GATE-BEABSTANDUNG IN INTEGRIERTE-SCHALTUNG-STRUKTUREN (German)
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2022
- Patent / Electronic Resource
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Title:GATE-BEABSTANDUNG IN INTEGRIERTE-SCHALTUNG-STRUKTUREN
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Patent number:DE102021121935
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Patent applicant:
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Patent family:
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Contributors:WALLACE CHARLES ( author ) / HARAN MOHIT ( author ) / NYHUS PAUL ( author ) / SINGH GURPREET ( author ) / HAN EUNGNAK ( author ) / SHYKIND DAVID ( author ) / PURSEL SEAN ( author )
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Publisher:
- New search for: Europäisches Patentamt
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Publication date:2022-03-31
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Type of media:Patent
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Type of material:Electronic Resource
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Language:German
- New search for: H01L
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Classification:
IPC: H01L Halbleiterbauelemente, SEMICONDUCTOR DEVICES -
Source: