New strategies for conformal, superconformal, and ultrasmooth films by low temperature chemical vapor deposition (English)
- New search for: Abelson, John R.
- New search for: Girolami, Gregory S.
- New search for: Abelson, John R.
- New search for: Girolami, Gregory S.
In:
Journal of Vacuum Science & Technology A
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38
, 3
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21
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2020
- Article (Journal) / Electronic Resource
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Title:New strategies for conformal, superconformal, and ultrasmooth films by low temperature chemical vapor deposition
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Contributors:Abelson, John R. ( author ) / Girolami, Gregory S. ( author )
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Published in:Journal of Vacuum Science & Technology A ; 38, 3 ; 21
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Publisher:
- New search for: American Vacuum Society
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Publication date:2020-05-01
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Size:21 pages
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ISSN:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:English
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Keywords:
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Source:
Table of contents – Volume 38, Issue 3
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
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Evaluation of alternatives to paraffin for antirelaxation coatingsLazare, Jovian / Enakaya, Nyesa / Lyons, John L. et al. | 2020
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Atomic layer deposition of high-quality Pt thin film as an alternative interconnect replacing CuHan, Seung-Min / Nandi, Dip K. / Joo, Yong-Hwan / Shigetomi, Toshiyuki / Suzuki, Kazuharu / Nabeya, Shunichi / Harada, Ryosuke / Kim, Soo-Hyun et al. | 2020
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Atomic layer deposition of amorphous antimony sulfide (a-Sb2S3) as semiconductor sensitizer in extremely thin absorber solar cellMahuli, Neha / Halder, Debabrata / Paul, Ankan / Sarkar, Shaibal K. et al. | 2020
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Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputteringHajihoseini, Hamidreza / Čada, Martin / Hubička, Zdenek / Ünaldi, Selen / Raadu, Michael A. / Brenning, Nils / Gudmundsson, Jon Tomas / Lundin, Daniel et al. | 2020
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Silicon nitride spacer etching selectively to silicon using CH3F/O2/He/SiCl4 plasmaPossémé, Nicolas / Garcia-Barros, Maxime / Arvet, Christian / Pollet, Olivier / Leverd, François / Barnola, Sébastien et al. | 2020
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New approach for an industrial low-temperature roll-to-roll CI(G)Se hybrid sputter coevaporation deposition processWeinberger, Nikolaus / Stock, David / Kaufmann, Christian Alexander / Kodalle, Tim / Heinemann, Marc D. / Huber, Daniel / Harnisch, Martina / Zimmermann, Andreas / Strauss, Georg N. / Lackner, Roman et al. | 2020
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Modularity optimization for enhancing edge detection in microstructural features using 3D atomic chemical scale imagingMukherjee, Arpan / Broderick, Scott / Rajan, Krishna et al. | 2020
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Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammoniaApaydin, Ramazan O. / Onnink, Arnoud J. / Liu, Xingyu / Aarnink, Antonius A. I. / de Jong, Michel P. / Gravesteijn, Dirk J. / Kovalgin, Alexey Y. et al. | 2020
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Erratum: “History of atomic layer deposition and its relationship with the American Vacuum Society” [J. Vac. Sci. Technol. A 31, 050818 (2013)]Parsons, Gregory N. / Elam, Jeffrey W. / George, Steven M. / Haukka, Suvi / Jeon, Hyeongtag / Leskelä, Markku / Poodt, Paul / Ritala, Mikko / Rossnagel, Steven M. et al. | 2020
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Structure evolution and mechanical properties of hard tantalum diboride filmsŠroba, Viktor / Fiantok, Tomáš / Truchlý, Martin / Roch, Tomáš / Zahoran, Miroslav / Grančič, Branislav / Švec, Peter / Nagy, Štefan / Izai, Vitalii / Kúš, Peter et al. | 2020
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Epitaxial to axiotaxial texture evolution in endotaxial MnP films grown on GaP (100)Nateghi, Nima / Lambert-Milot, Samuel / Masut, Remo A. et al. | 2020
