EUV Phase measuring device for high performance EUV mask (Korean)
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2021
- Patent / Electronic Resource
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Title:EUV Phase measuring device for high performance EUV mask
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Additional title:고성능 EUV 마스크의 위상 측정장치
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Patent number:KR20210061177
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Patent applicant:
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Patent family:
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Contributors:LEE DONG GUN ( author )
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Publisher:
- New search for: Europäisches Patentamt
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Publication date:2021-05-27
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Type of media:Patent
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Type of material:Electronic Resource
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Language:Korean
- New search for: G03F
- Further information on International Patent Classification
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Classification:
IPC: G03F Fotomechanische Herstellung strukturierter oder gemusterter Oberflächen, z.B. zum Drucken, zum Herstellen von Halbleiterbauelementen, PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES -
Source: