Low substrate temperature deposition of crystalline SiC using HWCVD (English)
- New search for: Klein, Stefan
- New search for: Carius, Reinhard
- New search for: Finger, Friedhelm
- New search for: Houben, Lothar
- New search for: Klein, Stefan
- New search for: Carius, Reinhard
- New search for: Finger, Friedhelm
- New search for: Houben, Lothar
In:
Thin Solid Films
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501
, 1-2
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169-172
;
2005
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ISSN:
- Article (Journal) / Electronic Resource
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Title:Low substrate temperature deposition of crystalline SiC using HWCVD
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Contributors:Klein, Stefan ( author ) / Carius, Reinhard ( author ) / Finger, Friedhelm ( author ) / Houben, Lothar ( author )
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Published in:Thin Solid Films ; 501, 1-2 ; 169-172
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Publisher:
- New search for: Elsevier B.V.
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Publication date:2005-01-01
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Size:4 pages
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ISSN:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:English
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Keywords:
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Source:
Table of contents – Volume 501, Issue 1-2
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1
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Third International Conference on Hot-Wire CVD (Cat-CVD) ProcessBourée, Jean-Eric / Mahan, A. Harv et al. | 2005
- 3
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An update on silicon deposition performed by hot wire CVDMahan, A.H. et al. | 2005
- 8
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Carbon nanostructures by Hot Filament Chemical Vapor Deposition: Growth, properties, applicationsBonard, Jean-Marc et al. | 2005
- 15
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Expectation for Cat-CVD in ULSI technology and business trendAkasaka, Yoichi et al. | 2005
- 21
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Hot wire radicals and reactionsZheng, Wengang / Gallagher, Alan et al. | 2005
- 26
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Elementary processes in silicon hot wire CVDNakamura, Seigo / Koshi, Mitsuo et al. | 2005
- 31
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H2 dilution effect in the Cat-CVD processes of the SiH4/NH3 systemAnsari, S.G. / Umemoto, Hironobu / Morimoto, Takashi / Yoneyama, Koji / Izumi, Akira / Masuda, Atsushi / Matsumura, Hideki et al. | 2005
- 35
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The mechanism of alumina formation from TMA and molecular oxygen using catalytic-CVD with an iridium catalyzerOgita, Yoh-Ichiro / Tomita, Toshiyuki et al. | 2005
- 39
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The mechanism of alumina formation from TMA and molecular oxygen using Catalytic-CVD with a tungsten catalyzerOgita, Yoh-Ichiro / Tomita, Toshiyuki et al. | 2005
- 43
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Improved deposition rates for μc-Si:H at low substrate temperatureKlein, Stefan / Finger, Friedhelm / Carius, Reinhard / Lossen, Jan et al. | 2005
- 47
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Beneficial effects of sputtered ZnO:Al protection layer on SnO2:F for high-deposition rate hot-wire CVD p–i–n solar cellsFranken, R.H. / van der Werf, C.H.M. / Löffler, J. / Rath, J.K. / Schropp, R.E.I. et al. | 2005
- 51
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Silicon nitride at high deposition rate by Hot Wire Chemical Vapor Deposition as passivating and antireflection layer on multicrystalline silicon solar cellsvan der Werf, C.H.M. / Goldbach, H.D. / Löffler, J. / Scarfó, A. / Kylner, A.M.C. / Stannowski, B. / ArnoldBik, W.M. / Weeber, A. / Rieffe, H. / Soppe, W.J. et al. | 2005
