Articles - A (NH4)2Sx-treated InSb(001) surface studied by using x-ray photoelectron spectroscopy, low-energy electron diffraction, and inverse photoemission spectroscopy (English)
- New search for: Ichikawa, S.
- New search for: Ichikawa, S.
- New search for: Suzuki, Y.
- New search for: Sanada, N.
- New search for: Utsumi, N.
- New search for: Yamaguchi, T.
- New search for: Gong, X.Y.
- New search for: Fukuda, Y.
In:
Journal of vacuum science and technology / A
;
17
, 2
; 421-424
;
1999
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ISSN:
- Article (Journal) / Print
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Title:Articles - A (NH4)2Sx-treated InSb(001) surface studied by using x-ray photoelectron spectroscopy, low-energy electron diffraction, and inverse photoemission spectroscopy
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Contributors:Ichikawa, S. ( author ) / Suzuki, Y. / Sanada, N. / Utsumi, N. / Yamaguchi, T. / Gong, X.Y. / Fukuda, Y.
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Published in:Journal of vacuum science and technology / A ; 17, 2 ; 421-424
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Publisher:
- New search for: Inst.
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Place of publication:New York, NY
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Publication date:1999
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ISSN:
-
ZDBID:
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Type of media:Article (Journal)
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Type of material:Print
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Language:English
- New search for: 52.78 / 33.09
- Further information on Basic classification
- New search for: 770/3422
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Keywords:
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Classification:
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Source:
Table of contents – Volume 17, Issue 2
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 325
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Molecularly engineered Iow temperature atomic layer growth of aluminum nitride on Si(100)Liu, H. / Rogers, J. W. et al. | 1999
- 325
-
Articles - Molecularly engineered low temperature atomic layer growth of aluminum nitride on Si(100)Liu, Herng et al. | 1999
- 325
-
Molecularly engineered low temperature atomic layer growth of aluminum nitride on Si(100)Liu, Herng / Rogers, J. W. et al. | 1999
- 332
-
Study on the transition temperature and phase formation sequence in TiZr silicides on Si(100)Cha, Taeho / Yoon, Sanghyun / Lee, Dongkun / Ryu, Hyun / Lee, Hwackjoo / Kim, Changsoo / Jeon, Hyeongtag et al. | 1999
- 332
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Articles - Study on the transition temperature and phase formation sequence in TiZr silicides on Si(100)Cha, Taeho et al. | 1999
- 338
-
Articles - Synthesis and characterization of In-Ti-Sb compounds grown by molecular beam epitaxyAntonell, M.J. et al. | 1999
- 338
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Synthesis and characterization of In–Tl–Sb compounds grown by molecular beam epitaxyAntonell, M. J. / Abernathy, C. R. / Acree, W. A. / Berding, M. A. / Sher, A. et al. | 1999
- 338
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Synthesis and characterization of In-Ti-Sb compounds grown by molecular beam epitaxyAntonell, M. J. / Abernathy, C. R. / Acree, W. A. / Berding, M. A. / Sher, A. et al. | 1999
- 342
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Line-of-sight mass spectrometric study of As/Sb exchange on Sb-terminated and Ga-terminated GaSb (001) during molecular beam epitaxyXie, Qianghua / Nostrand, J. E. Van et al. | 1999
- 342
-
Articles - Line-of-sight mass spectrometric study of As-Sb exchange on Sb-terminated and Ga-terminated GaSb (001) during molecular beam epitaxyXie, Qianghua et al. | 1999
- 347
-
Study of ohmic multilayer metal contacts to -type ZnSeRinta-Möykky, A. / Uusimaa, P. / Suhonen, S. / Valden, M. / Salokatve, A. / Pessa, M. / Likonen, J. et al. | 1999
- 347
-
Articles - Study of ohmic multilayer metal contacts to p-type ZnSeRinta-Möykky, A. et al. | 1999
- 354
-
Ge(001):B gas-source molecular beam epitaxy: B surface segregation, hydrogen desorption, and film growth kineticsKim, H. / Greene, J. E. et al. | 1999
- 354
-
Articles - Ge(001):B gas-source molecular beam epitaxy: B surface segregation, hydrogen desorption, and film growth kineticsKim, H. et al. | 1999
- 363
-
Articles - Effects of surface chemical treatment on the formation of metal GaAs interfacesShoji, Daisei et al. | 1999
- 363
-
Effects of surface chemical treatment on the formation of metal GaAs interfacesShoji, Daisei / Shinohara, Masanori / Miura, Taka-aki / Niwano, Michio / Miyamoto, Nobuo et al. | 1999
- 373
-
Articles - Model of interfacial thermal resistance of diamond compositesJagannadham, K. et al. | 1999
- 373
-
Model of interfacial thermal resistance of diamond compositesJagannadham, K. et al. | 1999
- 380
-
Combined beam profile reflectometry, beam profile ellipsometry and ultraviolet-visible spectrophotometry for the characterization of ultrathin oxide-nitride-oxide films on siliconLeng, J. M. / Opsal, J. / Aspnes, D. E. et al. | 1999
- 380
-
Articles - Combined beam profile reflectometry, beam profile ellipsometry and ultraviolet-visible spectrophotometry for the characterization of ultrathin oxide-nitride-oxide films on siliconLeng, J.M. et al. | 1999
- 385
-
Water dissociation and selective absorption in the gettering alloy: An x-ray photoemission spectroscopy investigationNarducci, E. / Kovac, J. / Ghezzi, F. / Venkataramani, N. / Sancrotti, M. et al. | 1999
- 385
-
Articles - Water dissociation and selective absorption in the Zr(V0.5Fe0.5)2 gettering alloy: An x-ray photoemission spectroscopy investigationNarducci, E. et al. | 1999
- 391
-
Analysis of silicon oxynitrides with spectroscopic ellipsometry and Auger spectroscopy, compared to analyses by Rutherford backscattering spectrometry and Fourier transform infrared spectroscopyTompkins, Harland G. / Gregory, Richard B. / Deal, Paul W. / Smith, Steven M. et al. | 1999
- 391
-
Articles - Analysis of silicon oxynitrides with spectroscopic ellipsometry and Auger spectroscopy, compared to analyses by Rutherford backscattering spectrometry and Fourier transform infrared spectroscopyTompkins, Harland G. et al. | 1999
- 398
-
Transmission characteristics of multilayer structure in the soft x-ray spectral region and its application to the design of quarter-wave plates at 13 and 4.4 nmKim, Dong-Eon / Lee, Su-Mi / Jeon, In-joon et al. | 1999
- 398
-
Articles - Transmission characteristics of multilayer structure in the soft x-ray spectral region and its application to the design of quarter-wave plates at 13 and 4.4 nmKim, Dong-Eon et al. | 1999
- 403
-
Investigation of electron-beam-induced phase transitions in amorphous aluminum trifluoride thin films using transmission electron microscopyChen, G. S. et al. | 1999
- 403
-
Articles - Investigation of electron-beam-induced phase transitions in amorphous aluminum trifluoride thin films using transmission electron microscopyChen, G.S. et al. | 1999
- 411
-
Electron spectroscopic study of C–N bond formation by low-energy nitrogen ion implantation of graphite and diamond surfacesGouzman, I. / Brener, R. / Hoffman, A. et al. | 1999
- 411
-
