Ion beam synthesis of Te and Bi nanoclusters in silicon: The effect of post-implantation high frequency electromagnetic field (English)
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In:
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
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242
, 1-2
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209-213
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2005
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ISSN:
- Article (Journal) / Electronic Resource
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Title:Ion beam synthesis of Te and Bi nanoclusters in silicon: The effect of post-implantation high frequency electromagnetic field
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Contributors:Kalitzova, M. ( author ) / Peeva, A. ( author ) / Ignatova, V. ( author ) / Lebedev, O.I. ( author ) / Zollo, G. ( author ) / Vitali, G. ( author )
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Published in:
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Publisher:
- New search for: Elsevier B.V.
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Publication date:2005-01-01
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Size:5 pages
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ISSN:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:English
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Keywords:
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Source:
Table of contents – Volume 242, Issue 1-2
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1
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Bioactivity of plasma implanted biomaterialsChu, Paul K. et al. | 2005
- 8
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Ion bombardment induced formation of micro-craters in plant cell envelopesSangyuenyongpipat, S. / Yu, L.D. / Vilaithong, T. / Brown, I.G. et al. | 2005
- 12
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In vitro platelet adhesion and activation of polyethylene terephthalate modified by acetylene plasma immersion ion implantation and depositionWang, J. / Chen, J.Y. / Yang, P. / Leng, Y.X. / Wan, G.J. / Sun, H. / Zhao, A.S. / Huang, N. / Chu, P.K. et al. | 2005
- 15
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Bloodcompatibility improvement of titanium oxide film modified by phosphorus ion implantationYang, P. / Leng, Y.X. / Zhao, A.S. / Zhou, H.F. / Xu, L.X. / Hong, S. / Huang, N. et al. | 2005
- 18
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Surface modification of coronary artery stent by Ti–O/Ti–N complex film coating prepared with plasma immersion ion implantation and depositionHuang, N. / Leng, Y.X. / Yang, P. / Chen, J.Y. / Sun, H. / Wang, J. / Wan, G.J. / Zhao, A.S. / Ding, P.D. et al. | 2005
- 22
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Wettability and biocompatibility of nitrogen-doped hydrogenated amorphous carbon films: Effect of nitrogenYang, P. / Huang, N. / Leng, Y.X. / Yao, Z.Q. / Zhou, H.F. / Maitz, M. / Leng, Y. / Chu, P.K. et al. | 2005
- 26
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Effect of tantalum content of titanium oxide film fabricated by magnetron sputtering on the behavior of cultured human umbilical vein endothelial cells (HUVEC)Chen, J.Y. / Leng, Y.X. / Zhang, X. / Yang, P. / Sun, H. / Wang, J. / Wan, G.J. / Zhao, A.S. / Huang, N. / Chu, P.K. et al. | 2005
- 30
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The biocompatibility of the tantalum and tantalum oxide films synthesized by pulse metal vacuum arc source depositionLeng, Y.X. / Chen, J.Y. / Yang, P. / Sun, H. / Wang, J. / Huang, N. et al. | 2005
- 33
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Studies of the composition, tribology and wetting behavior of silicon nitride films formed by pulsed reactive closed-field unbalanced magnetron sputteringYao, Zh.Q. / Yang, P. / Huang, N. / Wang, J. / Wen, F. / Leng, Y.X. et al. | 2005
- 37
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Evaluation of collagen immobilized to silicon plates by ion beamYokoyama, Y. / Kobayashi, T. / Iwaki, M. et al. | 2005
- 41
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Effect of low energy ion beam irradiation on wettability of narra (Pterocarpus indicus) wood chipsRamos, Henry J. / Monasterial, Jonathan Lee C. / Blantocas, Gene Q. et al. | 2005
- 45
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Formation of silver incorporated calcium phosphate film for medical applicationsLee, In-Seop / Whang, Chung-Nam / Oh, Kyung-Sik / Park, Jong-Chul / Lee, Kwon-Yong / Lee, Gun-Hwan / Chung, Sung-Min / Sun, Xiao-Dan et al. | 2005
- 48
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Cell adhesion to nitrogen-doped DLCS fabricated by plasma-based ion implantation and deposition methodYokota, T. / Terai, T. / Kobayashi, T. / Iwaki, M. et al. | 2005
- 51
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Analysis of cell-adhesion surface induced by ion-beam irradiation into biodegradable polymerYotoriyama, Tasuku / Nakao, Aiko / Suzuki, Yoshiaki / Tsukamoto, Takeyo / Iwaki, Masaya et al. | 2005
- 55
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A study on the electronic stopping of protons in soft biological matterEmfietzoglou, D. / Pathak, A. / Papamichael, G. / Kostarelos, K. / Dhamodaran, S. / Sathish, N. / Moscovitch, M. et al. | 2005
- 61
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Biocompatibility of modified ePTFE for an artificial dura materTakahashi, N. / Suzuki, Y. / Ujiie, H. / Hori, T. / Iwaki, M. / Yamada, T. et al. | 2005
- 65
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Production and accumulation of a mA-DC bismuth ion beamSchlegel, Christian / Ratschko, Dirk / Scholz, Frank / Gläser, Michael et al. | 2005
- 68
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Statistics of primary damage creation in high-energy displacement cascades in copper and zirconiumVoskoboinikov, R.E. / Osetsky, Yu.N. / Bacon, D.J. et al. | 2005
- 71
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The ORNL multicharged ion research facility upgrade projectMeyer, F.W. / Bannister, M.E. / Dowling, D. / Hale, J.W. / Havener, C.C. / Johnson, J.W. / Juras, R.C. / Krause, H.F. / Mendez, A.J. / Sinclair, J. et al. | 2005
- 79
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High-energy ion tracks in thin filmsFollstaedt, David M. / Norman, Adam K. / Rossi, Paolo / Doyle, Barney L. / McDaniel, Floyd D. / Bringa, Eduardo M. et al. | 2005
- 82
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Electronic stopping powers for Be, Ca and Ti in SiCZhang, Y. / Weber, W.J. / Razpet, A. / Possnert, G. et al. | 2005
- 85
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Swift heavy ion irradiation of amorphous siliconHedler, A. / Klaumünzer, S. / Wesch, W. et al. | 2005
- 88
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Indentation method to measure the residual stress induced by ion implantationWang, Q. / Ozaki, K. / Ishikawa, H. / Nakano, S. / Ogiso, H. et al. | 2005
- 93
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Advanced nanopattern formation by a subtractive self-organization process with focused ion beamsLugstein, A. / Basner, B. / Brezna, W. / Weil, M. / Golka, S. / Bertagnolli, E. et al. | 2005
- 96
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Formation of zinc-oxide nanoparticles in SiO2 by ion implantation combined with thermal oxidationAmekura, H. / Kono, K. / Kishimoto, N. / Buchal, Ch. et al. | 2005
- 100
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Production of liquid cluster ions and their application to surface etchingTakaoka, G.H. / Noguchi, H. / Hironaka, Y. et al. | 2005
- 104
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Optical properties tailoring by high fluence implantation of Ag ions on sapphireMarques, C. / da Silva, R.C. / Wemans, A. / Maneira, M.J.P. / Kozanecki, A. / Alves, E. et al. | 2005
- 109
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Photoluminescence behavior of silicon nanocrystals produced by hot implantation in SiO2Sias, U.S. / Amaral, L. / Behar, M. / Boudinov, H. / Moreira, E.C. et al. | 2005
- 114
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Magnetic nano-particles of Ni in MgO single crystals by ion implantationZhu, S. / Xiang, X. / Zu, X.T. / Wang, L.M. et al. | 2005
- 118
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Ion-induced optical response of nanocomposites in sapphirePlaksin, O.A. / Takeda, Y. / Kono, K. / Umeda, N. / Amekura, H. / Kishimoto, N. et al. | 2005
- 121
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Preferential amorphisation of Ge nanocrystals in a silica matrixRidgway, M.C. / Azevedo, G. de M. / Elliman, R.G. / Wesch, W. / Glover, C.J. / Miller, R. / Llewellyn, D.J. / Foran, G.J. / Hansen, J.L. / Larsen, A. Nylandsted et al. | 2005
- 125
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Formation of mono-layered gold nanoparticles in shallow depth of SiO2 thin film by low-energy negative-ion implantationTsuji, H. / Arai, N. / Ueno, K. / Matsumoto, T. / Gotoh, N. / Adachi, K. / Kotaki, H. / Gotoh, Y. / Ishikawa, J. et al. | 2005
- 129
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Photocatalytic properties of sol–gel titania film under fluorescent-light irradiation improved by silver negative-ion implantationTsuji, Hiroshi / Sakai, Noriaki / Gotoh, Yasuhito / Ishikawa, Junzo et al. | 2005
- 133
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Diffusion limited Cu and Au nanocrystal formation in thin film SiO2Johannessen, B. / Kluth, P. / Glover, C.J. / Foran, G.J. / Ridgway, M.C. et al. | 2005
- 137
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Effect of Fe and Ar implantation on the resistivity of Cr filmsHeck, C. / Chayahara, A. / Horino, Y. / Funahashi, R. / Miranda, R.M.N. / Baibich, M.N. et al. | 2005
- 140
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ITO surface smoothing with argon cluster ion beamHeck, C. / Seki, T. / Oosawa, T. / Chikamatsu, M. / Tanigaki, N. / Hiraga, T. / Matsuo, J. et al. | 2005
- 143
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Current research topics and applications of gas cluster ion beam processesYamada, Isao / Toyoda, Noriaki et al. | 2005