- 55
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High-rate deposition of SiNx films over 100 nm/min by Cat-CVD method at low temperatures below 80 °COsono, Tetsuo / Heya, Akira / Niki, Toshikazu / Takano, Masahiro / Minamikawa, Toshiharu / Muroi, Susumu / Masuda, Atsushi / Umemoto, Hironobu / Matsumura, Hideki et al. | 2005
- 58
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Present status and future feasibility for industrial implementation of Cat-CVD (Hot-Wire CVD) technologyMatsumura, Hideki / Masuda, Atsushi / Umemoto, Hironobu et al. | 2005
- 61
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Development of catalytic chemical vapor deposition apparatus for large size substratesOsono, S. / Kitazoe, M. / Tsuboi, H. / Asari, S. / Saito, K. et al. | 2005
- 65
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sp3's experience using hot filament CVD reactors to grow diamond for an expanding set of applicationsHerlinger, James et al. | 2005
- 70
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Real-time study of HWCVD a-Si:H film growth using optical second harmonic generation spectroscopyAarts, I.M.P. / Gielis, J.J.H. / Grauls, P.M.J. / Leewis, C.M. / van de Sanden, M.C.M. / Kessels, W.M.M. et al. | 2005
- 75
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Investigations of intrinsic strain and structural ordering in a-Si:H using synchrotron radiation diffractionHärting, M. / Britton, D.T. / Minani, E. / Ntsoane, T.P. / Topic, M. / Thovhogi, T. / Osiele, O.M. / Knoesen, D. / Harindintwari, S. / Furlan, F. et al. | 2005
- 79
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Microstructural defect characterisation of a-Si:H deposited by low temperature HW-CVD on paper substratesBritton, D.T. / Härting, M. / Knoesen, D. / Sigcau, Z. / Nemalili, F.P. / Ntsoane, T.P. / Sperr, P. / Egger, W. / Nippus, M. et al. | 2005
- 84
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Microstructure, optical characterization and light induced degradation in a-Si:H deposited at different temperaturesMinani, E. / Sigcau, Z. / Adgebite, O. / Ramukosi, F.L. / Ntsoane, T.P. / Harindintwari, S. / Knoesen, D. / Comrie, C.M. / Britton, D.T. / Härting, M. et al. | 2005
- 88
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Substrate temperature dependence of the roughness evolution of HWCVD a-Si:H studied by real-time spectroscopic ellipsometryKessels, W.M.M. / Hoefnagels, J.P.M. / Langereis, E. / van de Sanden, M.C.M. et al. | 2005
- 92
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Thermal stability of hot-wire deposited amorphous siliconArendse, C.J. / Knoesen, D. / Britton, D.T. et al. | 2005
- 95
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Hot wire-CVD deposited a-SiOx and its characterizationMatsumoto, Yasuhiro et al. | 2005
- 98
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Crystallization of HWCVD amorphous silicon thin films at elevated temperaturesMuller, Theo F.G. / Knoesen, Dirk / Arendse, Chris / Swanepoel, Ryno / Halindintwali, Sylvain / Theron, Chris et al. | 2005
- 102
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Structure of amorphous and microcrystalline silicon thin films prepared at various gas pressures and gas flow rates by hot-wire chemical vapor depositionDaimaru, T. / Tabata, A. / Mizutani, T. et al. | 2005
- 107
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Characterization of grain growth, nature and role of grain boundaries in microcrystalline silicon—review of typical featuresKočka, J. / Mates, T. / Stuchlíková, H. / Stuchlík, J. / Fejfar, A. et al. | 2005
- 113
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Nano-structure in micro-crystalline silicon thin films studied by small-angle X-ray scatteringZhou, Bingqing / Liu, Fengzhen / Gu, Jinhua / Zhang, Qunfang / Zhou, Yuqin / Zhu, Meifang et al. | 2005