Articles - Electron spectroscopic study of C-N bond formation by low-energy nitrogen ion implantation of graphite and diamond surfacesGouzman, I. et al. | 1999
- 421
-
Articles - A (NH4)2Sx-treated InSb(001) surface studied by using x-ray photoelectron spectroscopy, low-energy electron diffraction, and inverse photoemission spectroscopyIchikawa, S. et al. | 1999
- 421
-
A -treated InSb(001) surface studied by using x-ray photoelectron spectroscopy, low-energy electron diffraction, and inverse photoemission spectroscopyIchikawa, S. / Suzuki, Y. / Sanada, N. / Utsumi, N. / Yamaguchi, T. / Gong, X. Y. / Fukuda, Y. et al. | 1999
- 425
-
Effects of helium dilution of gas mixture on plasma-enhanced chemical vapor deposition of fluorine-doped silicon oxide filmYoshimaru, Masaki / Koizumi, Satoshi / Shimokawa, Kimiaki / Mori, Y. / Fukuda, H. / Matsuki, N. et al. | 1999
- 425
-
Articles - Effects of helium dilution of TEOS-O2-C2F6 gas mixture on plasma-enhanced chemical vapor deposition of fluorine-doped silicon oxide filmYoshimaru, Masaki et al. | 1999
- 433
-
Silicon nitride thin films deposited by electron cyclotron resonance plasma-enhanced chemical vapor depositionLapeyrade, M. / Besland, M. P. / Meva’a, C. / Sibaï, A. / Hollinger, G. et al. | 1999
- 433
-
Articles - Silicon nitride thin films deposited by electron cyclotron resonance plasma-enhanced chemical vapor depositionLapeyrade, M. et al. | 1999
- 445
-
Articles - Pulsed plasma-enhanced chemical vapor deposition from CH2F2, C2H2F4, and CHClF2Labelle, Catherine B. et al. | 1999
- 445
-
Pulsed plasma-enhanced chemical vapor deposition from andLabelle, Catherine B. / Gleason, Karen K. et al. | 1999
- 445
-
Pulsed plasma-enhanced chemical vapor deposition from CH~2F~2, C~2H~2F~4, and CHCIF~2Labelle, C. B. / Gleason, K. K. et al. | 1999
- 453
-
Articles - Depth dependence of hydrogenation using electron cyclotron plasma in GaAs-on-Si solar cell structuresKakinuma, H. et al. | 1999
- 453
-
Depth dependence of hydrogenation using electron cyclotron plasma in GaAs-on-Si solar cell structuresKakinuma, H. / Ueda, T. / Gotoh, S. / Akiyama, M. et al. | 1999
- 458
-
Articles - Effect of postplasma treatment on characteristics of electron cyclotron resonance chemical vapor deposition SiOF filmsLee, Seoghyeong et al. | 1999
- 458
-
Effect of postplasma treatment on characteristics of electron cyclotron resonance chemical vapor deposition SiOF filmsLee, Seoghyeong / Park, Jong-Wan et al. | 1999
- 463
-
Color, structure, and properties of TiN coatings prepared by plasma enhanced chemical vapor depositionNah, Jae-Woong / Kim, Byoung-June / Lee, Dong-Kak / Lee, Jung-Joong et al. | 1999
- 463
-
Articles - Color, structure, and properties of TiN coatings prepared by plasma enhanced chemical vapor depositionNah, Jae-Woong et al. | 1999
- 470
-
Audio-frequency glow discharge for plasma chemical vapor deposition from organic compounds of the carbon familyTyczkowski, J. et al. | 1999
- 470
-
Articles - Audio-frequency glow discharge for plasma chemical vapor deposition from organic compounds of the carbon familyTyczkowski, J. et al. | 1999
- 480
-
Langmuir probe studies of a transformer-coupled plasma, aluminum etcherMalyshev, M. V. / Donnelly, V. M. / Kornblit, A. / Ciampa, N. A. / Colonell, J. I. / Lee, J. T. C. et al. | 1999
- 480
-
Articles - Langmuir probe studies of a transformer-coupled plasma, aluminum etcherMalyshev, M.V. et al. | 1999
- 493
-
Comparison of electron property measurements in an inductively coupled plasma made by Langmuir probe and laser Thomson scattering techniquesBowden, M. D. / Kogano, M. / Suetome, Y. / Hori, T. / Uchino, K. / Muraoka, K. et al. | 1999
- 493
-
Articles - Comparison of electron property measurements in an inductively coupled plasma made by Langmuir probe and laser Thomson scattering techniquesBowden, M.D. et al. | 1999