- 146
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Ion irradiation through SiO2/Si interfaces: Non-conventional fabrication of Si nanocrystals for memory applicationsSchmidt, B. / Heinig, K.-H. / Röntzsch, L. / Müller, T. / Stegemann, K.-H. / Votintseva, E. et al. | 2005
- 149
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Experimental evidence of Si nanocluster δ-layer formation in the vicinity of ion-irradiated SiO2–Si interfacesRöntzsch, Lars / Heinig, Karl-Heinz / Schmidt, Bernd / Mücklich, Arndt et al. | 2005
- 152
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TEM characterization of Au nano-particles in TiO2 single crystals by ion implantationZhu, S. / Sun, K. / Wang, L.M. / Ewing, R.C. / Fromknecht, R. et al. | 2005
- 157
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Correlation between structural evolution and photoluminescence of Sn nanoclusters in SiO2 layersLopes, J.M.J. / Kremer, F. / Fichtner, P.F.P. / Zawislak, F.C. et al. | 2005
- 161
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Size dependent epitaxial cluster deposition: The effect of deposition energyMeinander, K. / Nordlund, K. / Keinonen, J. et al. | 2005
- 164
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Ion irradiation of porous silicon: The role of surface statesJacobsohn, L.G. / Bennett, B.L. / Cooke, D.W. / Muenchausen, R.E. / Nastasi, M. et al. | 2005
- 167
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Shape modifications of self-organised colloidal silica nanomasks on siliconLindner, J.K.N. / Gehl, B. / Stritzker, B. et al. | 2005
- 170
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Structural investigation of CdSSe-nanocrystals synthesized by ion-beam-implantationHuber, P. / Karl, H. / Lindner, J.K.N. / Stritzker, B. et al. | 2005
- 173
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Ion-implantation and characterization of 32P-radioactive platinum coils for endovascular treatment of intracranial aneurysmsLeblanc, Philippe / Raymond, Jean / Roorda, Sjoerd et al. | 2005
- 179
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Cluster size dependence of sputtering yield by cluster ion beam irradiationSeki, T. / Murase, T. / Matsuo, J. et al. | 2005
- 182
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Erbium-implanted silica microsphere laserKalkman, J. / Polman, A. / Kippenberg, T.J. / Vahala, K.J. / Brongersma, Mark. L. et al. | 2005
- 186
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Electronic excitation effects on nanoparticle formation in insulators under heavy-ion implantationKishimoto, N. / Plaksin, O.A. / Masuo, K. / Okubo, N. / Umeda, N. / Takeda, Y. et al. | 2005
- 190
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Relaxation of craters produced by ion bombardment on PMMA as a function of temperaturePapaléo, R.M. / Hasenkamp, W. / Barbosa, L.G. / Leal, R. et al. | 2005
- 194
-
Optical switching performance of metal nanoparticles fabricated by negative ion implantationTakeda, Y. / Plaksin, O.A. / Lu, J. / Kishimoto, N. et al. | 2005
- 198
-
Synthesis of room-temperature ferromagnetic Cr-doped TiO2(110) rutile single crystals using ion implantationShutthanandan, V. / Thevuthasan, S. / Droubay, T. / Heald, S.M. / Engelhard, M.H. / McCready, D.E. / Chambers, S.A. / Nachimuthu, P. / Mun, B.S. et al. | 2005
- 201
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Nanoscale BixTe3/Sb2Te3 multilayer thin film materials for reduced thermal conductivityXiao, Z. / Zimmerman, R.L. / Holland, L.R. / Zheng, B. / Muntele, C.I. / Ila, D. et al. | 2005
- 205
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Ion beam analysis of VLS grown Ge nanostructures on SiTaraci, J.L. / Clement, T. / Dailey, J.W. / Drucker, J. / Picraux, S.T. et al. | 2005
- 209
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Ion beam synthesis of Te and Bi nanoclusters in silicon: The effect of post-implantation high frequency electromagnetic fieldKalitzova, M. / Peeva, A. / Ignatova, V. / Lebedev, O.I. / Zollo, G. / Vitali, G. et al. | 2005
- 214
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How chemistry affects the ion beam synthesis of PbS nanocrystalsEspiau de Lamaestre, R. / Bernas, H. / Ricolleau, Ch. / Majimel, J. et al. | 2005
- 217
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Formation of silver nanoparticles aligned near the bottom of SiO2 film on silicon substrate by negative-ion implantation and post-annealingArai, N. / Tsuji, H. / Ueno, K. / Matsumoto, T. / Gotoh, N. / Aadachi, K. / Kotaki, H. / Gotoh, Y. / Ishikawa, J. et al. | 2005
- 221
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The role of energetic ions from plasma in the creation of nanostructured materials and stable polymer surface treatmentsBilek, M.M.M. / Newton-McGee, K. / McKenzie, D.R. / McCulloch, D.G. et al. | 2005
- 228
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Morphology of ion sputtered Cu(001) surface: Transition from unidirectional roughening to bidirectional rougheningChan, Wai Lun / Chason, Eric et al. | 2005
- 232