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Correlation between SiO2 growth rate and difference in electronegativity of metal–oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursorMaeda, Erika / Nabatame, Toshihide / Hirose, Masafumi / Inoue, Mari / Ohi, Akihiko / Ikeda, Naoki / Kiyono, Hajime et al. | 2020
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Atomic layer deposition of thermoelectric layered cobalt oxidesHagen, Dirk J. / Karppinen, Maarit et al. | 2020
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Properties of secondary particles for ion beam sputtering of silicon using low-energy oxygen ionsOh, Kyunghwan / Kalanov, Dmitry / Anders, André / Bundesmann, Carsten et al. | 2020
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Spatially controlled stem cell differentiation via morphogen gradients: A comparison of static and dynamic microfluidic platformsCui, Kiara W. / Engel, Leeya / Dundes, Carolyn E. / Nguyen, Tina C. / Loh, Kyle M. / Dunn, Alexander R. et al. | 2020
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Synthesis of AlOx thin films by atmospheric-pressure mist chemical vapor deposition for surface passivation and electrical insulator layersRajib, Arifuzzaman / Enamul, Karim Md / Kurosu, Shunji / Ukai, Tomofumi / Tokuda, Masahide / Fujii, Yasuhiko / Hanajiri, Tatsuro / Ishikawa, Ryo / Ueno, Keiji / Shirai, Hajime et al. | 2020
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Application of FEFF analyses to actinide 5f systemsTobin, J. G. / Sokaras, D. et al. | 2020
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Surface properties and interactions of transition metal oxide nanoparticles: A perspective on sustainabilityHedlund Orbeck, Jenny K. / Hamers, Robert J. et al. | 2020
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Uranium and arsenic unregulated water issues on Navajo landsIngram, Jani C. / Jones, Lindsey / Credo, Jonathan / Rock, Tommy et al. | 2020
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Inside the mysterious world of plasma: A process engineer’s perspectiveKanarik, Keren J. et al. | 2020
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Enhanced resistive switching characteristics of HfOx insulator fabricated by atomic layer deposition and La(NO3)3·6H2O solution as catalytic oxidantJung, Yong Chan / Park, In-Sung / Seong, Sejong / Lee, Taehoon / Kim, Seon Yong / Ahn, Jinho et al. | 2020
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Comparative study of two atomic layer etching processes for GaNMannequin, Cédric / Vallée, Christophe / Akimoto, Katsuhiro / Chevolleau, Thierry / Durand, Christophe / Dussarrat, Christian / Teramoto, Takashi / Gheeraert, Etienne / Mariette, Henri et al. | 2020
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Impact of thermodynamic fluctuations and pattern size on the nucleation behavior during area selective depositionYanguas-Gil, Angel et al. | 2020
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Guide to making XPS measurements on nanoparticlesBaer, Donald R. et al. | 2020
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Low temperature ALD growth optimization of ZnO, TiO2, and Al2O3 to be used as a buffer layer in perovskite solar cellsRajbhandari, Pravakar P. / Dhakal, Tara P. et al. | 2020
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Plasma deposition—Impact of ions in plasma enhanced chemical vapor deposition, plasma enhanced atomic layer deposition, and applications to area selective depositionVallée, Christophe / Bonvalot, Marceline / Belahcen, Samia / Yeghoyan, Taguhi / Jaffal, Moustapha / Vallat, Rémi / Chaker, Ahmad / Lefèvre, Gautier / David, Sylvain / Bsiesy, Ahmad et al. | 2020
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O·, H·, and ·OH radical etching probability of polystyrene obtained for a radio frequency driven atmospheric pressure plasma jetKondeti, V. S. Santosh K. / Zheng, Yashuang / Luan, Pingshan / Oehrlein, Gottlieb S. / Bruggeman, Peter J. et al. | 2020
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Impact of interface materials on side permeation in indirect encapsulation of organic electronicsSingh, Ankit Kumar / Chou, Wen-Fang / Jia, Xiaojia / Wang, Cheng-Yin / Fuentes-Hernandez, Canek / Kippelen, Bernard / Graham, Samuel et al. | 2020
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Contact potential induced carrier localization in nanometer-thin Cu/Ru, Cu/Co, and Cu/Mo superlatticesKim, Jiyoon Jessica / Wang, Gwo-Ching / Lu, Toh-Ming / Kuan, Tung-Sheng et al. | 2020
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Uncertainties in photoemission peak fitting accounting for the covariance with background parametersHerrera-Gomez, Alberto et al. | 2020
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Synthesis and integration of thin film solid state electrolytes for 3D Li-ion microbatteriesSheil, Ryan / Chang, Jane P. et al. | 2020
