High Performance Interference Patterning Device Using Higher Harmonic Wave Source (Korean)
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- New search for: LEE DONG GUN
- New search for: LEE DONG GUN
2021
- Patent / Electronic Resource
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Title:High Performance Interference Patterning Device Using Higher Harmonic Wave Source
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Additional title:고차조화파 광원을 이용한 고성능 간섭 패터닝 장치
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Patent number:KR20210029437
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Patent applicant:
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Patent family:
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Contributors:LEE DONG GUN ( author )
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Publisher:
- New search for: Europäisches Patentamt
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Publication date:2021-03-16
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Type of media:Patent
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Type of material:Electronic Resource
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Language:Korean
- New search for: G03F
- Further information on International Patent Classification
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Classification:
IPC: G03F Fotomechanische Herstellung strukturierter oder gemusterter Oberflächen, z.B. zum Drucken, zum Herstellen von Halbleiterbauelementen, PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES -
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