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Kinetic mechanisms in ion-induced ripple formation on Cu(001) surfacesChason, Eric / Chan, Wai Lun et al. | 2005
- 237
-
Nanostructure formation of SiC using ion implantation and CMPEryu, O. / Abe, K. / Takemoto, N. et al. | 2005
- 240
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Formation of local ferromagnetic areas on GaAs by focused Mn ion beam implantationKasai, M. / Yanagisawa, J. / Tanaka, H. / Hasegawa, S. / Asahi, H. / Gamo, K. / Akasaka, Y. et al. | 2005
- 244
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Nano-fabrication using electron-beam-induced deposition combined with low energy ion millingMitsuishi, K. / Shimojo, M. / Tanaka, M. / Furuya, K. et al. | 2005
- 247
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Application of highly charged Ar ion beams to ion beam lithographyMomota, S. / Nojiri, Y. / Hamagawa, Y. / Hamaguchi, K. / Taniguchi, J. / Ohno, H. et al. | 2005
- 250
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Three-dimensional GaN nano-structure fabrication by focused ion beam chemical vapor depositionNagata, T. / Ahmet, P. / Yamauchi, Y. / Sakuma, Y. / Sekiguchi, T. / Chikyow, T. et al. | 2005
- 253
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Fabrication of phosphor micro-grids using proton beam lithographyAuzelyte, V. / Elfman, M. / Kristiansson, P. / Pallon, J. / Wegdén, M. / Nilsson, C. / Malmqvist, K. / Doyle, B.L. / Rossi, P. / Hearne, S.J. et al. | 2005
- 257
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Dot-array implantation for patterned doping of semiconductorsWanzenboeck, H.D. / Ostermaier, C. / Gruen, A. / Eichinger, B. / Karner, M. / Bertagnolli, E. et al. | 2005
- 261
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Self-assembled nano-scale multilayer formation using physical vapor deposition methodsRonning, C. / Gerhards, I. / Seibt, M. / Hofsäss, H. / Wu, Wan-Yu / Ting, Jyh-Ming et al. | 2005
- 265
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Nanoscale patterning of composition and chemical order induced by displacement cascades in irradiated alloysYe, Jia / Bellon, Pascal / Enrique, Raúl A. et al. | 2005
- 270
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Improvement on corrosion resistance of NiTi orthopedic materials by carbon plasma immersion ion implantationPoon, Ray W.Y. / Ho, Joan P.Y. / Luk, Camille M.Y. / Liu, Xuanyong / Chung, Jonathan C.Y. / Chu, Paul K. / Yeung, Kelvin W.K. / Lu, William W. / Cheung, Kenneth M.C. et al. | 2005
- 275
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Ignition and dynamics of high-voltage glow discharge plasma implantationFu, Ricky K.Y. / Chu, Paul K. / Tian, X.B. / Yang, S.Q. et al. | 2005
- 279
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Influence of thermal treatment on photoluminescence of Er-doped Si-rich SiO2 prepared by ion implantationZhang, C.S. / Sun, J.Z. / Wang, X. / Zhang, F. et al. | 2005
- 282
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Phase formation in Ti after high fluence/high temperature nitrogen implantationManova, D. / Gerlach, J.W. / Neumann, H. / Assmann, W. / Mändl, S. et al. | 2005
- 285
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Variable lattice expansion in martensitic stainless steel after nitrogen ion implantationManova, D. / Thorwarth, G. / Mändl, S. / Neumann, H. / Stritzker, B. / Rauschenbach, B. et al. | 2005
- 289
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Correlation between RBS, reflectometry and ellipsometry data for TiO2 films deposited on SiGerlach, J.W. / Mändl, S. et al. | 2005
- 293
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Formation of transparent ZnO layers by MePIIIDMändl, S. / Rauschenbach, B. et al. | 2005
- 296
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Surface wettabiliy of nitrogen plasma-implanted siliconWan, G.J. / Fu, R.K.Y. / Yang, P. / Ho, J.P.Y. / Xie, X. / Huang, N. / Chu, P.K. et al. | 2005
- 300
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Water plasma implantation/oxidation of magnesium alloys for corrosion resistanceTian, X.B. / Wei, C.B. / Yang, S.Q. / Fu, Ricky K.Y. / Chu, Paul K. et al. | 2005
- 303
-
Maximizing light emission from silicon nanocrystals – The role of hydrogenWilkinson, A.R. / Elliman, R.G. et al. | 2005
- 307
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Optical doping of AlN by rare earth implantationLorenz, K. / Alves, E. / Monteiro, T. / Soares, M.J. / Peres, M. / Smulders, P.J.M. et al. | 2005
- 311
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Elastic nano-structure of diamond-like carbon (DLC)Ogiso, Hisato / Yoshida, Mikiko / Nakano, Shizuka / Yasui, Haruyuki / Awazu, Kaoru et al. | 2005
- 315
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Droplet-free high-density metal ion source for plasma immersion ion implantationNakamura, Keiji / Yoshinaga, Hiroaki / Yukimura, Ken et al. | 2005
- 318
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Ar/O2 gas pressure dependence of atomic concentration of zirconia prepared by zirconium pulse arc PBII&DYukimura, Ken / Yoshinaga, Hiroaki / Ohtsu, Yasunori / Fujita, Hiroharu / Nakamura, Keiji / Ma, Xinxin et al. | 2005