- 117
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Internal stress in Cat-CVD microcrystalline Si:H thin filmsSahu, Laxmi / Kale, Nitin / Kulkarni, Nilesh / Pinto, R. / Dusane, R.O. / Schröder, B. et al. | 2005
- 121
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Sub-bandgap optical absorption spectroscopy of hydrogenated microcrystalline silicon thin films prepared using hot-wire CVD (Cat-CVD) processGoktas, O. / Isik, N. / Okur, S. / Gunes, M. / Carius, R. / Klomfass, J. / Finger, F. et al. | 2005
- 125
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Optical and electronic properties of HWCVD and PECVD silicon films irradiated using excimer and Nd:Yag lasersShaikh, M.Z. / O'Neill, K.A. / Anthony, S. / Persheyev, S.K. / Rose, M.J. et al. | 2005
- 129
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Study of metastabilities in microcrystalline silicon films by photoconductivity techniquesSouffi, N. / Bauer, G.H. / Brüggemann, R. et al. | 2005
- 133
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Transport in microcrystalline silicon thin films deposited at low temperature by hot-wire chemical vapor depositionBourée, Jean-Eric / Jadkar, Sandesh R. / Kasouit, Samir / Vanderhaghen, Régis et al. | 2005
- 137
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Diffusion length measurements of microcrystalline silicon thin films prepared by hot-wire/catalytic chemical vapor deposition (HWCVD)Okur, S. / Güneş, M. / Finger, F. / Carius, R. et al. | 2005
- 141
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Properties of n-type μc-Si:H films by Cat-CVD for c-Si heterojunction solar cellsZhang, Q. / Zhu, M. / Liu, F. / Liu, J. et al. | 2005
- 144
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Hydrogenation of polycrystalline silicon thin filmsHonda, S. / Mates, T. / Knížek, K. / Ledinský, M. / Fejfar, A. / Kočka, J. / Yamazaki, T. / Uraoka, Y. / Fuyuki, T. et al. | 2005
- 149
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Various applications of silicon nitride by catalytic chemical vapor deposition for coating, passivation and insulating filmsMasuda, Atsushi / Umemoto, Hironobu / Matsumura, Hideki et al. | 2005
- 154
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Formation of highly moisture-resistive SiNx films on Si substrate by Cat-CVD at room temperatureMinamikawa, Toshiharu / Heya, Akira / Niki, Toshikazu / Takano, Masahiro / Yonezawa, Yasuto / Muroi, Susumu / Minami, Shigehira / Masuda, Atsushi / Umemoto, Hironobu / Matsumura, Hideki et al. | 2005
- 157
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Ultra thin silicon nitride prepared by direct nitridation using ammonia decomposed speciesIzumi, Akira et al. | 2005
- 160
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A layer-by-layer Cat-CVD of conformal and stoichiometric silicon nitride with in-situ H2 post-treatmentKitazoe, Makiko / Osono, Shuuji / Itoh, Hiromi / Asari, Shin / Saito, Kazuya / Hayama, Masahiro et al. | 2005
- 164
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The formation of hetero-junction using carbon alloys by hot-wire CVD methodNonomura, Shuichi / Yoshida, Norimitsu / Itoh, Takashi et al. | 2005
- 169
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Low substrate temperature deposition of crystalline SiC using HWCVDKlein, Stefan / Carius, Reinhard / Finger, Friedhelm / Houben, Lothar et al. | 2005
- 173
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Effect of H2 dilution on Cat-CVD a-SiC:H filmsSwain, Bibhu P. / Gundu Rao, T.K. / Roy, Mainak / Gupta, Jagannath / Dusane, R.O. et al. | 2005
- 177
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Properties of hydrogenated amorphous silicon carbide films prepared at various hydrogen gas flow rates by hot-wire chemical vapor depositionMori, M. / Tabata, A. / Mizutani, T. et al. | 2005
