Using emission spectroscopy to perform impurity analyses in UHP gases - An analyzer uses electro-optical modulation to achieve parts-per-billion detection limits for various impurities simultaneously. (English)
- New search for: Malczewski, Mark L.
- New search for: Malczewski, Mark L.
- New search for: Demmin, Hollis C.
- New search for: Borkman, James D.
- New search for: Kilinskas, William A.
- New search for: Wegrzyn, Joseph
In:
Micro
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15
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; 40-46
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1997
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ISSN:
- Article (Journal) / Print
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Title:Using emission spectroscopy to perform impurity analyses in UHP gases - An analyzer uses electro-optical modulation to achieve parts-per-billion detection limits for various impurities simultaneously.
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Contributors:Malczewski, Mark L. ( author ) / Demmin, Hollis C. / Borkman, James D. / Kilinskas, William A. / Wegrzyn, Joseph
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Published in:Micro ; 15, 4 ; 40-46
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Publisher:
- New search for: Canon Communications
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Place of publication:Santa Monica, Calif.
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Publication date:1997
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ISSN:
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ZDBID:
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Type of media:Article (Journal)
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Type of material:Print
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Language:English
- New search for: 44.00 / 58.00
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Table of contents – Volume 15, Issue 4
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 10
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Editor's Page| 1997
- 16
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LEAD STORY - Chipmakers, vendors will soon shake effects of DRAM glut| 1997
- 16
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Chipmakers, vendors will soon shake effects of DRAM glut| 1997
- 19
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OBITUARY - William H. Reed, 1924-1997| 1997
- 19
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Willliam H. Reed, 1924-1997| 1997
- 20
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'Net, future causing institute to take stock| 1997
- 20
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BREAKOUT - 'Net, future causing institute to take stock| 1997
- 24
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WORLD BEAT - Asia: Anam equips first fab; Fluoroware starts Korean joint venture; Lam opens Japanese customer center; Sverdrup tapped for Holtek's UPW system; Applied, Asyst score with ProMos; TSMC getting automated| 1997
- 25
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EXPANSIONS AND ACQUISITIONS - Millipore seals Tylan General deal; ChemWest signs sales agent; Voltaix enlarges NJ plant; Fuji-Hunt Electronics becomes Fujifilm Olin; HP buys Rockland Technologies; Price Waterhouse joins TEOS Consortium; BOC building gas generator at MEMC; Petroferm buys solvent line; Advance Tabco opens plant; Eagle Stainless Tube adds capacity| 1997
- 27
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ORDER DESK - Ion Systems equips TECH fab; Helix buys CD system from Fairchild; Eaton to serve Dominion; PRI stocks U.S. company; GaSonics moves USD 10M+ of product; Veeco scores AFM sales; Ultratech sells first disk-drive tool; VLSI sticks with Tencor; Therma-Wave tool shows off CMP system| 1997
- 28
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IES, SID, Surface Analysis '97, and more| 1997
- 28
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WHAT'S GOING ON - IES, SID, Surface Analysis '97, and more| 1997
- 30
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ROUND THE CIRCUIT - Consortium claims DRAM breakthrough; Valley Design debuts demo 300-mm wafers; NIST metrology fellowship awarded; AVS calls for papers; Fluoroware lab accredited by AALA; Dataquest sees '97 as year of 0.35 llm| 1997
- 31
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ON DISPLAY - Motorola FPD fab to open; dpiX picks PST; FSI unit sells cluster tools| 1997
- 32
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CLEANROOM TECHNOLOGIES - Developing an exit charge specification for semiconductor production equipment - An industry task force has proposed an exit charge guideline to limit static charge levels on products and product carriers when they leave a production tool.Steinman, Arnold et al. | 1997
- 32
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Developing an exit charge specification for semiconductor production equipmentSteinman, A. / Montoya, J. A. et al. | 1997
- 40
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Using emission spectroscopy to perform impurity analyses in UHP gases - An analyzer uses electro-optical modulation to achieve parts-per-billion detection limits for various impurities simultaneously.Malczewski, Mark L. et al. | 1997
- 40
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Using emission spectroscopy to perform impurity analyses in UHP gasesMalczewski, M. L. / Demmin, H. C. / Borkman, J. D. / Kilinskas, W. A. / Wegrzyn, J. et al. | 1997
- 47
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Cleaning silicon wafers with an argon/nitrogen cryogenic aerosol processWeygand, J. F. / Narayanswami, N. / Syverson, D. J. et al. | 1997
- 47
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Cleaning silicon wafers with an argon-nitrogen cryogenic aerosol process - An environmentally friendly wafer-cleaning process shows promising particle and postetch residue removal capabilities.Weygand, James F. et al. | 1997
- 55
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PRODUCTS - LCD cleaning module, handheld UV lamp, HPLC pump, laminar-flow hood, thin-film measurement tool, forced-hot-air dryer, FPD processing system, gas filters, conductivity sensors, coating system, ion implanter, flowmeters, cleanroom footwear, static-dissipative wiper, MFC, environmental monitor, gowning racks, inspection system, CCD camera, cleanroom mat, and more| 1997
- 58
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PICK OF THE LITERATURE - Brochures, catalogs, manuals, data sheets, and more| 1997
- 62
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PRODUCT EXTRA! - Dryer aids significant yield rise; CMP batch mix order improves assay; PVDF filter housings available; custom field support program offered; etch chamber parts stocked; PM service for analytical tools introduced; thickness modeling system allows etch-tc-clear determination| 1997
- 64
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Product Spotlight - Process components| 1997
- 65
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Classifieds| 1997
- 65
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Ad Index| 1997
- 66
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Movin' On - Richards replaces Schumaker at Emcore; UTI secures Sharp; Nishino gets nod at Cybeq Nano; Novak leaves TI for Radian; Starr ascends at Trebor| 1997