- 321
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Amorphous carbon film deposition by PBII&D using shunting arc dischargeYukimura, K. / Ego, K. / Takaki, K. / Mukaigawa, S. / Fujiwara, T. et al. | 2005
- 324
-
Studies of the composition, mechanical and electrical properties of N-doped carbon films prepared by DC-MFCADWen, F. / Huang, N. / Leng, Y.X. / Wang, J. / Sun, H. / Li, Y.J. / Wang, Z.W. et al. | 2005
- 328
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Plasma implantation using high-energy ions and short high voltage pulsesRossi, J.O. / Tan, I.H. / Ueda, M. et al. | 2005
- 332
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Magnetic field effects on secondary electrons emitted during ion implantation in vacuum arc plasmasTan, I.H. / Ueda, M. / Dallaqua, R.S. / Rossi, J.O. et al. | 2005
- 335
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Effect of ion beam implantation on density of DLC prepared by plasma-based ion implantation and depositionOka, Y. / Kirinuki, M. / Suzuki, T. / Yatsuzuka, M. / Yatsui, K. et al. | 2005
- 338
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Carbon protrusions on PTFE surface prepared by ion irradiation and chemical defluorinationKobayashi, T. / Iwaki, M. et al. | 2005
- 341
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Analysis of plasma and neutral gas flow inside of a PET bottle under PIII condition by particle-in-cell/Monte Carlo simulationMiyagawa, Y. / Tanaka, M. / Ikeyama, M. / Nakao, S. / Choi, J. / Miyagawa, S. et al. | 2005
- 346
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Effects of target bias voltage on the electrical conductivity of DLC films deposited by PBII/D with a bipolar pulseMiyagawa, S. / Nakao, S. / Choi, J. / Ikeyama, M. / Miyagawa, Y. et al. | 2005
- 349
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Ion implantation into concave polymer surfaceSakudo, N. / Shinohara, T. / Amaya, S. / Endo, H. / Okuji, S. / Ikenaga, N. et al. | 2005
- 353
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Surface modification of polymeric substrates by plasma-based ion implantationOkuji, S. / Sekiya, M. / Nakabayashi, M. / Endo, H. / Sakudo, N. / Nagai, K. et al. | 2005
- 357
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Effect of positive pulses on the microstructure and mechanical properties of diamond-like carbon films deposited by PBIIChoi, Junho / Miyagawa, Soji / Nakao, Setsuo / Ikeyama, Masami / Miyagawa, Yoshiko et al. | 2005
- 360
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Film synthesis of MgB2 by ion ablation of high-energy pulsed powerFudamoto, Y. / Kishimoto, N. / Torres, G.A. / Renk, T.J. et al. | 2005
- 363
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593MeV Au irradiation of InP, GaP, GaAs and AlAsWesch, W. / Kamarou, A. / Wendler, E. / Klaumünzer, S. et al. | 2005
- 367
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Investigation of the structural properties of ferromagnetic Mn-implanted SiBolduc, M. / Awo-Affouda, C. / Stollenwerk, A. / Huang, M.B. / Ramos, F. / LaBella, V.P. et al. | 2005
- 371
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Estimation of nitrogen ion energy calculated using distribution for nitrogen in Si implanted by PBIITanaka, T. / Watanabe, S. / Takagi, T. et al. | 2005
- 374
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Microstructure characteristics of steel M50 implanted with nitrogen by plasma-based ion implantation at elevated temperatureXu, Shuyan / Ma, Xinxin / Sun, Mingren / Sun, Yue / Yukimura, Ken et al. | 2005
- 377
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Characterization of sulfur-doped TiO2 films by RBS/CYamamoto, S. / Takeyama, A. / Yoshikawa, M. et al. | 2005
- 380
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Atomic level imaging of Au nanocluster dispersed in TiO2 and SrTiO3Wang, C.M. / Shutthanandan, V. / Zhang, Y. / Thevuthasan, S. / Thomas, L.E. / Weber, W.J. / Duscher, G. et al. | 2005
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Measurement of ion current distribution on a three-dimensional workpiece in the positive pulse bias PBIIIkehata, T. / Shioya, K. / Sato, N.Y. / Yukimura, K. et al. | 2005
- 387
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Proton beam lithography at the University of Surrey’s Ion Beam CentreMistry, P. / Gomez-Morilla, I. / Grime, G.W. / Webb, R. / Jeynes, C. / Gwilliam, R. / Cansell, A. / Merchant, M. / Kirkby, K.J. et al. | 2005
- 390
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Ion beam current dependence of compositions and resistivities on titanium nitride films deposited onto silicon by an ion beam assisted deposition methodYokota, Katsuhiro / Kasuya, Tomohiko / Nakamura, Kazuhiro / Ohnishi, Masami / Miyashita, Fumiyoshi et al. | 2005
- 393
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Effects of oxygen ion beam application on crystalline structures of TiO2 films deposited on Si wafers by an ion beam assisted depositionYokota, Katsuhiro / Yano, Yoshikazu / Nakamura, Kazuhiro / Ohnishi, Masami / Miyashita, Fumiyoshi et al. | 2005