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Selective atomic layer etching of HfO2 over silicon by precursor and substrate-dependent selective depositionLin, Kang-Yi / Li, Chen / Engelmann, Sebastian / Bruce, Robert L. / Joseph, Eric A. / Metzler, Dominik / Oehrlein, Gottlieb S. et al. | 2020
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Atomic-layer etching of GaN by using an HBr neutral beamOhori, Daisuke / Sawada, Takahiro / Sugawara, Kenta / Okada, Masaya / Nakata, Ken / Inoue, Kazutaka / Sato, Daisuke / Kurihara, Hideyuki / Samukawa, Seiji et al. | 2020
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Electron beam injection from a hollow cathode plasma into a downstream reactive environment: Characterization of secondary plasma production and Si3N4 and Si etchingLi, Chen / Godyak, Valery / Hofmann, Thorsten / Edinger, Klaus / Oehrlein, Gottlieb S. et al. | 2020
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Gas-phase diagnostic studies of H2 and CH4 inductively coupled plasmasVan Surksum, Tara L. / Fisher, Ellen R. et al. | 2020
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Directionally resolved measurements of momentum transport in sputter plumes as a critical test for simulationsKlette, Mathis / Maas, Manuel / Trottenberg, Thomas / Kersten, Holger et al. | 2020
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Practical guide for x-ray photoelectron spectroscopy: Applications to the study of catalystsDavies, Philip R. / Morgan, David J. et al. | 2020
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Thermal induced depletion of cationic vacancies in NiO thin films evidenced by x-ray absorption spectroscopy at the O 1s thresholdGutiérrez, Alejandro / Domínguez-Cañizares, Guillermo / Krause, Stefan / Díaz-Fernández, Daniel / Soriano, Leonardo et al. | 2020
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Fundamentals, impedance, and performance of solid-state Li-metal microbatteriesCollins, John / de Souza, Joel P. / Lee, Yun Seog / Pacquette, Adele / Papalia, John M. / Bishop, Douglas M. / Todorov, Teodor / Krishnan, Mahadevaiyer / Joseph, Eric / Rozen, John et al. | 2020
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Epitaxial metals for interconnects beyond CuBarmak, Katayun / Ezzat, Sameer / Gusley, Ryan / Jog, Atharv / Kerdsongpanya, Sit / Khaniya, Asim / Milosevic, Erik / Richardson, William / Sentosun, Kadir / Zangiabadi, Amirali et al. | 2020
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New strategies for conformal, superconformal, and ultrasmooth films by low temperature chemical vapor depositionAbelson, John R. / Girolami, Gregory S. et al. | 2020
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Low temperature platinum chemical vapor deposition on functionalized self-assembled monolayersSalazar, Bryan G. / Liu, Hanwen / Walker, Amy V. / McElwee-White, Lisa et al. | 2020
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XPS analysis and electrical conduction mechanisms of atomic layer deposition grown Ta2O5 thin films onto p-Si substratesKorkos, Spyridon / Xanthopoulos, Nikolaos J. / Botzakaki, Martha A. / Drivas, Charalampos / Kennou, Styliani / Ladas, Spyridon / Travlos, Anastasios / Georga, Stavroula N. / Krontiras, Christoforos A. et al. | 2020
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Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer depositionHirayama, Masaki / Teramoto, Akinobu / Sugawa, Shigetoshi et al. | 2020
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Effect of terminal methyl group concentration on critical properties and plasma resistance of organosilicate low-k dielectricsRezvanov, Askar A. / Miakonkikh, Andrey V. / Seregin, Dmitry S. / Vishnevskiy, Alexey S. / Vorotilov, Konstantin A. / Rudenko, Konstantin V. / Baklanov, Mikhail R. et al. | 2020
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Achieving reproducible data: Examples from surface analysis in semiconductor technologyConard, Thierry / Vanleenhove, Anja / van der Heide, Paul et al. | 2020
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Vapor phase infiltration of aluminum oxide into benzocyclobutene-based polymer dielectrics to increase adhesion strength to thin film metal interconnectsDwarakanath, Shreya / Raj, Pulugurtha Markondeya / Kondekar, Neha / Losego, Mark D. / Tummala, Rao et al. | 2020
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Simultaneous realization of infrared-light switching and high visible-light transmittance in extremely thin VO2 films grown on ZnO-nanorods buffered glassesFukuzumi, Tatsuro / Chen, Fei / Okimura, Kunio / Yamaguchi, Iwao / Tsuchiya, Tetsuo et al. | 2020