- 500
-
Effects of rare gas dilution for control of dissociation, ionization, and radical density in fluorocarbon ultrahigh-frequency plasmasSamukawa, Seiji / Nakano, Toshiki et al. | 1999
- 500
-
Articles - Effects of rare gas dilution for control of dissociation, ionization, and radical density in fluorocarbon ultrahigh-frequency plasmasSamukawa, Seiji et al. | 1999
- 506
-
Articles - Energy distribution of ions bombarding biased electrodes in high density plasma reactorsEdelberg, Erik A. et al. | 1999
- 506
-
Energy distribution of ions bombarding biased electrodes in high density plasma reactorsEdelberg, Erik A. / Perry, Andrew / Benjamin, Neil / Aydil, Eray S. et al. | 1999
- 517
-
Planar laser-induced fluorescence of in and chamber-cleaning plasmas: Spatial uniformity and comparison to electrical measurementsSteffens, Kristen L. / Sobolewski, Mark A. et al. | 1999
- 517
-
Articles - Planar laser-induced fluorescence of CF2 in O2-CF4 and O2-C2F6 chamber-cleaning plasmas: Spatial uniformity and comparison to electrical measurementsSteffens, Kristen L. et al. | 1999
- 528
-
Radial profile of energetic particles bombarding the substrate in a glow dischargeMoreno-Marı́n, Juan Carlos / Abril, Isabel / Garcia-Molina, Rafael et al. | 1999
- 528
-
Articles - Radial profile of energetic particles bombarding the substrate in a glow dischargeMoreno-Marin, Juan Carlos et al. | 1999
- 535
-
Articles - Patterning of NiFe and NiFeCo in CO-NH3 high density plasmasJung, K.B. et al. | 1999
- 535
-
Patterning of NiFe and NiFeCo in high density plasmasJung, K. B. / Hong, J. / Cho, H. / Onishi, S. / Johnson, D. / Park, Y. D. / Childress, J. R. / Pearton, S. J. et al. | 1999
- 540
-
Formation of alkylsiloxane self-assembled monolayers onSung, Myung M. / Kluth, G. Jonathan / Maboudian, Roya et al. | 1999
- 540
-
Articles - Formation of alkylsiloxane self-assembled monolayers on Si3N4Sung, Myung M. et al. | 1999
- 545
-
Articles - Growth kinetics and relationship between structure and mechanical properties of a-C(N):H films deposited in acetylene-nitrogen atmospheresJacobsohn, L.G. et al. | 1999
- 545
-
Growth kinetics and relationship between structure and mechanical properties of films deposited in acetylene–nitrogen atmospheresJacobsohn, L. G. / Freire, F. L. / Franceschini, D. F. / Lacerda, M. M. / Mariotto, G. et al. | 1999
- 552
-
Temperature dependence of /Si interfacial structure formed by radio-frequency magnetron sputter deposited thin films on Si(111)Li, Boquan / Fujimoto, Toshiyuki / Kojima, Isao et al. | 1999
- 552
-
Temperature dependence of SiO~2/Si interracial structure formed by radio-frequency magnetron sputter deposited SiO~2 thin films on Si(111)Li, B. / Fujimoto, T. / Kojima, I. et al. | 1999
- 552
-
Articles - Temperature dependence of SiO2-Si interfacial structure formed by radio-frequency magnetron sputter deposited SiO2 thin films on Si(111)Li, Boquan et al. | 1999
- 555
-
Articles - Rectangular magnetron with full target erosionMusil, J. et al. | 1999
- 555
-
Rectangular magnetron with full target erosionMusil, J. et al. | 1999
- 564
-
Articles - Composition, structure, and dielectric tunability of epitaxial SrTiO3 thin films grown by radio frequency magnetron sputteringWang, Xin et al. | 1999
- 564
-
Composition, structure, and dielectric tunability of epitaxial thin films grown by radio frequency magnetron sputteringWang, Xin / Helmersson, Ulf / Madsen, Lynnette D. / Ivanov, Ivan P. / Münger, Peter / Rudner, Staffan / Hjörvarsson, B. / Sundgren, Jan-Eric et al. | 1999
- 571
-
Articles - Comparison of the temperature dependence of the properties of ion beam and magnetron sputtered Fe films on (100) GaAsBernstein, S.D. et al. | 1999
- 571
