Advanced chemical vapor deposition silicon carbide barrier technology for ultralow permeability applications (English)
- New search for: Zambov, Ludmil
- New search for: Weidner, Ken
- New search for: Shamamian, Vasgen
- New search for: Camilletti, Robert
- New search for: Pernisz, Udo
- New search for: Loboda, Mark
- New search for: Cerny, Glenn
- New search for: Gidley, David
- New search for: Peng, Hua-Gen
- New search for: Vallery, Richard
- New search for: Zambov, Ludmil
- New search for: Weidner, Ken
- New search for: Shamamian, Vasgen
- New search for: Camilletti, Robert
- New search for: Pernisz, Udo
- New search for: Loboda, Mark
- New search for: Cerny, Glenn
- New search for: Gidley, David
- New search for: Peng, Hua-Gen
- New search for: Vallery, Richard
In:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
;
24
, 5
;
1706-1713
;
2006
- Article (Journal) / Electronic Resource
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Title:Advanced chemical vapor deposition silicon carbide barrier technology for ultralow permeability applications
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Additional title:Advanced CVD silicon carbide barrier technology
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Contributors:Zambov, Ludmil ( author ) / Weidner, Ken ( author ) / Shamamian, Vasgen ( author ) / Camilletti, Robert ( author ) / Pernisz, Udo ( author ) / Loboda, Mark ( author ) / Cerny, Glenn ( author ) / Gidley, David ( author ) / Peng, Hua-Gen ( author ) / Vallery, Richard ( author )
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Published in:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films ; 24, 5 ; 1706-1713
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Publisher:
- New search for: American Vacuum Society
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Publication date:2006-09-01
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Size:8 pages
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ISSN:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:English
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Keywords:
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Source:
Table of contents – Volume 24, Issue 5
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1695
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Design of a vapor transport deposition process for thin film materialsHanket, G. M. / McCandless, B. E. / Buchanan, W. A. / Fields, S. / Birkmire, R. W. et al. | 2006
- 1702
-
Wide-range vibratory vacuum gaugeThurmer, Dominic J. / Price, John C. et al. | 2006
- 1706
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Advanced chemical vapor deposition silicon carbide barrier technology for ultralow permeability applicationsZambov, Ludmil / Weidner, Ken / Shamamian, Vasgen / Camilletti, Robert / Pernisz, Udo / Loboda, Mark / Cerny, Glenn / Gidley, David / Peng, Hua-Gen / Vallery, Richard et al. | 2006
- 1714
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Optical properties of amorphous film sputtering with different partial pressuresTeng, X. M. / Fan, H. T / Pan, S. S. / Ye, C. / Li, G. H. et al. | 2006
- 1718
-
Optical diagnostics for plasma-surface interaction in radio-frequency inductively coupled plasma during Si and etchingMiyoshi, Y. / Miyauchi, M. / Oguni, A. / Makabe, T. et al. | 2006
- 1725
-
Silicon dioxide etching process for fabrication of micro-optics employing pulse-modulated electron-beam-excited plasmaTakeda, Keigo / Ohta, Takayuki / Ito, Masafumi / Hori, Masaru et al. | 2006
- 1730
-
Topography in secondary ion mass spectroscopy imagesRangarajan, Srinath / Tyler, Bonnie J. et al. | 2006
- 1737
-
