ACETAL COMPOUND POLYMER RESIST COMPOSITION AND PATTERNING PROCESS (Korean)
Free access
2015
- Patent / Electronic Resource
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Title:ACETAL COMPOUND POLYMER RESIST COMPOSITION AND PATTERNING PROCESS
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Additional title:아세탈 화합물, 고분자 화합물, 레지스트 재료 및 패턴 형성 방법
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Patent number:KR101576317
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Patent family:
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Publisher:
- New search for: Europäisches Patentamt
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Publication date:2015-12-09
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Type of media:Patent
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Type of material:Electronic Resource
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Language:Korean
- New search for: C07C / C08F / G03F / H01L
- Further information on International Patent Classification
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Classification:
IPC: C07C ACYCLIC OR CARBOCYCLIC COMPOUNDS, Acyclische oder carbocyclische Verbindungen / C08F MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS, Makromolekulare Verbindungen, erhalten durch Reaktionen, an denen nur ungesättigte Kohlenstoff-Kohlenstoff-Bindungen beteiligt sind / G03F Fotomechanische Herstellung strukturierter oder gemusterter Oberflächen, z.B. zum Drucken, zum Herstellen von Halbleiterbauelementen, PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES / H01L Halbleiterbauelemente, SEMICONDUCTOR DEVICES -
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