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Bixbyite-Ta2N2O film prepared by HiPIMS and postdeposition annealing: Structure and propertiesČapek, J. / Batková, Š. / Matas, M. / Kos, Š. / Kozák, T. / Haviar, S. / Houška, J. / Schusser, J. / Minár, J. / Dvořák, F. et al. | 2020
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Ammonia assisted low temperature growth of In2O3 (111) epitaxial films on c-sapphire substrates by chemical vapor deposition techniqueYadav, Santosh Kumar / Das, Souvik / Prasad, Nivedita / Barick, Barun K. / Arora, Simran / Sutar, Dayanand S. / Dhar, Subhabrata et al. | 2020
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Atomic layer deposition of a uniform thin film on two-dimensional transition metal dichalcogenidesNam, Taewook / Seo, Seunggi / Kim, Hyungjun et al. | 2020
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Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer depositionKrylov, Igor / Qi, Yuanshen / Korchnoy, Valentina / Weinfeld, Kamira / Eizenberg, Moshe / Yalon, Eilam et al. | 2020
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Plasma polymerization of cyclopropylamine in a low-pressure cylindrical magnetron reactor: A PIC-MC study of the roles of ions and radicalsMathioudaki, Stella / Vandenabeele, Cédric R. / Tonneau, Romain / Pflug, Andreas / Tennyson, Jonathan / Lucas, Stéphane et al. | 2020
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Utilizing photosensitive polymers to evaluate UV radiation exposures in different plasma chamber configurationsBuzi, Luxherta / Miyazoe, Hiroyuki / Sagianis, Matthew. P. / Marchack, Nathan / Papalia, John M. / Engelmann, Sebastian. U. et al. | 2020
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Area-selective chemical vapor deposition of cobalt from dicobalt octacarbonyl: Enhancement of dielectric-dielectric selectivity by adding a coflow of NH3Zhang, Zhejun V. / Liu, Sumeng / Girolami, Gregory S. / Abelson, John R. et al. | 2020
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Chemical vapor deposition of metallic films using plasma electrons as reducing agentsNadhom, Hama / Lundin, Daniel / Rouf, Polla / Pedersen, Henrik et al. | 2020
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New development of nanoscale spectroscopy using scanning probe microscopeMinn, Khant / Birmingham, Blake / Zhang, Zhenrong et al. | 2020
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Misconceptions in interpretation of nitrogen chemistry from x-ray photoelectron spectraArtyushkova, Kateryna et al. | 2020
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Perspectives from research on metal-semiconductor contacts: Examples from Ga2O3, SiC, (nano)diamond, and SnSPorter, Lisa M. / Hajzus, Jenifer R. et al. | 2020
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MoS2-supported Au31 for CO hydrogenation: A first-principle studyJiang, Tao / Le, Duy / Rahman, Talat S. et al. | 2020
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XPS guide: Charge neutralization and binding energy referencing for insulating samplesBaer, Donald R. / Artyushkova, Kateryna / Cohen, Hagai / Easton, Christopher D. / Engelhard, Mark / Gengenbach, Thomas R. / Greczynski, Grzegorz / Mack, Paul / Morgan, David J. / Roberts, Adam et al. | 2020
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Epitaxial growth of high-k BaxSr1−xTiO3 thin films on SrTiO3 (001) substrates by atomic layer depositionLe, Thanh Tung / Ekerdt, John G. et al. | 2020
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Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devicesLo Nigro, Raffaella / Schilirò, Emanuela / Fiorenza, Patrick / Roccaforte, Fabrizio et al. | 2020
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Ablation of piezoelectric polyvinylidene fluoride with a 193 nm excimer laserElloian, Jeffrey / Sherman, Jeffrey / Costa, Tiago / Shi, Chen / Shepard, Kenneth et al. | 2020
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Effect of undercoordinated Ag(111) defect sites on the adsorption of ethanolSchlosser, Daniel A. / Yehorova, Dariia / Kaleem, Hasan / Maxwell, Eric M. / Baker, Jordon S. / Gillum, Maxwell Z. / DePonte, Maria C. / Letchworth-Weaver, Kendra / Baber, Ashleigh E. et al. | 2020
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Improved epitaxial growth of TbAs film on III–V semiconductorsWang, Yuejing / Bork, James / Law, Stephanie / Zide, Joshua M. O. et al. | 2020
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Tutorial on forming through-silicon viasBurkett, Susan L. / Jordan, Matthew B. / Schmitt, Rebecca P. / Menk, Lyle A. / Hollowell, Andrew E. et al. | 2020
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