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Argon ion beam voltages influence the microstructure of aluminum nitride films in a dual ion beam sputtering systemChen, Hong-Ying / Han, Sheng / Shih, Han C. et al. | 2005
- 399
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Damage induced in high energy helium-implanted 4H-SiCLeclerc, S. / Beaufort, M.F. / Declémy, A. / Barbot, J.F. et al. | 2005
- 402
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A review of radiation enhanced diffusion in perspective materialsStarostin, V.A. et al. | 2005
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Radiation-induced luminescence from sol-gel silica glasses and phosphosilicate glasses by 1MeV H+ and 3MeV Zr2+ irradiationsKitazawa, Sin-iti / Yamamoto, Shunya / Asano, Masaharu / Ishiyama, Shintaro et al. | 2005
- 409
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High-temperature behavior of zirconia and spinel doped with cesiumEnescu, S.E. / Thomé, L. / Gentils, A. / Garrido, F. / Thomé, T. et al. | 2005
- 413
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The computer simulation of cluster induced desorption of moleculesWebb, Roger / Chatzipanagiotou, Alexandros et al. | 2005
- 417
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Interactions of ethanol cluster ion beams with silicon surfacesTakaoka, G.H. / Noguchi, H. / Kawashita, M. et al. | 2005
- 421
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Crack-arresting compression layers produced by ion implantationGurarie, V.N. / Otsuka, P.H. / Jamieson, D.N. / Prawer, S. et al. | 2005
- 424
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Zinc-blende aluminum nitride formation using low-energy ion beam assisted depositionMatsumoto, T. / Kiuchi, M. et al. | 2005
- 427
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Gas cluster ion beam infusion processing of semiconductorsMacCrimmon, R. / Hautala, J. / Gwinn, M. / Sherman, S. et al. | 2005
- 431
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Effect of irradiation temperature on dynamic recovery in gallium nitrideJiang, W. / Weber, W.J. et al. | 2005
- 434
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Effect of substrate temperature on the radiation damage from MeV Si implantation in SiYu, X.K. / Shao, Lin / Rusakova, Irene / Wang, X.M. / Ma, K.B. / Chen, H. / Liu, Jiarui / Chu, Wei-Kan et al. | 2005
- 437
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Spatial distribution of irradiation effects on silica glass induced by 15-MeV oxygen ion microbeamNishikawa, H. / Fukagawa, K. / Nakamura, T. / Ohki, Y. / Oikawa, M. / Kamiya, T. / Arakawa, K. et al. | 2005
- 441
-
Microstructural change with annealing of SiC irradiated with Ne at 573–673KAihara, J. / Hojou, K. / Furuno, S. / Shimura, K. / Hojo, T. / Sawa, K. / Yamamoto, H. / Motohashi, Y. et al. | 2005
- 445
-
Amorphization of carbon materials studied by X-ray photoelectron spectroscopyTakahiro, Katsumi / Terai, Atsushi / Oizumi, Shinnosuke / Kawatsura, Kiyoshi / Yamamoto, Shunya / Naramoto, Hiroshi et al. | 2005
- 448
-
Ion-beam implantation and cross-sectional TEM characterization of Gd2Ti2O7 pyrochloreLian, Jie / Wang, L.M. / Ewing, R.C. / Boatner, L.A. et al. | 2005
- 452
-
MeV ion beam deformation of colloidal silica particlesCheang-Wong, J.C. / Morales, U. / Oliver, A. / Rodríguez-Fernández, L. / Rickards, J. et al. | 2005
- 455
-
Dynamical behavior of helium bubbles in gold during irradiation with high-energy self-ionsOno, K. / Miyamoto, M. / Arakawa, K. / Birtcher, R.C. et al. | 2005
- 458
-
Effects of ion irradiation on metallic nanocrystals formed by ion beam synthesis in SiO2Kluth, Patrick / Ridgway, Mark C. et al. | 2005
- 461
-
Ion-irradiation induced stress relaxation in metallic thin films and multilayers grown by ion beam sputteringDebelle, A. / Michel, A. / Abadias, G. / Jaouen, C. et al. | 2005
- 466
-
Development of size-selected cluster ion irradiation systemToyoda, N. / Houzumi, S. / Yamada, I. et al. | 2005
- 469
-
Effect of implanted helium on thermal diffusivities of SiC/SiC compositesTaguchi, T. / Igawa, N. / Jitsukawa, S. / Shimura, K. et al. | 2005
- 473
-
Chemical short-range order in ion-beam-induced amorphous SiC: Irradiation temperature dependenceIshimaru, Manabu / Bae, In-Tae / Hirata, Akihiko / Hirotsu, Yoshihiko / Valdez, James A. / Sickafus, Kurt E. et al. | 2005
- 476
-
Radiation effects on MgAl2O4-stabilized zirconia composite material irradiated with Ne+ ionsHojo, T. / Yamamoto, H. / Aihara, J. / Furuno, S. / Sawa, K. / Sakuma, T. / Hojou, K. et al. | 2005
- 480
-
Rapid amorphization in InxGa1−xAs alloys at temperatures between 15K and 300KWesch, W. / Wendler, E. / Hussain, Z.S. / Kluth, S.M. / Ridgway, M.C. et al. | 2005
- 484
-
High-energy Au implantation of GaAs at 16KLauck, R. / Wendler, E. / Wesch, W. et al. | 2005
- 487
-
Use of ion beams to simulate reaction of reactor fuels with their claddingBirtcher, R.C. / Baldo, P. et al. | 2005
- 490
-
Grain growth in Zr–Fe thin films during in situ ion irradiation in a TEMKaoumi, D. / Motta, A.T. / Birtcher, R.C. et al. | 2005
- 494
-
Characterization of neon cavity in siliconPeripolli, S. / Oliviero, E. / Fichtner, P.F.P. / Vasconcellos, M.A.Z. / Amaral, L. et al. | 2005
- 498
-
Surface erosion by highly-charged ionsInsepov, Z. / Allain, J.P. / Hassanein, A. / Terasawa, M. et al. | 2005
- 503
-
A model for damage caused by cluster implantation: Non-linear effect due to damage overlapShao, Lin / Nastasi, Michael / Wang, Xuemei / Liu, Jiarui / Chu, Wei-Kan et al. | 2005
- 506
-
The energy dependence of excessive vacancies created by high energy Si+ ion implantation in SiShao, Lin / Nastasi, Michael / Thompson, Phillip E. / Rusakova, Irene / Chen, Quark Y. / Liu, Jiarui / Chu, Wei-Kan et al. | 2005
- 509
-
Ion-cut of Si facilitated by interfacial defects of Si substrate/epitaxial layer grown by molecular-beam epitaxyShao, Lin / Lee, J.K. / Höchbauer, T. / Nastasi, M. / Thompson, Phillip E. / Rusakova, I. / Seo, H.W. / Chen, Q.Y. / Liu, J.R. / Chu, Wei-Kan et al. | 2005
- 512
-
Properties of zinc oxide thin films bombarded with 5MeV silicon ionsMuntele, I. / Thevenard, P. / Muntele, C. / Chhay, B. / Zimmerman, R.L. / Sarkisov, S. / Ila, D. et al. | 2005
- 517
-
Molecular dynamics simulations of surface modification and damage formation by gas cluster ion impactsAoki, Takaaki / Matsuo, Jiro et al. | 2005
- 520
-
Xe+-irradiation effects on multilayer thin-film optical surfaces in EUV lithographyAllain, J.P. / Hassanein, A. / Allain, M.M.C. / Heuser, B.J. / Nieto, M. / Chrobak, C. / Rokusek, D. / Rice, B. et al. | 2005
- 523
-
Anisotropic deformation of metallo-dielectric core–shell colloids under MeV ion irradiationPenninkhof, J.J. / van Dillen, T. / Roorda, S. / Graf, C. / van Blaaderen, A. / Vredenberg, A.M. / Polman, A. et al. | 2005
- 530
-
Identification and morphology of point defect clusters created in displacement cascades in α-zirconiumVoskoboinikov, R.E. / Osetsky, Yu.N. / Bacon, D.J. et al. | 2005
- 534
-
Optical investigation of the propagation of the amorphous–crystalline boundary in ion-beam irradiated LiNbO3Olivares, J. / García, G. / Agulló-López, F. / Agulló-Rueda, F. / Soares, J.C. / Kling, A. et al. | 2005
- 538
-
Ion beam irradiation and characterization of GaAs based hetero-structuresDhamodaran, S. / Sathish, N. / Pathak, A.P. / Rao, S.V.S.N. / Siddiqui, A.M. / Khan, S.A. / Avasthi, D.K. / Srinivasan, T. / Muralidharan, R. / Muntele, C. et al. | 2005
- 542
-
Mass dependent surface interface modification of Ag/Co films under controlled ion beam irradiationKundu, S. et al. | 2005
- 546
-
Structure of defect cascades in heavy ions-irradiated nickel by X-ray diffuse scatteringMaeta, H. / Matsumoto, N. / Kato, T. / Sugai, H. / Ohtsuka, H. / Sataka, M. et al. | 2005
- 550
-
Low energy ion beam induced changes in ETFE polymerParada, M.A. / Delalez, N. / de Almeida, A. / Muntele, C. / Muntele, I. / Ila, D. et al. | 2005
- 553
-
Hydrogen up-take in noble gas implanted WNagata, S. / Yamamoto, S. / Tokunaga, K. / Tuschiya, B. / Toh, K. / Shikama, T. et al. | 2005
- 557
-
Damages in ceramics for nuclear waste transmutation by irradiation with swift heavy ionsBeauvy, Michel / Dalmasso, Chrystelle / Thiriet-Dodane, Catherine / Simeone, David / Gosset, Dominique et al. | 2005
- 562
-
Ar implantation of InSb and AlN at 15KWendler, E. / Wesch, W. et al. | 2005
- 565
-
Extended-type defects created by high temperature helium implantation into siliconBeaufort, M.F. / Donnelly, S.E. / Rousselet, S. / David, M.L. / Barbot, J.F. et al. | 2005
- 568
-
Strain relaxation of pseudomorphic Si1−xGex/Si(100) heterostructures by Si+ ion implantationHolländer, B. / Buca, D. / Lenk, St. / Mantl, S. / Herzog, H.-J. / Hackbarth, Th. / Loo, R. / Caymax, M. / Mörschbächer, M.J. / Fichtner, P.F.P. et al. | 2005
- 572
-
An ion-implanted standard for 11BTodd, A.D.W. / Lennard, W.N. / Magee, C.W. / Xia, H. et al. | 2005
- 576
-
Gettering of Pd and Cu by nanocavities and dislocations in SiBrett, D.A. / Llewellyn, D.J. / Ridgway, M.C. et al. | 2005
- 580
-
Stability and luminescence studies of Tm and Er implanted ZnO single crystalsRita, E. / Alves, E. / Wahl, U. / Correia, J.G. / Monteiro, T. / Soares, M.J. / Neves, A. / Peres, M. et al. | 2005
- 585
-
Research on nitrogen implantation energy dependence of the properties of SIMON materialsZhang, E.X. / Sun, J.Y. / Chen, J. / Chen, M. / Zhang, Zh.X. / Li, N. / Zhang, G.Q. / Wang, X. et al. | 2005
- 588
-
Effects of ion beam modification on absorption and transport of hydrogen in perovskite-type oxide ceramicsTsuchiya, B. / Nagata, S. / Toh, K. / Shikama, T. et al. | 2005
- 591
-
Solid phase epitaxial regrowth of amorphous layers in silicon created by low energy phosphorus implantation: A medium energy ion scattering studyRuffell, S. / Mitchell, I.V. / Simpson, P.J. et al. | 2005
- 595
-
Anomalous annealing behavior of isolated amorphous zones in siliconDonnelly, S.E. / Birtcher, R.C. / Vishnyakov, V.M. / Edmondson, P.D. / Carter, G. et al. | 2005
- 598
-
Characteristics of ion-beam-synthesized molybdenum silicide filmLiang, J.H. / Tsai, C.T. et al. | 2005
- 602
-