-
Comparison of the temperature dependence of the properties of ion beam and magnetron sputtered Fe films on (100) GaAsBernstein, S. D. / Wong, T. Y. / Tustison, R. W. et al. | 1999
- 577
-
Articles - Transmission electron microscopy study of platinum clusters on Al2O3-NiAl(110) under the influence of electron irradiationNepijko, S.A. et al. | 1999
- 577
-
Transmission electron microscopy study of platinum clusters on under the influence of electron irradiationNepijko, S. A. / Klimenkov, M. / Kuhlenbeck, H. / Freund, H.-J. et al. | 1999
- 584
-
Articles - Polymerization of dual ion beam deposited CNx films with increasing N contentNg, Y.M. et al. | 1999
- 584
-
Polymerization of dual ion beam deposited films with increasing N contentNg, Y. M. / Ong, C. W. / Zhao, X.-A. / Choy, C. L. et al. | 1999
- 593
-
X-ray emission study of ion beam mixed Cu/Al films on polyimideKurmaev, E. Z. / Zatsepin, D. A. / Winarski, R. P. / Stadler, S. / Ederer, D. L. / Moewes, A. / Fedorenko, V. V. / Shamin, S. N. / Galakhov, V. R. / Chang, G. S. et al. | 1999
- 593
-
Articles - X-ray emission study of ion beam mixed Cu-Al films on polyimideKurmaev, E.Z. et al. | 1999
- 597
-
Articles - Study of stress evolution of boron nitride films prepared by ion assisted depositionZeitler, Michael et al. | 1999
- 597
-
Study of stress evolution of boron nitride films prepared by ion assisted depositionZeitler, Michael / Sienz, Stefan / Rauschenbach, Bernd et al. | 1999
- 603
-
Mechanical properties and residual stress in AlN/Al mixed films prepared by ion-beam-assisted depositionWatanabe, Yoshihisa / Uchiyama, Shingo / Nakamura, Yoshikazu / Li, Chunlang / Sekino, Tohru / Niihara, Koichi et al. | 1999
- 603
-
Articles - Mechanical properties and residual stress in AIN-Al mixed films prepared by ion-beam-assisted depositionWatanabe, Yoshihisa et al. | 1999
- 608
-
Particle generation in W–Ti depositionLo, Chi-Fung / Gilman, Paul et al. | 1999
- 608
-
Articles - Particle generation in W-Ti depositionLo, Chi-Fung et al. | 1999
- 611
-
Influence of crucible material and source alloy composition on thermally evaporated indium tin oxide layersKerp, H. R. / van Cleef, M. W. M. / Wit, A. B. / Schropp, R. E. I. / Galloni, R. / Lazzeri, P. et al. | 1999
- 611
-
Articles - Influence of crucible material and source alloy composition on thermally evaporated indium tin oxide layersKerp, H.R. et al. | 1999
- 615
-
Velocity distribution of organic molecules emitted from effusion cells measured by time-of-flight techniqueShimada, Toshihiro / Koide, Jun / Cho, Kyoung Ah / Koma, Atsushi et al. | 1999
- 615
-
Articles - Velocity distribution of organic molecules emitted from effusion cells measured by time-of-flight techniqueShimada, Toshihiro et al. | 1999
- 619
-
Formation of films by pulsed laser deposition using iron targetLiu, Zhengxin / Okoshi, Masayuki / Hanabusa, Mitsugu et al. | 1999
- 619
-
Formation of beta -FeSi2 films by pulsed laser deposition using iron targetLiu, Zhengxin / Okoshi, M. / Hanabusa, M. et al. | 1999
- 619
-
Articles - Formation of b-FeSl2 films by pulsed laser deposition using iron targetLiu, Zhengxin et al. | 1999
- 624
-
Processing of porous GaAs at Iow frequency sparkingGudi�o-Martinez, A. / Rosendo, E. / Vidal, M. A. / Navarro-Contreras, H. / Rojas-Lopez, M. et al. | 1999
- 624
-
Articles - Processing of porous GaAs at low frequency sparkingGudiño-Martinez, A. et al. | 1999
- 624
-
Processing of porous GaAs at low frequency sparkingGudiño-Martínez, A. / Rosendo, E. / Vidal, M. A. / Navarro-Contreras, H. / Rojas-López, M. et al. | 1999
- 630
-
Ni content and grain size dependency of perovskite structure thin films for CO gas sensorChiu, C. M. / Chang, Y. H. et al. | 1999
- 630
-