- 181
-
A comparative study on SiC thin films grown on both uncatalyzed and Ni catalyzed Si(100) substrates by thermal MOCVD using single molecular precursorsKang, B.-C. / Moon, O.-M. / Boo, J.-H. et al. | 2005
- 186
-
Aluminum-doped hydrogenated microcrystalline cubic silicon carbide films deposited by hot wire CVDMiyajima, Shinsuke / Yamada, Akira / Konagai, Makoto et al. | 2005
- 190
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Low-temperature growth of Si-based organic–inorganic hybrid materials, Si–O–C and Si–N–C, by organic Cat-CVDNakayama, Hiroshi / Hata, Tsuyoshi et al. | 2005
- 195
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Deposition of SiCN films using organic liquid materials by HWCVD methodIzumi, Akira / Oda, Koshi et al. | 2005
- 198
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Deposition of photosensitive hydrogenated amorphous silicon–germanium films with a tantalum hot wireXu, Yueqin / Mahan, A.H. / Gedvilas, Lynn M. / Reedy, Robert C. / Branz, Howard M. et al. | 2005
- 202
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Deposition and characterization of μc-Ge1−xCx thin films grown by hot-wire chemical vapor deposition using organo-germaneYashiki, Yasutoshi / Miyajima, Shinsuke / Yamada, Akira / Konagai, Makoto et al. | 2005
- 206
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The bias-assisted HF CVD nucleation of diamond: Investigations on the substrate temperature and the filaments locationLarijani, M.M. / Navinrooz, A. / Le Normand, F. et al. | 2005
- 211
-
Polymeric nanocoatings by hot-wire chemical vapor deposition (HWCVD)Lau, Kenneth K.S. / Mao, Yu / Pryce Lewis, Hilton G. / Murthy, Shashi K. / Olsen, Brad D. / Loo, Leslie S. / Gleason, Karen K. et al. | 2005
- 216
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Hot-wire chemical vapor synthesis for a variety of nano-materials with novel applicationsDillon, A.C. / Mahan, A.H. / Deshpande, R. / Alleman, J.L. / Blackburn, J.L. / Parillia, P.A. / Heben, M.J. / Engtrakul, C. / Gilbert, K.E.H. / Jones, K.M. et al. | 2005
- 221
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Oriented growth of suspended single wall carbon nanotube by Hot Filament CVDIaia, A. / Marty, L. / Naud, C. / Bouchiat, V. / Loiseau, A. / Di Muoio, E. / Fournier, T. / Bonnot, A.M. et al. | 2006
- 224
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Hydrogen adsorption in single-walled and multi-walled carbon nanotubes grown in a hot-wire CVD (Cat-CVD) reactorDeshpande, R. / Dillon, A.C. / Mahan, A.H. / Alleman, J. / Mitra, S. et al. | 2005
- 227
-
Synthesis of multi-walled carbon nanotubes by combining hot-wire and dc plasma-enhanced chemical vapor depositionSorin Cojocaru, Costel / Kim, Dohyung / Pribat, Didier / Bourée, Jean-Eric et al. | 2005
- 233
-
Catalyst-assisted hot filament chemical vapor deposition and characterization of carbon nanostructuresPark, Kyung Ho / Yim, Jong Hyuk / Lee, Soonil / Koh, Ken Ha et al. | 2006
- 238
-
Characteristics of carbonaceous materials with nanotubes grown by hot-filament plasma-enhanced chemical vapor deposition methodJung, Kyung Ho / Shin, Yong-Seob / Boo, Jin-Hyo / Kim, Youn-Jae / Hong, Byungyou et al. | 2005
- 243
-
Key issues for fabrication of high quality amorphous and microcrystalline silicon solar cellsKondo, M. / Matsui, T. / Nasuno, Y. / Sonobe, H. / Shimizu, S. et al. | 2005
- 247
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Progress in single junction microcrystalline silicon solar cells deposited by Hot-Wire CVDFonrodona, M. / Soler, D. / Villar, F. / Escarré, J. / Asensi, J.M. / Bertomeu, J. / Andreu, J. et al. | 2005
- 252
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Instability phenomena in μc-Si:H solar cells prepared by hot-wire CVDSendova-Vassileva, M. / Klein, S. / Finger, F. et al. | 2005
- 256
