Heat Actuated and Projected Lithography Systems and Methods (English)
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2015
- Patent / Electronic Resource
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Title:Heat Actuated and Projected Lithography Systems and Methods
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Patent number:US2015286148
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Patent applicant:
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Patent family:
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Contributors:MIRKIN CHAD A ( author ) / LIAO XING ( author ) / BROWN KEITH A ( author ) / LIU GUOLIANG ( author ) / SCHMUCKER ABRIN L ( author ) / HE SHU ( author ) / SHIM WOOYOUNG ( author ) / EICHELSDOERFER DANIEL J ( author ) / RASIN BORIS ( author )
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Publisher:
- New search for: Europäisches Patentamt
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Publication date:2015-10-08
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Type of media:Patent
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Type of material:Electronic Resource
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Language:English
- New search for: G03F / B05D / G02B
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Classification:
IPC: G03F Fotomechanische Herstellung strukturierter oder gemusterter Oberflächen, z.B. zum Drucken, zum Herstellen von Halbleiterbauelementen, PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES / B05D PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL, Verfahren zum Aufbringen von Flüssigkeiten oder von anderen fließfähigen Stoffen auf Oberflächen allgemein / G02B Optische Elemente, Systeme oder Geräte, OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS -
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