Sorption and desorption behaviors of hexadecane vapors in plasma deposited fluorocarbon films using a quartz crystal microbalanceVaswani, Sudeep / Koskinen, Jere / Hess, Dennis W. et al. | 2006
- 1746
-
Chemical and optical properties of thermally evaporated manganese oxide thin filmsAl-Kuhaili, M. F. et al. | 2006
- 1751
-
Control of the plasma polymerized acrylic acid film surface chemistry at low electron temperature in low pressure dischargeDhayal, Marshal et al. | 2006
- 1756
-
X-ray photoelectron spectroscopy study of self-assembled monolayers of alkanethiols on (001) GaAsWieliczka, David M. / Ding, Ximing / Dubowski, Jan J. et al. | 2006
- 1760
-
Effects of addition on density and temperature of radicals in capacitively coupled gas plasmaNagai, M. / Hori, M. et al. | 2006
- 1764
-
Tantalum carbide etch characterization in inductively coupled Ar/CI~2/HBr plasmasKawai, H. / Rauf, S. / Luckowski, E. / Ventzek, P. L. G. et al. | 2006
- 1764
-
Tantalum carbide etch characterization in inductively coupled plasmasKawai, H. / Rauf, S. / Luckowski, E. / Ventzek, P. L. G. et al. | 2006
- 1776
-
Effect of surface topography on reflection electron energy loss plasmon spectra of group III metalsStrawbridge, B. / Singh, R. K. / Beach, C. / Mahajan, S. / Newman, N. et al. | 2006
- 1782
-
Zinc oxide-based transparent conductive oxide films prepared by pulsed magnetron sputtering from powder targets: Process features and film propertiesKelly, P. J. / Zhou, Y. et al. | 2006
- 1790
-
Corrosion resistance and antithrombogenic behavior of La and Nd ion implanted stainless steelsJing, F. J. / Jin, F. Y. / Liu, Y. W. / Wan, G. J. / Liu, X. M. / Zhao, X. B. / Fu, R. K. Y. / Leng, Y. X. / Huang, N. / Chu, Paul K. et al. | 2006
- 1795
-
Previous heat treatment inducing different plasma nitriding behaviors in martensitic stainless steelsFigueroa, C. A. / Alvarez, F. / Mitchell, D. R. G. / Collins, G. A. / Short, K. T. et al. | 2006
- 1802
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In vacuo substrate pretreatments for enhancing nanodiamond formation in electron cyclotron resonance plasmaTeii, Kungen / Kouzuma, Yutaka / Uchino, Kiichiro et al. | 2006
- 1807
-
Angular distribution of particles sputtered from Si bottom in a plasmaLee, Jin-Kwan / Lee, Gyeo-Re / Min, Jae-Ho / Moon, Sang Heup et al. | 2006
- 1812
-
Gas-phase and sample characterizations of multiwall carbon nanotube growth using an atmospheric pressure plasmaChandrashekar, Anand / Lee, Jeong-Soo / Lee, Gil S. / Goeckner, Matthew J. / Overzet, Lawrence J. et al. | 2006
- 1818
-
Continuous emission of ions into a vacuum from a bare surface of yttria-stabilized zirconia at elevated temperaturesFujiwara, Yukio / Sakai, Takaaki / Kaimai, Atsushi / Yashiro, Keiji / Kawada, Tatsuya / Mizusaki, Junichiro et al. | 2006
- 1823
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High-rate plasma-deposited films for surface passivation of crystalline siliconHoex, B. / Peeters, F. J. J. / Creatore, M. / Blauw, M. A. / Kessels, W. M. M. / van de Sanden, M. C. M. et al. | 2006
- 1831
-
Measurement uncertainties for vacuum standards at Korea Research Institute of Standards and ScienceHong, S. S. / Shin, Y. H. / Chung, K. H. et al. | 2006
- 1839
-
Energy distribution and flux of fast neutrals and residual ions extracted from a neutral beam sourceRanjan, Alok / Donnelly, Vincent M. / Economou, Demetre J. et al. | 2006
- 1847
-
Properties of a newly developed concave nickel gasket for the ConFlat-type sealing systemKurokouchi, Satoshi / Shinoda, Satsuo / Morita, Shinsaku et al. | 2006
- 1857
-
Investigation of reactive ion etching of dielectrics and Si in or for photovoltaic applicationsGatzert, C. / Blakers, A. W. / Deenapanray, Prakash N. K. / Macdonald, D. / Auret, F. D. et al. | 2006
