AUXILIARY EXPOSURE DEVICE, EXPOSURE METHOD, AND MEMORY MEDIUM (Japanese)
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- New search for: FUJIWARA SHIN
- New search for: NISHIYAMA JUN
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2023
- Patent / Electronic Resource
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Title:AUXILIARY EXPOSURE DEVICE, EXPOSURE METHOD, AND MEMORY MEDIUM
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Additional title:補助露光装置、露光方法および記憶媒体
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Patent number:JP2023100449
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Patent applicant:
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Patent family:
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Contributors:FUJIWARA SHIN ( author ) / NISHIYAMA JUN ( author )
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Publisher:
- New search for: Europäisches Patentamt
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Publication date:2023-07-19
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Type of media:Patent
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Type of material:Electronic Resource
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Language:Japanese
- New search for: G03F
- Further information on International Patent Classification
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Classification:
IPC: G03F Fotomechanische Herstellung strukturierter oder gemusterter Oberflächen, z.B. zum Drucken, zum Herstellen von Halbleiterbauelementen, PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES -
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