Formation of cobalt silicide films by ion beam depositionZhang, Y. / McCready, D.E. / Wang, C.M. / Young, J. / McKinley, M.I. / Whitlow, H.J. / Razpet, A. / Possnert, G. / Zhang, T. / Wu, Y. et al. | 2005
- 605
-
Post-annealing sequence effects on the characteristics of 20keV BF2 ion implantation at various ion fluencesLiang, J.H. / Wan, W.W. et al. | 2005
- 610
-
The effect of ion-beam specimen preparation techniques on vacancy-type defects in siliconGandy, A.S. / Donnelly, S.E. / Beaufort, M.-F. / Vishnyakov, V.M. / Barbot, J.-F. et al. | 2005
- 614
-
Fluorine incorporation during Si solid phase epitaxyImpellizzeri, G. / Mirabella, S. / Romano, L. / Napolitani, E. / Carnera, A. / Grimaldi, M.G. / Priolo, F. et al. | 2005
- 617
-
Random and channeling stopping power of H in Si below 100keVHobler, G. / Bourdelle, K.K. / Akatsu, T. et al. | 2005
- 620
-
Blistering effects of low energy hydrogen and helium ions implanted in GaAs(100) crystalsGiguère, A. / Desrosiers, N. / Terreault, B. et al. | 2005
- 623
-
Formation of hydrogen complexes in proton implanted silicon and their influence on the crystal damageHöchbauer, T. / Misra, A. / Nastasi, M. / Mayer, J.W. / Ensinger, W. et al. | 2005
- 627
-
Recrystallization process of phosphorus ion implanted 4H–SiC(112−0)Satoh, M. / Hitomi, T. / Suzuki, T. et al. | 2005
- 630
-
ion implantation in strained-Si/SiGe/Si hetero-structuresMorioka, J. / Irieda, S. / Ishidoya, Y. / Inada, T. / Sugii, N. et al. | 2005
- 630
-
Formula Not Shown ion implantation in strained-Si/SiGe/Si hetero-structuresMorioka, J. / Irieda, S. / Ishidoya, Y. / Inada, T. / Sugii, N. et al. | 2006
- 633
-
Electrical properties of n-type layers formed in GaN by Si implantationFuruhashi, Y. / Yoshida, S. / Ozaki, D. / Inada, T. et al. | 2005
- 637
-
Optical properties of amorphous carbon films implanted with nitrogenAbe, K. / Eryu, O. et al. | 2005
- 640
-
Irradiation fluence dependent microstructural evolution of porous InSbKluth, S.M. / Llewellyn, David / Ridgway, M.C. et al. | 2005
- 643
-
Quantitative analysis of radiation-induced disorder in spinel crystalsThomé, L. / Jagielski, J. / Gentils, A. / Nowicki, L. / Garrido, F. et al. | 2005
- 646
-
Group III impurities – Si interstitials interaction caused by ion irradiationRomano, L. / Piro, A.M. / De Bastiani, R. / Grimaldi, M.G. / Rimini, E. et al. | 2005
- 650
-
Effect of thermal annealing on the optical and structural properties of silicon implanted with a high hydrogen fluenceKling, A. / Soares, J.C. / Rodríguez, A. / Rodríguez, T. / Avella, M. / Jiménez, J. et al. | 2005
- 653
-
Incorporation of active Fe impurities in GaInP by high temperature ion implantationCesca, T. / Gasparotto, A. / Verna, A. / Fraboni, B. / Impellizzeri, G. / Priolo, F. / Tarricone, L. / Longo, M. et al. | 2005
- 656
-
Role of Si self-interstitials on the electrical de-activation of B doped SiPiro, A.M. / Romano, L. / Badalà, P. / Mirabella, S. / Grimaldi, M.G. / Rimini, E. et al. | 2005
- 659
-
Swift heavy-ion induced trap generation and mixing at Si/SiO2 interface in depletion n-MOSShinde, N. / Bhoraskar, V.N. / Dhole, S.D. et al. | 2005
- 663
-
Photoluminescence of He-implanted ZnOHamby, D.W. / Lucca, D.A. / Lee, J.-K. / Nastasi, M. et al. | 2005
- 667
-
Dose-rate dependence of damage formation in Si by N implantation as determined from channeling profile measurementsOtto, G. / Hobler, G. / Palmetshofer, L. / Mayerhofer, K. / Piplits, K. / Hutter, H. et al. | 2005
- 670
-
Application of high energy ion beam for the control of boron diffusionShao, Lin / Nastasi, M. / Thompson, Phillip E. / Chen, Quark Y. / Liu, Jiarui / Chu, Wei-Kan et al. | 2005
- 673
-
Photoluminescence of β-FeSi2 thin film prepared by ion beam sputter deposition methodShimura, K. / Yamaguchi, K. / Yamamoto, H. / Sasase, M. / Shamoto, S. / Hojou, K. et al. | 2005
- 676
-
Modification of thin SIMOX film into β-FeSi2 via dry processesShimura, K. / Yamaguchi, K. / Sasase, M. / Yamamoto, H. / Shamoto, S. / Hojou, K. et al. | 2005
- 676
-
Modification of thin SIMOX film into beta-FeSi2 via dry processesShimura, K. / Yamaguchi, K. / Sasase, M. / Yamamoto, H. / Shamoto, S. / Hojou, K. et al. | 2006
- 679
-
Monte-Carlo simulation study of the self-organization of nanometric amorphous precipitates in regular arrays during ion irradiationZirkelbach, F. / Häberlen, M. / Lindner, J.K.N. / Stritzker, B. et al. | 2005
- 683
-
Recovery of the Si–SiO2 interface studied by self-diffusion after high fluence ion implantation of 28SiKarl, H. / Delpero, Ch. / Huber, P. / Stritzker, B. et al. | 2005
- 686
-
In situ transmission electron microscopy studies of radiation damage in copper indium diselenideDonnelly, S.E. / Hinks, J.A. / Edmondson, P.D. / Pilkington, R.D. / Yakushev, M. / Birtcher, R.C. et al. | 2005
- 690
-
Modelling of ion implantation in SiC crystalsChakarov, Ivan / Temkin, Misha et al. | 2005
- 693
-
Electrical profiles of 20nm junctions in Sb implanted siliconAlzanki, T. / Gwilliam, R. / Emerson, N. / Smith, A. / Webb, R. / Sealy, B.J. et al. | 2005
- 696
-
Author index| 2005
- CO2
-
Editorial board| 2005
- ix
-
Committees| 2005
- vii
-
Editorial| 2005
- x
-
Contents| 2005