow, Witold / Kaul, Anupama B. et al. | 2020
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Atomic layer etching of metals with anisotropy, specificity, and selectivitySang, Xia / Xia, Yantao / Sautet, Philippe / Chang, Jane P. et al. | 2020
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Role of physisorption in atomic layer etching of silicon nitrideSridhar, Shyam / Ventzek, Peter L. G. / Ranjan, Alok et al. | 2020
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Fabrication of crystal plane oriented trenches in gallium nitride using SF6 + Ar dry etching and wet etching post-treatmentDannecker, Kevin / Baringhaus, Jens et al. | 2020
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Microstructural and chemical analysis of polycrystalline LiNbO3 films obtained by room-temperature RF sputtering after various annealing durationsSauze, Laura C. / Vaxelaire, Nicolas / Rouchon, Denis / Pierre, François / Templier, Roselyne / Remiens, Denis / Rodriguez, Guillaume et al. | 2020
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Patterning nickel for extreme ultraviolet lithography mask application I. Atomic layer etch processingSang, Xia / Chen, Ernest / Chang, Jane P. et al. | 2020
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On the formation of black silicon in SF6-O2 plasma: The clear, oxidize, remove, and etch (CORE) sequence and black silicon on demandNguyen, Vy Thi Hoang / Jensen, Flemming / Hübner, Jörg / Leussink, Pele / Jansen, Henri et al. | 2020
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Chemical vapor deposition of sp2-boron nitride on Si(111) substrates from triethylboron and ammonia: Effect of surface treatmentsSouqui, Laurent / Pedersen, Henrik / Högberg, Hans et al. | 2020
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Thin film deposition research and its impact on microelectronics scalingCabral, Cyril / Lavoie, Christian / Murray, Conal / Pyzyna, Adam / Rodbell, Ken et al. | 2020
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Magnetic properties and resistive switching in mixture films and nanolaminates consisting of iron and silicon oxides grown by atomic layer depositionKukli, Kaupo / Kemell, Marianna / Castán, Helena / Dueñas, Salvador / Link, Joosep / Stern, Raivo / Heikkilä, Mikko J. / Jõgiaas, Taivo / Kozlova, Jekaterina / Rähn, Mihkel et al. | 2020
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Atomic layer deposition of HfO2 films using carbon-free tetrakis(tetrahydroborato)hafnium and waterChoudhury, Devika / Mandia, David J. / Langeslay, Ryan R. / Yanguas-Gil, Angel / Letourneau, Steven / Sattelberger, Alfred P. / Balasubramanium, Mahalingam / Mane, Anil U. / Delferro, Massimiliano / Elam, Jeffrey W. et al. | 2020
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Procedure which allows the performance and calibration of an XPS instrument to be checked rapidly and frequentlyWolstenholme, John et al. | 2020
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Slowing DNA translocation through a solid-state nanopore by applying hydrophobic microchannel-guided wallsKang, Jae-Hyun / Lee, Kidan / Kim, Hyun-Mi / Kim, Ki-Bum et al. | 2020
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In situ surface analysis of an ion-energy-dependent chlorination layer on GaN during cyclic etching using Ar+ ions and Cl radicalsHasegawa, Masaki / Tsutsumi, Takayoshi / Tanide, Atsushi / Nakamura, Shohei / Kondo, Hiroki / Ishikawa, Kenji / Sekine, Makoto / Hori, Masaru et al. | 2020
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Vacuum ultraviolet-absorption spectroscopy and delocalized plasma-induced emission used for the species detection in a down-stream soft-etch plasma reactorSoriano, Robert / Cunge, Gilles / Sadeghi, Nader et al. | 2020
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Vapor deposition of quaternary ammonium methacrylate polymers with high antimicrobial activity: Synthetic route, toxicity assessment, and durability analysisÇıtak, Emre / Testici, Hilal / Gürsoy, Mehmet / Sevgili, Emine / Dağı, Hatice Türk / Öztürk, Bahadır / Karaman, Mustafa et al. | 2020
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Assessment of atomic layer deposited TiO2 photocatalytic self-cleaning by quartz crystal microbalanceHenry, Théo / Martins, Paolo / Eustache, Etienne / Servet, Bernard / Divay, Laurent / Jouanne, Pierre / Grasset, Philippe / Dudon, Jean-Paul / Hugonnot, Patrick / Fleury-Frenette, Karl et al. | 2020
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Reduction of unintentional Si doping in β-Ga2O3 grown via plasma-assisted molecular beam epitaxyAsel, Thaddeus J. / Steinbrunner, Erich / Hendricks, Jessica / Neal, Adam T. / Mou, Shin et al. | 2020
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Plasmonic nanocomposites of zinc oxide and titanium nitrideBeaudette, Chad A. / Held, Jacob T. / Greenberg, Benjamin L. / Nguyen, Phong H. / Concannon, Nolan M. / Holmes, Russell J. / Mkhoyan, K. Andre / Aydil, Eray S. / Kortshagen, Uwe R. et al. | 2020
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Area-selective atomic layer deposition of molybdenum oxideKvalvik, Julie Nitsche / Borgersen, Jon / Hansen, Per-Anders / Nilsen, Ola et al. | 2020
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Effect of frequency and applied voltage of an atmospheric-pressure dielectric-barrier discharge on breakdown and hydroxyl-radical generation with a liquid electrodeBlatz, Joshua M. / Benjamin, Daniel / Choudhury, Faraz A. / Minkoff, Benjamin B. / Sussman, Michael R. / Shohet, J. Leon et al. | 2020
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Manipulation of thin silver film growth on weakly interacting silicon dioxide substrates using oxygen as a surfactantPliatsikas, Nikolaos / Jamnig, Andreas / Konpan, Martin / Delimitis, Andreas / Abadias, Gregory / Sarakinos, Kostas et al. | 2020
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Experimental determination of electron attenuation lengths in complex materials by means of epitaxial film growth: Advantages and challengesChambers, Scott A. / Du, Yingge et al. | 2020