Semiconductor Metrology Based On Hyperspectral Imaging (English)
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2020
- Patent / Electronic Resource
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Title:Semiconductor Metrology Based On Hyperspectral Imaging
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Patent number:US2020225151
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Patent applicant:
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Patent family:
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Contributors:WANG DAVID Y ( author ) / BUETTNER ALEXANDER ( author ) / PANDEV STILIAN IVANOV ( author ) / SAERCHEN EMANUEL ( author ) / SHCHEGROV ANDREI V ( author ) / BLASENHEIM BARRY ( author )
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Publisher:
- New search for: Europäisches Patentamt
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Publication date:2020-07-16
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Type of media:Patent
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Type of material:Electronic Resource
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Language:English
- New search for: G01N / G01J / H01L
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Classification:
IPC: G01N Untersuchen oder Analysieren von Stoffen durch Bestimmen ihrer chemischen oder physikalischen Eigenschaften, INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES / G01J Messen der Intensität, der Geschwindigkeit, der spektralen Zusammensetzung, der Polarisation, der Phase oder der Pulscharakteristik von infrarotem, sichtbarem oder ultraviolettem Licht, MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT / H01L Halbleiterbauelemente, SEMICONDUCTOR DEVICES -
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