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Tandem and triple junction silicon thin film solar cells with intrinsic layers prepared by hot-wire CVDStolk, R.L. / Li, H. / van der Werf, C.H.M. / Schropp, R.E.I. et al. | 2005
- 260
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Microcrystalline B-doped window layers prepared near amorphous to microcrystalline transition by HWCVD and its application in amorphous silicon solar cellsKumar, P. / Kupich, M. / Grunsky, D. / Schroeder, B. et al. | 2005
- 264
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Relation between pin a-Si:H solar-cell performances and intrinsic-layer properties prepared by Cat-CVDKitamura, T. / Honda, K. / Nishimura, M. / Sugita, K. / Takemoto, K. / Yamaguchi, Y. / Toyama, Y. / Yamamoto, T. / Miyazaki, S. / Eguchi, M. et al. | 2005
- 268
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Preparation of microcrystalline silicon nip solar cells and amorphous–microcrystalline nipnip tandem solar cells entirely by hot-wire CVDKupich, Markus / Grunsky, Dmitry / Kumar, Prabhat / Schröder, Bernd et al. | 2005
- 272
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Differences in the structure composition of microcrystalline silicon solar cells deposited by HWCVD and PECVD: Influence on open circuit voltageMai, Y. / Klein, S. / Geng, X. / Hülsbeck, M. / Carius, R. / Finger, F. et al. | 2005
- 276
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Thin film micro- and polycrystalline silicon nip cells on stainless steel made by hot-wire chemical vapour depositionLi, H. / Stolk, R.L. / van der Werf, C.H.M. / Rusche, M.Y.S. / Rath, J.K. / Schropp, R.E.I. et al. | 2005
- 280
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Optimisation of superstrate solar cells entirely prepared by HWCVD at low substrate temperatureGrunsky, D. / Kupich, M. / Schröder, B. et al. | 2005
- 284
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Effect of emitter deposition temperature on surface passivation in hot-wire chemical vapor deposited silicon heterojunction solar cellsWang, T.H. / Iwaniczko, E. / Page, M.R. / Levi, D.H. / Yan, Y. / Branz, H.M. / Wang, Q. et al. | 2005
- 288
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Microsecond minority carrier lifetimes in HWCVD-grown films and implications for thin film solar cellsMason, M.S. / Richardson, C.E. / Atwater, H.A. / Ahrenkiel, R.K. et al. | 2005
- 291
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A combined experimental and computer simulation study of HWCVD nip microcrystalline silicon solar cellsStrengers, J.J.H. / Rubinelli, F.A. / Rath, J.K. / Schropp, R.E.I. et al. | 2005
- 295
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One-dimensional simulation study of microcrystalline silicon thin films for solar cell and thin film transistor applications using AMPS-1DTripathi, S. / Venkataramani, N. / Dusane, R.O. / Schroeder, B. et al. | 2005
- 299
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Self-assembled single wall carbon nanotube field effect transistors and AFM tips prepared by hot filament assisted CVDMarty, L. / Iaia, A. / Faucher, M. / Bouchiat, V. / Naud, C. / Chaumont, M. / Fournier, T. / Bonnot, A.M. et al. | 2005
- 303
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Low temperature amorphous and nanocrystalline silicon thin film transistors deposited by Hot-Wire CVD on glass substrateFonrodona, M. / Soler, D. / Escarré, J. / Villar, F. / Bertomeu, J. / Andreu, J. / Saboundji, A. / Coulon, N. / Mohammed-Brahim, T. et al. | 2005
- 307
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Preparation of SiNx gate-insulating films for bottom-gate type TFTs by Cat-CVD methodSeri, Yasuhiro / Masuda, Atsushi / Matsumura, Hideki et al. | 2005
- 310
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Laser annealed HWCVD and PECVD thin silicon films. Electron field emissionO'Neill, K.A. / Shaikh, M.Z. / Lyttle, G. / Anthony, S. / Fan, Y.C. / Persheyev, S.K. / Rose, M.J. et al. | 2005