- 1866
-
Development of novel tungsten-doped high mobility transparent conductive thin filmsLi, Xifeng / Zhang, Qun / Miao, Weina / Huang, Li / Zhang, Zhuangjian / Hua, Zhongyi et al. | 2006
- 1870
-
Growth and characterization of chromium oxide thin films prepared by reactive ac magnetron sputteringKhanna, Atul / Bhat, Deepak G. / Payzant, E. A. et al. | 2006
- 1878
-
Rotational and translational temperature equilibrium in an inductively coupled plasmaShimada, Masashi / Tynan, George R. / Cattolica, Robert et al. | 2006
- 1884
-
Interfacial interaction of in situ Cu growth on tetrasulfide self-assembled monolayer on plasma treated parylene surfacePimanpang, S. / Wang, Pei-I / Juneja, Jasbir S. / Wang, G.-C. / Lu, T.-M. et al. | 2006
- 1892
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Real-time, noninvasive monitoring of ion energy and ion current at a wafer surface during plasma etchingSobolewski, Mark A. et al. | 2006
- 1906
-
Surface kinetics modeling of silicon and silicon oxide plasma etching. I. Effect of neutral and ion fluxes on etching yield of silicon oxide in fluorocarbon plasmasKwon, Ohseung / Sawin, Herbert H. et al. | 2006
- 1914
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Surface kinetics modeling of silicon and silicon oxide plasma etching. II. Plasma etching surface kinetics modeling using translating mixed-layer representationKwon, Ohseung / Sawin, Herbert H. et al. | 2006
- 1920
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Surface kinetics modeling of silicon and silicon oxide plasma etching. III. Modeling of silicon oxide etching in fluorocarbon chemistry using translating mixed-layer representationKwon, Ohseung / Bai, Bo / Sawin, Herbert H. et al. | 2006
- 1928
-
Study of nonisothermal crystallization in amorphous alloyAbo-Ghazala, M. S. / Farag, El-Sayed M. / Ammar, A. H. et al. | 2006
- 1933
-
Amorphous silicon layer characteristics during 70-2000 eV Ar+-ion bombardment of Si(100)Stevens, A.A.E. et al. | 2006
- 1933
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Amorphous silicon layer characteristics during -ion bombardment of Si(100)a)Stevens, A. A. E. / Kessels, W. M. M. / van de Sanden, M. C. M. / Beijerinck, H. C. W. et al. | 2006
- 1941
-
Tailored synthesis of ZnO:Er(III) nanosystems by a hybrid rf-sputtering/sol-gel routeArmelao, Lidia / Barreca, Davide / Bottaro, Gregorio / Gasparotto, Alberto / Leonarduzzi, Daniele / Maragno, Cinzia / Tondello, Eugenio / Sada, Cinzia et al. | 2006
- 1948
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Methods for processing tantalum films of controlled microstructures and propertiesNarayan, J. / Bhosle, V. / Tiwari, A. / Gupta, A. / Kumar, P. / Wu, R. et al. | 2006
- 1955
-
Scaling of hollow cathode magnetrons for ionized metal physical vapor depositionVyas, Vivek / Kushner, Mark J. et al. | 2006
- 1970
-
Design of a hydrogen etching system for surface preparation of SiC wafersRearick, D. J. / Maksimov, O. / Heydemann, V. D. et al. | 2006
- 1970
-
Shop Notes - Design of a hydrogen etching system for surface preparation of SiC wafersRearick, D.J. et al. | 2006
- 1972
-
Erratum: Neuronal cells cultured on modified microelectronic device surfaces [Offenhäusser, Andreas / Rühe, Jürgen / Knoll, Wolfgang et al. | 2006
- 1973
-
CUMULATIVE AUTHOR INDEX| 2006
- L7
-
Interaction of with Zircaloy-4 surfaces at various temperaturesStojilovic, N. / Ramsier, R. D. et al. | 2006
-
Preliminary Program of the AVS 53rd International Symposium| 2006
-
An International journal devoted to Vacuum, Surfaces, and Films| 2006
-
Letters - Interaction of SO2 with Zircaloy-4 surfaces at various temperaturesStojilovic, N. et al. | 2006