Articles - Ni content and grain size dependency of perovskite structure La0.8Sr0.2Co1-xNixO3-d thin films for CO gas sensorChiu, C.M. et al. | 1999
- 630
-
Ni content and grain size dependency of perovskite structure La0.8Sr0.2Co1-xNixO3- delta thin films for CO gas sensorChiu, C.M. / Chang, Y.H. et al. | 1999
- 635
-
Articles - Photon stimulated desorption of an unbaked stainless steel chamber by 3.75 keV critical energy photonsHerbeaux, C. et al. | 1999
- 635
-
Photon stimulated desorption of an unbaked stainless steel chamber by 3.75 keV critical energy photonsHerbeaux, C. / Marin, P. / Baglin, V. / Gröbner, O. et al. | 1999
- 644
-
Study of the surface morphology and gas sensing properties of thin films deposited by vacuum thermal evaporationSantucci, S. / Lozzi, L. / Passacantando, M. / Di Nardo, S. / Phani, A. R. / Cantalini, C. / Pelino, M. et al. | 1999
- 644
-
Articles - Study of the surface morphology and gas sensing properties of WO3 thin films deposited by vacuum thermal evaporationSantucci, S. et al. | 1999
- 650
-
Measurements of trace gaseous ambient impurities on an atmospheric pressure rapid thermal processorKondoh, Eiichi / Vereecke, Guy / Heyns, Marc M. / Maex, Karen / Gutt, Thomas et al. | 1999
- 650
-
Articles - Measurements of trace gaseous ambient impurities on an atmospheric pressure rapid thermal processorKondoh, Eiichi et al. | 1999
- 657
-
Fluorination of Si(001)-2x1 surface near step edges: A mechanism for surface defect Induced etchingSrivastava, D. / Halicioglu, T. / Schoolcraft, T. A. et al. | 1999
- 657
-
Articles - Fluorination of Si(001)-2x1 surface near step edges: A mechanism for surface defect induced etchingSrivastava, Deepak et al. | 1999
- 657
-
Fluorination of Si(001)-2×1 surface near step edges: A mechanism for surface defect induced etchingSrivastava, Deepak / Halicioglu, Timur / Schoolcraft, Tracy A. et al. | 1999
- 662
-
Chemical and structural alterations induced at surfaces by air exposures following atomic oxygen or 1 keV treatmentsWolan, John T. / Hoflund, Gar B. et al. | 1999
- 662
-
Brief Reports and Comments - Chemical and structural alterations induced at Kapton(D) surfaces by air exposures following atomic oxygen or 1 keV Ar+ treatmentsWolan, John T. et al. | 1999
- 662
-
Chemical and structural alterations induced at Kapton[R] surfaces by air exposures following atomic oxygen or 1 kev Ar^+ treatmentsWolan, J. T. / Hoflund, G. B. et al. | 1999
- 665
-
Mechanism of nitrogen removal from silicon nitride by nitric oxideBlain, M. G. et al. | 1999
- 665
-
Brief Reports and Comments - Mechanism of nitrogen removal from silicon nitride by nitric oxideBlain, M.G. et al. | 1999
- 668
-
Transferable resistively heated metal evaporator for ultrahigh vacuumDrummond, Thomas G. / Burgess, James S. / Wallace, William T. / Leavitt, Andrew J. et al. | 1999
- 668
-
Shop Notes - Transferable resistively heated metal evaporator for ultrahigh vacuumDrummond, Thomas G. et al. | 1999
- 670
-
Photon shield for atomic hydrogen plasma sourcesNienhaus, H. / Gergen, B. / Bergh, H. S. / Majumdar, A. / Weinberg, W. H. / McFarland, E. W. et al. | 1999
- 670
-
Shop Notes - Photon shield for atomic hydrogen plasma sourcesNienhaus, H. et al. | 1999
- 673
-
A convenient means of securing gaskets during assembly of vertically oriented knife-edge flangesMcCabe, P. R. / Utz, A. L. et al. | 1999
- 673
-
Shop Notes - A convenient means of securing gaskets during assembly of vertically oriented knife-edge flangesMcCabe, P.R. et al. | 1999
- 674
-
Ultrahigh vacuum dual fluid line rotatable connectorKaczer, B. / Jones, D. E. / Im, H.-J. / Pelz, J. P. et al. | 1999
- 674
-
Shop Notes - Ultrahigh vacuum dual fluid line rotatable connectorKaczer, B. et al. | 1999
- 676
-
CUMULATIVE AUTHOR INDEX| 1999