- 314
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Preparation and electron field emission of carbon nanowall by Cat-CVDItoh, Takashi / Shimabukuro, Seiji / Kawamura, Shigeo / Nonomura, Shuichi et al. | 2005
- 318
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Potential of Cat-CVD deposited a-SiC:H as diffusion barrier layer on low-k HSQ films for ULSISingh, Sunil Kumar / Kumbhar, Alka A. / Kothari, Mayur / Dusane, R.O. et al. | 2005
- 322
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Investigation of the tantalum catalyst during the hot wire chemical vapor deposition of thin silicon filmsGrunsky, D. / Kupich, M. / Hofferberth, B. / Schroeder, B. et al. | 2005
- 326
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Systematic study on photoresist removal using hydrogen atoms generated on heated catalyzerHashimoto, Kouhei / Masuda, Atsushi / Matsumura, Hideki / Ishibashi, Tomoatsu / Takao, Kazuhisa et al. | 2005
- 329
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Enhancement of moisture resistance of spin-on low-k HSQ films by hot wire generated atomic hydrogen treatmentKumbhar, Alka A. / Singh, Sunil Kumar / Dusane, R.O. et al. | 2005
- 332
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Hot-wire CVD-grown epitaxial Si films on Si (100) substrates and a model of epitaxial breakdownRichardson, Christine E. / Mason, M.S. / Atwater, Harry A. et al. | 2005
- 335
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Epitaxial thickening by hot wire chemical vapor deposition of polycrystalline silicon seed layers on glassStradal, J. / Scholma, G. / Li, H. / van der Werf, C.H.M. / Rath, J.K. / Widenborg, P.I. / Campbell, P. / Aberle, A.G. / Schropp, R.E.I. et al. | 2005
- 338
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μc-Si:H n-type doped layers resistant against HWCVD i-layers deposited at high temperature and high growth rateGordijn, Aad / Francke, Jeroen / Rath, Jatindra K. / Schropp, Ruud E.I. et al. | 2005
- 341
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Characterization of polyconjugated thin films synthesized by hot-wire chemical vapor deposition of anilineZaharias, Gillian A. / Shi, Helen H. / Bent, Stacey F. et al. | 2005
- 346
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Improvement of indium–tin oxide films on polyethylene terephthalate substrates using hot-wire surface treatmentWuu, Dong-Sing / Lien, Shui-Yang / Mao, Hsin-Yuan / Wang, Jui-Hao / Wu, Bing-Rui / Yao, Pin-Chuan / Hsieh, In-Cha / Peng, Hsin-Han / Horng, Ray-Hua / Chuang, Yuan-Chou et al. | 2005
- 350
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Photonic amorphous silicon device technologyFortmann, C.M. / Mawyin, J. / Tonucci, R.J. / Mahan, A.H. et al. | 2005
- 354
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Simulation of SiH4 adsorption on H/Si(100) surfacesAnan'yina, Ol'ga / Yanovs'ky, Olexandr et al. | 2005
- 358
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Investigation of structural properties of poly-Si thin films obtained by aluminium induced crystallization in different atmospheresDimova-Malinovska, D. / Grigorov, V. / Nikolaeva-Dimitrova, M. / Angelov, O. / Peev, N. et al. | 2005
- 362
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Structural changes in amorphous carbon nitride films due to bias voltageChampi, A. / Marques, F.C. et al. | 2005
- 366
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Pulsed laser deposition of zinc oxideVillanueva, Yolanda Y. / Liu, Da-Ren / Cheng, Pei Tzu et al. | 2005
- 370
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Author Index of Volume 501 Issues 1–2| 2006
- 372
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Subject Index of Volume 501 Issues 1–2| 2006
- iii
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Editorial Board| 2006
- ix
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List of Committees/Sponsors| 2006